DE20306904U1 - Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers - Google Patents

Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers

Info

Publication number
DE20306904U1
DE20306904U1 DE20306904U DE20306904U DE20306904U1 DE 20306904 U1 DE20306904 U1 DE 20306904U1 DE 20306904 U DE20306904 U DE 20306904U DE 20306904 U DE20306904 U DE 20306904U DE 20306904 U1 DE20306904 U1 DE 20306904U1
Authority
DE
Germany
Prior art keywords
layer
reflected
light
measuring
coating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE20306904U
Other languages
German (de)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otto Von Guericke Universitaet Magdeburg
Original Assignee
Otto Von Guericke Universitaet Magdeburg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otto Von Guericke Universitaet Magdeburg filed Critical Otto Von Guericke Universitaet Magdeburg
Priority to DE20306904U priority Critical patent/DE20306904U1/en
Publication of DE20306904U1 publication Critical patent/DE20306904U1/en
Priority to DE10361792A priority patent/DE10361792B4/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

Description

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßt The description text was not recorded electronically  

Der Beschreibungstext wurde nicht elektronisch erfaßtThe description text was not recorded electronically

Claims (10)

1. Vorrichtung zur Messung der Schichtdicke und der Krümmung von mindestens teilweise reflektierenden Oberflächen von Schichten, insbesondere während der Schichtherstellung in einer Beschichtungsapparatur, gekennzeichnet durch
  • a) Mittel zum Beleuchten der Schichtoberfläche mit mindestens zwei nahezu parallelen Lichtstrahlen,
  • b) die nahezu parallele Führung der einfallenden und der an der Schichtoberfläche reflektierten Lichtstrahlen in der Beschichtungsapparatur,
  • c) einen Strahlteiler zur Trennung der einfallenden und der an der Schichtoberfläche reflektierten Lichtstrahlen voneinander,
  • d) einen Zeilen- oder Flächendetektor zum Messen des Abstands von mindestens zwei an der Schichtoberfläche reflektierten und auf den Detektor auftreffenden Lichtstrahlen,
  • e) Mittel zur Messung der Intensität der an der Schicht reflektierten Lichtstrahlen oder der Gesamtintensität als Maß für die Schichtdicke.
1. Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers, in particular during the layer production in a coating apparatus, characterized by
  • a) means for illuminating the layer surface with at least two almost parallel light beams,
  • b) the almost parallel guidance of the incident and of the light rays reflected on the layer surface in the coating apparatus,
  • c) a beam splitter for separating the incident light rays and those reflected on the layer surface from one another,
  • d) a line or area detector for measuring the distance between at least two light beams reflected on the layer surface and impinging on the detector,
  • e) means for measuring the intensity of the light rays reflected on the layer or the total intensity as a measure of the layer thickness.
2. Vorrichtung nach Anspruch 1, gekennzeichnet durch das Verwenden eines Etalons zur Aufspaltung und damit zur Erzeugung mehrerer Lichtstrahlen.2. Device according to claim 1, characterized by using an etalon for splitting and thus for generating multiple light beams. 3. Vorrichtung nach Anspruch 1, gekennzeichnet durch das Verwenden von mehreren Lichtquellen zur Erzeugung mehrerer Lichtstrahlen.3. Device according to claim 1, characterized by the use of several Light sources for generating multiple light beams. 4. Vorrichtung nach Anspruch 1, gekennzeichnet durch das Verwenden einer Beugungsanordnung oder eines holographischen Gitters, das ein Punkt- oder Linienmuster erzeugt, zur Erzeugung mehrerer Lichtstrahlen.4. The device according to claim 1, characterized by using a Diffraction arrangement or a holographic grating, which is a point or Line pattern generated to generate multiple light rays. 5. Vorrichtung nach Anspruch 2, gekennzeichnet durch der Verwendung eines Spiegels zur Erhöhung der Lichtintensität durch Rückreflektion des ersten, am Etalon reflektierten, Strahls.5. The device according to claim 2, characterized by the use of a mirror to increase the light intensity by reflecting back the first, on the etalon reflected, beam. 6. Vorrichtung nach Anspruch 1, 2 und/oder 5, gekennzeichnet durch der Verwendung eines Spiegels zur Erzeugung einer oder mehrerer versetzten Lichtpunktlinien analog zu den primär erzeugten Lichtpunkten. 6. The device according to claim 1, 2 and / or 5, characterized by the use of a mirror for generating one or more offset light dot lines analog to the primarily generated light points.   7. Vorrichtung nach einem der vorhergehenden Ansprüche, gekennzeichnet durch die Verwendung eines optischen Bandpasses im reflektierten Strahlengang.7. Device according to one of the preceding claims, characterized by the Use of an optical bandpass in the reflected beam path. 8. Vorrichtung nach einem der vorhergehenden Ansprüche, gekennzeichnet durch die Bestimmung der Oberflächentemperatur der zu vermessenden Schicht durch Messung der Hintergrundstrahlung.8. Device according to one of the preceding claims, characterized by the Determination of the surface temperature of the layer to be measured by measurement the background radiation. 9. Vorrichtung nach einem der vorhergehenden Ansprüche, gekennzeichnet durch die Verwendung eines entspiegelten Eintrittsfensters in die Beschichtungsapparatur.9. Device according to one of the preceding claims, characterized by the Use of an anti-glare entry window in the coating apparatus. 10. Vorrichtung nach einem der vorhergehenden Ansprüche, gekennzeichnet durch die Verwendung eines Eintrittsfensters in die Beschichtungsapparatur, das um wenige Grad gegenüber der Oberfläche der zu vermessenden Schicht verkippt ist.10. Device according to one of the preceding claims, characterized by the Use of an entry window in the coating apparatus, which by a few Degree is tilted relative to the surface of the layer to be measured.
DE20306904U 2003-05-02 2003-05-02 Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers Expired - Lifetime DE20306904U1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE20306904U DE20306904U1 (en) 2003-05-02 2003-05-02 Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers
DE10361792A DE10361792B4 (en) 2003-05-02 2003-12-31 Device for measuring the layer thickness and the curvature of at least partially reflective surfaces of layers and their use

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE20306904U DE20306904U1 (en) 2003-05-02 2003-05-02 Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers

Publications (1)

Publication Number Publication Date
DE20306904U1 true DE20306904U1 (en) 2003-09-04

Family

ID=27816377

Family Applications (2)

Application Number Title Priority Date Filing Date
DE20306904U Expired - Lifetime DE20306904U1 (en) 2003-05-02 2003-05-02 Device for measuring the layer thickness and the curvature of at least partially reflecting surfaces of layers
DE10361792A Expired - Lifetime DE10361792B4 (en) 2003-05-02 2003-12-31 Device for measuring the layer thickness and the curvature of at least partially reflective surfaces of layers and their use

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE10361792A Expired - Lifetime DE10361792B4 (en) 2003-05-02 2003-12-31 Device for measuring the layer thickness and the curvature of at least partially reflective surfaces of layers and their use

Country Status (1)

Country Link
DE (2) DE20306904U1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7505150B2 (en) 2005-05-13 2009-03-17 Laytec Gmbh Device and method for the measurement of the curvature of a surface
DE102005023302B4 (en) * 2005-05-13 2010-09-16 Laytec Gesellschaft Für In-Situ und Nano-Sensorik mbH Apparatus and method for measuring the curvature of a surface
CN106949843A (en) * 2016-01-07 2017-07-14 上海新微技术研发中心有限公司 Device and method for detecting warping degree of micro-mirror surface

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007015616A1 (en) * 2005-08-01 2007-02-08 Nanotron Technologies, Inc. Apparatus and method for measuring curvature using multiple beams
US20070146685A1 (en) * 2005-11-30 2007-06-28 Yoo Woo S Dynamic wafer stress management system
EP2546600B1 (en) 2011-07-11 2014-07-30 LayTec AG Method and apparatus for real-time determination of spherical and non-spherical curvature of a surface
DE102016203298B3 (en) * 2016-03-01 2017-03-23 Nasp Iii/V Gmbh Method for characterizing semiconductor materials

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5067817A (en) * 1990-02-08 1991-11-26 Bauer Associates, Inc. Method and device for noncontacting self-referencing measurement of surface curvature and profile
US5232547A (en) * 1992-07-01 1993-08-03 Motorola, Inc. Simultaneously measuring thickness and composition of a film
FR2718231B1 (en) * 1994-04-05 1996-06-21 Sofie Method and device for in situ quantification of the morphology and thickness in a localized area of a surface layer being treated on a thin layer structure.
ES2181814T3 (en) * 1995-02-11 2003-03-01 Roke Manor Research IMPROVEMENTS RELATED TO THE MEASUREMENT OF THE SURFACE CURVATURE.
US5912738A (en) * 1996-11-25 1999-06-15 Sandia Corporation Measurement of the curvature of a surface using parallel light beams

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7505150B2 (en) 2005-05-13 2009-03-17 Laytec Gmbh Device and method for the measurement of the curvature of a surface
DE102005023302B4 (en) * 2005-05-13 2010-09-16 Laytec Gesellschaft Für In-Situ und Nano-Sensorik mbH Apparatus and method for measuring the curvature of a surface
CN106949843A (en) * 2016-01-07 2017-07-14 上海新微技术研发中心有限公司 Device and method for detecting warping degree of micro-mirror surface

Also Published As

Publication number Publication date
DE10361792B4 (en) 2005-11-24
DE10361792A1 (en) 2004-11-25

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Legal Events

Date Code Title Description
R207 Utility model specification

Effective date: 20031009

R150 Term of protection extended to 6 years

Effective date: 20060216

R151 Term of protection extended to 8 years

Effective date: 20080610

R152 Term of protection extended to 10 years

Effective date: 20110428

R071 Expiry of right