DE112009001341A5 - Apparatus for the plasma treatment of workpieces - Google Patents

Apparatus for the plasma treatment of workpieces Download PDF

Info

Publication number
DE112009001341A5
DE112009001341A5 DE112009001341T DE112009001341T DE112009001341A5 DE 112009001341 A5 DE112009001341 A5 DE 112009001341A5 DE 112009001341 T DE112009001341 T DE 112009001341T DE 112009001341 T DE112009001341 T DE 112009001341T DE 112009001341 A5 DE112009001341 A5 DE 112009001341A5
Authority
DE
Germany
Prior art keywords
workpieces
plasma treatment
plasma
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE112009001341T
Other languages
German (de)
Inventor
Sönke SIEBELS
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KHS GmbH
Original Assignee
KHS Corpoplast GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KHS Corpoplast GmbH filed Critical KHS Corpoplast GmbH
Publication of DE112009001341A5 publication Critical patent/DE112009001341A5/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE112009001341T 2008-03-31 2009-03-13 Apparatus for the plasma treatment of workpieces Withdrawn DE112009001341A5 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008016923A DE102008016923A1 (en) 2008-03-31 2008-03-31 Apparatus for the plasma treatment of workpieces
DE102008016923.4 2008-03-31
PCT/DE2009/000370 WO2009121324A1 (en) 2008-03-31 2009-03-13 Device for the plasma treatment of workpieces

Publications (1)

Publication Number Publication Date
DE112009001341A5 true DE112009001341A5 (en) 2011-03-24

Family

ID=40910042

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102008016923A Pending DE102008016923A1 (en) 2008-03-31 2008-03-31 Apparatus for the plasma treatment of workpieces
DE112009001341T Withdrawn DE112009001341A5 (en) 2008-03-31 2009-03-13 Apparatus for the plasma treatment of workpieces

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102008016923A Pending DE102008016923A1 (en) 2008-03-31 2008-03-31 Apparatus for the plasma treatment of workpieces

Country Status (2)

Country Link
DE (2) DE102008016923A1 (en)
WO (1) WO2009121324A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010012501A1 (en) 2010-03-12 2011-09-15 Khs Corpoplast Gmbh Method and device for plasma treatment of workpieces
DE102010023119A1 (en) * 2010-06-07 2011-12-22 Khs Corpoplast Gmbh Apparatus for the plasma treatment of workpieces
DE102015121773B4 (en) 2015-12-14 2019-10-24 Khs Gmbh Method and apparatus for plasma treatment of containers
DE102022119836A1 (en) 2022-08-08 2024-02-08 Khs Gmbh Positioning and sealing device for holding and sealing a workpiece in a plasma chamber of a plasma coating device

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3403317A1 (en) * 1984-01-31 1985-08-01 Siemens AG, 1000 Berlin und 8000 München Device for holding the quartz overtubes, which support the boats fitted with substrates, on horizontal lead-in devices in low-pressure phase-coating apparatuses
ZA951048B (en) 1994-02-16 1995-10-12 Coca Cola Co Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization
EP1010773A4 (en) 1997-02-19 2004-08-25 Kirin Brewery Method and apparatus for producing plastic container having carbon film coating
DE19722205A1 (en) * 1997-05-27 1998-12-03 Leybold Systems Gmbh Method and device for coating plastic or glass containers by means of a PCVD coating method
WO1999017334A1 (en) 1997-09-30 1999-04-08 Tetra Laval Holdings & Finance S.A. Method and apparatus for treating the inside surface of plastic bottles in a plasma enhanced process
FR2791598B1 (en) 1999-03-30 2001-06-22 Sidel Sa CAROUSEL MACHINE FOR THE TREATMENT OF HOLLOW BODIES COMPRISING AN IMPROVED PRESSURE DISTRIBUTION CIRCUIT AND DISPENSER FOR SUCH A MACHINE
FR2799994B1 (en) 1999-10-25 2002-06-07 Sidel Sa DEVICE FOR TREATING A CONTAINER USING A LOW PRESSURE PLASMA COMPRISING AN IMPROVED VACUUM CIRCUIT
DE19957744A1 (en) * 1999-12-01 2001-06-07 Tetra Laval Holdings & Finance Device for sealing the front edge of a container neck
DE10221461B4 (en) * 2002-05-15 2004-05-06 Schott Glas Device and use of a device for receiving and vacuum sealing a container with an opening
DE10224547B4 (en) * 2002-05-24 2020-06-25 Khs Corpoplast Gmbh Method and device for the plasma treatment of workpieces
EP1507887B1 (en) * 2002-05-24 2008-07-09 Schott Ag Multistation coating device and method for plasma coating
DE10300734A1 (en) * 2003-01-11 2004-07-22 Sig Technology Ltd. Plasma treatment of workpieces involves positioning plasma chamber along closed path with carrying device that can be driven with rotary motion about essentially horizontal axis of rotation
EP1610041B1 (en) * 2003-03-31 2010-03-17 Nichias Corporation Ring-shaped metal gasket
DE102004020185B4 (en) 2004-04-22 2013-01-17 Schott Ag Method and device for the inner coating of hollow bodies and use of the device

Also Published As

Publication number Publication date
DE102008016923A1 (en) 2009-10-01
WO2009121324A1 (en) 2009-10-08

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Legal Events

Date Code Title Description
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20131001