DE1521166C3 - Process for producing a solid mixed crystal layer from carbides on hard metal bodies - Google Patents

Process for producing a solid mixed crystal layer from carbides on hard metal bodies

Info

Publication number
DE1521166C3
DE1521166C3 DE19661521166 DE1521166A DE1521166C3 DE 1521166 C3 DE1521166 C3 DE 1521166C3 DE 19661521166 DE19661521166 DE 19661521166 DE 1521166 A DE1521166 A DE 1521166A DE 1521166 C3 DE1521166 C3 DE 1521166C3
Authority
DE
Germany
Prior art keywords
hard metal
carbide
metal body
mixed crystal
crystal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19661521166
Other languages
German (de)
Other versions
DE1521166B2 (en
DE1521166A1 (en
Inventor
Grete Elisabeth Dix
Walter Friedrich Georg Dr.Phil. Rix
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fried Krupp AG
Original Assignee
Fried Krupp AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fried Krupp AG filed Critical Fried Krupp AG
Priority to US641474A priority Critical patent/US3558445A/en
Publication of DE1521166A1 publication Critical patent/DE1521166A1/en
Publication of DE1521166B2 publication Critical patent/DE1521166B2/en
Priority to US32627673 priority patent/USRE28485E/en
Application granted granted Critical
Publication of DE1521166C3 publication Critical patent/DE1521166C3/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C29/00—Alloys based on carbides, oxides, nitrides, borides, or silicides, e.g. cermets, or other metal compounds, e.g. oxynitrides, sulfides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)

Description

Die Erfindung betrifft ein Verfahren zum Herstellen einer Mischkristallschicht aus Titankarbid, Vanadinkarbid, Tantalkarbid, Niobkarbid jeweils einzeln oder zu mehreren mit Wolframkarbid auf der Oberfläche eines Hartmetallkörpers, der Wolframkarbid enthält.The invention relates to a method for producing a mixed crystal layer from titanium carbide, vanadium carbide, Tantalum carbide, niobium carbide each individually or in groups with tungsten carbide on the surface of one Carbide body containing tungsten carbide.

Es ist bekannt, daß Titankarbid bei höheren Temperaturen leicht und schnell große Mengen Wolfram bzw. Wolframkarbid in sein Gitter einbaut, während Wolframkarbid kein Titan oder Titankarbid bzw. diese nur in außerordentlich geringer Menge löst. In einer Mischung von Titankarbid—Wolfram wird daher mit steigender Temperatur das Wolfram von dem Titankarbid bis zu einem großen Prozentsatz aufgenommen.It is known that titanium carbide easily and quickly removes large amounts of tungsten at elevated temperatures or tungsten carbide built into its grid, while tungsten carbide does not include titanium or titanium carbide or this only dissolves in an extremely small amount. In a mixture of titanium carbide and tungsten, therefore, as the temperature rises, the tungsten becomes from the titanium carbide up to a large percentage.

Es ist ferner bekannt, daß sich in einer Titan-Wolfram-Kohlenstoff-Mischung bei erhöhter Temperatur ein Mischkristall mit dem Titankarbidgitter bildet. Erst wenn die Menge des Wolframs die Lösungsgrenze für Wolfram in Titankarbid überschreitet, bildet sich auch Wolframkarbid. In entsprechender Weise gelten diese Feststellungen auch für die Metalle Vanadin, Tantal, Niob sowie ihre Karbide.It is also known that in a titanium-tungsten-carbon mixture forms a mixed crystal with the titanium carbide lattice at elevated temperature. First when the amount of tungsten exceeds the limit of solution for tungsten in titanium carbide, it also forms Tungsten carbide. Correspondingly, these statements also apply to the metals vanadium, tantalum, Niobium and their carbides.

Die Aufgabe der vorliegenden Erfindung ist es, ein Verfahren zum Herstellen einer Mischkristallschicht auf der Oberfläche eines Hartmetallkörpers, der Wolframkarbid enthält, anzugeben, die eine gute Haftfestigkeit und einwandfreie Verwachsung mit der Oberfläche ' des Hartmetallkörpers aufweist.The object of the present invention is to provide a method for producing a mixed crystal layer on the surface of a hard metal body containing tungsten carbide to indicate that it has good adhesive strength and flawless intergrowth with the surface 'of the hard metal body.

Dieses Verfahren besteht gemäß der Erfindung dar- j in, daß die Mischkristallschicht durch Reaktion einer ! auf die Oberfläche des Hartmetallkörpers aufgebrachten, aus den Metallen Titan, Vanadin, Tantal, Niob oder deren Legierungen, einzeln oder zu mehreren, bestehenden Schicht mit dem Wolframkarbid des Hartmetallkörpers mittels Wärmebehandlung im Schutzgas oder im Vakuum bei einer Temperatur oberhalb von etwa 9000C hergestellt wird.According to the invention, this method consists in that the mixed crystal layer is formed by the reaction of a! Applied to the surface of the hard metal body, made from the metals titanium, vanadium, tantalum, niobium or their alloys, individually or in several, existing layers with the tungsten carbide of the hard metal body by means of heat treatment in a protective gas or in a vacuum at a temperature above about 900 ° C will.

Das neue Verfahren kann so durchgeführt werden, daß der Hartmetallkörper in Titanhydridpulver eingebettet, unter Schutzgas auf Temperaturen von oberhalb 9000C erwärmt und einige Zeit bei dieser TemperaturThe new process can be carried out in such a way that the hard metal body is embedded in titanium hydride powder, heated to temperatures above 900 ° C. under protective gas and at this temperature for some time

ίο gehalten wird. Nach einer anderen Ausführungsform der Erfindung wird der Hartmetallkörper im Vakuum mit Titan bedampft und anschließend ebenfalls einige Zeit bei einer Temperatur von oberhalb 9000C gehalten! Auch ist es möglich, den Hartmetallkörper den Dämpfen von flüchtigen, leicht zersetzbaren Titanverbindungen bei erhöhter Temperatur auszusetzen; mit Vorteil wird hier Titanchloriddampf bei oberhalb 9000C verwendet. Je höher die Behandlungstemperatur gewählt wird, um so schneller geht die gewünschte Mischkristallbildung vonstatten.ίο is held. According to another embodiment of the invention, the hard metal body is vaporized with titanium in a vacuum and then also kept at a temperature of above 900 ° C. for some time! It is also possible to expose the hard metal body to the vapors of volatile, easily decomposable titanium compounds at elevated temperatures; advantageously titanium chloride vapor is used at above 900 0 C here. The higher the treatment temperature selected, the faster the desired mixed crystal formation takes place.

Schließlich wird nach einer weiteren Ausführungsform des neuen Verfahrens der Hartmetallkörper elektrolytisch mit einer Titanschicht überzogen und anschließend im Vakuum oder unter Schutzgas einige Zeit bei oberhalb 9000C gehalten.Finally, according to a further embodiment of the new method, the hard metal body is electrolytically coated with a titanium layer and then kept for some time at above 900 ° C. in a vacuum or under protective gas.

In der dem Titan bzw. seinen Verbindungen oder Legierungen entsprechenden Weise können die Metalle Vanadin, Tantal, Niob bzw. deren Verbindungen oder Legierungen verwendet werden.In the manner corresponding to titanium or its compounds or alloys, the metals Vanadium, tantalum, niobium or their compounds or alloys can be used.

Die Vorteile des neuen Verfahrens sind vor allem darin zu sehen, daß eine gute Haftfestigkeit und einwandfreie Verwachsung der Mischkristallschicht mit dem Hartmetallkörper erreicht wird. Außerdem kann auf die zusätzliche Zugabe von Kohlenstoffverbindungen verzichtet werden.The advantages of the new process are mainly to be seen in the fact that it has good adhesive strength and flawless Adhesion of the mixed crystal layer with the hard metal body is achieved. Also can the additional addition of carbon compounds can be dispensed with.

Es ist zwar bereits vorgeschlagen worden, durch Auftragsschweißung unter Verwendung von Hartmetall-Elektroden, die beispielsweise aus Wolframkarbid, Titankarbid und Kobalt bestehen können, und unter Anwendung des elektrischen Lichtbogens eine Hartmetallschicht auf einen aus Stahl, Kupfer oder W-Ti-Karbid bestehenden Grundkörper aufzubringen. An eine Reaktion zwischen dem aufgeschweißten Hartmetallgut und dem Grundkörper ist bei diesen bekannten Verfahren jedoch nicht gedacht.It has already been proposed, by build-up welding using hard metal electrodes, which can for example consist of tungsten carbide, titanium carbide and cobalt, and under Applying the electric arc to a hard metal layer on one made of steel, copper or W-Ti carbide apply existing base body. A reaction between the welded-on hard metal material and the base body is not intended for these known methods.

Claims (4)

Patentansprüche:Patent claims: 1. Verfahren zum Herstellen einer haftfesten Mischkristallschicht aus Titankarbid, Vanadinkarbid, Tantalkarbid, Niobkarbid jeweils einzeln oder zu mehreren mit Wolframkarbid auf der Oberfläche eines Hartmetallkörpers, der Wolframkarbid enthält, dadurch gekennzeichnet, daß die Mischkristallschicht durch Reaktion einer auf die Oberfläche des Hartmetallkörpers aufgebrachten, aus den Metallen Titan, Vanadin, Tantal, Niob oder deren Legierungen, einzeln oder zu mehreren, bestehenden Schicht mit dem Wolframkarbid des Hartmetallkörpers mittels Wärmebehandlung im Schutzgas oder im Vakuum bei einer Temperatur oberhalb von etwa 900° C hergestellt wird.1. A method for producing a solid mixed crystal layer made of titanium carbide, vanadium carbide, Tantalum carbide, niobium carbide each individually or in groups with tungsten carbide on the surface a hard metal body containing tungsten carbide, characterized in that the Mixed crystal layer by reaction of a layer applied to the surface of the hard metal body, made of the metals titanium, vanadium, tantalum, niobium or their alloys, individually or in groups Layer with the tungsten carbide of the hard metal body by means of heat treatment in a protective gas or in a vacuum at one temperature is produced above about 900 ° C. 2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Metallschicht durch Aufdampfen im Vakuum auf den Hartmetallkörper aufgebracht wird.2. The method according to claim 1, characterized in that the metal layer by vapor deposition is applied to the hard metal body in a vacuum. 3. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Metallschicht durch Zersetzung der entsprechenden flüchtigen, leicht zersetzbaren Metallverbindungen auf den Hartmetallkörper aufgebracht wird.3. The method according to claim 1, characterized in that the metal layer by decomposition the corresponding volatile, easily decomposable metal compounds applied to the hard metal body will. 4. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Metallschicht durch elektrolytische Abscheidung auf den Hartmetallkörper aufgebracht wird.4. The method according to claim 1, characterized in that the metal layer by electrolytic Deposition is applied to the hard metal body.
DE19661521166 1966-06-02 1966-06-02 Process for producing a solid mixed crystal layer from carbides on hard metal bodies Expired DE1521166C3 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US641474A US3558445A (en) 1966-06-02 1967-05-26 Method of producing coatings on hard metal bodies
US32627673 USRE28485E (en) 1966-06-02 1973-01-24 Method of producing coatings on hard metal bodies

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB0087396 1966-06-02

Publications (3)

Publication Number Publication Date
DE1521166A1 DE1521166A1 (en) 1969-07-24
DE1521166B2 DE1521166B2 (en) 1971-11-04
DE1521166C3 true DE1521166C3 (en) 1975-11-20

Family

ID=6983775

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19661521166 Expired DE1521166C3 (en) 1966-06-02 1966-06-02 Process for producing a solid mixed crystal layer from carbides on hard metal bodies

Country Status (3)

Country Link
CH (1) CH476122A (en)
DE (1) DE1521166C3 (en)
NL (1) NL6703930A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4018631A (en) * 1975-06-12 1977-04-19 General Electric Company Coated cemented carbide product
DE4002839A1 (en) * 1990-02-01 1991-08-08 Forschungszentrum Juelich Gmbh High temp. multilayer wall structure - with iron or nickel alloy core contg. carbide formers

Also Published As

Publication number Publication date
DE1521166B2 (en) 1971-11-04
NL6703930A (en) 1967-12-04
CH476122A (en) 1969-07-31
DE1521166A1 (en) 1969-07-24

Similar Documents

Publication Publication Date Title
DE2435989C2 (en) Process for the production of a wear-resistant, coated hard metal body for machining purposes
DE2305202C2 (en) Foil for use in the diffusion bonding process of nickel-based superalloy parts
EP0168868A1 (en) Process for the deposition of a corrosion-inhibiting layer, comprising protective oxide-forming elements at the base of a gas turbine blade, and a corrosion-inhibiting layer
DE2621753A1 (en) PROCESS FOR THE PRODUCTION OF ALUMINIDE COATINGS ON NICKEL, COBALT AND IRON BASED ALLOYS
DE2013205A1 (en)
EP0108877A1 (en) Method of applying protective coatings to the surfaces of tools and devices
DE1242984B (en) Use of an electrode made of sintered hard metal for armoring large areas by means of inert gas arc deposition welding
DE1521166C3 (en) Process for producing a solid mixed crystal layer from carbides on hard metal bodies
DE3004080C2 (en) Method for coating a porous electrode
DE2446517B2 (en) CARBIDE-FREE WELDING MATERIAL FOR DEPOSIT WELDING
DE2418101A1 (en) PROCESS FOR PRODUCING A JOINT BETWEEN DIAMONDS AND A METAL
DE1283403B (en) Indirectly heated storage cathode for electrical discharge vessels
CH312216A (en) Process for applying hard metal to carrier materials.
DE2258906A1 (en) FILTER ELEMENT AND METHOD OF MANUFACTURING IT
DE1483483A1 (en) Powder for welding or coating metal pieces
DE2129992C3 (en) Process for the production of welding wires
DE1446117C3 (en) Process for producing a diffusion layer on objects made of alloys
DE599768C (en) Process for the production of metallic layers
DE2251656C3 (en) Process for the manufacture of an X-ray tube rotating anode
DE1913793A1 (en) Rotary anode for x ray tubes and processing - technique for it
DE1921211B2 (en) PROCESS FOR MANUFACTURING HIGH STRENGTH MATERIALS FROM POLYCRYSTALLINE METAL WHISPER
DE467247C (en) Process for the production of metallic beryllium or its alloys
DE2038894C3 (en) Process for the production of coated electrodes for spark gaps and electrodes produced according to this process
DE1059738B (en) Process for the production of a multilayer metal
DE626316C (en) Process for the production of work pieces from hard metals

Legal Events

Date Code Title Description
SH Request for examination between 03.10.1968 and 22.04.1971
C3 Grant after two publication steps (3rd publication)