DE10301818A1 - Linear drive for optical equipment used in semiconductor manufacture, includes piezoelectric actuator sections operating longitudinally and in shear with anisotropic connection - Google Patents
Linear drive for optical equipment used in semiconductor manufacture, includes piezoelectric actuator sections operating longitudinally and in shear with anisotropic connection Download PDFInfo
- Publication number
- DE10301818A1 DE10301818A1 DE2003101818 DE10301818A DE10301818A1 DE 10301818 A1 DE10301818 A1 DE 10301818A1 DE 2003101818 DE2003101818 DE 2003101818 DE 10301818 A DE10301818 A DE 10301818A DE 10301818 A1 DE10301818 A1 DE 10301818A1
- Authority
- DE
- Germany
- Prior art keywords
- stack
- linear drive
- actuator
- connecting element
- shear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title description 8
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000004065 semiconductor Substances 0.000 title description 2
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000000969 carrier Substances 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 10
- 230000003071 parasitic effect Effects 0.000 description 4
- 238000001393 microlithography Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/0005—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing non-specific motion; Details common to machines covered by H02N2/02 - H02N2/16
- H02N2/001—Driving devices, e.g. vibrators
- H02N2/0045—Driving devices, e.g. vibrators using longitudinal or radial modes combined with torsion or shear modes
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
- H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
- H02N2/021—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Abstract
Description
Die Erfindung betrifft einen Piezo-Linearantrieb mit einer Gruppe von Piezostapelaktuatoren, welche einen in einer Führung befindlichen Läufer antreiben.The invention relates to a piezo linear drive with a group of piezo stack actuators, one in one guide drive the existing runner.
Aus der nicht vorveröffentlichten deutschen Anmeldung mit dem Titel "Piezo-Linearantrieb mit einer Gruppe von Piezostapelaktuatoren sowie Verfahren zum Betreiben eines solchen Antriebs" und dem Aktenzeichen 101 28 497.7 sind derartige Piezo-Linearantriebe bekannt. Dabei ist innerhalb eines solchen Stapels, von einem für mehrere der Stapel gemeinsamen Substrat als Trägermaterial ausgehend, ein erstes Stapelteil als Longitudinal- und eine zweites Stapelteil als Scheraktor ausgebildet.From the unpublished German application entitled "Piezo linear actuator with a group of piezo stack actuators and method for operating one Drive "and the file number 101 28 497.7 such piezo linear drives are known. there is within such a stack, one common to several of the stacks Substrate as a carrier material proceeding, a first stack part as a longitudinal and a second Stack part designed as a shear actuator.
In einer idealen Ausgestaltung dieses Piezo-Linearantriebes sind nun jeweils mehrere der Stapel auf einem der Trägerelemente angeordnet sind, z.B. jeweils vier der Stapel auf einem gemeinsamen Trägerelement auf jeder Seite eines anzutreibenden geführten Läufers. Für die Funktionsweise der Piezo-Linearantriebe ist dabei ein Abstand zwischen den benachbarten Stapeln auf jedem der Trägerelemente erforderlichen. Bei sehr hohen mechanischen Anforderungen können durch die vergleichsweise große longitudinale Ausdehnung der Stapel parasitäre Bewegungen in Richtung der gewünschten Antriebsrichtung durch eine Verformung der Stapel auftreten. Für spezielle Anwendungsfälle mit sehr hohen Anforderungen an die Aktuatoren können diese parasitären Bewegungen störend sein.In an ideal embodiment of this Piezo linear drives are now several of the stacks on one of the support elements are arranged, e.g. four each of the stacks on a common carrier element on each side of a guided runner to be driven. For the functionality of the piezo linear drives is a distance between the adjacent stacks on each of the support elements . required With very high mechanical requirements, the comparatively large longitudinal extension of the stack parasitic movements in the direction of the desired Drive direction occur due to a deformation of the stack. For special use cases With very high demands on the actuators, these parasitic movements can disturbing his.
Aus der deutschen Patentanmeldung 102 25 266.1, welche ebenfalls nicht vorveröffentlicht ist, gehen entsprechende Anwendungsfälle für derartige Aktuatortypen hervor. Diese speziellen Anwendungsfälle, welche entsprechend hohe Anforderungen an die Aktuatoren stellen, sind dabei im Bereich der Manipulation von optischen Elementen in der Mikrolithographie zu suchen und unterstreichen die oben geäußerten Anwendungen mit hohen An- Die Aufgabe der Erfindung besteht nun darin, einen Piezo-Linearantrieb mit einer Gruppe von Piezostapelaktuatoren, welche nach dem oben genannten Funktionsprinzip einen in einer Führung befindlichen Läufer antreiben, dahingehend zu optimieren, dass das Auftreten von parasitären Bewegungen, insbesondere von parasitären Bewegungen in Antriebsrichtung, minimiert wird.From the German patent application 102 25 266.1, which is also not prepublished, go accordingly use cases for such actuator types out. These special use cases, which are correspondingly high The demands placed on the actuators are in the area of Manipulation of optical elements in microlithography too search and underline the above-mentioned applications with high The task of the invention is now a piezo linear actuator with a group of piezo stack actuators, which according to the above mentioned operating principle drive a runner located in a guide to that effect optimize that the occurrence of parasitic movements, in particular of parasitic Movements in the drive direction is minimized.
Die oben genannte Aufgabe wird durch einen Piezo-Linearantrieb gelöst, bei welchem zwischen dem ersten Stapelteil, welcher als Longitudinalaktor ausgebildet ist, und dem wenigstens einen zweiten Stapelteil, welcher als Scheraktor ausgebildet ist, wenigstens ein Verbindungselement angeordnet ist, welches jeweils zumindest einen Teil der Stapel untereinander verbindet, wobei die Verbindung in Aktorrichtung der Longitudinalaktoren weich und in Bewegungsrichtung des Läufers steif ausgebildet ist.The above task is accomplished by solved a piezo linear actuator, in which between the first stack part, which is designed as a longitudinal actuator and the at least one second stack part, which acts as a shear actuator is formed, at least one connecting element is arranged, which connects at least some of the stacks to each other, the connection in the actuator of the longitudinal actuators is soft and in the direction of movement of the rotor is rigid.
Durch das erfindungsgemäße Verbindungselement wird in vorteilhafter Weise erreicht, dass die Verformungen der einzelnen Stapel minimiert werden. Durch die steife Anbindung im Bereich zwischen dem Scheraktor und dem Longitudinalaktor, bei der Verwendung von zwei Stapelteilen also in etwa in der Mitte eines jeden Stapels, wird die Neigung der Stapel zur Verformung minimiert und somit die Steifigkeit des gesamten Piezo-Linearantriebs in der Bewegungsrichtung des Läufers verbessert.Through the connecting element according to the invention is achieved in an advantageous manner that the deformations of the individual stacks can be minimized. Due to the rigid connection in the Area between the shear actuator and the longitudinal actuator when in use of two parts of the stack, approximately in the middle of each stack, the tendency of the stack to deform is minimized and thus the Rigidity of the entire piezo linear drive in the direction of movement of the runner improved.
Weitere vorteilhafte Ausgestaltungen der Erfindung lassen sich den Unteransprüchen entnehmen und sind in den anhand der Zeichnung nachfolgend dargestellten Ausführungsbeispielen näher erläutert.Further advantageous configurations the invention can be found in the dependent claims and are in the embodiments shown below with reference to the drawing explained in more detail.
Es zeigt:It shows:
In
Die Projektionsbelichtungsanlage
Das grundsätzliche Funktionsprinzip sieht dabei
vor, dass die in das Reticle
Nach einer erfolgten Belichtung wird
der Wafer
Die Beleuchtungseinrichtung
Über
den Projektionsstrahl
Die oben bereits angesprochene Lagerung der
optischen Elemente, wie z.B. den Linsen
In
Jeder dieser Stapel
In der Darstellung gemäß
In
In
Selbstverständlich sind auch Aufbauten denkbar,
bei denen die Stapel
Eine weitere Ausgestaltung des Piezo-Linearantriebs
Das Verbindungselement
Claims (7)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003101818 DE10301818A1 (en) | 2003-01-20 | 2003-01-20 | Linear drive for optical equipment used in semiconductor manufacture, includes piezoelectric actuator sections operating longitudinally and in shear with anisotropic connection |
PCT/EP2004/000176 WO2004066405A1 (en) | 2003-01-20 | 2004-01-14 | Linear piezo drive unit comprising a group of stacked piezo actuators |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003101818 DE10301818A1 (en) | 2003-01-20 | 2003-01-20 | Linear drive for optical equipment used in semiconductor manufacture, includes piezoelectric actuator sections operating longitudinally and in shear with anisotropic connection |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10301818A1 true DE10301818A1 (en) | 2004-07-29 |
Family
ID=32602709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2003101818 Withdrawn DE10301818A1 (en) | 2003-01-20 | 2003-01-20 | Linear drive for optical equipment used in semiconductor manufacture, includes piezoelectric actuator sections operating longitudinally and in shear with anisotropic connection |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10301818A1 (en) |
WO (1) | WO2004066405A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008034285A1 (en) * | 2008-07-22 | 2010-02-04 | Carl Zeiss Smt Ag | Actuator for the high-precision positioning or manipulation of components and projection exposure apparatus for microlithography |
US8269948B2 (en) | 2006-08-25 | 2012-09-18 | Carl Zeiss Smt Gmbh | Projection exposure apparatus and optical system |
CN104753389A (en) * | 2015-02-05 | 2015-07-01 | 西安交通大学 | Large stroke linear stepping actuator containing asymmetric portal structures and method |
CN104883090A (en) * | 2015-06-02 | 2015-09-02 | 北京大学 | Piezoelectric linear motor fused with shear piezoelectric actuator composite drive mode |
DE102023200329B3 (en) | 2023-01-17 | 2024-05-02 | Carl Zeiss Smt Gmbh | Optical assembly, method for assembling the optical assembly and projection exposure system |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102006048238B4 (en) * | 2005-11-23 | 2011-07-28 | Physik Instrumente (PI) GmbH & Co. KG, 76228 | Piezo linear drive |
GB2483428A (en) * | 2010-08-25 | 2012-03-14 | Univ Leiden | A piezoelectric drive assembly |
DE102012221891B3 (en) * | 2012-11-29 | 2014-02-13 | Picofine GmbH | Non-resonant driving method for e.g. linear positioning of object using piezoelectric actuator, involves accelerating or canceling friction force at contact unit by varying distance between friction surface and mass of contact unit |
WO2014140143A2 (en) | 2013-03-15 | 2014-09-18 | Carl Zeiss Smt Gmbh | Piezo drive unit |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63316676A (en) * | 1987-06-19 | 1988-12-23 | Mitsubishi Electric Corp | Piezoelectric linear motor |
US6420819B1 (en) * | 1994-01-27 | 2002-07-16 | Active Control Experts, Inc. | Packaged strain actuator |
DE19605214A1 (en) * | 1995-02-23 | 1996-08-29 | Bosch Gmbh Robert | Ultrasonic drive element |
FR2806225B1 (en) * | 2000-03-10 | 2006-12-29 | Sagem | VIBRATION MOTORS |
DE10148267B4 (en) * | 2001-06-08 | 2005-11-24 | Physik Instrumente (Pi) Gmbh & Co. Kg | Piezo-linear drive with a group of piezo stack actuators and method for operating such a drive |
-
2003
- 2003-01-20 DE DE2003101818 patent/DE10301818A1/en not_active Withdrawn
-
2004
- 2004-01-14 WO PCT/EP2004/000176 patent/WO2004066405A1/en active Application Filing
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8269948B2 (en) | 2006-08-25 | 2012-09-18 | Carl Zeiss Smt Gmbh | Projection exposure apparatus and optical system |
US9110388B2 (en) | 2006-08-25 | 2015-08-18 | Carl Zeiss Smt Gmbh | Projection exposure apparatus with multiple sets of piezoelectric elements moveable in different directions and related method |
DE102008034285A1 (en) * | 2008-07-22 | 2010-02-04 | Carl Zeiss Smt Ag | Actuator for the high-precision positioning or manipulation of components and projection exposure apparatus for microlithography |
US9766550B2 (en) | 2008-07-22 | 2017-09-19 | Carl Zeiss Smt Gmbh | Actuators and microlithography projection exposure systems and methods using the same |
CN104753389A (en) * | 2015-02-05 | 2015-07-01 | 西安交通大学 | Large stroke linear stepping actuator containing asymmetric portal structures and method |
CN104753389B (en) * | 2015-02-05 | 2017-01-18 | 西安交通大学 | Large stroke linear stepping actuator containing asymmetric portal structures and method |
CN104883090A (en) * | 2015-06-02 | 2015-09-02 | 北京大学 | Piezoelectric linear motor fused with shear piezoelectric actuator composite drive mode |
CN104883090B (en) * | 2015-06-02 | 2017-03-22 | 北京大学 | Piezoelectric linear motor fused with shear piezoelectric actuator composite drive mode |
DE102023200329B3 (en) | 2023-01-17 | 2024-05-02 | Carl Zeiss Smt Gmbh | Optical assembly, method for assembling the optical assembly and projection exposure system |
Also Published As
Publication number | Publication date |
---|---|
WO2004066405A1 (en) | 2004-08-05 |
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8141 | Disposal/no request for examination |