DE112013001058A5 - Verfahren zur Herstellung von hochreinem SiO2 - Google Patents

Verfahren zur Herstellung von hochreinem SiO2 Download PDF

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Publication number
DE112013001058A5
DE112013001058A5 DE112013001058.5T DE112013001058T DE112013001058A5 DE 112013001058 A5 DE112013001058 A5 DE 112013001058A5 DE 112013001058 T DE112013001058 T DE 112013001058T DE 112013001058 A5 DE112013001058 A5 DE 112013001058A5
Authority
DE
Germany
Prior art keywords
producing high
purity sio
sio
purity
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE112013001058.5T
Other languages
English (en)
Inventor
Jürgen Erwin Lang
Hartwig Rauleder
Bodo Frings
Christian Panz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Evonik Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa GmbH filed Critical Evonik Degussa GmbH
Publication of DE112013001058A5 publication Critical patent/DE112013001058A5/de
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/187Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
    • C01B33/193Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • C01B33/142Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
    • C01B33/143Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/51Particles with a specific particle size distribution
    • C01P2004/53Particles with a specific particle size distribution bimodal size distribution
DE112013001058.5T 2012-02-21 2013-02-08 Verfahren zur Herstellung von hochreinem SiO2 Withdrawn DE112013001058A5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE201210202587 DE102012202587A1 (de) 2012-02-21 2012-02-21 Verfahren zur Herstellung von hochreinem SiO2
DE102012202587.1 2012-02-21
PCT/EP2013/052488 WO2013124166A1 (de) 2012-02-21 2013-02-08 Verfahren zur herstellung von hochreinem sio2

Publications (1)

Publication Number Publication Date
DE112013001058A5 true DE112013001058A5 (de) 2014-12-11

Family

ID=47710140

Family Applications (2)

Application Number Title Priority Date Filing Date
DE201210202587 Withdrawn DE102012202587A1 (de) 2012-02-21 2012-02-21 Verfahren zur Herstellung von hochreinem SiO2
DE112013001058.5T Withdrawn DE112013001058A5 (de) 2012-02-21 2013-02-08 Verfahren zur Herstellung von hochreinem SiO2

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE201210202587 Withdrawn DE102012202587A1 (de) 2012-02-21 2012-02-21 Verfahren zur Herstellung von hochreinem SiO2

Country Status (3)

Country Link
DE (2) DE102012202587A1 (de)
TW (1) TW201343552A (de)
WO (1) WO2013124166A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111892059B (zh) * 2020-08-19 2023-04-25 昆明理工大学 一种高纯石英砂的制备方法
CN114735712A (zh) * 2022-04-25 2022-07-12 吉林省临江天元催化剂有限公司 一种硅藻土的提纯方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1282008B (de) * 1964-12-16 1968-11-07 Degussa Verfahren zur Reinigung von gefaellten Kieselsaeuren und/oder Silicaten
DE2855251A1 (de) * 1978-12-21 1980-07-03 Mittex Ag Verfahren und vorrichtung zum herstellen von silikagel
US5100581A (en) 1990-02-22 1992-03-31 Nissan Chemical Industries Ltd. Method of preparing high-purity aqueous silica sol
AU2007226533B2 (en) 2006-03-15 2012-12-13 Reaction Sciences, Inc. Method for making silicon for solar cells and other applications
US20110262336A1 (en) 2008-09-30 2011-10-27 Hartwig Rauleder Production of solar-grade silicon from silicon dioxide
KR20110076904A (ko) * 2008-09-30 2011-07-06 에보니크 데구사 게엠베하 규산염 용액으로부터 고순도 sio2의 제조 방법
EP2481245A1 (de) 2009-09-24 2012-08-01 Nokia Siemens Networks OY Verfahren für dynamische steuerung einer uplink-übertragungsleistung eines benutzergeräts
US8609068B2 (en) * 2010-02-24 2013-12-17 J.M. Huber Corporation Continuous silica production process and silica product prepared from same

Also Published As

Publication number Publication date
TW201343552A (zh) 2013-11-01
WO2013124166A1 (de) 2013-08-29
DE102012202587A1 (de) 2013-08-22

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Legal Events

Date Code Title Description
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee