DE3278835D1 - Exposure method utilising an energy beam - Google Patents
Exposure method utilising an energy beamInfo
- Publication number
- DE3278835D1 DE3278835D1 DE8282304571T DE3278835T DE3278835D1 DE 3278835 D1 DE3278835 D1 DE 3278835D1 DE 8282304571 T DE8282304571 T DE 8282304571T DE 3278835 T DE3278835 T DE 3278835T DE 3278835 D1 DE3278835 D1 DE 3278835D1
- Authority
- DE
- Germany
- Prior art keywords
- energy beam
- exposure method
- method utilising
- utilising
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56138762A JPS5840826A (ja) | 1981-09-03 | 1981-09-03 | 荷電ビ−ム露光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3278835D1 true DE3278835D1 (en) | 1988-09-01 |
Family
ID=15229586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282304571T Expired DE3278835D1 (en) | 1981-09-03 | 1982-08-31 | Exposure method utilising an energy beam |
Country Status (4)
Country | Link |
---|---|
US (1) | US4530064A (de) |
EP (1) | EP0074238B1 (de) |
JP (1) | JPS5840826A (de) |
DE (1) | DE3278835D1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4630223A (en) * | 1984-03-05 | 1986-12-16 | Minnesota Mining And Manufacturing Company | Scanner amplitude stabilization system |
US4718019A (en) * | 1985-06-28 | 1988-01-05 | Control Data Corporation | Election beam exposure system and an apparatus for carrying out a pattern unwinder |
US4806921A (en) * | 1985-10-04 | 1989-02-21 | Ateq Corporation | Rasterizer for pattern generator |
GB2190567A (en) * | 1986-05-16 | 1987-11-18 | Philips Electronic Associated | Electron beam pattern generator control |
JPS63314833A (ja) * | 1987-06-17 | 1988-12-22 | Jeol Ltd | ビ−ム描画装置 |
US4943730A (en) * | 1988-09-19 | 1990-07-24 | Jeol Ltd. | Charged particle beam lithography method |
JPH0748471B2 (ja) * | 1988-09-19 | 1995-05-24 | 日本電子株式会社 | 荷電粒子ビーム描画方法 |
US5434795A (en) * | 1990-01-11 | 1995-07-18 | Fujitsu Limited | Method of forming pattern having optical angle in charged particle exposure system |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5316578A (en) * | 1976-07-30 | 1978-02-15 | Toshiba Corp | Electron beam exposure apparatus |
US4199689A (en) * | 1977-12-21 | 1980-04-22 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam exposing method and electron beam apparatus |
US4280186A (en) * | 1978-07-07 | 1981-07-21 | Tokyo Shibaura Denki Kabushiki Kaisha | Exposure apparatus using electron beams |
DE3069060D1 (en) * | 1979-06-08 | 1984-10-04 | Fujitsu Ltd | Electron beam projecting system |
JPS56135929A (en) * | 1980-03-28 | 1981-10-23 | Toshiba Corp | Electron-beam drawing device |
-
1981
- 1981-09-03 JP JP56138762A patent/JPS5840826A/ja active Granted
-
1982
- 1982-08-24 US US06/411,044 patent/US4530064A/en not_active Expired - Lifetime
- 1982-08-31 EP EP82304571A patent/EP0074238B1/de not_active Expired
- 1982-08-31 DE DE8282304571T patent/DE3278835D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0074238A2 (de) | 1983-03-16 |
US4530064A (en) | 1985-07-16 |
JPS5840826A (ja) | 1983-03-09 |
EP0074238A3 (en) | 1985-01-30 |
EP0074238B1 (de) | 1988-07-27 |
JPS6219047B2 (de) | 1987-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |