DE3278835D1 - Exposure method utilising an energy beam - Google Patents

Exposure method utilising an energy beam

Info

Publication number
DE3278835D1
DE3278835D1 DE8282304571T DE3278835T DE3278835D1 DE 3278835 D1 DE3278835 D1 DE 3278835D1 DE 8282304571 T DE8282304571 T DE 8282304571T DE 3278835 T DE3278835 T DE 3278835T DE 3278835 D1 DE3278835 D1 DE 3278835D1
Authority
DE
Germany
Prior art keywords
energy beam
exposure method
method utilising
utilising
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282304571T
Other languages
German (de)
Inventor
Tadahiro Patent Divis Takigawa
Yasunobe Kawauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Shibaura Machine Co Ltd
Original Assignee
Toshiba Corp
Toshiba Machine Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Machine Co Ltd filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3278835D1 publication Critical patent/DE3278835D1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
DE8282304571T 1981-09-03 1982-08-31 Exposure method utilising an energy beam Expired DE3278835D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56138762A JPS5840826A (en) 1981-09-03 1981-09-03 Charged beam exposure

Publications (1)

Publication Number Publication Date
DE3278835D1 true DE3278835D1 (en) 1988-09-01

Family

ID=15229586

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282304571T Expired DE3278835D1 (en) 1981-09-03 1982-08-31 Exposure method utilising an energy beam

Country Status (4)

Country Link
US (1) US4530064A (en)
EP (1) EP0074238B1 (en)
JP (1) JPS5840826A (en)
DE (1) DE3278835D1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4630223A (en) * 1984-03-05 1986-12-16 Minnesota Mining And Manufacturing Company Scanner amplitude stabilization system
US4718019A (en) * 1985-06-28 1988-01-05 Control Data Corporation Election beam exposure system and an apparatus for carrying out a pattern unwinder
US4806921A (en) * 1985-10-04 1989-02-21 Ateq Corporation Rasterizer for pattern generator
GB2190567A (en) * 1986-05-16 1987-11-18 Philips Electronic Associated Electron beam pattern generator control
JPS63314833A (en) * 1987-06-17 1988-12-22 Jeol Ltd Beam lithography equipment
JPH0748471B2 (en) * 1988-09-19 1995-05-24 日本電子株式会社 Charged particle beam drawing method
US4943730A (en) * 1988-09-19 1990-07-24 Jeol Ltd. Charged particle beam lithography method
US5434795A (en) * 1990-01-11 1995-07-18 Fujitsu Limited Method of forming pattern having optical angle in charged particle exposure system

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
US4199689A (en) * 1977-12-21 1980-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposing method and electron beam apparatus
US4280186A (en) * 1978-07-07 1981-07-21 Tokyo Shibaura Denki Kabushiki Kaisha Exposure apparatus using electron beams
DE3069060D1 (en) * 1979-06-08 1984-10-04 Fujitsu Ltd Electron beam projecting system
JPS56135929A (en) * 1980-03-28 1981-10-23 Toshiba Corp Electron-beam drawing device

Also Published As

Publication number Publication date
EP0074238A3 (en) 1985-01-30
JPS5840826A (en) 1983-03-09
US4530064A (en) 1985-07-16
EP0074238B1 (en) 1988-07-27
JPS6219047B2 (en) 1987-04-25
EP0074238A2 (en) 1983-03-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition