DE2312774A1 - Verfahren zur herstellung duenner anorganischer filme auf unterlagen - Google Patents
Verfahren zur herstellung duenner anorganischer filme auf unterlagenInfo
- Publication number
- DE2312774A1 DE2312774A1 DE19732312774 DE2312774A DE2312774A1 DE 2312774 A1 DE2312774 A1 DE 2312774A1 DE 19732312774 DE19732312774 DE 19732312774 DE 2312774 A DE2312774 A DE 2312774A DE 2312774 A1 DE2312774 A1 DE 2312774A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- directed towards
- plasma
- constant potential
- thin inorganic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 9
- 230000008569 process Effects 0.000 claims abstract description 6
- 238000006243 chemical reaction Methods 0.000 claims description 19
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 239000011541 reaction mixture Substances 0.000 claims description 5
- 230000009471 action Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000376 reactant Substances 0.000 abstract description 7
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 4
- 239000000377 silicon dioxide Substances 0.000 abstract description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 230000005684 electric field Effects 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 210000002381 plasma Anatomy 0.000 description 13
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- -1 oxygen ions Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002028 premature Effects 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16360672A DD96984A1 (cs) | 1972-06-12 | 1972-06-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2312774A1 true DE2312774A1 (de) | 1974-01-03 |
Family
ID=5486942
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19732312774 Pending DE2312774A1 (de) | 1972-06-12 | 1973-03-15 | Verfahren zur herstellung duenner anorganischer filme auf unterlagen |
Country Status (4)
| Country | Link |
|---|---|
| CS (1) | CS166979B1 (cs) |
| DD (1) | DD96984A1 (cs) |
| DE (1) | DE2312774A1 (cs) |
| PL (1) | PL86395B1 (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2750597A1 (de) * | 1976-11-18 | 1978-05-24 | Alsthom Atlantique | Verfahren zum aufdampfen von duennen schichten durch zersetzung eines gases in einem plasma |
| EP0087151A3 (de) * | 1982-02-23 | 1984-07-25 | Siemens Aktiengesellschaft | Verfahren zum Herstellen von Schichten aus hochschmelzenden Metallen bzw. Metallverbindungen durch Abscheidung aus der Dampfphase |
| DE3841730A1 (de) * | 1988-12-10 | 1990-06-13 | Krupp Widia Gmbh | Verfahren zum beschichten eines metallischen grundkoerpers mit einem nichtleitenden beschichtungsmaterial |
-
1972
- 1972-06-12 DD DD16360672A patent/DD96984A1/xx unknown
-
1973
- 1973-03-15 DE DE19732312774 patent/DE2312774A1/de active Pending
- 1973-05-03 CS CS317573A patent/CS166979B1/cs unknown
- 1973-06-09 PL PL16325773A patent/PL86395B1/xx unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2750597A1 (de) * | 1976-11-18 | 1978-05-24 | Alsthom Atlantique | Verfahren zum aufdampfen von duennen schichten durch zersetzung eines gases in einem plasma |
| EP0087151A3 (de) * | 1982-02-23 | 1984-07-25 | Siemens Aktiengesellschaft | Verfahren zum Herstellen von Schichten aus hochschmelzenden Metallen bzw. Metallverbindungen durch Abscheidung aus der Dampfphase |
| DE3841730A1 (de) * | 1988-12-10 | 1990-06-13 | Krupp Widia Gmbh | Verfahren zum beschichten eines metallischen grundkoerpers mit einem nichtleitenden beschichtungsmaterial |
Also Published As
| Publication number | Publication date |
|---|---|
| CS166979B1 (cs) | 1976-03-29 |
| PL86395B1 (cs) | 1976-05-31 |
| DD96984A1 (cs) | 1973-04-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OHJ | Non-payment of the annual fee |