DE3174261D1 - Strain gauge measurement device with a thin-glass layer support - Google Patents

Strain gauge measurement device with a thin-glass layer support

Info

Publication number
DE3174261D1
DE3174261D1 DE8181401768T DE3174261T DE3174261D1 DE 3174261 D1 DE3174261 D1 DE 3174261D1 DE 8181401768 T DE8181401768 T DE 8181401768T DE 3174261 T DE3174261 T DE 3174261T DE 3174261 D1 DE3174261 D1 DE 3174261D1
Authority
DE
Germany
Prior art keywords
thin
measurement device
strain gauge
glass layer
layer support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181401768T
Other languages
English (en)
Inventor
Gilles Delapierre
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE3174261D1 publication Critical patent/DE3174261D1/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/20Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2206Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/20Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49082Resistor making
    • Y10T29/49103Strain gauge making

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Force In General (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
DE8181401768T 1980-11-20 1981-11-05 Strain gauge measurement device with a thin-glass layer support Expired DE3174261D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8024656A FR2494437A1 (fr) 1980-11-20 1980-11-20 Dispositif de mesure comprenant une jauge de contrainte avec un support en verre mince

Publications (1)

Publication Number Publication Date
DE3174261D1 true DE3174261D1 (en) 1986-05-07

Family

ID=9248178

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181401768T Expired DE3174261D1 (en) 1980-11-20 1981-11-05 Strain gauge measurement device with a thin-glass layer support

Country Status (6)

Country Link
US (1) US4418326A (de)
EP (1) EP0053059B1 (de)
JP (2) JPS57113306A (de)
CA (1) CA1178083A (de)
DE (1) DE3174261D1 (de)
FR (1) FR2494437A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2606875B1 (fr) * 1986-11-18 1989-06-09 Dal Dan Felice Procede de realisation d'une jauge de contrainte
US7150199B2 (en) * 2003-02-19 2006-12-19 Vishay Intertechnology, Inc. Foil strain gage for automated handling and packaging
FR2919486B1 (fr) * 2007-07-31 2009-10-02 Captomed Entpr Unipersonnelle Capteur de pression auto-etalonnable.
CN101813452B (zh) * 2010-03-30 2011-12-28 中国船舶重工集团公司第七〇二研究所 应变片防水密封方法及其结构
EP2426472B1 (de) * 2010-09-01 2017-11-01 Silicon Valley Micro E Corporation Fahrrad Leistungsmesser mit rahmenmontiertem Sensor
US8474332B2 (en) * 2010-10-20 2013-07-02 Medtronic Minimed, Inc. Sensor assembly and medical device incorporating same
US8495918B2 (en) 2010-10-20 2013-07-30 Medtronic Minimed, Inc. Sensor assembly and medical device incorporating same
CN104405744A (zh) * 2014-10-15 2015-03-11 深圳市伊爱高新技术开发有限公司 一种片式传感器安装工艺
DE102017129877B4 (de) * 2016-12-19 2022-03-10 Laser Zentrum Hannover E.V. Verfahren zur Herstellung einer Dünnschicht-Messanordnung und Dünnschicht-Messanordnung

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1022075A (en) * 1961-12-20 1966-03-09 Western Electric Co Improvements in or relating to film resistors
JPS4920239B1 (de) * 1969-10-28 1974-05-23
US3713068A (en) * 1971-06-07 1973-01-23 Itt Bonded assemblies and methods of making the same
US3803706A (en) * 1972-12-27 1974-04-16 Itt Method of making a transducer
US3805377A (en) * 1973-04-18 1974-04-23 Itt Method of making a transducer
US4016644A (en) * 1974-03-18 1977-04-12 Kulite Semiconductor Products, Inc. Methods of fabricating low pressure silicon transducers
JPS514692U (de) * 1974-06-25 1976-01-14
US3953920A (en) * 1975-05-14 1976-05-04 International Telephone & Telegraph Corporation Method of making a transducer
US4195279A (en) * 1978-02-16 1980-03-25 Nasa Attaching of strain gages to substrates
FR2440547A1 (fr) * 1978-11-06 1980-05-30 Dal Dan Felice Jauge de contrainte perfectionnee
DE2916390C2 (de) * 1979-04-23 1982-05-27 Siemens AG, 1000 Berlin und 8000 München Brückenschaltung zur Messung mechanischer Spannungen einer Dehnungsmeßfeder

Also Published As

Publication number Publication date
JPS57113306A (en) 1982-07-14
EP0053059B1 (de) 1986-04-02
CA1178083A (en) 1984-11-20
JPH05149773A (ja) 1993-06-15
US4418326A (en) 1983-11-29
EP0053059A1 (de) 1982-06-02
JPH0320682B2 (de) 1991-03-20
FR2494437A1 (fr) 1982-05-21
FR2494437B1 (de) 1983-10-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition