DE2937136C2 - - Google Patents
Info
- Publication number
- DE2937136C2 DE2937136C2 DE2937136A DE2937136A DE2937136C2 DE 2937136 C2 DE2937136 C2 DE 2937136C2 DE 2937136 A DE2937136 A DE 2937136A DE 2937136 A DE2937136 A DE 2937136A DE 2937136 C2 DE2937136 C2 DE 2937136C2
- Authority
- DE
- Germany
- Prior art keywords
- deflection
- frequency
- electrostatic
- magnetic
- corpuscular beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 239000003990 capacitor Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000000523 sample Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1472—Deflecting along given lines
- H01J37/1474—Scanning means
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Particle Accelerators (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792937136 DE2937136A1 (de) | 1979-09-13 | 1979-09-13 | Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls |
US06/172,085 US4335309A (en) | 1979-09-13 | 1980-07-24 | Method and device for the rapid deflection of a particle beam |
EP80105370A EP0025579B1 (de) | 1979-09-13 | 1980-09-08 | Verfahren und Vorrichtung zur schnellen Ablenkung eines Korpuskularstrahles |
JP12589180A JPS5650041A (en) | 1979-09-13 | 1980-09-10 | Method and device for deflecting particle beam at high speed |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792937136 DE2937136A1 (de) | 1979-09-13 | 1979-09-13 | Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2937136A1 DE2937136A1 (de) | 1981-04-02 |
DE2937136C2 true DE2937136C2 (US08063081-20111122-C00102.png) | 1988-09-15 |
Family
ID=6080854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19792937136 Granted DE2937136A1 (de) | 1979-09-13 | 1979-09-13 | Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls |
Country Status (4)
Country | Link |
---|---|
US (1) | US4335309A (US08063081-20111122-C00102.png) |
EP (1) | EP0025579B1 (US08063081-20111122-C00102.png) |
JP (1) | JPS5650041A (US08063081-20111122-C00102.png) |
DE (1) | DE2937136A1 (US08063081-20111122-C00102.png) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19911372A1 (de) * | 1999-03-15 | 2000-09-28 | Pms Gmbh | Vorrichtung zum Steuern eines Strahls aus elektrisch geladenen Teilchen |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2937004C2 (de) * | 1979-09-13 | 1984-11-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Chromatisch korrigierte Ablenkvorrichtung für Korpuskularstrahlgeräte |
US4590379A (en) * | 1980-09-16 | 1986-05-20 | Martin Frederick W | Achromatic deflector and quadrupole lens |
GB2139411B (en) * | 1983-05-05 | 1987-01-07 | Cambridge Instr Ltd | Charged particle deflection |
EP0175933A1 (de) * | 1984-09-21 | 1986-04-02 | Siemens Aktiengesellschaft | Rasterlinsen-System ohne Ablenkfarbfehler zur Materialbearbeitung mit Korpuskularstrahlen |
US4795912A (en) * | 1987-02-17 | 1989-01-03 | Trw Inc. | Method and apparatus for correcting chromatic aberration in charged particle beams |
NL8701871A (nl) * | 1987-08-10 | 1989-03-01 | Philips Nv | Geladen deeltjes apparaat met bundelontmenger. |
US4859856A (en) * | 1988-01-11 | 1989-08-22 | International Business Machines Corporation | Telecentric sub-field deflection with vail |
US5311028A (en) * | 1990-08-29 | 1994-05-10 | Nissin Electric Co., Ltd. | System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions |
US6605811B2 (en) * | 2001-11-09 | 2003-08-12 | Elionix Inc. | Electron beam lithography system and method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2623196A (en) * | 1950-02-28 | 1952-12-23 | Products And Licensing Corp | Television apparatus and method for phase-shift scanning |
JPS4922351B1 (US08063081-20111122-C00102.png) * | 1969-12-25 | 1974-06-07 | ||
US3668462A (en) * | 1970-12-22 | 1972-06-06 | Monsanto Co | Cathode ray tube deflection system utilizing electromagnetic and electrostatic beam deflection |
FR2233703B1 (US08063081-20111122-C00102.png) * | 1973-06-13 | 1976-04-30 | Cit Alcatel | |
US3894271A (en) * | 1973-08-31 | 1975-07-08 | Ibm | Method and apparatus for aligning electron beams |
US3900736A (en) * | 1974-01-28 | 1975-08-19 | Ibm | Method and apparatus for positioning a beam of charged particles |
US4117339A (en) * | 1977-07-01 | 1978-09-26 | Burroughs Corporation | Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices |
US4149085A (en) * | 1978-01-16 | 1979-04-10 | International Business Machines Corporation | Automatic overlay measurements using an electronic beam system as a measurement tool |
US4213053A (en) * | 1978-11-13 | 1980-07-15 | International Business Machines Corporation | Electron beam system with character projection capability |
-
1979
- 1979-09-13 DE DE19792937136 patent/DE2937136A1/de active Granted
-
1980
- 1980-07-24 US US06/172,085 patent/US4335309A/en not_active Expired - Lifetime
- 1980-09-08 EP EP80105370A patent/EP0025579B1/de not_active Expired
- 1980-09-10 JP JP12589180A patent/JPS5650041A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19911372A1 (de) * | 1999-03-15 | 2000-09-28 | Pms Gmbh | Vorrichtung zum Steuern eines Strahls aus elektrisch geladenen Teilchen |
Also Published As
Publication number | Publication date |
---|---|
JPS5650041A (en) | 1981-05-07 |
DE2937136A1 (de) | 1981-04-02 |
EP0025579A1 (de) | 1981-03-25 |
US4335309A (en) | 1982-06-15 |
EP0025579B1 (de) | 1983-12-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OM8 | Search report available as to paragraph 43 lit. 1 sentence 1 patent law | ||
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |