DE3168026D1 - A developer for dry planographic printing plates - Google Patents
A developer for dry planographic printing platesInfo
- Publication number
- DE3168026D1 DE3168026D1 DE8181105035T DE3168026T DE3168026D1 DE 3168026 D1 DE3168026 D1 DE 3168026D1 DE 8181105035 T DE8181105035 T DE 8181105035T DE 3168026 T DE3168026 T DE 3168026T DE 3168026 D1 DE3168026 D1 DE 3168026D1
- Authority
- DE
- Germany
- Prior art keywords
- developer
- printing plates
- planographic printing
- dry planographic
- dry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8779580A JPS5713448A (en) | 1980-06-30 | 1980-06-30 | Developing solution for use in lithographic plate requiring no dampening water |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3168026D1 true DE3168026D1 (en) | 1985-02-14 |
Family
ID=13924907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8181105035T Expired DE3168026D1 (en) | 1980-06-30 | 1981-06-29 | A developer for dry planographic printing plates |
Country Status (4)
Country | Link |
---|---|
US (1) | US4378423A (de) |
EP (1) | EP0043132B2 (de) |
JP (1) | JPS5713448A (de) |
DE (1) | DE3168026D1 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5835539A (ja) * | 1981-08-27 | 1983-03-02 | Toray Ind Inc | 湿し水不要ネガ型平版印刷版の製版方法 |
JPS59146054A (ja) * | 1983-02-09 | 1984-08-21 | Toray Ind Inc | 湿し水不要平版印刷版用現像液 |
JPS60217915A (ja) * | 1984-04-10 | 1985-10-31 | 株式会社ダイフク | 物品の被覆装置 |
US5143814A (en) * | 1984-06-11 | 1992-09-01 | Hoechst Celanese Corporation | Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate |
US5066561A (en) * | 1984-06-11 | 1991-11-19 | Hoechst Celanese Corporation | Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
US4824769A (en) * | 1984-10-15 | 1989-04-25 | Allied Corporation | High contrast photoresist developer |
JPS61127407A (ja) * | 1984-11-17 | 1986-06-14 | 株式会社ダイフク | 物品の包装方法 |
JPS61275759A (ja) * | 1984-12-12 | 1986-12-05 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版用現像液 |
US4806458A (en) * | 1985-10-28 | 1989-02-21 | Hoechst Celanese Corporation | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate |
US4692398A (en) * | 1985-10-28 | 1987-09-08 | American Hoechst Corporation | Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
US4983490A (en) * | 1985-10-28 | 1991-01-08 | Hoechst Celanese Corporation | Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
DE3667109D1 (en) * | 1985-10-28 | 1989-12-28 | Hoechst Celanese Corp | Liquid for the treatment of a photoresist composition, and process therefor |
ZA87922B (en) * | 1986-02-28 | 1987-09-30 | Macdermid Inc | Photoresist stripper composition |
DE3715792A1 (de) * | 1987-05-12 | 1988-11-24 | Hoechst Ag | Entwickler fuer wasserlos druckende offsetplatten |
US4851324A (en) * | 1987-07-27 | 1989-07-25 | Hoechst Celanese Corporation | Phenoxy propanol containing developer compositions for lithographic plates having neutral pH |
DE3807929A1 (de) * | 1988-03-10 | 1989-09-28 | Basf Ag | Verfahren zur herstellung von reliefformen |
JP2543742B2 (ja) * | 1988-04-07 | 1996-10-16 | 富士写真フイルム株式会社 | ポジ型フオトレジスト用現像液 |
US5055870A (en) * | 1989-02-17 | 1991-10-08 | Fuji Photo Film Co., Ltd. | Waterless presensitized lithographic printing plate developing apparatus |
US5122438A (en) * | 1989-11-02 | 1992-06-16 | Konica Corporation | Method for developing a waterless light-sensitive lithographic plate |
JPH03148666A (ja) * | 1989-11-04 | 1991-06-25 | Konica Corp | 湿し水不要の感光性平版印刷版用現像液 |
JPH03167554A (ja) * | 1989-11-27 | 1991-07-19 | Toray Ind Inc | 水なし平版印刷版用現像液 |
JP2532287B2 (ja) * | 1990-02-07 | 1996-09-11 | 富士写真フイルム株式会社 | 水なしps版用現像液 |
JP2596855B2 (ja) * | 1990-11-15 | 1997-04-02 | 信栄製紙 株式会社 | ノーパレット多段積層梱包体の製造方法 |
JP2689037B2 (ja) * | 1991-09-02 | 1997-12-10 | 富士写真フイルム株式会社 | 画像形成方法及びアルカリ性現像液 |
JP3290313B2 (ja) | 1994-09-07 | 2002-06-10 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版及びその製版方法 |
US6743254B2 (en) * | 2002-02-01 | 2004-06-01 | Mentor Corporation | Tissue expander with protection against accidental puncture |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1146618A (en) * | 1965-10-11 | 1969-03-26 | Harry Frank Gipe | Method for preparing photo-lithographic plates |
JPS5426923B2 (de) * | 1972-03-21 | 1979-09-06 | ||
JPS4968803A (de) * | 1972-11-02 | 1974-07-03 | ||
JPS6060051B2 (ja) * | 1977-12-27 | 1985-12-27 | 東レ株式会社 | 平版印刷板の製版方法 |
-
1980
- 1980-06-30 JP JP8779580A patent/JPS5713448A/ja active Granted
-
1981
- 1981-06-29 EP EP81105035A patent/EP0043132B2/de not_active Expired
- 1981-06-29 US US06/278,094 patent/US4378423A/en not_active Expired - Lifetime
- 1981-06-29 DE DE8181105035T patent/DE3168026D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS6321890B2 (de) | 1988-05-10 |
EP0043132B1 (de) | 1985-01-02 |
JPS5713448A (en) | 1982-01-23 |
EP0043132B2 (de) | 1989-02-08 |
US4378423A (en) | 1983-03-29 |
EP0043132A1 (de) | 1982-01-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8328 | Change in the person/name/address of the agent |
Free format text: KADOR, U., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8000 MUENCHEN |
|
8366 | Restricted maintained after opposition proceedings |