DE10335523A1 - Vorrichtung zur Plasmaerregung mit Mikrowellen - Google Patents

Vorrichtung zur Plasmaerregung mit Mikrowellen Download PDF

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Publication number
DE10335523A1
DE10335523A1 DE2003135523 DE10335523A DE10335523A1 DE 10335523 A1 DE10335523 A1 DE 10335523A1 DE 2003135523 DE2003135523 DE 2003135523 DE 10335523 A DE10335523 A DE 10335523A DE 10335523 A1 DE10335523 A1 DE 10335523A1
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DE
Germany
Prior art keywords
impacting
electrodes
microwave energy
area
adjacent conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE2003135523
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English (en)
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DE10335523B4 (de
Inventor
Berthold Koch
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Individual
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Individual
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Priority to DE10335523A priority Critical patent/DE10335523B4/de
Publication of DE10335523A1 publication Critical patent/DE10335523A1/de
Application granted granted Critical
Publication of DE10335523B4 publication Critical patent/DE10335523B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
    • F02P—IGNITION, OTHER THAN COMPRESSION IGNITION, FOR INTERNAL-COMBUSTION ENGINES; TESTING OF IGNITION TIMING IN COMPRESSION-IGNITION ENGINES
    • F02P23/00—Other ignition
    • F02P23/04—Other physical ignition means, e.g. using laser rays
    • F02P23/045—Other physical ignition means, e.g. using laser rays using electromagnetic microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Abstract

Die Erfindung betrifft eine Vorrichtung zur Mikrowellenenergiebeaufschlagung mit einem Beaufschlagungsbereich, in dem die Mikrowellenenergiebeaufschlagung erfolgt, und einer Zuführung zur Mikrowellenenergiezuführung an den Beaufschlagungsbereich. Hierbei ist vorgesehen, dass die Zuführung eine Vielzahl von Stegelektroden und zumindest einen benachbarten, davon verschiedenen Leiter zur Zusammenwirkung damit umfasst, wobei der Beaufschlagungsbereich zwischen den Stegelektroden vorgesehen ist und diese dazu angeordnet sind, am Beaufschlagungsbereich eine Beaufschlagung mit erforderlicher Intensität durch eine dazwischen vorliegende Mikrowellenphasenverschiebung vorzunehmen.
DE10335523A 2003-07-31 2003-07-31 Vorrichtung zur Plasmaerregung mit Mikrowellen Expired - Fee Related DE10335523B4 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10335523A DE10335523B4 (de) 2003-07-31 2003-07-31 Vorrichtung zur Plasmaerregung mit Mikrowellen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10335523A DE10335523B4 (de) 2003-07-31 2003-07-31 Vorrichtung zur Plasmaerregung mit Mikrowellen

Publications (2)

Publication Number Publication Date
DE10335523A1 true DE10335523A1 (de) 2005-05-04
DE10335523B4 DE10335523B4 (de) 2009-04-30

Family

ID=34398639

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10335523A Expired - Fee Related DE10335523B4 (de) 2003-07-31 2003-07-31 Vorrichtung zur Plasmaerregung mit Mikrowellen

Country Status (1)

Country Link
DE (1) DE10335523B4 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005056726A1 (de) * 2005-11-29 2007-05-31 Daniel Dehne Verfahren zur oxidativen Behandlung von Gasinhaltsstoffen, das nach dem Prinzip der nichtthermischen, plasmachemischen Umsetzung arbeitet
DE102007020419A1 (de) * 2007-04-27 2008-11-06 Forschungsverbund Berlin E.V. Elektrode für Plasmaerzeuger
WO2012095081A1 (de) 2010-12-27 2012-07-19 Karlsruher Institut für Technologie Leuchtmittel und betriebsverfahren dafür

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100109500A (ko) 2009-03-31 2010-10-08 오스람 게젤샤프트 미트 베쉬랭크터 하프퉁 무전극 가스 방전 램프들의 동작을 위한 장 어플리케이터들에 대한 콤팩트한 지연 라인 구조들
DE102011008944A1 (de) 2011-01-19 2012-07-19 Karlsruher Institut für Technologie Leuchtmittel und Betriebsverfahren dafür
DE102012001000A1 (de) 2012-01-20 2013-07-25 Karlsruher Institut für Technologie Leuchtmittel und Betriebsverfahren dafür

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5070277A (en) * 1990-05-15 1991-12-03 Gte Laboratories Incorporated Electrodless hid lamp with microwave power coupler
DE4227631A1 (de) * 1991-08-20 1993-02-25 Bridgestone Corp Verfahren und vorrichtung zur oberflaechenbehandlung
DE19851628A1 (de) * 1998-11-10 2000-05-11 Bilgic Dipl Phys Attila M Streifenleitungsanordnung mit integrierten Gaszuführungen für mikrowelleninduzierte Plasmaquellen zur Anwendung in der analytischen Atomspektrometrie
DE19914941C1 (de) * 1999-04-01 2000-05-25 Daimler Chrysler Ag Verfahren und Vorrichtung zur mikrowellengestützten Gemischverbrennung im Brennraum einer Brennkraftmaschine
US6353290B1 (en) * 1996-03-06 2002-03-05 The United States Of America As Represented By The Secretary Of The Army Microwave field emitter array limiter
US20020079058A1 (en) * 1997-03-27 2002-06-27 Tomohiro Okumura Method and apparatus for plasma processing
EP0840354B1 (de) * 1996-11-01 2003-02-19 Matsushita Electric Industrial Co., Ltd. Energieversorgungsvorrichtung einer Hochfrequenzentladung und elektrodenlose Hochfrequenz-Entladungslampenvorrichtung
WO2003039214A1 (en) * 2001-10-26 2003-05-08 Michigan State University Improved microwave stripline applicators
US6570333B1 (en) * 2002-01-31 2003-05-27 Sandia Corporation Method for generating surface plasma
US20030111962A1 (en) * 2001-12-18 2003-06-19 Steven Shannon Plasma reactor with spoke antenna having a VHF mode with the spokes in phase

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5070277A (en) * 1990-05-15 1991-12-03 Gte Laboratories Incorporated Electrodless hid lamp with microwave power coupler
DE4227631A1 (de) * 1991-08-20 1993-02-25 Bridgestone Corp Verfahren und vorrichtung zur oberflaechenbehandlung
US6353290B1 (en) * 1996-03-06 2002-03-05 The United States Of America As Represented By The Secretary Of The Army Microwave field emitter array limiter
EP0840354B1 (de) * 1996-11-01 2003-02-19 Matsushita Electric Industrial Co., Ltd. Energieversorgungsvorrichtung einer Hochfrequenzentladung und elektrodenlose Hochfrequenz-Entladungslampenvorrichtung
US20020079058A1 (en) * 1997-03-27 2002-06-27 Tomohiro Okumura Method and apparatus for plasma processing
DE19851628A1 (de) * 1998-11-10 2000-05-11 Bilgic Dipl Phys Attila M Streifenleitungsanordnung mit integrierten Gaszuführungen für mikrowelleninduzierte Plasmaquellen zur Anwendung in der analytischen Atomspektrometrie
DE19914941C1 (de) * 1999-04-01 2000-05-25 Daimler Chrysler Ag Verfahren und Vorrichtung zur mikrowellengestützten Gemischverbrennung im Brennraum einer Brennkraftmaschine
WO2003039214A1 (en) * 2001-10-26 2003-05-08 Michigan State University Improved microwave stripline applicators
US20030111962A1 (en) * 2001-12-18 2003-06-19 Steven Shannon Plasma reactor with spoke antenna having a VHF mode with the spokes in phase
US6570333B1 (en) * 2002-01-31 2003-05-27 Sandia Corporation Method for generating surface plasma

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005056726A1 (de) * 2005-11-29 2007-05-31 Daniel Dehne Verfahren zur oxidativen Behandlung von Gasinhaltsstoffen, das nach dem Prinzip der nichtthermischen, plasmachemischen Umsetzung arbeitet
DE102005056726B4 (de) * 2005-11-29 2011-09-15 Daniel Dehne Kondensatorenvorrichtung und Verfahren zur Erzeugung von Radikalen und Oxidantien
DE102007020419A1 (de) * 2007-04-27 2008-11-06 Forschungsverbund Berlin E.V. Elektrode für Plasmaerzeuger
US8339047B2 (en) 2007-04-27 2012-12-25 Forschungsverbund Berlin E.V. Electrode for a plasma generator
WO2012095081A1 (de) 2010-12-27 2012-07-19 Karlsruher Institut für Technologie Leuchtmittel und betriebsverfahren dafür

Also Published As

Publication number Publication date
DE10335523B4 (de) 2009-04-30

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8364 No opposition during term of opposition
R084 Declaration of willingness to license
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20140201