DE3264268D1 - Radiation-sensitive composition and pattern-formation method using the same - Google Patents

Radiation-sensitive composition and pattern-formation method using the same

Info

Publication number
DE3264268D1
DE3264268D1 DE8282303696T DE3264268T DE3264268D1 DE 3264268 D1 DE3264268 D1 DE 3264268D1 DE 8282303696 T DE8282303696 T DE 8282303696T DE 3264268 T DE3264268 T DE 3264268T DE 3264268 D1 DE3264268 D1 DE 3264268D1
Authority
DE
Germany
Prior art keywords
radiation
pattern
same
formation method
sensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282303696T
Other languages
English (en)
Inventor
Takumi Ueno
Takao Iwayanagi
Saburo Nonogaki
Hiroshi Shiraishi
Takahiro Kohashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP10933781A external-priority patent/JPS5811930A/ja
Priority claimed from JP57075231A external-priority patent/JPS58192033A/ja
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE3264268D1 publication Critical patent/DE3264268D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C247/00—Compounds containing azido groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray
    • Y10S430/168—X-ray exposure process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
DE8282303696T 1981-07-15 1982-07-14 Radiation-sensitive composition and pattern-formation method using the same Expired DE3264268D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10933781A JPS5811930A (ja) 1981-07-15 1981-07-15 放射線感応性組成物及びそれを用いたパタ−ン形成方法
JP57075231A JPS58192033A (ja) 1982-05-07 1982-05-07 放射線感応性組成物及びそれを用いたパタ−ン形成方法

Publications (1)

Publication Number Publication Date
DE3264268D1 true DE3264268D1 (en) 1985-07-25

Family

ID=26416388

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282303696T Expired DE3264268D1 (en) 1981-07-15 1982-07-14 Radiation-sensitive composition and pattern-formation method using the same

Country Status (5)

Country Link
US (1) US4465768A (de)
EP (1) EP0070198B1 (de)
KR (1) KR880002518B1 (de)
CA (1) CA1176903A (de)
DE (1) DE3264268D1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4665541A (en) * 1983-06-06 1987-05-12 The University Of Rochester X-ray lithography
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物
JPS60107644A (ja) * 1983-09-16 1985-06-13 フイリツプ　エイ．ハント　ケミカル　コ−ポレ−シヨン 現像しうる水性ネガレジスト組成物
CA1265948A (en) * 1983-11-02 1990-02-20 Olin Hunt Specialty Products Inc. Thermally stable positive resist
JPS60114575A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
JPS60115222A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 微細パタ−ン形成方法
GB8611229D0 (en) * 1986-05-08 1986-06-18 Ucb Sa Forming positive pattern
KR930000293B1 (ko) * 1987-10-26 1993-01-15 마쯔시다덴기산교 가부시기가이샤 미세패턴형성방법
US5240795A (en) * 1988-07-04 1993-08-31 Canon Kabushiki Kaisha Volume phase type hologram film and photosensitive resin composition employed therefor
US5550004A (en) * 1992-05-06 1996-08-27 Ocg Microelectronic Materials, Inc. Chemically amplified radiation-sensitive composition
US5340687A (en) * 1992-05-06 1994-08-23 Ocg Microelectronic Materials, Inc. Chemically modified hydroxy styrene polymer resins and their use in photoactive resist compositions wherein the modifying agent is monomethylol phenol
US5302637A (en) * 1992-07-22 1994-04-12 Eastman Kodak Company Miscible blends of cellulose esters and vinylphenol containing polymers
US5552256A (en) * 1994-09-29 1996-09-03 International Business Machines Corporation Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
US6472060B1 (en) * 2000-01-19 2002-10-29 Seco Tools Ab Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction
KR102207247B1 (ko) 2020-01-03 2021-01-25 숭실대학교산학협력단 외부 및 내부 응력감응형 하이드로젤용 가교제 및, 이를 포함하여 형성된 외부 및 내부 응력감응형 하이드로젤

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
US3748135A (en) * 1972-05-18 1973-07-24 American Cyanamid Co Photoimaging processes and compositions
JPS5525418B2 (de) * 1972-12-20 1980-07-05
US3923522A (en) * 1973-07-18 1975-12-02 Oji Paper Co Photosensitive composition
US4019907A (en) * 1973-10-24 1977-04-26 Hodogaya Chemical Co., Ltd. Photosensitive azido color-forming element
JPS56137347A (en) * 1980-03-29 1981-10-27 Tokyo Ohka Kogyo Co Ltd Photosensitive composition for dry development

Also Published As

Publication number Publication date
EP0070198B1 (de) 1985-06-19
KR840000820A (ko) 1984-02-27
CA1176903A (en) 1984-10-30
EP0070198A1 (de) 1983-01-19
KR880002518B1 (ko) 1988-11-26
US4465768A (en) 1984-08-14

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Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: STREHL, P., DIPL.-ING. DIPL.-WIRTSCH.-ING. SCHUEBEL-HOPF, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANWAELTE, 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee