DE10233343A1 - Release gas used in continuous hot-dip coating - Google Patents
Release gas used in continuous hot-dip coating Download PDFInfo
- Publication number
- DE10233343A1 DE10233343A1 DE10233343A DE10233343A DE10233343A1 DE 10233343 A1 DE10233343 A1 DE 10233343A1 DE 10233343 A DE10233343 A DE 10233343A DE 10233343 A DE10233343 A DE 10233343A DE 10233343 A1 DE10233343 A1 DE 10233343A1
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- Germany
- Prior art keywords
- gas
- zinc
- nitrogen
- argon
- sulfur
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 238000003618 dip coating Methods 0.000 title claims abstract description 8
- 239000007789 gas Substances 0.000 claims abstract description 43
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 19
- 239000002184 metal Substances 0.000 claims abstract description 19
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 13
- 239000011701 zinc Substances 0.000 claims abstract description 13
- 229910052786 argon Inorganic materials 0.000 claims abstract description 10
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims abstract description 6
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 claims abstract description 6
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims abstract description 6
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000831 Steel Inorganic materials 0.000 claims abstract description 5
- 229910001297 Zn alloy Inorganic materials 0.000 claims abstract description 5
- 239000010959 steel Substances 0.000 claims abstract description 5
- 230000008020 evaporation Effects 0.000 claims abstract description 4
- 238000001704 evaporation Methods 0.000 claims abstract description 4
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 claims abstract description 3
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 claims abstract description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910015900 BF3 Inorganic materials 0.000 claims abstract description 3
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 claims abstract description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 claims abstract description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910018503 SF6 Inorganic materials 0.000 claims abstract description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001273 butane Substances 0.000 claims abstract description 3
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 claims abstract description 3
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims abstract description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 3
- WMIYKQLTONQJES-UHFFFAOYSA-N hexafluoroethane Chemical compound FC(F)(F)C(F)(F)F WMIYKQLTONQJES-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 claims abstract description 3
- 239000001282 iso-butane Substances 0.000 claims abstract description 3
- 229910052743 krypton Inorganic materials 0.000 claims abstract description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims abstract description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims abstract description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims abstract description 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000001294 propane Substances 0.000 claims abstract description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims abstract description 3
- 229910000077 silane Inorganic materials 0.000 claims abstract description 3
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims abstract description 3
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229960000909 sulfur hexafluoride Drugs 0.000 claims abstract description 3
- QHMQWEPBXSHHLH-UHFFFAOYSA-N sulfur tetrafluoride Chemical compound FS(F)(F)F QHMQWEPBXSHHLH-UHFFFAOYSA-N 0.000 claims abstract description 3
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims abstract description 3
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 claims abstract description 3
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 claims abstract description 3
- 229910052724 xenon Inorganic materials 0.000 claims abstract description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000000926 separation method Methods 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 claims description 4
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 2
- -1 phoshpin Natural products 0.000 claims description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 abstract 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000000859 sublimation Methods 0.000 description 6
- 230000008022 sublimation Effects 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 206010040007 Sense of oppression Diseases 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0034—Details related to elements immersed in bath
- C23C2/00342—Moving elements, e.g. pumps or mixers
- C23C2/00344—Means for moving substrates, e.g. immersed rollers or immersed bearings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
- C23C2/003—Apparatus
- C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating With Molten Metal (AREA)
Abstract
Die Erfindung betrifft ein Verfahren zur Unterdrückung der Zinkverdampfung beim Schmelztauchbeschichten eines Stahlbandes mit Zink oder Zinklegierungen. Hierzu wird erfindungsgemäß vorgeschlagen, oberhalb des Metallbandes eine Trenngasschicht, bspw. aus Argon, Butan, Krypton, Propan, Schwefeldioxid, Schwefelwasserstoff, Xenon, Azetylen, Arsin, Bortrichlorid, Bortrifluorid, Buten, Dichlorsilan, Disilan, Ethylenoxid, Tetrafluormethan, Monochlordifluormethan, Trifluormethan, Hexafluorethan, Tetrafluorethen, Isobutan, Stickstoffdioxid, Stickstofftrifluorid, Stickstoffoxid, Phosphin, Propylen, Silan, Siliziumtetrafluorid, Siliziumtetrachlorid, Schwefelhexafluorid, Schwefeltetrafluorid, Wolframhexafluorid oder aus einer beliebigen Zusammensetzung der genannten Gase zu einem Gasgemisch mit oder ohne Argon vorzusehen, die eine schlechte Leitfähigkeit aufweisen und geeignet sind, Gasturbulenzen zu unterbinden.The invention relates to a method for suppressing zinc evaporation during hot dip coating of a steel strip with zinc or zinc alloys. For this purpose, it is proposed according to the invention to have a separating gas layer above the metal strip, for example made from argon, butane, krypton, propane, sulfur dioxide, hydrogen sulfide, xenon, acetylene, arsine, boron trichloride, boron trifluoride, butene, dichlorosilane, disilane, ethylene oxide, tetrafluoromethane, monochlorodifluoromethane, trichlorodifluoromethane, Hexafluoroethane, tetrafluoroethene, isobutane, nitrogen dioxide, nitrogen trifluoride, nitrogen oxide, phosphine, propylene, silane, silicon tetrafluoride, silicon tetrachloride, sulfur hexafluoride, sulfur tetrafluoride, tungsten hexafluoride or from any composition of the above gases to provide a gas mixture with and without argon, with or without argon are suitable to prevent gas turbulence.
Description
Die Erfindung betrifft ein Verfahren zur Unterdrückung der Zinkverdampfung beim Schmelztauchbeschichten eines Stahlbandes mit Zink oder Zinklegierungen.The invention relates to a method for oppression the zinc evaporation during hot dip coating of a steel strip with zinc or zinc alloys.
Bei der kontinuierlichen Schmelztauchveredelung und speziell der Feuerverzinkung von Metallbändern tritt der Effekt der Sublimation des Beschichtungsmetalls auf. Dies ist besonders kritisch, da die Sublimation auch im Ofenraum der vorgelagerten Bandglühung und Oberflächenaktivierung stattfindet. In diesem Aggregat liegt üblicherweise eine Wasserstoff-/Stickstoffatmosphäre vor. Das Sublimat dringt gegen den Bandlauf zurück und lagert sich an kälteren Stellen im Ofen ab. Dieser Effekt wird durch die Anwesenheit von Wasserstoff gefördert. Dieser Effekt ist bekannt und führt mit zunehmender Sublimatbildung zu Oberflächenfehler auf dem zu beschichtenden Metallband.For continuous hot dip coating and especially the hot-dip galvanizing of metal strips has the effect of Sublimation of the coating metal. This is particularly critical since the sublimation is also in the furnace area of the upstream strip annealing and surface activation takes place. A hydrogen / nitrogen atmosphere is usually present in this unit. The sublimate penetrates back against the belt run and settles in colder places in the oven. This effect is due to the presence of hydrogen promoted. This effect is known and leads with increasing sublimation to surface defects on the surface to be coated Metal band.
Aus dem Stand der Technik ist bekannt, dass durch eine Zugabe von Feuchte bzw. von Kohlenmonoxid/-dioxid der Sublimationseffekt nachhaltig gehemmt und sogar unterdrückt werden kann.It is known from the prior art that by adding moisture or carbon monoxide / dioxide the sublimation effect is permanently inhibited and even suppressed can.
Das Dokument
In dem Dokument
Die im Stand der Technik verwendeten Gase oder Gasgemische führen aber auch zu einer Oxidation der Metallbandoberfläche, die eine fehlerfreie Beschichtung erschwert. Auch diese Problematik, insbesondere bei der Feuchte, ist bei der Produktion von feuerverzinkten Metallbändern hinlänglich bekannt.The used in the prior art Lead gases or gas mixtures but also to an oxidation of the metal strip surface, the a faultless coating is difficult. This problem, in particular humidity, is well known in the production of hot-dip galvanized metal strips.
Der Erfindung liegt die Erkenntnis zugrunde, dass in die Menge der Sublimatbildung die Turbulenz des Gases über der Oberfläche des Metallbades und dessen Wärmeleitfähigkeit eingeht. Es gilt daher, ein Gas zu finden, dass sich über dem Metallbad ansammelt und damit eine Turbulenz unterbindet und eine schlechte Leitfähigkeit aufweist.The invention is based on the knowledge based on the fact that the turbulence of the Gases over the surface of the metal bath and its thermal conductivity received. It is therefore important to find a gas that is above the Metal bath accumulates and thus prevents turbulence and bad conductivity having.
Auf dem Hintergrund dieser Erkenntnis hat die vorliegende Erfindung sich zur Aufgabe gemacht, die Bildung von Sublimat zu unterdrücken und unabhängig von der zugeführten Menge an Sublimat vermeidendem Gas die fehlerfreie Beschichtung sicherzustellen.Against the background of this knowledge the present invention has set itself the task of education to suppress sublimate and independent from the fed Amount of sublimate avoiding gas the flawless coating sure.
Zur Lösung der genannten Aufgabe wird vorgeschlagen, dass sich oberhalb des Metallbades ein Gas oder ein Gasgemisch als Trenngas befindet, das eine schlechte Wärmeleitfähigkeit aufweist und die Eigenschaft beinhaltet, Turbulenzen des Gases bzw. Gasgemisches über der Oberfläche des Metallbades zu reduzieren bzw. zu unterbinden. Hierzu bietet sich neben den o. g. Gasen wie Kohlendioxid und Wasserdampf (Feuchte) ein Edelgas als Trenngas, bspw. Argon, an, das beide Eigenschaften aufweist. Der Vorteil von Argon liegt darin, dass es sowohl eine hohe Dichte (geringe Turbulenz) aufweist als auch eine schlechtere Wärmeleitfähigkeit als der sonst verwendete Stickstoff. Zudem wirkt es als Edelgas nicht oxidierend. Weiterhin sind folgende Gase als Trenngas denkbar: Butan, Krypton, Propan, Schwefeldioxid, Schwefelwasserstoff, Xenon und andere Gase wie Azetylen, Arsin, Bortrichlorid, Bortrifluorid, Buten, Dichlorsilan, Disilan, Ethylenoxid, Tetrafluormethan, Monochlordifluormethan, Trifluormethan, Hexafluorethan, Tetrafluorethen, Isobutan, Stickstoffdioxid, Stickstofftrifluorid, Stickstoffoxid, Phoshpin, Propylen, Silan, Siliziumtetrafluorid, Siliziumtetrachlorid, Schwefelhexafluorid, Schwefeltetrafluorid, Wolframhexafluorid. Es kann als Trenngas auch eine beliebige Zusammensetzung der zuvor genannten Gase zu einem Gasgemisch mit oder ohne Argon verwendet werden, sobald diese Gasmischung den Bedingungen der Erfindung genügt.To solve the above task it is proposed that a gas or a gas mixture is located as the separation gas, which has poor thermal conductivity has and includes the property, turbulence of the gas or gas mixture over the surface to reduce or prevent the metal bath. To do this offers next to the above Gases such as carbon dioxide and water vapor (moisture) an inert gas as separation gas, for example argon, which has both properties having. The advantage of argon is that it is both high Density (low turbulence) also has poorer thermal conductivity than the otherwise used nitrogen. In addition, it does not act as an inert gas oxidizing. The following gases are also conceivable as separation gas: butane, Krypton, propane, sulfur dioxide, hydrogen sulfide, xenon and other gases such as acetylene, arsine, boron trichloride, boron trifluoride, butene, Dichlorosilane, disilane, ethylene oxide, tetrafluoromethane, monochlorodifluoromethane, Trifluoromethane, hexafluoroethane, tetrafluoroethene, isobutane, nitrogen dioxide, Nitrogen trifluoride, nitrogen oxide, phoshpin, propylene, silane, Silicon tetrafluoride, silicon tetrachloride, sulfur hexafluoride, Sulfur tetrafluoride, tungsten hexafluoride. It can also act as a separation gas any combination of the aforementioned gases into one Gas mixture with or without argon can be used once this gas mixture the conditions of the invention are sufficient.
Die Erfindung wird in einer
Claims (4)
Priority Applications (16)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10233343A DE10233343A1 (en) | 2002-06-28 | 2002-07-23 | Release gas used in continuous hot-dip coating |
PL372068A PL206283B1 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
JP2004516548A JP2005539136A (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dipping. |
ES03714895T ES2297143T3 (en) | 2002-06-28 | 2003-03-28 | EXTENSION OF SEPARATION GAS DURING CONTINUOUS FINISHING BY IMMERSION IN FUSION. |
DE50308889T DE50308889D1 (en) | 2002-06-28 | 2003-03-28 | TRENNGASE INSERT IN CONTINUOUS MELT DIPPING |
US10/519,579 US20050233088A1 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
RU2005102086/02A RU2319786C2 (en) | 2002-06-28 | 2003-03-28 | Method of application of the separating gas at continuous deposition of the coating by dipping in the melt |
MXPA04012328A MXPA04012328A (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing. |
CNB038153661A CN100422378C (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
EP03714895A EP1518004B1 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
PCT/EP2003/003219 WO2004003250A1 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
AT03714895T ATE382104T1 (en) | 2002-06-28 | 2003-03-28 | SEPARATION GAS USE IN CONTINUOUS MELTS-DIP REFINING |
BR0311470-8A BR0311470A (en) | 2002-06-28 | 2003-03-28 | Use of separating gas during continuous hot bath dip finishing process |
AU2003219109A AU2003219109B2 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
SI200331126T SI1518004T1 (en) | 2002-06-28 | 2003-03-28 | Use of separation gas in continuous hot dip metal finishing |
TW092107239A TW200400279A (en) | 2002-06-28 | 2003-03-31 | Insulation gas application during hot dip coating refinement |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10229203.5 | 2002-06-28 | ||
DE10229203 | 2002-06-28 | ||
DE10233343A DE10233343A1 (en) | 2002-06-28 | 2002-07-23 | Release gas used in continuous hot-dip coating |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10233343A1 true DE10233343A1 (en) | 2004-01-22 |
Family
ID=29761539
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10233343A Withdrawn DE10233343A1 (en) | 2002-06-28 | 2002-07-23 | Release gas used in continuous hot-dip coating |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE10233343A1 (en) |
TW (1) | TW200400279A (en) |
-
2002
- 2002-07-23 DE DE10233343A patent/DE10233343A1/en not_active Withdrawn
-
2003
- 2003-03-31 TW TW092107239A patent/TW200400279A/en unknown
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