DE2820301B2 - Arrangement for the inner coating of pipes - Google Patents

Description

35

The invention relates to an arrangement for the inner coating of pipes with layer material Metal or its alloys in a vacuum using cathode sputtering, in which the sputtering target is used as a Rod-shaped electrode is used and is arranged in the longitudinal axis of the pipe to be coated.

Such arrangements are already known (DE-PS 76 529).

A process for the internal coating of pipes - especially metal pipes - is also known. in which a tubular film made of corrosion- and heat-resistant plastic with a whole or Almost the inner diameter of the pipe corresponding to the outer diameter axially inserted into the pipe and then made to adhere to the inner wall of the pipe, the inner wall and / or film being one are subjected to pretreatment serving for adhesion (DE-OS 26 02 108). By means of incoming pressure a liquid or gaseous medium - after one-sided closure of the pipe - the film is there Seamlessly adhered to the inner wall of the pipe.

It is also already a method of applying layers of substantially uniform thickness Substrates known by means of high-frequency cathode sputtering, in which a Magnetic field of suitable strength with a field line course perpendicular to the target surface is used and the pressure of the inert gas in the atomizing chamber at constant discharge energy as is adjusted so that a negative bias is maintained on the surface of the substrate (DE-AS 19 33 467). The known arrangement, which a high-frequency cathode sputtering with the help of a magnetic field is used for the deposition of layers on substrates with flat surfaces or suitable for flat surfaces with irregular surfaces In this case, the substrates, typically wafers made of semiconductor material, are coated should, placed on the anode of the discharge path located directly opposite the anode, in a certain distance, the cathode with the target from the coating material. That used Magnetic field is used to influence the coating so that irregularities in the substrate surface obtain the same or a similar layer thickness as the flat surface areas.

Also a ring discharge process with a non-metallic one Vacuum recipient is already known (DE-OS2415111).

The invention is based on the object of providing an arrangement of the type mentioned at the beginning improve that the inner surfaces of pipes up to a diameter of about 50 mm and more with be provided with a metallic or insulating coating of high uniformity. This task will solved by the means described in the characterizing part of claim 1.

As a result, it is advantageously possible to make pipe inner walls homogeneous even with small pipe diameters to coat and to use layer materials of almost any composition and to achieve high coating speeds.

In the following, exemplary embodiments of the invention are explained in more detail with reference to the drawings. In the Drawing shows

F i g. 1 is an exploded perspective view of the electrode;

F i g. 2 shows a cross section of FIG. 1;

F i g. 3 shows a side view of the exemplary embodiments according to FIG. 1;

F i g. 4 shows a cross section through a further exemplary embodiment of an electrode.

The inner surface of a tube 11 is in accordance with the described arrangement by means of cathode sputtering coated with the additional application of a magnetic field in the vicinity of the surface of a target 12, by forming the so-called sputter target 12 as a cylindrical electrode and under arrangement a cooling - for example water cooling - in the longitudinal axis 16 of the pipe 11 to be coated is arranged.

According to the exemplary embodiment according to FIG. 1, the cylindrical target 12 is hollow-cylindrical in this way formed that within the target 12 between two armature disks 13 a longitudinally magnetized bar magnet 14 stored in centering 20. These armature disks 13 have holes 15 for water cooling Mistake.

The pipe 11 to be coated is evacuated after the introduction of the target arrangement, so that the coating can be done by an atomization process. In order to ensure that the target 12 is removed evenly obtained, a relative movement is carried out between the target and the magnet arrangement.

Fig. 2 shows the polar arrangement of the longitudinally magnetized bar magnets between the armature disks, if more than two of the latter are used.

The F i g. 3 shows a further embodiment

an electrode according to the arrangement described. Here 12 are radial in a hollow cylindrical target Magnetic cylinders 17 supported, which are supported on a copper tube 19. Between each in the Magnetflussrichtui. «Changing magnetized cylinders 17 iron connection lines 18 are arranged, which both the distance between the magnetic cylinder 17, as well fix the cover of the coolant bores 15 between the copper pipe 19 and the iron connection section 18.

The embodiments described above make it possible for the first time to carry out normal glow discharges to be used for cathode sputtering in narrow tubes · !. But this also made it possible To coat ferromagnetic tubes inside, which was the case with the previous versions according to the prior art Technique that required the magnets to be placed outside the tubes was not feasible.

For this purpose 2 sheets of drawings

Claims (4)

1 claims: 1. Arrangement for the inner coating of pipes with layer material made of metal or its alloys in a vacuum using cathode sputtering, in which the sputtering target is used as a rod-shaped electrode serves and is arranged in the longitudinal axis of the pipe to be coated, characterized in that that the sputtering target (12) is designed as a hollow cylinder and by a magnet arrangement is carried, which either has armature disks (13), of which two with one longitudinally magnetized bar magnet (14) are positively connected, or with radially magnetized Cylinders (17) is provided, which along the longitudinal axis (16) of the pipe to be coated (U) are arranged, and that the magnet arrangement is provided with cooling bores (15) for water cooling is 2. Arrangement according to claim 1, characterized in that that there is a relative movement between the sputtering target (12) and the magnet arrangement. 3. Arrangement according to claim 1 or 2, characterized in that the radially magnetized Cylinder (17) between iron connection lines (18) and an axial rod (19), for example Copper are arranged. 4. Arrangement according to claim 3, characterized in that the radially magnetized cylinder (17) with alternately directed magnetic current direction side by side through the iron connection lines (18) are stored fixed at a distance.