DE102022207687A1 - Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem - Google Patents
Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem Download PDFInfo
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- DE102022207687A1 DE102022207687A1 DE102022207687.7A DE102022207687A DE102022207687A1 DE 102022207687 A1 DE102022207687 A1 DE 102022207687A1 DE 102022207687 A DE102022207687 A DE 102022207687A DE 102022207687 A1 DE102022207687 A1 DE 102022207687A1
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Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/005—Testing of reflective surfaces, e.g. mirrors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0278—Detecting defects of the object to be tested, e.g. scratches or dust
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Plasma & Fusion (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Geometry (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102022207687.7A DE102022207687A1 (de) | 2022-07-27 | 2022-07-27 | Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem |
| PCT/EP2023/069443 WO2024022835A1 (fr) | 2022-07-27 | 2023-07-13 | Procédé, dispositif et procédé mis en œuvre par ordinateur pour inspecter un composant, en particulier un composant d'un système de lithographie, et système de lithographie |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102022207687.7A DE102022207687A1 (de) | 2022-07-27 | 2022-07-27 | Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102022207687A1 true DE102022207687A1 (de) | 2024-02-01 |
Family
ID=87418748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102022207687.7A Pending DE102022207687A1 (de) | 2022-07-27 | 2022-07-27 | Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102022207687A1 (fr) |
| WO (1) | WO2024022835A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024022835A1 (fr) | 2022-07-27 | 2024-02-01 | Carl Zeiss Smt Gmbh | Procédé, dispositif et procédé mis en œuvre par ordinateur pour inspecter un composant, en particulier un composant d'un système de lithographie, et système de lithographie |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6573978B1 (en) | 1999-01-26 | 2003-06-03 | Mcguire, Jr. James P. | EUV condenser with non-imaging optics |
| US20060132747A1 (en) | 2003-04-17 | 2006-06-22 | Carl Zeiss Smt Ag | Optical element for an illumination system |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| US20180074303A1 (en) | 2015-04-14 | 2018-03-15 | Carl Zeiss Smt Gmbh | Imaging optical unit and projection exposure unit including same |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE9501243L (sv) * | 1995-04-05 | 1996-10-06 | Contest Marketing Ab | Apparat för automatisk magnetpulverprovning |
| JP2002014057A (ja) * | 2000-06-30 | 2002-01-18 | Nidek Co Ltd | 欠陥検査装置 |
| US6828542B2 (en) * | 2002-06-07 | 2004-12-07 | Brion Technologies, Inc. | System and method for lithography process monitoring and control |
| JP4589101B2 (ja) * | 2003-12-25 | 2010-12-01 | 昭和電工株式会社 | 表面検査方法および同装置 |
| DE102004007829B4 (de) * | 2004-02-18 | 2007-04-05 | Isra Vision Systems Ag | Verfahren zur Bestimmung von zu inspizierenden Bereichen |
| JP4988224B2 (ja) * | 2006-03-01 | 2012-08-01 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及びその装置 |
| JP2008145226A (ja) * | 2006-12-08 | 2008-06-26 | Olympus Corp | 欠陥検査装置及び欠陥検査方法 |
| JP5031691B2 (ja) * | 2008-07-17 | 2012-09-19 | 新日本製鐵株式会社 | 表面疵検査装置 |
| KR102321222B1 (ko) * | 2011-09-02 | 2021-11-03 | 가부시키가이샤 니콘 | 공간 광 변조기의 검사 방법 및 장치, 및 노광 방법 및 장치 |
| DE102016206088A1 (de) * | 2016-04-12 | 2017-05-24 | Carl Zeiss Smt Gmbh | Verfahren zum Bestimmen der Dicke einer kontaminierenden Schicht und/oder der Art eines kontaminierenden Materials, optisches Element und EUV-Lithographiesystem |
| US10726543B2 (en) * | 2018-11-27 | 2020-07-28 | General Electric Company | Fluorescent penetrant inspection system and method |
| US10746667B2 (en) * | 2018-11-27 | 2020-08-18 | General Electric Company | Fluorescent penetrant inspection system and method |
| DE102018221825B4 (de) * | 2018-12-14 | 2020-06-25 | Carl Zeiss Industrielle Messtechnik Gmbh | Beleuchtungseinrichtung für eine Kamera oder einen optischen Sensor |
| DE102020206753B4 (de) * | 2020-05-29 | 2023-10-19 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Bestimmen eines Kontaminationszustands einer Oberfläche eines Facetten-Elements |
| DE102022207687A1 (de) | 2022-07-27 | 2024-02-01 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Inspektion eines Bauteils, computerimplementiertes Verfahren und Lithografiesystem |
-
2022
- 2022-07-27 DE DE102022207687.7A patent/DE102022207687A1/de active Pending
-
2023
- 2023-07-13 WO PCT/EP2023/069443 patent/WO2024022835A1/fr unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6573978B1 (en) | 1999-01-26 | 2003-06-03 | Mcguire, Jr. James P. | EUV condenser with non-imaging optics |
| US20060132747A1 (en) | 2003-04-17 | 2006-06-22 | Carl Zeiss Smt Ag | Optical element for an illumination system |
| EP1614008B1 (fr) | 2003-04-17 | 2009-12-02 | Carl Zeiss SMT AG | Element optique pour systeme d eclairage |
| DE102008009600A1 (de) | 2008-02-15 | 2009-08-20 | Carl Zeiss Smt Ag | Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie |
| US20180074303A1 (en) | 2015-04-14 | 2018-03-15 | Carl Zeiss Smt Gmbh | Imaging optical unit and projection exposure unit including same |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024022835A1 (fr) | 2022-07-27 | 2024-02-01 | Carl Zeiss Smt Gmbh | Procédé, dispositif et procédé mis en œuvre par ordinateur pour inspecter un composant, en particulier un composant d'un système de lithographie, et système de lithographie |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024022835A1 (fr) | 2024-02-01 |
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|---|---|---|---|
| R012 | Request for examination validly filed |