DE1221874B - Process for the galvanic deposition of palladium-silver alloy coatings - Google Patents
Process for the galvanic deposition of palladium-silver alloy coatingsInfo
- Publication number
- DE1221874B DE1221874B DEL41658A DEL0041658A DE1221874B DE 1221874 B DE1221874 B DE 1221874B DE L41658 A DEL41658 A DE L41658A DE L0041658 A DEL0041658 A DE L0041658A DE 1221874 B DE1221874 B DE 1221874B
- Authority
- DE
- Germany
- Prior art keywords
- solution
- silver
- palladium
- film
- porous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/86—Inert electrodes with catalytic activity, e.g. for fuel cells
- H01M4/94—Non-porous diffusion electrodes, e.g. palladium membranes, ion exchange membranes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Chemically Coating (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Description
DEUTSCHESGERMAN
PATENTAMTPATENT OFFICE
AUSLEGESCHRIFTEDITORIAL
Int. Cl.:Int. Cl .:
C23bC23b
Deutsche Kl.: 48 a -S/32German class: 48 a -S / 32
Nummer: 1221 874Number: 1221 874
Aktenzeichen: L 41658 VIb/48iFile number: L 41658 VIb / 48i
Anmeldetag: 4. April 1962 Filing date: April 4, 1962
Auslegetag: 28. Juli 1966Opening day: July 28, 1966
Die Erfindung betrifft das galvanische Abscheiden von Palladium-Silber-Legierungsüberzügen und insbesondere die Abscheidung eines nichtporösen Filmes einer solchen Legierung aus einer ammoniakalischen Lösung der Nitrate.The invention relates to the electrodeposition of palladium-silver alloy coatings and, more particularly, to the deposition of a non-porous film such an alloy from an ammoniacal solution of the nitrates.
Eine Elektroabscheidung diente bisher dem Zweck, einem Metall eine ansprechende Ausrüstung zu geben Oder es mit einer Oberfläche zu versehen, die gegenüber den korrodierenden Einflüssen der Atmosphäre beständig war. Seit kurzem wird eine Elektroabscheidung auch angewandt, um auf Metalle, wie Stahl od. dgl., die keine guten elektrischen Leiter sind, eine gut leitende Oberflächenschicht aus Kupfer, Silber oder Gold aufzubringen.Up to now, electrodeposition has served the purpose of giving a metal an attractive finish Or to provide it with a surface that is resistant to the corrosive effects of the atmosphere was. Electrodeposition has recently also been used to apply to metals such as steel or the like. which are not good electrical conductors, a good conductive surface layer made of copper, silver or To apply gold.
Aus der deutschen Patentschrift 688 398 ist ein Verfahren zur Herstellung von Silber und Platin enthaltenden galvanischen Niederschlägen aus cyanidhaltigen Lösungen bekannt. Dieses Verfahren hat den großen Nachteil, daß der verwendete Elektrolyt außerordentlich giftig ist.From the German patent specification 688 398 is a method for the production of silver and platinum containing electroplating known from cyanide-containing solutions. This procedure has the great disadvantage that the electrolyte used is extremely toxic.
Aufgabe der Erfindung ist ein Verfahren zur Abscheidung eines nichtporösen Filmes aus einer Palladium-Silber-Legierung aus ungiftigen Elektrolyten. The object of the invention is a method for depositing a non-porous film from a Palladium-silver alloy made from non-toxic electrolytes.
Gegenstand der Erfindung ist ein Verfahren zum galvanischen Abscheiden von porenfreien Palladium-Silber-Legierungsüberzügen. Das Verfahren ist dadurch gekennzeichnet, daß die Abscheidung mit Hilfe einer ammoniakalischen Palladium- und Silbernitratlösung be>' einem pH-Wert von 7,5 bis 11, einer Temperatur von 35 bis 9O0C und einer Stromdichte von 1 bis 100 mA/cms bei einer Spannung von 0,5 bis 7 Volt vorgenommen wird.The invention relates to a method for the galvanic deposition of pore-free palladium-silver alloy coatings. The method is characterized in that the separation be by means of an ammoniacal palladium and silver nitrate solution>'a pH value of 7.5 to 11, a temperature of 35 to 9O 0 C and a current density of 1 to 100 mA / cm s is made at a voltage of 0.5 to 7 volts.
Um eine gute Haftung des Filmes aus der Palladiumlegierung auf der Probe zu erzielen, muß die Oberfläche des zu plattierenden Gegenstandes chemisch gereinigt werden, damit sie frei von Oberflächenoxyden usw. ist. Außerdem muß die Oberfläche des Gegenstandes frei von Ölen, Fetten und ähnlichen Substanzen sein. Diese Reinigung erfolgt nach bekannten Methoden.In order to achieve good adhesion of the film from the palladium alloy to the sample, the surface must of the object to be plated are chemically cleaned so that they are free of surface oxides etc. is. In addition, the surface of the object must be free of oils, fats and the like Be substances. This cleaning takes place according to known methods.
Die verwendeten Nitratlösungen werden zweckmäßig hergestellt, indem man eine Palladium-Silber-Legierung
in Salpetersäure auflöst und die Lösung dann durch Zugabe von Ammoniak bis zu einem pH
von etwa 7,5 bis 11 alkalisch macht. Alternativ kann die Lösung hergestellt werden, indem man die Nitrate
von Silber und Palladium löst und die Lösungen miteinander vermischt und ammoniakalisch macht.
Die Konzentration der Lösung ist nicht besonders kritisch. Jedoch wurde gefunden, daß gute Ergebnisse
mit Lösungen erhalten werden, die 0,5 bis etwa 10 g Verfahren zum galvanischen Abscheiden
von Palladium-Silber-LegierungsüberzügenThe nitrate solutions used are expediently prepared by dissolving a palladium-silver alloy in nitric acid and then making the solution alkaline to a pH of about 7.5 to 11 by adding ammonia. Alternatively, the solution can be made by dissolving the nitrates of silver and palladium and mixing the solutions together and rendering them ammoniacal. The concentration of the solution is not particularly critical. However, it has been found that good results are obtained with solutions containing 0.5 to about 10 grams of electrodeposition processes
of palladium-silver alloy coatings
Anmelder:Applicant:
Leesona Corporation, Warwick, R. I. (V. St. A.)
Vertreter:Leesona Corporation, Warwick, RI (V. St. A.)
Representative:
Dipl.-Chem. Dr. rer. nat. I. Ruch, Patentanwalt,
ίο München 5, Reichenbachstr. 51Dipl.-Chem. Dr. rer. nat. I. Ruch, patent attorney,
ίο Munich 5, Reichenbachstr. 51
Als Erfinder benannt:
Victor Emanuel Medina, New York,
N. Y. (V. St. A.)Named as inventor:
Victor Emanuel Medina, New York,
NY (V. St. A.)
Beanspruchte Priorität:Claimed priority:
V. St. v. Amerika vom 6. April 1961 (101115)V. St. v. America April 6, 1961 (101115)
des Metalls oder der Metalle je Liter Lösung enthalten. Es können aber auch Lösungen mit bis zu 150 g und mehr Metall je Liter verwendet werden.of the metal or metals per liter of solution. However, solutions with up to 150 g and more metal per liter can be used.
Die Abscheidung wird bei Temperaturen in dem Bereich von 35 bis 900C und vorzugsweise etwa 50 bis 6O0C durchgeführt. Die Zusammensetzung der Abscheidungen hängt von der angewandten Stromdichte und Spannung ab.The deposition is preferably about 50 carried out at temperatures in the range from 35 to 90 0 C and 6O 0 C to. The composition of the deposits depends on the current density and voltage used.
Bei der Abscheidung eines Filmes aus einer Legierung von Palladium und Silber müssen geeignete Mengen an Silbernitrat und Palladiumnitrat miteinander vermischt werden, oder es kann eine fertige Legierung mit einer geeigneten Zusammensetzung in Salpetersäure gelöst und Ammoniak zugesetzt werden, so daß beide Materialien im richtigen Mengenverhältnis vorliegen. Es wurden nichtporöse Filme mit einer Dicke in dem Bereich von etwa 5 bis 100 μ abgeschieden. Wenn der Überzug weniger als 5 μ dick war, waren die Filme porös.When depositing a film made of an alloy of palladium and silver must be suitable Quantities of silver nitrate and palladium nitrate can be mixed together, or it can be a finished product Alloy with a suitable composition dissolved in nitric acid and ammonia added, so that both materials are present in the correct proportions. There were non-porous films with a Deposited thickness in the range of about 5 to 100 μ. If the coating was less than 5μ thick, the films were porous.
Für die Abscheidung gemäß der Erfindung können verschiedene Anoden verwendet werden. Als besonders geeignet haben sich Platinanoden erwiesen. Aber auch Anoden aus einer Silber-Palladium-Legierung oder rostfreiem Stahl können verwendet werden. Die Erfindung soll im folgenden an Hand von Beispielen näher erläutert werden. Teile beziehen sich, sofern nicht anders angegeben, auf das Gewicht.Various anodes can be used for the deposition according to the invention. As special Platinum anodes have proven suitable. But also anodes made from a silver-palladium alloy or stainless steel can be used. In the following, the invention is intended to be based on examples are explained in more detail. Unless otherwise stated, parts are based on weight.
so Beispiell so for example
Dieses Beispiel veranschaulicht die Herstellung eines nichtporösen Überzuges aus einer Palladium-This example illustrates the production of a non-porous coating from a palladium
609 607'335609 607,335
Claims (1)
daß die zu versilbernde Oberfläche horizontal und nach Eine poröse Matrix aus gesintertem Nickelpulver oben gerichtet war. Vorzugsweise wird die Folie in mit einer Porosität von 85 % und einer mittleren einer Haltevorrichtung ausgebreitet, so daß sie 0,3 bis Porengröße von 8 μ wurde wie folgt auf einer Ober-0,6 cm über dem Boden des Behälters steht, damit 20 fläche mit einem nichtporösen Film aus einer Pallawährend des Verfahrens gebildeter Schmutz sich am dium-Silber-Legierung überzogen: 10 g einer Palla-Boden. des Behälters und nicht auf der Oberfläche der diumnitratlösung mit einem Gehalt von 3 g Palladium-Folie sammelt. nitrat je 100 ecm Wasser und 10 g einer Silbernitrat-Adhesive tape attached to the bottom of the container, so B eis ρ ie 1 2
that the surface to be silvered was horizontal and directed towards a porous matrix of sintered nickel powder on top. The film is preferably spread out with a porosity of 85% and a medium holding device, so that it is 0.3 to pore size 8 μ as follows on an upper 0.6 cm above the bottom of the container, so that it is 20 surface area Soil formed during the process with a non-porous film of a Palla coated on the dium-silver alloy: 10 g of a Palla soil. of the container and not on the surface of the dium nitrate solution containing 3 g of palladium foil collects. nitrate per 100 ecm of water and 10 g of a silver nitrate
gründlich mit Wasser gewaschen.wipes to remove stains, and the film has turned 60,
washed thoroughly with water.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US101115A US3053741A (en) | 1961-04-06 | 1961-04-06 | Deposition of metals |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1221874B true DE1221874B (en) | 1966-07-28 |
Family
ID=22283103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEL41658A Pending DE1221874B (en) | 1961-04-06 | 1962-04-04 | Process for the galvanic deposition of palladium-silver alloy coatings |
Country Status (5)
Country | Link |
---|---|
US (1) | US3053741A (en) |
DE (1) | DE1221874B (en) |
FR (1) | FR1319205A (en) |
GB (1) | GB960338A (en) |
NL (1) | NL276877A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5549810A (en) * | 1994-07-21 | 1996-08-27 | W.C. Heraeus Gmbh | Bath for the electrodeposition of palladium-silver alloys |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3130072A (en) * | 1961-09-22 | 1964-04-21 | Sel Rex Corp | Silver-palladium immersion plating composition and process |
US3446393A (en) * | 1967-08-25 | 1969-05-27 | Uniroyal Inc | Storage container for pressurized fluids |
IT989422B (en) * | 1973-06-25 | 1975-05-20 | Oronzio De Nora Impianti | CATHODE FOR USE IN ELECTROLYTIC CELLS FORMED BY NEW CATHODE MATERIALS AND METHOD FOR ITS PREPARATION |
US4269671A (en) * | 1979-11-05 | 1981-05-26 | Bell Telephone Laboratories, Incorporated | Electroplating of silver-palladium alloys and resulting product |
US4478692A (en) * | 1982-12-22 | 1984-10-23 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4465563A (en) * | 1982-12-22 | 1984-08-14 | Learonal, Inc. | Electrodeposition of palladium-silver alloys |
US4628165A (en) * | 1985-09-11 | 1986-12-09 | Learonal, Inc. | Electrical contacts and methods of making contacts by electrodeposition |
CH675843A5 (en) * | 1987-11-07 | 1990-11-15 | Thomas Allmendinger |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE688398C (en) * | 1937-12-19 | 1940-02-20 | Siebert G M B H G | Process for the production of silver-containing, galvanic deposits |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE637648C (en) * | 1930-04-25 | 1936-11-03 | Heinrich Gockel Dr | Process for the production of galvanic coatings |
GB367587A (en) * | 1931-03-12 | 1932-02-25 | Alan Richard Powell | Improvements in or relating to the electro-deposition of palladium |
US2452308A (en) * | 1946-02-28 | 1948-10-26 | George C Lambros | Process of plating palladium and plating bath therefor |
-
0
- NL NL276877D patent/NL276877A/xx unknown
-
1961
- 1961-04-06 US US101115A patent/US3053741A/en not_active Expired - Lifetime
-
1962
- 1962-03-30 GB GB12429/62A patent/GB960338A/en not_active Expired
- 1962-04-04 DE DEL41658A patent/DE1221874B/en active Pending
- 1962-04-06 FR FR893570A patent/FR1319205A/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE688398C (en) * | 1937-12-19 | 1940-02-20 | Siebert G M B H G | Process for the production of silver-containing, galvanic deposits |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5549810A (en) * | 1994-07-21 | 1996-08-27 | W.C. Heraeus Gmbh | Bath for the electrodeposition of palladium-silver alloys |
Also Published As
Publication number | Publication date |
---|---|
GB960338A (en) | 1964-06-10 |
US3053741A (en) | 1962-09-11 |
FR1319205A (en) | 1963-02-22 |
NL276877A (en) |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69203287T2 (en) | Acid bath to apply a palladium intermediate layer. | |
DE1671422B2 (en) | ELECTRODE FOR USE IN ELECTROLYTIC PROCESSES AND METHODS FOR THEIR PRODUCTION | |
DE1571721B2 (en) | ELECTRODE FOR USE IN ELECTROLYTIC PROCESSES | |
DE1221874B (en) | Process for the galvanic deposition of palladium-silver alloy coatings | |
DE2929787C2 (en) | Method for producing a porous electrode surface on a metal substrate | |
DE2724074A1 (en) | METHOD OF TREATMENT OF THE SURFACE OF COPPER FOIL FOR PRINTED CIRCUITS | |
DE2845736C2 (en) | ||
DE1546708A1 (en) | Method of making an electrode | |
DE2647527C2 (en) | ||
DE1800049A1 (en) | Nickel or copper foil with an electrolytically applied nickel-containing adhesive layer, especially for thermoset supports for printed circuits | |
DE1256504B (en) | Process for the galvanic production of insoluble anodes for electrochemical processes | |
WO1989004556A1 (en) | Electrochemical process for manufacturing a pore-free membrane based on palladium and supported by a porous metallic element | |
EP0360863A1 (en) | Method and nickel-oxide electrode for applying a composite nickel-oxide coating to a metal carrier | |
WO2005008682A1 (en) | Electrically conducting element comprising an adhesive layer, and method for depositing an adhesive layer | |
DE3124522C2 (en) | Process for electroless coloring of porous materials | |
Gardam | Polarisation in the electrodeposition of metals | |
WO1992007975A1 (en) | Process for the galvanic production of a smooth, non-porous coating in the micrometre range of a palladium alloy of defined composition | |
DE2643424C3 (en) | Process for electroless nickel plating of non-conductive materials | |
DE1168735B (en) | Process for pretreating an object made of aluminum or an aluminum alloy for the application of a galvanic metal coating | |
US4450187A (en) | Immersion deposited cathodes | |
DE3045968A1 (en) | ELECTROLYTIC BATH, PRODUCTION OF PALLADIUM COATINGS USING THE ELECTROLYTIC BATH AND REGENERATION OF THE ELECTROLYTIC BATH | |
DE2112417C3 (en) | Aqueous bath for the chemical deposition of ductile copper coatings and its uses | |
DE1240358B (en) | Bath for the galvanic deposition of platinum coatings | |
DE19610361A1 (en) | Bath and process for the electrodeposition of semi-gloss nickel | |
AT247093B (en) | Method and bath for the production of adhesive precipitates from platinum with improved overvoltage properties |