DE3278183D1 - A semiconductor integrated device and a method for manufacturing the same - Google Patents
A semiconductor integrated device and a method for manufacturing the sameInfo
- Publication number
- DE3278183D1 DE3278183D1 DE8282303391T DE3278183T DE3278183D1 DE 3278183 D1 DE3278183 D1 DE 3278183D1 DE 8282303391 T DE8282303391 T DE 8282303391T DE 3278183 T DE3278183 T DE 3278183T DE 3278183 D1 DE3278183 D1 DE 3278183D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- same
- semiconductor integrated
- integrated device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/04—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of a single character by selection from a plurality of characters, or by composing the character by combination of individual elements, e.g. segments using a combination of such display devices for composing words, rows or the like, in a frame with fixed character positions
- G09G3/06—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of a single character by selection from a plurality of characters, or by composing the character by combination of individual elements, e.g. segments using a combination of such display devices for composing words, rows or the like, in a frame with fixed character positions using controlled light sources
- G09G3/10—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of a single character by selection from a plurality of characters, or by composing the character by combination of individual elements, e.g. segments using a combination of such display devices for composing words, rows or the like, in a frame with fixed character positions using controlled light sources using gas tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8238—Complementary field-effect transistors, e.g. CMOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
- H01L27/0922—Combination of complementary transistors having a different structure, e.g. stacked CMOS, high-voltage and low-voltage CMOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
- H01L29/7835—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with asymmetrical source and drain regions, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Ceramic Engineering (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56100510A JPS583264A (ja) | 1981-06-30 | 1981-06-30 | 高耐圧半導体集積回路およびその製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3278183D1 true DE3278183D1 (en) | 1988-04-07 |
Family
ID=14275940
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8282303391T Expired DE3278183D1 (en) | 1981-06-30 | 1982-06-29 | A semiconductor integrated device and a method for manufacturing the same |
Country Status (4)
Country | Link |
---|---|
US (1) | US4677314A (de) |
EP (1) | EP0069524B1 (de) |
JP (1) | JPS583264A (de) |
DE (1) | DE3278183D1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2552575B1 (fr) * | 1983-09-27 | 1985-11-08 | Thomson Csf | Circuit de commande d'un panneau a plasma de type alternatif |
US5016077A (en) * | 1985-08-26 | 1991-05-14 | Kabushiki Kaisha Toshiba | Insulated gate type semiconductor device and method of manufacturing the same |
NL8503331A (nl) * | 1985-12-03 | 1987-07-01 | Philips Nv | Geintegreerde schakeling bevattende een lastkapaciteit en geintegreerde referentiebron. |
US4737667A (en) * | 1986-03-11 | 1988-04-12 | Siemens Aktiengesellschaft | Driving circuitry for a MOSFET having a source load |
JP2728424B2 (ja) * | 1988-03-16 | 1998-03-18 | 株式会社日立製作所 | 半導体集積回路装置 |
US5128823A (en) * | 1989-06-14 | 1992-07-07 | Nippondenso Co., Ltd. | Power semiconductor apparatus |
US5471225A (en) * | 1993-04-28 | 1995-11-28 | Dell Usa, L.P. | Liquid crystal display with integrated frame buffer |
US20080056795A1 (en) * | 2006-08-31 | 2008-03-06 | Toshiba Tec Kabushiki Kaisha | Ribbon cassette and printer using the ribbon cassette |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3472712A (en) * | 1966-10-27 | 1969-10-14 | Hughes Aircraft Co | Field-effect device with insulated gate |
GB1233545A (de) * | 1967-08-18 | 1971-05-26 | ||
US3925120A (en) * | 1969-10-27 | 1975-12-09 | Hitachi Ltd | A method for manufacturing a semiconductor device having a buried epitaxial layer |
US3657568A (en) * | 1970-01-05 | 1972-04-18 | Hamilton Watch Co | Pulse shaping circuit using complementary mos devices |
US3679492A (en) * | 1970-03-23 | 1972-07-25 | Ibm | Process for making mosfet's |
US3997813A (en) * | 1975-11-10 | 1976-12-14 | Burroughs Corporation | MOS integrated circuit chip for display panels |
US4072937A (en) * | 1976-01-15 | 1978-02-07 | Bell Telephone Laboratories, Incorporated | MOS transistor driver circuits for plasma panels and similar matrix display devices |
US4268847A (en) * | 1977-09-16 | 1981-05-19 | Nippon Electric Co., Ltd. | Semiconductor device having an insulated gate type field effect transistor and method for producing the same |
DE2832388C2 (de) * | 1978-07-24 | 1986-08-14 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von MNOS- und MOS-Transistoren in Silizium-Gate-Technologie auf einem Halbleitersubstrat |
US4223334A (en) * | 1978-08-29 | 1980-09-16 | Harris Corporation | High voltage CMOS with local oxidation for self-aligned guard rings and process of fabrication |
US4232327A (en) * | 1978-11-13 | 1980-11-04 | Rca Corporation | Extended drain self-aligned silicon gate MOSFET |
-
1981
- 1981-06-30 JP JP56100510A patent/JPS583264A/ja active Pending
-
1982
- 1982-06-29 EP EP82303391A patent/EP0069524B1/de not_active Expired
- 1982-06-29 DE DE8282303391T patent/DE3278183D1/de not_active Expired
-
1986
- 1986-09-30 US US06/913,580 patent/US4677314A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US4677314A (en) | 1987-06-30 |
JPS583264A (ja) | 1983-01-10 |
EP0069524B1 (de) | 1988-03-02 |
EP0069524A1 (de) | 1983-01-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |