DE3267917D1 - Improved aqueous processable, positive-working photopolymer compositions - Google Patents

Improved aqueous processable, positive-working photopolymer compositions

Info

Publication number
DE3267917D1
DE3267917D1 DE8282304443T DE3267917T DE3267917D1 DE 3267917 D1 DE3267917 D1 DE 3267917D1 DE 8282304443 T DE8282304443 T DE 8282304443T DE 3267917 T DE3267917 T DE 3267917T DE 3267917 D1 DE3267917 D1 DE 3267917D1
Authority
DE
Germany
Prior art keywords
positive
improved aqueous
photopolymer compositions
aqueous processable
working photopolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282304443T
Other languages
English (en)
Inventor
Stephen Prowskow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/400,660 external-priority patent/US4415652A/en
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE3267917D1 publication Critical patent/DE3267917D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
DE8282304443T 1982-07-27 1982-08-23 Improved aqueous processable, positive-working photopolymer compositions Expired DE3267917D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/400,660 US4415652A (en) 1982-01-04 1982-07-27 Aqueous processable, positive-working photopolymer compositions

Publications (1)

Publication Number Publication Date
DE3267917D1 true DE3267917D1 (en) 1986-01-23

Family

ID=23584499

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282304443T Expired DE3267917D1 (en) 1982-07-27 1982-08-23 Improved aqueous processable, positive-working photopolymer compositions

Country Status (3)

Country Link
EP (1) EP0099949B1 (de)
JP (1) JPS5924844A (de)
DE (1) DE3267917D1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5212043A (en) * 1988-02-17 1993-05-18 Tosho Corporation Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
DE3927632A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit erhaltenes strahlungsempfindliches material
JP4458389B2 (ja) 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
JP2012068357A (ja) 2010-09-22 2012-04-05 Eastman Kodak Co 平版印刷版原版

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905820A (en) * 1972-01-27 1975-09-16 Hoechst Ag Light sensitive copolymers, a process for their manufacture and copying compositions containing them
US3950569A (en) * 1972-05-05 1976-04-13 W. R. Grace & Co. Method for preparing coatings with solid curable compositions containing styrene-allyl alcohol copolymer based polythiols
US4130469A (en) * 1975-07-14 1978-12-19 Scm Corporation Aqueous coating composition from a mercaptan containing polymer and a bis-maleimide
US4234676A (en) * 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
DE3005036A1 (de) * 1980-02-11 1981-08-27 Basf Ag, 6700 Ludwigshafen Strahlungshaertbare waessrige bindemitteldispersionen
US4415651A (en) * 1981-03-30 1983-11-15 E. I. Du Pont De Nemours And Company Aqueous processable, positive-working photopolymer compositions

Also Published As

Publication number Publication date
JPS5924844A (ja) 1984-02-08
EP0099949B1 (de) 1985-12-11
EP0099949A1 (de) 1984-02-08
JPH0141972B2 (de) 1989-09-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee