DE3360694D1 - Apparatus and method for exposing a substrate - Google Patents
Apparatus and method for exposing a substrateInfo
- Publication number
- DE3360694D1 DE3360694D1 DE8383101043T DE3360694T DE3360694D1 DE 3360694 D1 DE3360694 D1 DE 3360694D1 DE 8383101043 T DE8383101043 T DE 8383101043T DE 3360694 T DE3360694 T DE 3360694T DE 3360694 D1 DE3360694 D1 DE 3360694D1
- Authority
- DE
- Germany
- Prior art keywords
- exposing
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34675282A | 1982-02-08 | 1982-02-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3360694D1 true DE3360694D1 (en) | 1985-10-10 |
Family
ID=23360903
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8383101043T Expired DE3360694D1 (en) | 1982-02-08 | 1983-02-04 | Apparatus and method for exposing a substrate |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0086410B1 (de) |
JP (1) | JPS58147121A (de) |
CA (1) | CA1191728A (de) |
DE (1) | DE3360694D1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3249669C2 (de) * | 1982-10-18 | 1986-06-05 | Wilhelm Staub Gmbh, 6078 Neu-Isenburg | Beleuchtungsvorrichtung in einer Leiterplattenkopiervorrichtung |
EP0250975B1 (de) * | 1986-06-13 | 1991-08-28 | Dainippon Screen Mfg. Co., Ltd. | Belichtungssystem |
JPH01243042A (ja) * | 1988-03-24 | 1989-09-27 | Ushio Yuutec:Kk | フィルム密着反転プリンター及びフィルム密着反転プリンターの歪の防止方法 |
DE3925455A1 (de) * | 1989-08-01 | 1991-02-14 | Robert Hanus | Belichtungsvorrichtung zum belichten eines metallkaschierten basismaterials |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2048471A1 (en) * | 1970-10-02 | 1972-04-06 | Sel | Plastics embossing machine - esp for printing plates using direct uv hardening of emulsion by image tube |
US3761264A (en) * | 1971-10-12 | 1973-09-25 | Rca Corp | Method of defining a detailed pattern on a surface of a body |
DE2603879A1 (de) * | 1976-02-02 | 1977-08-04 | Siemens Ag | Belichtungsanordnung |
-
1983
- 1983-02-03 CA CA000420848A patent/CA1191728A/en not_active Expired
- 1983-02-04 EP EP19830101043 patent/EP0086410B1/de not_active Expired
- 1983-02-04 DE DE8383101043T patent/DE3360694D1/de not_active Expired
- 1983-02-07 JP JP58017595A patent/JPS58147121A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP0086410A1 (de) | 1983-08-24 |
JPS58147121A (ja) | 1983-09-01 |
EP0086410B1 (de) | 1985-09-04 |
CA1191728A (en) | 1985-08-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |