DE2861769D1 - Optical distance measuring apparatus - Google Patents

Optical distance measuring apparatus

Info

Publication number
DE2861769D1
DE2861769D1 DE7878101459T DE2861769T DE2861769D1 DE 2861769 D1 DE2861769 D1 DE 2861769D1 DE 7878101459 T DE7878101459 T DE 7878101459T DE 2861769 T DE2861769 T DE 2861769T DE 2861769 D1 DE2861769 D1 DE 2861769D1
Authority
DE
Germany
Prior art keywords
measuring apparatus
distance measuring
optical distance
optical
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE7878101459T
Other languages
German (de)
English (en)
Inventor
Ronald Stephen Charsky
Alexander Leon Flamholz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE2861769D1 publication Critical patent/DE2861769D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE7878101459T 1977-12-30 1978-11-27 Optical distance measuring apparatus Expired DE2861769D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/865,807 US4172664A (en) 1977-12-30 1977-12-30 High precision pattern registration and overlay measurement system and process

Publications (1)

Publication Number Publication Date
DE2861769D1 true DE2861769D1 (en) 1982-06-09

Family

ID=25346276

Family Applications (1)

Application Number Title Priority Date Filing Date
DE7878101459T Expired DE2861769D1 (en) 1977-12-30 1978-11-27 Optical distance measuring apparatus

Country Status (5)

Country Link
US (1) US4172664A (cg-RX-API-DMAC7.html)
EP (1) EP0002668B1 (cg-RX-API-DMAC7.html)
JP (1) JPS5495267A (cg-RX-API-DMAC7.html)
CA (1) CA1104338A (cg-RX-API-DMAC7.html)
DE (1) DE2861769D1 (cg-RX-API-DMAC7.html)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472209A1 (fr) * 1979-12-18 1981-06-26 Thomson Csf Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium
DE3071858D1 (en) * 1980-07-31 1987-01-22 Ibm Method and device for optical distance measurement
JPS58193547A (ja) * 1982-05-07 1983-11-11 Hitachi Ltd 縮小投影露光装置
JPS5998525A (ja) * 1982-11-26 1984-06-06 Canon Inc 分割焼付け装置のアライメント方法
JPH0619280B2 (ja) * 1983-09-24 1994-03-16 名古屋大学長 光学式自動位置決め装置
DE3336901A1 (de) * 1983-10-11 1985-04-18 Deutsche Itt Industries Gmbh, 7800 Freiburg Maskenmarkierung und substratmarkierung fuer ein verfahren zum justieren einer eine maskenmarkierung enthaltenden photomaske auf einer substratmarkierung
US4679942A (en) * 1984-02-24 1987-07-14 Nippon Kogaku K. K. Method of aligning a semiconductor substrate and a photomask
US4703434A (en) * 1984-04-24 1987-10-27 The Perkin-Elmer Corporation Apparatus for measuring overlay error
US7115858B1 (en) 2000-09-25 2006-10-03 Nanometrics Incorporated Apparatus and method for the measurement of diffracting structures
WO2002065545A2 (en) * 2001-02-12 2002-08-22 Sensys Instruments Corporation Overlay alignment metrology using diffraction gratings
US6898537B1 (en) 2001-04-27 2005-05-24 Nanometrics Incorporated Measurement of diffracting structures using one-half of the non-zero diffracted orders
US6713753B1 (en) 2001-07-03 2004-03-30 Nanometrics Incorporated Combination of normal and oblique incidence polarimetry for the characterization of gratings
US7061615B1 (en) 2001-09-20 2006-06-13 Nanometrics Incorporated Spectroscopically measured overlay target
KR100385066B1 (ko) * 2001-10-16 2003-05-23 삼성전자주식회사 레이저 스캐닝 유니트
US6982793B1 (en) 2002-04-04 2006-01-03 Nanometrics Incorporated Method and apparatus for using an alignment target with designed in offset
US6949462B1 (en) 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
US7582538B2 (en) * 2005-04-06 2009-09-01 Taiwan Semiconductor Manufacturing Company, Ltd. Method of overlay measurement for alignment of patterns in semiconductor manufacturing
US7432605B2 (en) * 2006-09-21 2008-10-07 Macronix International Co., Ltd. Overlay mark, method for forming the same and application thereof
US7990528B2 (en) * 2009-09-29 2011-08-02 Xerox Corporation High resolution linear image sensing using multi-row low resolution image sensor
PL224191B1 (pl) 2012-05-25 2016-11-30 Polska Spółka Inżynierska Digilab Spółka Z Ograniczoną Sposób wyznaczania  wartości wymiaru liniowego obiektu oraz optyczne urządzenie do wyznaczania wymiaru liniowego obiektu
US10822890B2 (en) 2018-06-15 2020-11-03 Rus-Tec Engineering, Ltd. Pipe handling apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1231431A (cg-RX-API-DMAC7.html) * 1967-06-24 1971-05-12
US3507597A (en) * 1967-09-26 1970-04-21 Bausch & Lomb Lens axial alignment method and apparatus
US3797939A (en) * 1968-08-09 1974-03-19 T Pryor Diffractographic measurement of profile
JPS5117297B1 (cg-RX-API-DMAC7.html) * 1971-03-11 1976-06-01
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3883249A (en) * 1972-05-15 1975-05-13 Timothy R Pryor Z-factor and other diffractographic displacement and profile sensors
US3957376A (en) * 1974-01-25 1976-05-18 International Business Machines Corporation Measuring method and system using a diffraction pattern
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.

Also Published As

Publication number Publication date
EP0002668A2 (de) 1979-07-11
US4172664A (en) 1979-10-30
EP0002668A3 (en) 1979-07-25
EP0002668B1 (de) 1982-04-28
JPS6351241B2 (cg-RX-API-DMAC7.html) 1988-10-13
JPS5495267A (en) 1979-07-27
CA1104338A (en) 1981-07-07

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee