DE1564352A1 - Verfahren zur Metallisierung von Halbleiterbauelementen - Google Patents

Verfahren zur Metallisierung von Halbleiterbauelementen

Info

Publication number
DE1564352A1
DE1564352A1 DE19661564352 DE1564352A DE1564352A1 DE 1564352 A1 DE1564352 A1 DE 1564352A1 DE 19661564352 DE19661564352 DE 19661564352 DE 1564352 A DE1564352 A DE 1564352A DE 1564352 A1 DE1564352 A1 DE 1564352A1
Authority
DE
Germany
Prior art keywords
gold
aluminum
film
ooo
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19661564352
Other languages
German (de)
English (en)
Inventor
Wilson Richard William
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Publication of DE1564352A1 publication Critical patent/DE1564352A1/de
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrodes Of Semiconductors (AREA)
DE19661564352 1965-10-22 1966-09-17 Verfahren zur Metallisierung von Halbleiterbauelementen Pending DE1564352A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US50251865A 1965-10-22 1965-10-22

Publications (1)

Publication Number Publication Date
DE1564352A1 true DE1564352A1 (de) 1970-04-02

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ID=23998195

Family Applications (1)

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DE19661564352 Pending DE1564352A1 (de) 1965-10-22 1966-09-17 Verfahren zur Metallisierung von Halbleiterbauelementen

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DE (1) DE1564352A1 (enExample)
NL (1) NL6614963A (enExample)

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NL6614963A (enExample) 1967-04-24

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