DE112022004634T5

DE112022004634T5 - Organische Verbindung, Licht emittierende Vorrichtung, Dünnfilm, Licht emittierende Einrichtung, elektronisches Gerät und Beleuchtungsvorrichtung

Organische Verbindung, Licht emittierende Vorrichtung, Dünnfilm, Licht emittierende Einrichtung, elektronisches Gerät und Beleuchtungsvorrichtung Download PDF

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Publication number: DE112022004634T5
Authority: DE; Germany
Prior art keywords: light; layer; abbreviation; carbon atoms; substituted
Prior art date: 2021-09-30
Legal status : Pending

Application number

DE112022004634.1T

Other languages

German (de)

English (en)

Inventor

Yuki Hayashi

Sachiko Kawakami

Hiromitsu KIDO

Current Assignee

Semiconductor Energy Laboratory Co Ltd

Original Assignee

Semiconductor Energy Laboratory Co Ltd

Priority date

2021-09-30

Filing date

2022-09-21

Publication date

2024-08-01

2022-09-21 Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd

2024-08-01 Publication of DE112022004634T5 publication Critical patent/DE112022004634T5/de

Status Pending legal-status Critical Current

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150000002894 organic compounds Chemical class 0.000 title claims abstract description 177
239000010409 thin film Substances 0.000 title claims description 18
125000004432 carbon atom Chemical group C* 0.000 claims abstract description 162
125000001072 heteroaryl group Chemical group 0.000 claims abstract description 74
YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical group [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 claims abstract description 58
229910052805 deuterium Inorganic materials 0.000 claims abstract description 58
125000003118 aryl group Chemical group 0.000 claims abstract description 57
229910052739 hydrogen Inorganic materials 0.000 claims abstract description 57
239000001257 hydrogen Substances 0.000 claims abstract description 57
125000000217 alkyl group Chemical group 0.000 claims abstract description 34
150000002431 hydrogen Chemical class 0.000 claims abstract description 34
125000000732 arylene group Chemical group 0.000 claims abstract description 16
125000005549 heteroarylene group Chemical group 0.000 claims abstract description 16
239000000758 substrate Substances 0.000 claims description 89
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238000004891 communication Methods 0.000 claims description 17
239000010410 layer Substances 0.000 description 892
239000000463 material Substances 0.000 description 237
238000005401 electroluminescence Methods 0.000 description 143
239000010408 film Substances 0.000 description 125
238000002347 injection Methods 0.000 description 125
239000007924 injection Substances 0.000 description 125
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239000000126 substance Substances 0.000 description 92
238000000034 method Methods 0.000 description 91
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MILUBEOXRNEUHS-UHFFFAOYSA-N iridium(3+) Chemical compound [Ir+3] MILUBEOXRNEUHS-UHFFFAOYSA-N 0.000 description 40
238000003786 synthesis reaction Methods 0.000 description 40
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VVVPGLRKXQSQSZ-UHFFFAOYSA-N indolo[3,2-c]carbazole Chemical group C1=CC=CC2=NC3=C4C5=CC=CC=C5N=C4C=CC3=C21 VVVPGLRKXQSQSZ-UHFFFAOYSA-N 0.000 description 34
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239000002904 solvent Substances 0.000 description 11
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238000001514 detection method Methods 0.000 description 10
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229910052581 Si3N4 Inorganic materials 0.000 description 9
238000005229 chemical vapour deposition Methods 0.000 description 9
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230000008020 evaporation Effects 0.000 description 9
238000010438 heat treatment Methods 0.000 description 9
239000010453 quartz Substances 0.000 description 9
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 9
LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 9
229910052721 tungsten Inorganic materials 0.000 description 9
239000010937 tungsten Substances 0.000 description 9
238000005160 1H NMR spectroscopy Methods 0.000 description 8
XESMNQMWRSEIET-UHFFFAOYSA-N 2,9-dinaphthalen-2-yl-4,7-diphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC(C=2C=C3C=CC=CC3=CC=2)=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=C(C=3C=C4C=CC=CC4=CC=3)N=C21 XESMNQMWRSEIET-UHFFFAOYSA-N 0.000 description 8
UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical group C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 8
HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 8
150000004982 aromatic amines Chemical class 0.000 description 8
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150000002910 rare earth metals Chemical class 0.000 description 8
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OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
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DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 7
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238000005755 formation reaction Methods 0.000 description 7
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150000003852 triazoles Chemical class 0.000 description 7
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229910008449 SnF 2 Inorganic materials 0.000 description 6
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IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 6
239000000706 filtrate Substances 0.000 description 6
AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 6
150000002605 large molecules Chemical class 0.000 description 6
PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 6
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238000005481 NMR spectroscopy Methods 0.000 description 5
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229910052731 fluorine Inorganic materials 0.000 description 5
239000011737 fluorine Substances 0.000 description 5
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125000002883 imidazolyl group Chemical group 0.000 description 5
239000003446 ligand Substances 0.000 description 5
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GICWIDZXWJGTCI-UHFFFAOYSA-I molybdenum pentachloride Chemical compound Cl[Mo](Cl)(Cl)(Cl)Cl GICWIDZXWJGTCI-UHFFFAOYSA-I 0.000 description 5
WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 5
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JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 5
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IYZMXHQDXZKNCY-UHFFFAOYSA-N 1-n,1-n-diphenyl-4-n,4-n-bis[4-(n-phenylanilino)phenyl]benzene-1,4-diamine Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 IYZMXHQDXZKNCY-UHFFFAOYSA-N 0.000 description 4
FQJQNLKWTRGIEB-UHFFFAOYSA-N 2-(4-tert-butylphenyl)-5-[3-[5-(4-tert-butylphenyl)-1,3,4-oxadiazol-2-yl]phenyl]-1,3,4-oxadiazole Chemical compound C1=CC(C(C)(C)C)=CC=C1C1=NN=C(C=2C=C(C=CC=2)C=2OC(=NN=2)C=2C=CC(=CC=2)C(C)(C)C)O1 FQJQNLKWTRGIEB-UHFFFAOYSA-N 0.000 description 4
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CINYXYWQPZSTOT-UHFFFAOYSA-N 3-[3-[3,5-bis(3-pyridin-3-ylphenyl)phenyl]phenyl]pyridine Chemical compound C1=CN=CC(C=2C=C(C=CC=2)C=2C=C(C=C(C=2)C=2C=C(C=CC=2)C=2C=NC=CC=2)C=2C=C(C=CC=2)C=2C=NC=CC=2)=C1 CINYXYWQPZSTOT-UHFFFAOYSA-N 0.000 description 4
DHDHJYNTEFLIHY-UHFFFAOYSA-N 4,7-diphenyl-1,10-phenanthroline Chemical compound C1=CC=CC=C1C1=CC=NC2=C1C=CC1=C(C=3C=CC=CC=3)C=CN=C21 DHDHJYNTEFLIHY-UHFFFAOYSA-N 0.000 description 4
VDHOGVHFPFGPIP-UHFFFAOYSA-N 9-[3-[5-(3-carbazol-9-ylphenyl)pyridin-3-yl]phenyl]carbazole Chemical compound C12=CC=CC=C2C2=CC=CC=C2N1C1=CC(C=2C=NC=C(C=2)C=2C=CC=C(C=2)N2C3=CC=CC=C3C3=CC=CC=C32)=CC=C1 VDHOGVHFPFGPIP-UHFFFAOYSA-N 0.000 description 4
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238000003775 Density Functional Theory Methods 0.000 description 4
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229910052769 Ytterbium Inorganic materials 0.000 description 4
229910052783 alkali metal Inorganic materials 0.000 description 4
150000001340 alkali metals Chemical class 0.000 description 4
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150000001342 alkaline earth metals Chemical class 0.000 description 4
REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 4
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WZJYKHNJTSNBHV-UHFFFAOYSA-N benzo[h]quinoline Chemical group C1=CN=C2C3=CC=CC=C3C=CC2=C1 WZJYKHNJTSNBHV-UHFFFAOYSA-N 0.000 description 4
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238000004364 calculation method Methods 0.000 description 4
230000008859 change Effects 0.000 description 4
239000002800 charge carrier Substances 0.000 description 4
238000002484 cyclic voltammetry Methods 0.000 description 4
YMWUJEATGCHHMB-DICFDUPASA-N dichloromethane-d2 Chemical compound [2H]C([2H])(Cl)Cl YMWUJEATGCHHMB-DICFDUPASA-N 0.000 description 4
125000006575 electron-withdrawing group Chemical group 0.000 description 4
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230000005283 ground state Effects 0.000 description 4
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238000004949 mass spectrometry Methods 0.000 description 4
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238000007254 oxidation reaction Methods 0.000 description 4
230000033116 oxidation-reduction process Effects 0.000 description 4
PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 4
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238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 4
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238000001308 synthesis method Methods 0.000 description 4
239000008096 xylene Substances 0.000 description 4
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MYTPBXDNSPHTLI-UHFFFAOYSA-N 3-[9-[3-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl]carbazol-2-yl]-9-phenylcarbazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=C(C=CC=2)N2C3=CC(=CC=C3C3=CC=CC=C32)C=2C=C3C4=CC=CC=C4N(C=4C=CC=CC=4)C3=CC=2)=N1 MYTPBXDNSPHTLI-UHFFFAOYSA-N 0.000 description 3
QVSJCRDHNCCXFC-UHFFFAOYSA-N 3-[9-[4-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl]carbazol-3-yl]-9-phenylcarbazole Chemical compound C1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=NC(C=2C=CC(=CC=2)N2C3=CC=C(C=C3C3=CC=CC=C32)C=2C=C3C4=CC=CC=C4N(C=4C=CC=CC=4)C3=CC=2)=N1 QVSJCRDHNCCXFC-UHFFFAOYSA-N 0.000 description 3
RGTWCCOQVAMEIV-UHFFFAOYSA-N 5-[3-(4,6-diphenyl-1,3,5-triazin-2-yl)phenyl]-7,7-dimethylindeno[2,1-b]carbazole Chemical compound C1=C2C(C)(C)C3=CC=CC=C3C2=CC(C2=CC=CC=C22)=C1N2C(C=1)=CC=CC=1C(N=1)=NC(C=2C=CC=CC=2)=NC=1C1=CC=CC=C1 RGTWCCOQVAMEIV-UHFFFAOYSA-N 0.000 description 3
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OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
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YNPNZTXNASCQKK-UHFFFAOYSA-N Phenanthrene Natural products C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 3
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 3
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QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 3
XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 3
239000002585 base Substances 0.000 description 3
125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 3
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ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 3
125000006268 biphenyl-3-yl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C1=C([H])C(*)=C([H])C([H])=C1[H] 0.000 description 3
229910052796 boron Inorganic materials 0.000 description 3
229910000024 caesium carbonate Inorganic materials 0.000 description 3
229910052801 chlorine Inorganic materials 0.000 description 3
239000011651 chromium Substances 0.000 description 3
238000000576 coating method Methods 0.000 description 3
229940125904 compound 1 Drugs 0.000 description 3
229940126214 compound 3 Drugs 0.000 description 3
239000000412 dendrimer Substances 0.000 description 3
229920000736 dendritic polymer Polymers 0.000 description 3
150000004826 dibenzofurans Chemical class 0.000 description 3
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AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 3
DKHNGUNXLDCATP-UHFFFAOYSA-N dipyrazino[2,3-f:2',3'-h]quinoxaline-2,3,6,7,10,11-hexacarbonitrile Chemical group C12=NC(C#N)=C(C#N)N=C2C2=NC(C#N)=C(C#N)N=C2C2=C1N=C(C#N)C(C#N)=N2 DKHNGUNXLDCATP-UHFFFAOYSA-N 0.000 description 3
238000010894 electron beam technology Methods 0.000 description 3
OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 3
230000002349 favourable effect Effects 0.000 description 3
XEZPQQXHOCEWLB-UHFFFAOYSA-N furo[2,3-b]pyrazine Chemical compound C1=CN=C2OC=CC2=N1 XEZPQQXHOCEWLB-UHFFFAOYSA-N 0.000 description 3
229910001195 gallium oxide Inorganic materials 0.000 description 3
230000009477 glass transition Effects 0.000 description 3
239000010931 gold Substances 0.000 description 3
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 3
125000005843 halogen group Chemical group 0.000 description 3
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
229910052742 iron Inorganic materials 0.000 description 3
229910052943 magnesium sulfate Inorganic materials 0.000 description 3
235000019341 magnesium sulphate Nutrition 0.000 description 3
239000002086 nanomaterial Substances 0.000 description 3
QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 3
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239000011368 organic material Substances 0.000 description 3
230000003647 oxidation Effects 0.000 description 3
BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 3
230000035515 penetration Effects 0.000 description 3
IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
229920000642 polymer Polymers 0.000 description 3
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238000004549 pulsed laser deposition Methods 0.000 description 3
150000003222 pyridines Chemical class 0.000 description 3
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150000003252 quinoxalines Chemical class 0.000 description 3
230000002441 reversible effect Effects 0.000 description 3
238000007789 sealing Methods 0.000 description 3
230000035945 sensitivity Effects 0.000 description 3
238000010898 silica gel chromatography Methods 0.000 description 3
239000004332 silver Substances 0.000 description 3
VNFWTIYUKDMAOP-UHFFFAOYSA-N sphos Chemical group COC1=CC=CC(OC)=C1C1=CC=CC=C1P(C1CCCCC1)C1CCCCC1 VNFWTIYUKDMAOP-UHFFFAOYSA-N 0.000 description 3
238000005092 sublimation method Methods 0.000 description 3
229910052717 sulfur Inorganic materials 0.000 description 3
239000011593 sulfur Substances 0.000 description 3
229910001936 tantalum oxide Inorganic materials 0.000 description 3
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical class ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 3
YXFVVABEGXRONW-JGUCLWPXSA-N toluene-d8 Chemical compound [2H]C1=C([2H])C([2H])=C(C([2H])([2H])[2H])C([2H])=C1[2H] YXFVVABEGXRONW-JGUCLWPXSA-N 0.000 description 3
229910052723 transition metal Inorganic materials 0.000 description 3
TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 3
229910001930 tungsten oxide Inorganic materials 0.000 description 3
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238000005406 washing Methods 0.000 description 3
238000001039 wet etching Methods 0.000 description 3
229910052725 zinc Inorganic materials 0.000 description 3
HTPBWAPZAJWXKY-UHFFFAOYSA-L zinc;quinolin-8-olate Chemical compound [Zn+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 HTPBWAPZAJWXKY-UHFFFAOYSA-L 0.000 description 3
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UKSZBOKPHAQOMP-SVLSSHOZSA-N (1e,4e)-1,5-diphenylpenta-1,4-dien-3-one;palladium Chemical compound [Pd].C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1.C=1C=CC=CC=1\C=C\C(=O)\C=C\C1=CC=CC=C1 UKSZBOKPHAQOMP-SVLSSHOZSA-N 0.000 description 2
HDMYKJVSQIHZLM-UHFFFAOYSA-N 1-[3,5-di(pyren-1-yl)phenyl]pyrene Chemical compound C1=CC(C=2C=C(C=C(C=2)C=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)C=2C3=CC=C4C=CC=C5C=CC(C3=C54)=CC=2)=C2C=CC3=CC=CC4=CC=C1C2=C43 HDMYKJVSQIHZLM-UHFFFAOYSA-N 0.000 description 2
XOYZGLGJSAZOAG-UHFFFAOYSA-N 1-n,1-n,4-n-triphenyl-4-n-[4-[4-(n-[4-(n-phenylanilino)phenyl]anilino)phenyl]phenyl]benzene-1,4-diamine Chemical group C1=CC=CC=C1N(C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 XOYZGLGJSAZOAG-UHFFFAOYSA-N 0.000 description 2
NYPMWIHVZGWERR-UHFFFAOYSA-N 10-(3-dibenzothiophen-4-ylphenyl)phenanthro[9,10-b]pyrazine Chemical compound C1=C2C3=CC=CC=C3C3=NC=CN=C3C2=CC=C1C1=CC(C2=C3SC=4C(C3=CC=C2)=CC=CC=4)=CC=C1 NYPMWIHVZGWERR-UHFFFAOYSA-N 0.000 description 2
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STTGYIUESPWXOW-UHFFFAOYSA-N 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline Chemical compound C=12C=CC3=C(C=4C=CC=CC=4)C=C(C)N=C3C2=NC(C)=CC=1C1=CC=CC=C1 STTGYIUESPWXOW-UHFFFAOYSA-N 0.000 description 2
UOCMXZLNHQBBOS-UHFFFAOYSA-N 2-(1,3-benzoxazol-2-yl)phenol zinc Chemical compound [Zn].Oc1ccccc1-c1nc2ccccc2o1.Oc1ccccc1-c1nc2ccccc2o1 UOCMXZLNHQBBOS-UHFFFAOYSA-N 0.000 description 2
GJLCPQHEVZERAU-UHFFFAOYSA-N 2-(3-dibenzothiophen-4-ylphenyl)-1-phenylbenzimidazole Chemical compound C1=CC=CC=C1N1C2=CC=CC=C2N=C1C1=CC=CC(C=2C=3SC4=CC=CC=C4C=3C=CC=2)=C1 GJLCPQHEVZERAU-UHFFFAOYSA-N 0.000 description 2
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WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
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