DE3269664D1 - Negative-type resist sensitive to ionizing radiation - Google Patents

Negative-type resist sensitive to ionizing radiation

Info

Publication number
DE3269664D1
DE3269664D1 DE8282109353T DE3269664T DE3269664D1 DE 3269664 D1 DE3269664 D1 DE 3269664D1 DE 8282109353 T DE8282109353 T DE 8282109353T DE 3269664 T DE3269664 T DE 3269664T DE 3269664 D1 DE3269664 D1 DE 3269664D1
Authority
DE
Germany
Prior art keywords
negative
ionizing radiation
type resist
resist sensitive
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282109353T
Other languages
English (en)
Inventor
Kiyoshi Oguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE3269664D1 publication Critical patent/DE3269664D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyamides (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE8282109353T 1981-10-09 1982-10-08 Negative-type resist sensitive to ionizing radiation Expired DE3269664D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56161431A JPS5862643A (ja) 1981-10-09 1981-10-09 電離放射線感応ネガ型レジスト

Publications (1)

Publication Number Publication Date
DE3269664D1 true DE3269664D1 (en) 1986-04-10

Family

ID=15734974

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282109353T Expired DE3269664D1 (en) 1981-10-09 1982-10-08 Negative-type resist sensitive to ionizing radiation

Country Status (4)

Country Link
US (1) US4520097A (de)
EP (1) EP0077056B1 (de)
JP (1) JPS5862643A (de)
DE (1) DE3269664D1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5862643A (ja) * 1981-10-09 1983-04-14 Kiyoshi Oguchi 電離放射線感応ネガ型レジスト
JP5144127B2 (ja) * 2007-05-23 2013-02-13 キヤノン株式会社 ナノインプリント用のモールドの製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US26018A (en) * 1859-11-08 Railroad-gate
JPS5862643A (ja) * 1981-10-09 1983-04-14 Kiyoshi Oguchi 電離放射線感応ネガ型レジスト

Also Published As

Publication number Publication date
JPH0121492B2 (de) 1989-04-21
EP0077056B1 (de) 1986-03-05
EP0077056A1 (de) 1983-04-20
JPS5862643A (ja) 1983-04-14
US4520097A (en) 1985-05-28

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: BEHN, K., DIPL.-ING., PAT.-ANW., 8134 POECKING

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee