DE1934326A1 - Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten - Google Patents

Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten

Info

Publication number
DE1934326A1
DE1934326A1 DE19691934326 DE1934326A DE1934326A1 DE 1934326 A1 DE1934326 A1 DE 1934326A1 DE 19691934326 DE19691934326 DE 19691934326 DE 1934326 A DE1934326 A DE 1934326A DE 1934326 A1 DE1934326 A1 DE 1934326A1
Authority
DE
Germany
Prior art keywords
electrode
suction
uniform
adjusted
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691934326
Other languages
German (de)
English (en)
Inventor
Reisse Dipl-Phys Guenter
Fiedler Dr Rer Nat Otto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST ELEKTRONISCHE BAUELEMENTE
Original Assignee
INST ELEKTRONISCHE BAUELEMENTE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INST ELEKTRONISCHE BAUELEMENTE filed Critical INST ELEKTRONISCHE BAUELEMENTE
Publication of DE1934326A1 publication Critical patent/DE1934326A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
    • B23B31/16158—Jaws movement actuated by coaxial conical surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/16—Chucks with simultaneously-acting jaws, whether or not also individually adjustable moving radially
    • B23B31/16233—Jaws movement actuated by oblique surfaces of a coaxial control rod
    • B23B31/16254—Jaws movement actuated by oblique surfaces of a coaxial control rod using fluid-pressure means to actuate the gripping means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/10—Chucks characterised by the retaining or gripping devices or their immediate operating means
    • B23B31/12—Chucks with simultaneously-acting jaws, whether or not also individually adjustable
    • B23B31/20—Longitudinally-split sleeves, e.g. collet chucks
    • B23B31/201—Characterized by features relating primarily to remote control of the gripping means
    • B23B31/204—Characterized by features relating primarily to remote control of the gripping means using fluid-pressure means to actuate the gripping means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
    • B23B31/02—Chucks
    • B23B31/24—Chucks characterised by features relating primarily to remote control of the gripping means
    • B23B31/28—Chucks characterised by features relating primarily to remote control of the gripping means using electric or magnetic means in the chuck
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23B—TURNING; BORING
    • B23B2270/00—Details of turning, boring or drilling machines, processes or tools not otherwise provided for
    • B23B2270/38—Using magnetic fields

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Gripping On Spindles (AREA)
  • Electron Sources, Ion Sources (AREA)
DE19691934326 1968-10-17 1969-07-07 Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten Pending DE1934326A1 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
DD13543168 1968-10-17
DD13774469 1969-02-10
DE19691934320 DE1934320A1 (de) 1968-10-17 1969-07-07 Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen
FR6930469A FR2063256A5 (enExample) 1968-10-17 1969-09-08
FR6931339A FR2064480A5 (enExample) 1968-10-17 1969-09-15
GB5503769A GB1294697A (en) 1968-10-17 1969-11-11 Apparatus for the selective sputtering of solid substances by means of ion bombardment according to the plasma or to the ion-beam process

Publications (1)

Publication Number Publication Date
DE1934326A1 true DE1934326A1 (de) 1970-08-06

Family

ID=27543993

Family Applications (3)

Application Number Title Priority Date Filing Date
DE19691934326 Pending DE1934326A1 (de) 1968-10-17 1969-07-07 Mehrstrahl-Ionenzerstaeubungssystem zur Herstellung duenner einheitlicher oder legierter Schichten
DE19691934328 Pending DE1934328A1 (de) 1968-10-17 1969-07-07 Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode
DE19691934320 Pending DE1934320A1 (de) 1968-09-09 1969-07-07 Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen

Family Applications After (2)

Application Number Title Priority Date Filing Date
DE19691934328 Pending DE1934328A1 (de) 1968-10-17 1969-07-07 Vorrichtung zur wahlweisen Zerstaeubung fester Substanzen durch Ionenbeschuss nach der Plasma- oder Ionenstrahlmethode
DE19691934320 Pending DE1934320A1 (de) 1968-09-09 1969-07-07 Kraftspannfutter zum Einspannen von Werkstuecken an Arbeitsmaschinen

Country Status (4)

Country Link
CH (2) CH522951A (enExample)
DE (3) DE1934326A1 (enExample)
FR (2) FR2063256A5 (enExample)
GB (1) GB1294697A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2853251A1 (de) * 1978-12-09 1980-06-12 Willy Klein Zerlegbare und transportable materialhuette
EP0019725A1 (en) * 1979-05-18 1980-12-10 International Business Machines Corporation Deposition method using an energetic particle beam
EP0177115A1 (en) * 1984-09-04 1986-04-09 The Standard Oil Company Dual ion beam deposition of amorphous semiconductor films

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998718A (en) * 1976-02-18 1976-12-21 Bell Telephone Laboratories, Incorporated Ion milling apparatus
FR2410360A1 (fr) * 1977-11-28 1979-06-22 Anvar Source d'ions notamment pour implanteur ionique
US4785220A (en) * 1985-01-30 1988-11-15 Brown Ian G Multi-cathode metal vapor arc ion source
DE102010007542A1 (de) 2010-02-08 2011-08-11 KHS Corpoplast GmbH, 22145 Verfahren und Vorrichtung zur Blasformung von Behältern
CN115188648B (zh) * 2022-09-08 2022-12-23 合肥中科离子医学技术装备有限公司 内潘宁源结构、回旋加速器

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2853251A1 (de) * 1978-12-09 1980-06-12 Willy Klein Zerlegbare und transportable materialhuette
EP0019725A1 (en) * 1979-05-18 1980-12-10 International Business Machines Corporation Deposition method using an energetic particle beam
EP0177115A1 (en) * 1984-09-04 1986-04-09 The Standard Oil Company Dual ion beam deposition of amorphous semiconductor films

Also Published As

Publication number Publication date
CH516226A (de) 1971-11-30
DE1934328A1 (de) 1970-04-30
GB1294697A (en) 1972-11-01
FR2064480A5 (enExample) 1971-07-23
CH522951A (de) 1972-05-15
FR2063256A5 (enExample) 1971-07-09
DE1934320A1 (de) 1971-05-13

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