DE3170995D1 - Fluoroalkyl acrylate copolymera and composition containing the same - Google Patents

Fluoroalkyl acrylate copolymera and composition containing the same

Info

Publication number
DE3170995D1
DE3170995D1 DE8181102310T DE3170995T DE3170995D1 DE 3170995 D1 DE3170995 D1 DE 3170995D1 DE 8181102310 T DE8181102310 T DE 8181102310T DE 3170995 T DE3170995 T DE 3170995T DE 3170995 D1 DE3170995 D1 DE 3170995D1
Authority
DE
Germany
Prior art keywords
copolymera
same
composition containing
fluoroalkyl acrylate
fluoroalkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181102310T
Other languages
English (en)
Inventor
Takahiro Tsunoda
Tsuguo Yamaoka
Sinji Tamaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Application granted granted Critical
Publication of DE3170995D1 publication Critical patent/DE3170995D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE8181102310T 1980-03-31 1981-03-27 Fluoroalkyl acrylate copolymera and composition containing the same Expired DE3170995D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4270480A JPS56139515A (en) 1980-03-31 1980-03-31 Polyfluoroalkyl acrylate copolymer

Publications (1)

Publication Number Publication Date
DE3170995D1 true DE3170995D1 (en) 1985-07-25

Family

ID=12643443

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181102310T Expired DE3170995D1 (en) 1980-03-31 1981-03-27 Fluoroalkyl acrylate copolymera and composition containing the same

Country Status (4)

Country Link
US (1) US4365049A (de)
EP (1) EP0037094B1 (de)
JP (1) JPS56139515A (de)
DE (1) DE3170995D1 (de)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56167139A (en) * 1980-05-27 1981-12-22 Daikin Ind Ltd Sensitive material
JPS589146A (ja) * 1981-07-09 1983-01-19 Nippon Paint Co Ltd 水不要平版用版材
JPS60250310A (ja) * 1984-05-28 1985-12-11 Daikin Ind Ltd 光学繊維鞘材
DE3421526A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421471A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten
DE3421511A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Polymerisierbare, perfluoralkylgruppen aufweisende verbindungen, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS61189693A (ja) * 1985-02-19 1986-08-23 旭硝子株式会社 電子部品の防湿コ−テイング方法
US4600441A (en) * 1985-03-21 1986-07-15 Westinghouse Electric Corp. Oil and dirt repellent alkyd paint
NL8501181A (nl) * 1985-04-24 1986-11-17 Philips Nv Kristal voor een roentgenanalyse apparaat.
FR2592055B1 (fr) * 1985-12-24 1988-05-06 Charbonnages Ste Chimique Vernis de protection
US5126189A (en) * 1987-04-21 1992-06-30 Gelman Sciences, Inc. Hydrophobic microporous membrane
JPH0195115A (ja) * 1987-10-07 1989-04-13 Terumo Corp 紫外線吸収高分子材料
EP0331056A3 (de) * 1988-03-01 1991-03-27 Daikin Industries, Limited Fluorenthaltendes Copolymer und Verfahren zu seiner Herstellung
JPH02262152A (ja) * 1989-03-31 1990-10-24 Terumo Corp 光レジスト材料
JPH0442229A (ja) * 1990-06-08 1992-02-12 Fujitsu Ltd レジスト材料およびパターンの形成方法
FR2735781B1 (fr) * 1995-06-23 1997-10-31 Atochem Elf Sa Composition auto-reticulable a base de copolymeres fluores et de copolymeres acryliques, son procede de preparation et son utilisation pour le revetement de substrats
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
IL141803A0 (en) * 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography
US6787286B2 (en) * 2001-03-08 2004-09-07 Shipley Company, L.L.C. Solvents and photoresist compositions for short wavelength imaging
US7931944B2 (en) * 2003-11-25 2011-04-26 Kimberly-Clark Worldwide, Inc. Method of treating substrates with ionic fluoropolymers
US7811949B2 (en) * 2003-11-25 2010-10-12 Kimberly-Clark Worldwide, Inc. Method of treating nonwoven fabrics with non-ionic fluoropolymers
US7193023B2 (en) * 2003-12-04 2007-03-20 International Business Machines Corporation Low activation energy photoresists
US7820369B2 (en) * 2003-12-04 2010-10-26 International Business Machines Corporation Method for patterning a low activation energy photoresist
US20060110997A1 (en) * 2004-11-24 2006-05-25 Snowden Hue S Treated nonwoven fabrics and method of treating nonwoven fabrics
KR100732301B1 (ko) * 2005-06-02 2007-06-25 주식회사 하이닉스반도체 포토레지스트 중합체, 포토레지스트 조성물 및 이를 이용한반도체 소자의 제조 방법
US7750103B2 (en) * 2006-09-08 2010-07-06 The University Of Massachusetts Cyclooctene monomers and polymers, and water purification articles and methods utilizing them
JP4783853B2 (ja) * 2007-06-12 2011-09-28 富士フイルム株式会社 ネガ型現像用レジスト組成物を用いたパターン形成方法
US8088445B2 (en) 2008-01-29 2012-01-03 General Electric Company Process to increase the oleophobicity of PTFE, and resulting oleophobic articles
US8202579B2 (en) * 2008-03-31 2012-06-19 Cooley Group Holdings, Inc. Water-resistant fabrics and methods of preparation thereof
US8673040B2 (en) 2008-06-13 2014-03-18 Donaldson Company, Inc. Filter construction for use with air in-take for gas turbine and methods
CN106432778A (zh) 2011-07-18 2017-02-22 赛尔格有限责任公司 表面改性聚合材料、改性官能化聚合物、功能聚合物和方法
US9080070B2 (en) 2012-04-03 2015-07-14 Gem Gravure Co., Inc. Inkjet ink for printing on fluoropolymers
CN102964546A (zh) * 2012-11-07 2013-03-13 中科院广州化学有限公司 一种水分散性紫外光交联型含氟聚合物及其应用
US10888470B2 (en) * 2014-04-11 2021-01-12 Rsd Holdings Limited Absorbent reusable clothing and undergarments
US10557055B2 (en) 2014-07-14 2020-02-11 3M Innovative Properties Company Conformable coating composition comprising fluorinated copolymer
EP3342806B1 (de) * 2015-08-24 2020-09-23 AGC Inc. Herstellungsverfahren für flüssigkeitsabweisende form und zusammensetzung eines flüssigkeitsabweisenden mittels
EP3184560A1 (de) * 2015-12-22 2017-06-28 Solvay SA Lichthärtbares copolymer, lichthärtbare harzzusammensetzung damit und daraus hergestellter fingerabdruckfester film
JP6752507B2 (ja) * 2016-03-31 2020-09-09 東ソー株式会社 光反応性モノマー及び重合体

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923761A (en) * 1972-07-18 1975-12-02 Western Litho Plate & Supply Photopolymers
JPS5290269A (en) * 1976-01-23 1977-07-29 Nippon Telegr & Teleph Corp <Ntt> Forming method for fine resist patterns
JPS56167139A (en) * 1980-05-27 1981-12-22 Daikin Ind Ltd Sensitive material

Also Published As

Publication number Publication date
JPS56139515A (en) 1981-10-31
JPH0146523B2 (de) 1989-10-09
EP0037094B1 (de) 1985-06-19
EP0037094A3 (en) 1982-08-11
US4365049A (en) 1982-12-21
EP0037094A2 (de) 1981-10-07

Similar Documents

Publication Publication Date Title
DE3170995D1 (en) Fluoroalkyl acrylate copolymera and composition containing the same
JPS5784456A (en) Stripping composition and use thereof
DE3162761D1 (en) Triazoloquinoxalin-4-ones and such oxaline-4-thiones
JPS56159210A (en) Polymeric composition and compound thereof
DE3164692D1 (en) Ultraviolet-transmissible composition
JPS5740518A (en) Self-oxidizable composition
JPS5721350A (en) Perfume composition and use
DE3169284D1 (en) Etchant composition and application thereof
GB2067407B (en) Pesticidal composition and use
GB2070016B (en) 17-acyloxy-5-corticoids and 17-acyloxy-5-corticoids
PH16858A (en) 2-nitroimidazoles and use thereof
IL62027A0 (en) 1 -hydroxy-2 -fluorocholecalciferol and related compounds
DE3067811D1 (en) Ammelinium beta-octamolybdate and composition containing same
JPS573839A (en) Composition
DE3170701D1 (en) Helichromic compounds and displays
PH17864A (en) Curable composition and use thereof
PH15971A (en) Hypoglycemic guanylamidines and their use as hypoglycemic agents
JPS5716819A (en) Antifungal composition and use
GB2077265B (en) N-trifluoroacetyladriamycin-14-o-hemiglutarate and hemiadipate and therapeutic compositions containing the same
JPS57145824A (en) Composition and use
JPS5759941A (en) Composition
ZA803099B (en) Tripentylammonium decamolybdate and composition containing same
JPS56145253A (en) 2-haloacetanilide and its use
JPS56145252A (en) 2-haloacetanilide and its use
JPS5771850A (en) Composition

Legal Events

Date Code Title Description
8328 Change in the person/name/address of the agent

Free format text: TUERK, D., DIPL.-CHEM. DR.RER.NAT. GILLE, C., DIPL.-ING., PAT.-ANW., 4000 DUESSELDORF

8339 Ceased/non-payment of the annual fee