DE3277021D1 - Vacuum sputtering apparatus - Google Patents
Vacuum sputtering apparatusInfo
- Publication number
- DE3277021D1 DE3277021D1 DE8282306336T DE3277021T DE3277021D1 DE 3277021 D1 DE3277021 D1 DE 3277021D1 DE 8282306336 T DE8282306336 T DE 8282306336T DE 3277021 T DE3277021 T DE 3277021T DE 3277021 D1 DE3277021 D1 DE 3277021D1
- Authority
- DE
- Germany
- Prior art keywords
- sputtering apparatus
- vacuum sputtering
- vacuum
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/327,971 US4525264A (en) | 1981-12-07 | 1981-12-07 | Cylindrical post magnetron sputtering system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3277021D1 true DE3277021D1 (en) | 1987-09-24 |
Family
ID=23278909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8282306336T Expired DE3277021D1 (en) | 1981-12-07 | 1982-11-29 | Vacuum sputtering apparatus |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4525264A (de) |
| EP (1) | EP0081331B1 (de) |
| JP (1) | JPS58100681A (de) |
| DE (1) | DE3277021D1 (de) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4683758A (en) * | 1986-01-16 | 1987-08-04 | Ford Motor Company | Device for measuring stresses in vacuum deposition coatings |
| US4774437A (en) * | 1986-02-28 | 1988-09-27 | Varian Associates, Inc. | Inverted re-entrant magnetron ion source |
| EP0270807B1 (de) * | 1986-11-21 | 1993-04-28 | Balzers Aktiengesellschaft | Vorrichtung zur Uebertragung elektrischer Ströme auf rotierende Maschinenteile |
| AT392291B (de) * | 1987-09-01 | 1991-02-25 | Miba Gleitlager Ag | Stabfoermige sowie magnetron- bzw. sputterkathodenanordnung, sputterverfahren, und vorrichtung zur durchfuehrung des verfahrens |
| US5130005A (en) * | 1990-10-31 | 1992-07-14 | Materials Research Corporation | Magnetron sputter coating method and apparatus with rotating magnet cathode |
| US5147520A (en) * | 1991-02-15 | 1992-09-15 | Mcnc | Apparatus and method for controlling processing uniformity in a magnetron |
| US5374343A (en) * | 1992-05-15 | 1994-12-20 | Anelva Corporation | Magnetron cathode assembly |
| US5922176A (en) * | 1992-06-12 | 1999-07-13 | Donnelly Corporation | Spark eliminating sputtering target and method for using and making same |
| JPH08506855A (ja) * | 1993-01-15 | 1996-07-23 | ザ ビーオーシー グループ インコーポレイテッド | 円筒形マグネトロンのシールド構造 |
| WO1996021750A1 (en) * | 1995-01-12 | 1996-07-18 | The Boc Group, Inc. | Rotatable magnetron with curved or segmented end magnets |
| US5527439A (en) * | 1995-01-23 | 1996-06-18 | The Boc Group, Inc. | Cylindrical magnetron shield structure |
| DE69928790T2 (de) * | 1998-04-16 | 2006-08-31 | Bekaert Advanced Coatings N.V. | Mittel zur kontrolle der targetabtragung und der zerstäubung in einem magnetron |
| US6436252B1 (en) | 2000-04-07 | 2002-08-20 | Surface Engineered Products Corp. | Method and apparatus for magnetron sputtering |
| CA2567372A1 (en) * | 2004-07-01 | 2006-01-19 | Cardinal Cg Company | Cylindrical target with oscillating magnet from magnetron sputtering |
| US7790003B2 (en) * | 2004-10-12 | 2010-09-07 | Southwest Research Institute | Method for magnetron sputter deposition |
| US7520965B2 (en) * | 2004-10-12 | 2009-04-21 | Southwest Research Institute | Magnetron sputtering apparatus and method for depositing a coating using same |
| US7592051B2 (en) * | 2005-02-09 | 2009-09-22 | Southwest Research Institute | Nanostructured low-Cr Cu-Cr coatings for high temperature oxidation resistance |
| US20070080056A1 (en) * | 2005-10-07 | 2007-04-12 | German John R | Method and apparatus for cylindrical magnetron sputtering using multiple electron drift paths |
| DE102008018609B4 (de) * | 2008-04-11 | 2012-01-19 | Von Ardenne Anlagentechnik Gmbh | Antriebsendblock für ein rotierendes Magnetron |
| EP2407999B1 (de) * | 2010-07-16 | 2014-09-03 | Applied Materials, Inc. | Magnetanordnung für eine Auffangträgerelektrode, Auffangträgerelektrode, die sie umfasst, zylindrische Auffanganordnung und Zerstäubungssystem |
| WO2016135693A1 (en) * | 2015-02-27 | 2016-09-01 | Istituto Nazionale Di Fisica Nucleare | System for magnetron sputtering deposition of a film of a base material on the interior surface of a substrate |
| IT201600126397A1 (it) * | 2016-12-14 | 2018-06-14 | Kenosistec S R L | Macchina per la deposizione di materiale secondo la tecnica di polverizzazione catodica. |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4041353A (en) * | 1971-09-07 | 1977-08-09 | Telic Corporation | Glow discharge method and apparatus |
| US4030996A (en) * | 1971-09-07 | 1977-06-21 | Telic Corporation | Electrode type glow discharge method and apparatus |
| US3884793A (en) * | 1971-09-07 | 1975-05-20 | Telic Corp | Electrode type glow discharge apparatus |
| US4031424A (en) * | 1971-09-07 | 1977-06-21 | Telic Corporation | Electrode type glow discharge apparatus |
| US3995187A (en) * | 1971-09-07 | 1976-11-30 | Telic Corporation | Electrode type glow discharge apparatus |
| JPS51117933A (en) * | 1975-04-10 | 1976-10-16 | Tokuda Seisakusho | Spattering apparatus |
| US4179351A (en) * | 1976-09-09 | 1979-12-18 | Hewlett-Packard Company | Cylindrical magnetron sputtering source |
| JPS5358489A (en) * | 1976-11-08 | 1978-05-26 | Ise Electronics Corp | Spattering system |
| US4126530A (en) * | 1977-08-04 | 1978-11-21 | Telic Corporation | Method and apparatus for sputter cleaning and bias sputtering |
| US4175030A (en) * | 1977-12-08 | 1979-11-20 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4116806A (en) * | 1977-12-08 | 1978-09-26 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4180450A (en) * | 1978-08-21 | 1979-12-25 | Vac-Tec Systems, Inc. | Planar magnetron sputtering device |
| US4243505A (en) * | 1979-06-18 | 1981-01-06 | Telic Corporation | Magnetic field generator for use in sputtering apparatus |
| US4457825A (en) * | 1980-05-16 | 1984-07-03 | Varian Associates, Inc. | Sputter target for use in a sputter coating source |
| EP0046154B1 (de) * | 1980-08-08 | 1984-11-28 | Battelle Development Corporation | Vorrichtung zur Beschichtung von Substraten mittels Hochleistungskathodenzerstäubung sowie Zerstäuberkathode für diese Vorrichtung |
| US4356073A (en) * | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
-
1981
- 1981-12-07 US US06/327,971 patent/US4525264A/en not_active Expired - Fee Related
-
1982
- 1982-11-04 JP JP57193925A patent/JPS58100681A/ja active Pending
- 1982-11-29 EP EP82306336A patent/EP0081331B1/de not_active Expired
- 1982-11-29 DE DE8282306336T patent/DE3277021D1/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| EP0081331B1 (de) | 1987-08-19 |
| US4525264A (en) | 1985-06-25 |
| JPS58100681A (ja) | 1983-06-15 |
| EP0081331A1 (de) | 1983-06-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8320 | Willingness to grant licences declared (paragraph 23) | ||
| 8330 | Complete disclaimer |