DE2902244A1 - Strain-gauge with vapour deposited measuring grid - of alloy on basis of gold on an insulating carrier - Google Patents

Strain-gauge with vapour deposited measuring grid - of alloy on basis of gold on an insulating carrier

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Publication number
DE2902244A1
DE2902244A1 DE19792902244 DE2902244A DE2902244A1 DE 2902244 A1 DE2902244 A1 DE 2902244A1 DE 19792902244 DE19792902244 DE 19792902244 DE 2902244 A DE2902244 A DE 2902244A DE 2902244 A1 DE2902244 A1 DE 2902244A1
Authority
DE
Germany
Prior art keywords
measuring grid
alloy
gold
strain
strain gauge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19792902244
Other languages
German (de)
Other versions
DE2902244C2 (en
Inventor
Norbert Dipl Phys Dr Ruecker
Michael Dipl Phys D Sellschopp
Gudrun Ullrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WC Heraus GmbH and Co KG
Original Assignee
WC Heraus GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WC Heraus GmbH and Co KG filed Critical WC Heraus GmbH and Co KG
Priority to DE19792902244 priority Critical patent/DE2902244C2/en
Publication of DE2902244A1 publication Critical patent/DE2902244A1/en
Application granted granted Critical
Publication of DE2902244C2 publication Critical patent/DE2902244C2/en
Expired legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/12—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means
    • G01D5/14—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage
    • G01D5/16—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using electric or magnetic means influencing the magnitude of a current or voltage by varying resistance

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

A strain gauge consists of a carrier of insulating material with a vapour deposited or sputtered metal grid. The metal grid is made of an alloy of >=2 precious metals with a basis of gold, with >=1 base metal. A pref. compsn. is 70 wt.% gold, 20 wt.% palladium and 10 wt.% vanadium. The grid thickness varies from 0.2-3 microns. The measuring grid made of an Au-Pd-V alloy pref. is applied in a thickness of 1 mu to an insulating carrier which is a polyimide foil with a heat resistance up to at least 150 degrees C. This foil is fixed by an adhesive to a substrate. The whole is protected by an organic coating of polyimide or lacquer. Such a strain gauge combines a better electric resistivity with a better temp. coefft. and a better k-factor.

Description

Dehnungsmeßstreifen mit aufgedampftem oder aufge- Strain gauges with vapor-deposited or

stäubtem Meßgittert' Die Erfindung betrifft einen Dehnungsmeßstreifen mit aufgedampftem oder aufgestäubtem korrosionsbeständigem Meßgitter, das auf einem Träger aus Isolierstoff aufgebracht ist. dusty measuring grid 'The invention relates to a strain gauge with vapor-deposited or dusted corrosion-resistant measuring grid, which is on a Carrier made of insulating material is applied.

Aufgabe der Erfindung ist es, die Eigenschaften des Dehnungsmeßstreifens, insbesondere hinsichtlich spezifischem elektrischem Widerstand, des Temperaturkoeffizienten und des K-Faktors zu verbessern.The object of the invention is to determine the properties of the strain gauge, in particular with regard to the specific electrical resistance, the temperature coefficient and to improve the K-factor.

Gelöst wird diese Aufgabe durch die im Kennzeichen des Anspruchs 1 enthaltenen Merkmale. Verfahren zur Herstellung sind in den Ansprüchen 6 bis 9 beschrieben.This problem is solved by the features in the characterizing part of claim 1 contained features. Process for the production are described in claims 6 to 9.

Zur Erfindung gehören ausdrücklich alle Kombinationen und Unterkombinationen der beschriebenen, dargestellten und beansoruchten Merkmale.The invention expressly includes all combinations and sub-combinations the described, illustrated and related features.

Mit der Erfindung wird es möglich, neben einem hohen spezifischen Widerstandswert und einem kleinen Temperaturkoeffizienten den K-Faktor des Meßstreifens gegenüber bekannen Meßfühlern deutlich zu vergrößern (vgl. DE-OS 27 45 263). Erreicht wird dies nach Ansicht der Erfinder durch die Abkehr von dem üblichen Meßgittermaterial, wie Konstantan- oder Nickel-Chrom-Legierungen.With the invention it becomes possible, in addition to a high specific Resistance value and a small temperature coefficient the K-factor of the measuring strip compared to known sensors to increase significantly (see. DE-OS 27 45 263). Achieved In the opinion of the inventors, this is achieved by turning away from the usual measuring grid material, such as constantan or nickel-chromium alloys.

Ein Ausführungsbeispiel der Erfindung ist in der beigefügten Zeichnung rein schematisch dargestellt und ein Herstellungsverfahren hierzu erläutert.An embodiment of the invention is shown in the accompanying drawing shown purely schematically and explained a manufacturing process for this purpose.

Mit 1 ist das Meßgitter bezeichnet, das auf einem Isolierstoff-Träger 2 direkt aufgebracht ist. Die Trägerfolie 2 wird über eine Klebezone 3 mit einer Unterlage 4 verbunden.1 with the measuring grid is referred to, which is on an insulating carrier 2 is applied directly. The carrier film 2 is over an adhesive zone 3 with a Pad 4 connected.

Das Meßgitter besteht aus einer Goldbasis-Legierung, insbesondere mit Palladium und Vanadium, wobei die Gewichtsprozente in der genannten Reihenfolge 70, 20 und 10 betragen. Das Meßgitter weist eine Dicke von z.B. l/um auf und ist auf eine Folie aus bis mindestens 150 C temperaturbeständigem Kunststoff, wie Polyimid, aufgebracht. Diese Trägerfolie kann mit Hilfe eines Klebers auf eine Unterlage 4 aufgeklebt werden. Es ist auch möglich, statt der Klebeschicht eine Lötschicht bzw. eine lötfähige Schicht auf der dem Meßgitter abgekehrten Seite des Trägers aufzubringen.The measuring grid consists of a gold-based alloy, in particular with palladium and vanadium, the percentages by weight in the order mentioned 70, 20 and 10. The measuring grid has a thickness of, for example, 1 / µm and is on a film made of plastic that is temperature-resistant up to at least 150 C, such as polyimide, upset. This carrier film can be attached to a base 4 with the aid of an adhesive be glued on. It is also possible to use a solder layer instead of the adhesive layer. to apply a solderable layer on the side of the carrier facing away from the measuring grid.

Nicht dargestellt ist noch eine organische Abdeckschicht auf dem Meßgitter, die aus Polyimid oder einem Lack besteht. Diese Abdeckschicht kann z.B. heiß aufgesiegelt sein. Die Meßgitter-Anschlußeneden können galvanisch, z.B. auf bis zu 8 um Dicke, verstärkt werden, z.B. mit einer Gold-Schicht.An organic cover layer on the measuring grid is not shown, which consists of polyimide or a varnish. This covering layer can, for example, be heat-sealed be. The measuring grid connections can be galvanically, e.g. up to 8 µm thick, be reinforced, e.g. with a gold layer.

Beispiel für die bevorzugte Herstellung zum Aufbringen des Meßgitters: Durch Vakuumabscheidung wird der Träger, insbesondere die Kunststoffolie, zunächst auf der dem aufzubringenden Meßfühler gegenüberliegenden Seite mit einer lötfähigen Schicht gemäß Parallelanmeldung P ........... Titel: ,Kunststoff, insbesondere Kunststoff-Folie mit lötfähiger Schicht" des Anmelders von gleichen Tage versehen, und zur iJeiterbearbeitung auf eine Unterlage mit Hilfe eines Klebers aufgeklebt, gemäß Parallelanmeldung P zu Titel: "Verfahren zum spannungsfreien Aufstäuben von metallischen dünnen Schichten auf Kunststoffolien mit hohem thermischem Ausdehnungskoeffizienten" des Anmelders vom gleichen Tage, sodaß sie wieder ablösbar ist.Example of the preferred production method for applying the measuring grid: The carrier, in particular the plastic film, is initially deposited by vacuum deposition on the side opposite the sensor to be applied with a solderable Layer according to parallel application P ........... Title:, Plastic, in particular plastic film provided with a solderable layer "of the applicant from the same day, and for further processing glued to a base with the help of an adhesive, according to parallel application P on title: "Process for stress-free sputtering of thin metallic layers on plastic films with a high coefficient of thermal expansion "by the applicant from the same day, so that it can be removed again.

Nunmehr wird bei einem Vakuum von besser als 10 Pa in einem Gemisch von Edelgas, wie Argon,und Sauerstoff mit einem Sauerstoffpartialdruck von etwa 20 Pa auf der der Lötschicht abgekehrten Seite der Trägerfolie, die Goldbasis-Legierung oben genannter Zusammensetzung aufgestäubt.Now a vacuum of better than 10 Pa is used in a mixture of noble gas, such as argon, and oxygen with an oxygen partial pressure of about 20 Pa on the side of the carrier foil facing away from the solder layer, the gold-based alloy above composition.

Das Muster des Meßgitters, z.B. Mäander, wird auf photolithographischem Wege hergestellt, die Schicht wird verzugs weise mit Königswasser geätzt. Die elektrischen Anschlüsse des Meßgitters werden galvanisch verstärkt, z.B. mittels einer 4 bis 6/um dicken Gold-Schicht, danach sind die Anschlüsse gut schweißbar.The pattern of the measuring grid, e.g. meander, is made on photolithographic Paths made, the layer is etched with aqua regia after a delay. The electric Connections of the measuring grid are galvanically reinforced, e.g. by means of a 4 to 6 / um thick gold layer, after which the connections are easy to weld.

Die so hergestellten Dehnungsmeßstreifen werden von den ebenen Unterlagen mechanisch abgelöst und wenn die Beschichtung in der Vakuumkammer auf Großsubstraten erfolgte, werden die Einzel-Dehnungsmeßstreifen zur Entfernung daraus abgetrennt.The strain gauges produced in this way are from the flat surfaces mechanically detached and when the coating in the vacuum chamber on large substrates occurs, the individual strain gauges are cut off for removal.

Als Aufdampfverfahren für das Meßgitter im Vakuum haben sich die Elektronenstrahlverdampfung oder die Flash-Verdampfung, insbesondere aus Wolfram-Tiegeln, bewährt.Electron beam evaporation has proven to be the evaporation method for the measuring grid in a vacuum or flash evaporation, especially from tungsten crucibles, has proven its worth.

Nach dem erfindungsgemäßen Verfahren hergestellte Dehnungsmeßstreifen wiesen einen spezifischen, elektrischen Widerstand in Elöhe von ca. 2 A mm2/m auf, der Temperaturkoeffizient des elektrischen Widerstandes war< 20 x 10-6, insbesondere wurden 9 x 10-6 erreicht. Der K-Faktor des erfindungsgemäßen Dehnungsmeßstreifens betrug ca. 4.Strain gauges produced by the method of the invention exhibited a specific electrical resistance at a height of approx. 2 A mm2 / m, the temperature coefficient of the electrical resistance was <20 x 10-6, in particular 9 x 10-6 were achieved. The K-factor of the strain gauge according to the invention was about 4.

Zusammenfassung Dehnungsmeßstreifen mit aufgedampftem oder aufgestäubtem Meßgitter.Als Widerstandsmaterial wird eine Edelmetall-Legierung auf Gold-Basis verwendet. Summary of strain gauges with vapor-deposited or dust-coated A precious metal alloy based on gold is used as the resistance material used.

L e e r s e i t eL e r s e i t e

Claims (8)

"Dehnungameßstreifen mit sufgedampftem oder aufgestäubtem Meßgitter" Pat entanspriiche 1. Dehnungsmeßstreifen mit aufgedampftem oder aufestäubtem Neßgitter, das auf einem Isolierstoff-Träger aufgebracht ist, dadurch gekennzeichnet, daß das Meßgitter aus einer Leigierung von weigstens zwei Edlmetallen mit weigstens einem Unedelmetall besteht, wobei Gold die Basis dieser Legierung bildet. "Strain gauges with steamed or dusted measuring grid" Patent claims 1. Strain gauges with vapor-deposited or dust-coated mesh, which is applied to an insulating carrier, characterized in that the Measuring grid made from an alloy of at least two precious metals with at least one Base metal consists, with gold forming the basis of this alloy. 2. Dehnungsmeßstreifen nach Anspruch 1, dadurch gekennzeichnet, daß das Meßgitter aus einer Legierung mit 70 Gewichts-% Gold, 20 Gewichts Palladium und 10 Gewichts-% Vanadium besteht. 2. Strain gauge according to claim 1, characterized in that the measuring grid made of an alloy with 70% by weight of gold, 20% by weight of palladium and 10% by weight vanadium. 3. Dchnungsmeßstreifen nach Anspruch 1 oder 2, dadurch gekennzeichnet, daß das Moßgitter eine Schichtdicke im Bereich zwischen 0,2/um und 3/um aufweist. 3. strain gauge according to claim 1 or 2, characterized in that that the measuring grid has a layer thickness in the range between 0.2 / µm and 3 / µm. 4, Dehnungsmeßstreifen nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß die elektrischen Anschlüsse des Meßgitters galvanisch verstärkt sind auf eine Schichtdicke im Bereich bis etwa 8/um.4, strain gauges according to one of the preceding claims, characterized characterized in that the electrical connections of the measuring grid are galvanically reinforced are to a layer thickness in the range up to about 8 / um. 5. Dehnungsmeßstreifen nach einem der vorhergehenden Ansprüche, gekennzeichnet durch eine organische Abdeckung aus Polyimid oder einem Lack.5. Strain gauge according to one of the preceding claims, characterized by an organic cover made of polyimide or a lacquer. 6. Verfahren zur Herstellung von Dehnungsmeßstreifen nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, daß sie während der Herstellungsschritte ablösbar auf einer Unterlage appliziert sind.6. Process for the production of strain gauges according to one of the preceding claims, characterized in that during the manufacturing steps are removably applied to a base. 7. Verfahren zum Herstellen eines Dehnungsmeßstreifens durch Aufdampfen oder Aufstäuben in einem Hochvakuum besser als 10 2Pa in einem Gemisch von Edelgas und Sauerstoff, wobei der Partialdruck des Sauerstoffs bis etwa 20 Pa beträgt, hergestellt wird.7. Method of making a strain gauge by vapor deposition or sputtering in a high vacuum better than 10 2Pa in a mixture of noble gas and oxygen, the partial pressure of the oxygen being up to about 20 Pa will. 8. Verfahren nach Anspruch 7, dadurch gekennzeichnet, daß das Meßgitter auf photolithographischem Wege hergestellt wird.8. The method according to claim 7, characterized in that the measuring grid is produced by photolithographic means. 9, Verfahren nach Anspruch 7, dadurch gekennzeichnet, daß das Meßgitter mit Hilfe einer Maske direkt aufgestäubt oder aufgedampft wird.9, method according to claim 7, characterized in that the measuring grid is sprayed or vaporized directly with the help of a mask.
DE19792902244 1979-01-20 1979-01-20 Stretch marks with a metal alloy measuring grid applied in a vacuum to an adhesive plastic carrier Expired DE2902244C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19792902244 DE2902244C2 (en) 1979-01-20 1979-01-20 Stretch marks with a metal alloy measuring grid applied in a vacuum to an adhesive plastic carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19792902244 DE2902244C2 (en) 1979-01-20 1979-01-20 Stretch marks with a metal alloy measuring grid applied in a vacuum to an adhesive plastic carrier

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DE2902244A1 true DE2902244A1 (en) 1980-07-24
DE2902244C2 DE2902244C2 (en) 1982-11-11

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192938A (en) * 1990-04-07 1993-03-09 Hottinger Baldwin Messtechnik Gmbh Strain gage, transducer employing the strain gage, and method for producing the strain gage
EP2000765A2 (en) * 2006-03-30 2008-12-10 Millennium Gate Technology Co., Ltd. Strain gauge manufacturing method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1200421B (en) * 1959-11-27 1965-09-09 Ibm Process for the production of electrical resistors
DE1665236A1 (en) * 1966-03-23 1971-01-21 Philips Nv Stable resistance layer made of NiCr
DE1665224A1 (en) * 1965-12-07 1971-01-21 Philips Nv Process for the production of thin-film resistors from a nickel-chromium alloy and thin-film resistors produced by this process
DE1765516A1 (en) * 1967-07-06 1971-07-29 Philips Nv Electrical film resistors
DE2614775A1 (en) * 1976-04-06 1977-10-13 Hottinger Messtechnik Baldwin Strain gauge mfr. by vacuum vapour deposition - ensures measurement bridge null point stability with low resistance drift
DE2745263A1 (en) * 1976-10-08 1978-04-13 Schlumberger Ind Sa MEASURING PROBE WITH STRAIN GAUGE AND METHOD FOR ITS MANUFACTURING

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1200421B (en) * 1959-11-27 1965-09-09 Ibm Process for the production of electrical resistors
DE1665224A1 (en) * 1965-12-07 1971-01-21 Philips Nv Process for the production of thin-film resistors from a nickel-chromium alloy and thin-film resistors produced by this process
DE1665236A1 (en) * 1966-03-23 1971-01-21 Philips Nv Stable resistance layer made of NiCr
DE1765516A1 (en) * 1967-07-06 1971-07-29 Philips Nv Electrical film resistors
DE2614775A1 (en) * 1976-04-06 1977-10-13 Hottinger Messtechnik Baldwin Strain gauge mfr. by vacuum vapour deposition - ensures measurement bridge null point stability with low resistance drift
DE2745263A1 (en) * 1976-10-08 1978-04-13 Schlumberger Ind Sa MEASURING PROBE WITH STRAIN GAUGE AND METHOD FOR ITS MANUFACTURING

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192938A (en) * 1990-04-07 1993-03-09 Hottinger Baldwin Messtechnik Gmbh Strain gage, transducer employing the strain gage, and method for producing the strain gage
EP2000765A2 (en) * 2006-03-30 2008-12-10 Millennium Gate Technology Co., Ltd. Strain gauge manufacturing method
EP2000765A4 (en) * 2006-03-30 2010-11-10 Jtekt Corp Strain gauge manufacturing method

Also Published As

Publication number Publication date
DE2902244C2 (en) 1982-11-11

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