DE102022207348A1 - PROCEDURE AND ADJUSTMENT KIT - Google Patents

Abstract

A method for designing an adjusting element set (100A, 100B) with a plurality of adjusting elements (102, 102A, 102B) for adjusting a position of a component (202, 202') of a projection exposure system (1), with the following steps: a) determining (S1) a the total area (G) to be covered by the set of adjusting elements (100A, 100B) that is required to adjust the position of the component (202, 202'), b) determining (S2) an increment (Δs) of the adjusting elements (102, 102A, 102B), c) determining (S3) a probability with which adjusting elements (102, 102A, 102B) differing in their geometry are required for adjusting the position of the component (202, 202'), and d) determining (S4 ) a minimum required number of adjustment elements (102, 102A, 102B) for each geometry.

Description

The present invention relates to a method for designing an adjusting element set for adjusting a position of a component of a projection exposure system and an adjusting element set designed using such a method for adjusting a position of a component of a projection exposure system.

Microlithography is used to produce microstructured components such as integrated circuits. The microlithography process is carried out using a lithography system which has an illumination system and a projection system. The image of a mask (reticle) illuminated by the illumination system is projected by the projection system onto a substrate coated with a light-sensitive layer (photoresist) and arranged in the image plane of the projection system, for example a silicon wafer, in order to place the mask structure on the light-sensitive coating of the substrate transferred to.

Driven by the striving for ever smaller structures in the manufacture of integrated circuits, EUV lithography systems are currently being developed which use light with a wavelength in the range from 0.1 nm to 30 nm, in particular 13.5 nm. In such EUV lithography systems, because of the high absorption of light of this wavelength by most materials, reflective optics, ie mirrors, must be used instead of—as hitherto—refractive optics, ie lenses.

When manufacturing an illumination system as mentioned above or a projection system as mentioned above, a highly precise correction of manufacturing tolerances, in particular from an original state to a state ready for delivery, is required. A very precise setting of components or assemblies in the order of about 10 microns is necessary. The attachment of the components or assemblies should ensure good thermal transfer. At the same time, dynamically stable transitions are required and the correction should be inexpensive compared to an actuation.

The challenge with the projection system in particular is to align heavy components with a mass of 1 to 2,000 kg with an accuracy of around 10 µm. This alignment must be stable over the long term against settling effects. In addition, small components (less than 1 kg) must also be aligned with one another in the tightest of spaces, with an adjustment mechanism or an actuator not being able to be implemented due to the lack of available space. A large adjustment range with small increments is also desirable.

It is possible to keep spacers or spacers in defined sizes and quantities, for example in the form of type cases, in particular spacer type cases, in order to be able to space the components to be aligned with one another in the manufacturing process. Such type cases can contain several thousand spacers. This requires appropriate storage options. Alternatively, the spacers can also be individually manufactured on request. However, this lengthens the production times and is preferably only implemented in exceptional cases. This needs to be improved.

Against this background, it is an object of the present invention to provide an improved method for designing an adjustment element set.

Accordingly, a method for designing an adjustment element set with a plurality of adjustment elements for adjusting a position of a component of a projection exposure system is proposed. The method comprises the following steps: a) determining a total area to be covered by the adjusting element set, which is required to adjust the position of the component, b) determining an increment of the adjusting elements, c) determining a probability with which their geometry will differ from one another distinguishing adjustment elements are respectively required to adjust the position of the component, and d) determining a minimum required number of adjustment elements for each geometry.

By determining the probability with which the adjusting elements that differ in their increments are required to adjust the position of the component, it is possible to only keep the actually required adjusting elements or spacers in stock in the respective adjusting element set. This advantageously leads to a cost reduction.

The adjusting element set can also be referred to as a spacer set, spacer box, type case or spacer type box. The alignment element set can include any number of alignment elements. the Adjusting elements differ from one another in terms of their thickness or height, but it is also possible for several adjusting elements, each with an identical height, to be provided. The geometry of the adjusting elements can be understood in particular as their height. The term "geometry" can therefore be replaced by the term "height".

The component basically has six degrees of freedom, namely three translational degrees of freedom in each case along an x-direction, a y-direction and a z-direction and three rotational degrees of freedom in each case about the x-direction, the y-direction and the z-direction. This means that both a position and an orientation of the component can be determined or described using the six degrees of freedom.

Accordingly, the “position” of the component is to be understood as meaning its coordinates or the coordinates of a measurement point provided on the component with respect to the x-direction, the y-direction and the z-direction. Accordingly, the "orientation" of the component is to be understood in particular as its tilting with respect to the three directions. This means that the component can be tilted about the x-direction, the y-direction and/or the z-direction. This results in the six degrees of freedom for the position and/or orientation of the component.

The "position" of the component includes both its position and its orientation. This means that the orientation and the position can also be referred to as position or the position can be referred to as orientation and position. The terms "location" and "orientation and position" can thus be interchanged as desired. Accordingly, “adjusting” or “aligning” the component can be understood to mean that preferably both the orientation and the position of the component can be changed in order to move the component from an actual position to a target position.

In the present case, the “entire area” is to be understood in particular as an area that must be covered with the aid of the adjusting elements of the adjusting element set in order to move the component from its actual position to its desired target position. The "step" or "increment" is the smallest step in the geometry or height of the adjustment elements that is needed to get to the desired specification.

A geometry or height, as mentioned above, is assigned to each adjustment element. The geometries or heights of the adjustment elements differ from one another. However, there can also be several adjustment elements for each geometry or height. These adjusting elements then all have the same geometry or height and accordingly do not differ from one another in terms of their geometries or heights. The difference in geometries or heights is defined by the step size or increment. In step c), it is determined or calculated, in particular for each geometry or height, how high the probability is that the respective adjustment element will be used to adjust the position of the component.

In step d), on the other hand, it is determined or calculated how many adjustment elements must each have the same geometry or height in order to reliably have all the adjustment elements available during the adjustment of the position of the component, without the process flow in the adjustment of the position being impaired by the absence of one certain adjustment element is endangered.

According to one embodiment, step a) and/or step b) is carried out with the aid of tests and/or a tolerance analysis.

A virtual assembly model (VMM) can be used for this. An actual assembly of the component before the adjustment is hereby dispensable. All manufacturing tolerances of the components to be installed that influence the dimension to be set are included in the tolerance analysis. The increment is significantly influenced by the maximum deviation of the dimension to be set from its nominal value.

According to a further embodiment, during step c) a Gaussian distribution, a uniform distribution, an exponential distribution or the like is laid over the overall range determined during step a).

This makes it possible to determine the probability with which an adjustment element with a specific geometry or height is required to adjust the component.

According to a further embodiment, the minimum number of adjustment elements required for each geometry is calculated during step d) with the aid of a cumulative binomial distribution, a simulation or an actual consumption.

Alternatively, a determination can be made about the consumption in reality. In particular, it is calculated how many adjusting elements of the respective geometry or height can be taken from the adjusting element set in order to always have at least one adjusting element with a high probability.

According to a further embodiment, a safety factor is taken into account during step d).

This makes it possible to secure the design of the adjusting element set. In order to be able to prevent non-statistical effects, such as systematic errors, it is possible to include additional adjustment elements in the adjustment element set. For example, a number of unlikely edge aligners can be included in the aligner set. As soon as a certain number of adjustment steps have been carried out and adjustment elements have been installed, statistics can be prepared for the removal quantity per respective geometry or height, from which improved estimates for the probabilities and advantageous numbers can be derived.

According to a further embodiment, during step a) a nominal adjustment element is used, which is added to the adjustment element set.

A “nominal adjusting element” or “nominal spacer” is to be understood here as that adjusting element whose probability that it will be used when adjusting the position of the component is highest compared to the other adjusting elements of the adjusting element set.

According to a further embodiment, the adjustment element set has coarse adjustment elements and fine adjustment elements, with a probability being determined during step c) with which the coarse adjustment elements, which differ from one another in their geometries, are required to adjust the position of the component.

The fine adjustment elements and the coarse adjustment elements differ from one another in terms of their increment or step width. This means that the coarse adjustment elements have a larger increment and the fine adjustment elements have a smaller increment.

According to a further embodiment, a Gaussian distribution is placed over an entire area of the coarse adjustment elements, with the fine adjustment elements being assumed to be uniformly distributed.

This means in particular that the same number of fine adjustment elements is kept available for each geometry or height of the fine adjustment elements.

Furthermore, an adjusting element set is proposed for adjusting a position of a component of a projection exposure system, the adjusting element set being designed using the aforementioned method, and the adjusting element set having a plurality of adjusting elements that differ in their geometries.

The number of adjustment elements is fundamentally arbitrary. However, more adjustment elements per geometry or height are provided for those geometries or heights that are more likely to be used to adjust the position of the component than for those adjustment elements that are less likely to be used.

According to one embodiment, the adjustment elements have coarse adjustment elements and fine adjustment elements, with an increment of the coarse adjustment elements being larger or an integer multiple of an increment of the fine adjustment elements.

The coarse adjustment elements and the fine adjustment elements thus differ from one another in terms of their increments. The step width or the increment can be larger for the coarse adjustment elements than for the fine adjustment elements.

"A" is not necessarily to be understood as being limited to exactly one element. Rather, a plurality of elements, such as two, three or more, can also be provided. Any other count word used here should also not be understood to mean that there is a restriction to precisely the stated number of elements. Rather, numerical deviations upwards and downwards are possible, unless otherwise stated.

The embodiments and features described for the method apply correspondingly to the proposed adjustment element set and vice versa.

Further possible implementations of the invention also include combinations of features or embodiments described above or below with regard to the exemplary embodiments that are not explicitly mentioned. The person skilled in the art will also add individual aspects as improvements or additions to the respective basic form of the invention.

• 1 zeigt einen schematischen Meridionalschnitt einer Projektionsbelichtungsanlage für die EUV-Projektionslithographie;
• 2 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Justierelementsatzes zum Justieren einer Lage eines Bauteils der Projektionsbelichtungsanlage gemäß 1;
• 3 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Justierelements für den Justierelementsatz gemäß 2;
• 4 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Justierelements gemäß 3;
• 5 zeigt eine tabellarische Übersicht zur Bedarfsberechnung von unterschiedlichen Justierelementen gemäß 3;
• 6 zeigt ein schematisches Diagramm zur Auslegung des Justierelementsatzes gemäß 2;
• 7 zeigt eine schematische perspektivische Ansicht einer weiteren Ausführungsform eines Justierelementsatzes zum Justieren einer Lage eines Bauteils der Projektionsbelichtungsanlage gemäß 1;
• 8 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Grobjustierelements für den Justierelementsatz gemäß 7;
• 9 zeigt eine schematische perspektivische Ansicht einer Ausführungsform eines Feinjustierelements für den Justierelementsatz gemäß 7;
• 10 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Grobjustierelements gemäß 8;
• 11 zeigt ein schematisches Diagramm einer Wahrscheinlichkeitsverteilung von unterschiedlichen Höhen des Feinjustierelements gemäß 9;
• 12 zeigt eine tabellarische Ansicht des Justierelementsatzes gemäß 7;
• 13 zeigt eine schematische Darstellung der Toleranz für den Justierelementsatz gemäß 2 oder 7;
• 14 zeigt eine schematische Darstellung der Konvergenz für den Justierelementsatz gemäß 2 oder 7;
• 15 zeigt eine schematische Ansicht einer Ausführungsform eines optischen Systems für die Projektionsbelichtungsanlage gemäß 1; und
• 16 zeigt ein schematisches Blockdiagramm einer Ausführungsform eines Verfahrens zum Auslegen des Justierelementsatzes gemäß 2 oder 7.

Further advantageous refinements and aspects of the invention are the subject matter of the dependent claims and of the exemplary embodiments of the invention described below. The invention is explained in more detail below on the basis of preferred embodiments with reference to the enclosed figures.

• 1 shows a schematic meridional section of a projection exposure system for EUV projection lithography;
• 2 shows a schematic perspective view of an embodiment of an adjusting element set for adjusting a position of a component of the projection exposure system according to FIG 1 ;
• 3 shows a schematic perspective view of an embodiment of an adjusting element for the adjusting element set according to FIG 2 ;
• 4 FIG. 12 shows a schematic diagram of a probability distribution of different heights of the adjustment element according to FIG 3 ;
• 5 shows a tabular overview for calculating the requirements of different adjustment elements 3 ;
• 6 shows a schematic diagram for the design of the adjusting element set according to FIG 2 ;
• 7 shows a schematic perspective view of a further embodiment of an adjusting element set for adjusting a position of a component of the projection exposure system according to FIG 1 ;
• 8th shows a schematic perspective view of an embodiment of a coarse adjustment element for the adjustment element set according to FIG 7 ;
• 9 shows a schematic perspective view of an embodiment of a fine adjustment element for the adjustment element set according to FIG 7 ;
• 10 FIG. 12 shows a schematic diagram of a probability distribution of different heights of the coarse adjustment element according to FIG 8th ;
• 11 FIG. 12 shows a schematic diagram of a probability distribution of different heights of the fine adjustment element according to FIG 9 ;
• 12 shows a tabular view of the adjustment element set according to 7 ;
• 13 shows a schematic representation of the tolerance for the adjustment element set according to FIG 2 or 7 ;
• 14 FIG. 12 shows a schematic representation of the convergence for the adjustment element set according to FIG 2 or 7 ;
• 15 shows a schematic view of an embodiment of an optical system for the projection exposure apparatus according to FIG 1 ; and
• 16 FIG. 12 shows a schematic block diagram of an embodiment of a method for designing the alignment element set according to FIG 2 or 7 .

Elements that are the same or have the same function have been provided with the same reference symbols in the figures, unless otherwise stated. Furthermore, it should be noted that the representations in the figures are not necessarily to scale.

1 shows an embodiment of a projection exposure system 1 (lithography system), in particular an EUV lithography system. One embodiment of an illumination system 2 of the projection exposure system 1 has, in addition to a light or radiation source 3, illumination optics 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the illumination system 2. In this case, the lighting system 2 does not include the light source 3 .

A reticle 7 arranged in the object field 5 is exposed. The reticle 7 is held by a reticle holder 8 . The reticle holder 8 can be displaced via a reticle displacement drive 9, in particular in a scanning direction.

In the 1 a Cartesian coordinate system with an x-direction x, a y-direction y and a z-direction z is drawn in for explanation. The x-direction x runs perpendicularly into the plane of the drawing. The y-direction y runs horizontally and the z-direction z runs vertically. The scanning direction is in the 1 along the y-direction y. The z-direction z runs perpendicular to the object plane 6.

The projection exposure system 1 includes projection optics 10. The projection optics 10 are used to image the object field 5 in an image field 11 in an image plane 12. The image plane 12 runs parallel to the object plane 6. Alternatively, there is also an angle other than 0° between the object plane 6 and the Image plane 12 possible.

A structure on the reticle 7 is imaged onto a light-sensitive layer of a wafer 13 arranged in the region of the image field 11 in the image plane 12 . The wafer 13 is held by a wafer holder 14 . The wafer holder 14 can be displaced in particular along the y-direction y via a wafer displacement drive 15 . The displacement of the reticle 7 via the reticle displacement drive 9 on the one hand and the wafer 13 via the wafer displacement drive 15 on the other hand can be synchronized with one another.

The light source 3 is an EUV radiation source. The light source 3 emits in particular EUV radiation 16, which is also referred to below as useful radiation, illumination radiation or illumination light. The useful radiation 16 has in particular a wavelength in the range between 5 nm and 30 nm. The light source 3 can be a plasma source, for example an LPP source (Engl .: Laser Produced Plasma, plasma generated with the help of a laser) or a DPP (Gas Discharged Produced Plasma) source. It can also be a synchrotron-based radiation source. The light source 3 can be a free-electron laser (FEL).

The illumination radiation 16 emanating from the light source 3 is bundled by a collector 17 . The collector 17 can be a collector with one or more ellipsoidal and/or hyperboloidal reflection surfaces. The at least one reflection surface of the collector 17 can in grazing incidence (Engl.: Grazing Incidence, GI), i.e. with angles of incidence greater than 45°, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence less than 45°, with the Illumination radiation 16 are applied. The collector 17 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress stray light.

After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focus plane 18. The intermediate focus plane 18 can represent a separation between a radiation source module, comprising the light source 3 and the collector 17, and the illumination optics 4.

The illumination optics 4 comprises a deflection mirror 19 and a first facet mirror 20 downstream of this in the beam path. The deflection mirror 19 can be a plane deflection mirror or alternatively a mirror with an effect that influences the bundle beyond the pure deflection effect. Alternatively or additionally, the deflection mirror 19 can be designed as a spectral filter, which separates a useful light wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first facet mirror 20 is arranged in a plane of the illumination optics 4 which is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field facet mirror. The first facet mirror 20 includes a multiplicity of individual first facets 21, which can also be referred to as field facets. Of these first facets 21 are in the 1 only a few shown as examples.

The first facets 21 can be embodied as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour. The first facets 21 can be embodied as planar facets or alternatively as convexly or concavely curved facets.

Like for example from the DE 10 2008 009 600 A1 is known, the first facets 21 themselves can each also be composed of a large number of individual mirrors, in particular a large number of micromirrors. The first facet mirror 20 can be embodied in particular as a microelectromechanical system (MEMS system). For details refer to the DE 10 2008 009 600 A1 referred.

The illumination radiation 16 runs horizontally between the collector 17 and the deflection mirror 19, ie along the y-direction y.

A second facet mirror 22 is arranged downstream of the first facet mirror 20 in the beam path of the illumination optics 4. If the second facet mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil facet mirror. The second facet mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4 . In this case, the combination of the first facet mirror 20 and the second facet mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006/0132747 A1 , the EP 1 614 008 B1 and the U.S. 6,573,978 .

The second facet mirror 22 includes a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

The second facets 23 can also be macroscopic facets, which can have round, rectangular or hexagonal borders, for example, or alternatively facets composed of micromirrors. In this regard, also on the DE 10 2008 009 600 A1 referred.

The second facets 23 can have plane or alternatively convexly or concavely curved reflection surfaces.

The illumination optics 4 thus forms a double-faceted system. This basic principle is also known as a honeycomb condenser (English: Fly's Eye Integrator).

It can be advantageous not to arrange the second facet mirror 22 exactly in a plane which is optically conjugate to a pupil plane of the projection optics 10 . In particular, the second facet mirror 22 can be arranged tilted relative to a pupil plane of the projection optics 10, as is the case, for example, in FIG DE 10 2017 220 586 A1 is described.

The individual first facets 21 are imaged in the object field 5 with the aid of the second facet mirror 22 . The second facet mirror 22 is the last beam-forming mirror or actually the last mirror for the illumination radiation 16 in the beam path in front of the object field 5.

In another embodiment of the illumination optics 4 that is not shown, transmission optics can be arranged in the beam path between the second facet mirror 22 and the object field 5 , which particularly contributes to the imaging of the first facets 21 in the object field 5 . The transmission optics can have exactly one mirror, but alternatively also have two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4 . The transmission optics can in particular comprise one or two mirrors for normal incidence (NI mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GI mirror, grazing incidence mirror).

The illumination optics 4 has the version in which 1 shown, exactly three mirrors after the collector 17, namely the deflection mirror 19, the first facet mirror 20 and the second facet mirror 22.

In a further embodiment of the illumination optics 4, the deflection mirror 19 can also be omitted, so that the illumination optics 4 can then have exactly two mirrors after the collector 17, namely the first facet mirror 20 and the second facet mirror 22.

The imaging of the first facets 21 by means of the second facets 23 or with the second facets 23 and transmission optics in the object plane 6 is generally only an approximate imaging.

The projection optics 10 includes a plurality of mirrors Mi, which are numbered consecutively according to their arrangement in the beam path of the projection exposure system 1 .

At the in the 1 example shown, the projection optics 10 includes six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible. The projection optics 10 are doubly obscured optics. The penultimate mirror M5 and the last mirror M6 each have a passage opening for the illumination radiation 16. The projection optics 10 has an image-side numerical aperture which is greater than 0.5 and which can also be greater than 0.6 and which, for example, is 0.7 or 0.75.

Reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry. Alternatively, the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape. Just like the mirrors of the illumination optics 4, the mirrors Mi can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

The projection optics 10 has a large object-image offset in the y-direction y between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction y can be about as large as a z-distance between the object plane 6 and the image plane 12.

The projection optics 10 can in particular be anamorphic. In particular, it has different imaging scales βx, βy in the x and y directions x, y. The two image scales βx, βy of the projection optics 10 are preferably at (βx, βy)=(+/−0.25, +/-0.125). A positive image scale ß means an image without image reversal. A negative sign for the imaging scale ß means imaging with image reversal.

The projection optics 10 thus leads to a reduction in the ratio 4:1 in the x-direction x, ie in the direction perpendicular to the scanning direction.

The projection optics 10 lead to a reduction of 8:1 in the y-direction y, ie in the scanning direction.

Other imaging scales are also possible. Image scales with the same sign and absolutely the same in the x and y directions x, y, for example with absolute values of 0.125 or 0.25, are also possible.

The number of intermediate image planes in the x and y directions x, y in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, can be different. Examples of projection optics with different numbers of such intermediate images in the x and y directions x, y are known from U.S. 2018/0074303 A1 .

In each case one of the second facets 23 is assigned to precisely one of the first facets 21 in order to form a respective illumination channel for illuminating the object field 5 . In this way, in particular, lighting can result according to Köhler's principle. The far field is broken down into a large number of object fields 5 with the aid of the first facets 21 . The first facets 21 generate a plurality of images of the intermediate focus on the second facets 23 assigned to them.

The first facets 21 are each imaged onto the reticle 7 by an associated second facet 23 in a superimposed manner in order to illuminate the object field 5 . In particular, the illumination of the object field 5 is as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

The illumination of the entrance pupil of the projection optics 10 can be defined geometrically by arranging the second facets 23 . By selecting the lighting channels, especially the part quantity of the second facets 23 that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as illumination setting or illumination pupil filling.

A likewise preferred pupil uniformity in the area of defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by redistributing the illumination channels.

Further aspects and details of the illumination of the object field 5 and in particular the entrance pupil of the projection optics 10 are described below.

The projection optics 10 can in particular have a homocentric entrance pupil. This can be accessible. It can also be inaccessible.

The entrance pupil of the projection optics 10 cannot regularly be illuminated exactly with the second facet mirror 22 . When imaging the projection optics 10, which telecentrically images the center of the second facet mirror 22 onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found in which the distance between the aperture rays, which is determined in pairs, is minimal. This surface represents the entrance pupil or a surface conjugate to it in position space. In particular, this surface shows a finite curvature.

The projection optics 10 may have different positions of the entrance pupil for the tangential and for the sagittal beam path. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second facet mirror 22 and the reticle 7 . With the help of this optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.

At the in the 1 shown arrangement of the components of the illumination optics 4, the second facet mirror 22 is arranged in a conjugate to the entrance pupil of the projection optics 10 surface. The first facet mirror 20 is arranged tilted to the object plane 6 . The first facet mirror 20 is tilted relative to an arrangement plane that is defined by the deflection mirror 19 . The first facet mirror 20 is tilted relative to an arrangement plane that is defined by the second facet mirror 22 .

When manufacturing an illumination optics 4 as mentioned above or a projection optics 10 as mentioned above, a highly precise correction of manufacturing tolerances, in particular from an original state to a state ready for delivery, is required. A very precise adjustment of the order of about 10 μm is necessary, whereby a good thermal transition should be ensured. At the same time, dynamically stable transitions are required and the correction should be inexpensive compared to an actuation.

In the case of the projection optics 10 in particular, the challenge lies in aligning heavy components with a mass of 1 to 2,000 kg with one another with an accuracy of around 10 μm. This alignment must be stable over the long term against settling effects. Small components (less than 1 kg) must be aligned with one another in the tightest of spaces, with an adjustment mechanism or an actuator not being able to be implemented due to the lack of available space. A large adjustment range with small increments is also desirable.

These requirements can be implemented as follows. Spacers or spacers must be available in defined sizes and quantities, for example in the form of type cases, in particular spacer type cases, in order to be able to space the components to be aligned with one another in the manufacturing process. Alternatively, the spacers can also be individually manufactured on request. However, this lengthens the production times and is preferably only implemented in exceptional cases. The total range must be spacerable or with the required accuracy. Advantageously, only the spacers or spacers that are actually required should be available in stock in a respective set of spacers. This leads to a cost reduction.

Intermediate pieces, spacers or spacers with an accuracy of less than 10 µm are often required for the precise assembly of components. These spacers can be ground individually. However, at least half a day elapses between the calculation of the required dimensions and the availability of the ground parts. Faster availability can be achieved by using construction kits or spacer replacement kits.

2 Fig. 12 shows a schematic view of an embodiment of a kit, case or adjustment element set 100A as mentioned above. The adjustment element set 100A can also be referred to as a spacer replacement box. 3 12 shows a schematic perspective view of one embodiment of a spacer or adjustment element 102 for the adjustment element set 100A. The following will refer to the 2 and 3 referenced at the same time.

The adjusting element set 100A comprises a plurality of adjusting elements 102. The adjusting elements 102 differ from one another in terms of their geometry, in particular their thickness or height, as will be explained below. However, several adjustment elements 102 with the same geometry or height can be provided for each geometry or height. The number of adjusting elements 102 is fundamentally arbitrary. However, only one adjustment element 102 is referred to below.

The adjusting element 102 can be disk-shaped or hollow-cylindrical and comprises a cylindrical outer side or outer surface 104 and a centrally provided bore or an opening 106. The opening 106 is also cylindrical. Furthermore, the adjustment element 102 has a front side or first end face 108 and a rear side or second end face 110 . In principle, however, the adjustment element 102 can have any desired geometry.

The end faces 108, 110 are arranged parallel to one another and spaced apart from one another. The adjustment element 102 has a thickness or height d102. As previously mentioned, the adjusters 102 of the adjuster set 100A include adjusters 102 with different heights d102, but multiple adjusters 102 with the same height d102 can also be part of the adjuster set 100A. In the present case, the height d102 is to be understood as a distance between the two end faces 108, 110 arranged parallel to one another.

The adjusting element 102 can rest with its two end faces 108, 110 on two objects or components of the projection exposure system 1 that are to be aligned with one another. A fastening element, in particular a screw, can be passed through the opening 106 .

In order to design the adjustment element set 100A, an area to be compensated for, which is to be adjustable with the aid of the adjustment element set 100A or with the aid of the adjustment element 102, is first determined. This area can also be referred to as the overall area, range or overall spacer range. This determination of the range takes place, for example, via a tolerance consideration or tests.

An increment or spacer increment, in other words the sensitivity, is then determined by considering tolerances, geometric considerations, tolerance simulations or tests. The increment can also be referred to as a step size. The smallest spacer increment is determined in order to get the alignment tasks into the specification. In designing the set of alignment elements 100A, the probabilities of the needs of the individual alignment elements 102 are now determined.

For this purpose, as in the 4 shown, a Gaussian distribution can be superimposed over a total spacer range or total area G as previously mentioned. In the 3 the height d102 in mm is plotted on the abscissa or right-hand axis and the probability p is plotted on the ordinate or vertical axis. In the exemplary case according to FIG 4 the total area G is as follows: $$G=\mathrm{3,685}mm-\mathrm{2,305}mm=1.38mm$$

For example, it can be laid out with a spacer range of -3s, +3s. The spacer increments with a magnitude of approximately 10 μm quantize the Gaussian distribution over the entire range G. The individual spacer increment probabilities add up to 1. A nominal spacer or nominal adjustment element 102' is therefore the most probable. The nominal adjustment element 102′ differs from the other adjustment elements 102 only in that the probability of using the nominal adjustment element 102′ is greatest compared to the other adjustment elements 102 . The nominal adjustment element 102' can also be referred to as the middle adjustment element.

A procedure for designing the alignment element set 100A can be performed as follows. First, all the components to be aligned, including the nominal spacer or nominal adjustment element 102', are assembled. This can be done in real life or using a virtual assembly model (VMM). Then the original state is determined in real terms or via a measuring system or virtually via the virtual assembly model. The correction and the adjustment elements 102 required for correction are subsequently described definitely. The adjustment elements 102 are then provided and installed. The corrected state is then determined either in real terms or via the measuring system. If necessary, another spacer loop is required.

When designing the adjustment element set 100A, it must be determined how many adjustment elements 102 make sense as a maximum per increment or step size. On the other hand, there must always be enough adjusting elements 102 in order not to endanger the flow of the process. An optimization takes place in terms of costs versus availability of the respective adjustment elements 102. The required boundary conditions here are recovery time, the consumption of adjustment elements 102 per adjustment element set 100A and the spacer probability or probability of the respective adjustment element 102.

The objective here is to determine the number of adjustment elements 102 per increment or pitch required in the adjustment element set 100A in order to reliably have all increments available during assembly, particularly during the replenishment time. This is implemented by a cumulative binomial distribution that calculates how many adjustment elements 102 can be taken from the adjustment element set 100A in order to always have at least one adjustment element 102 present with a high probability, for example 99%.

5 shows a table with an overview of requirement calculations for the cumulative probability C greater than 0.997. In the 5 p denotes the probability and N the number of spacer tasks. The cumulative probability C indicates the security against the adjustment element set 100A running empty. The probability p provides information about how high the probability p is for the use of a respective adjustment element 102 with a specific height d102.

The design of the adjustment element set 100A can be secured. In order to prevent non-statistical effects such as a systematic error, additional adjustment elements 102 can be included in the adjustment element set 100A. For example, this can be done by increasing the number of improbable edge spacers or edge adjustment elements. This increases security. Furthermore, nominal spacers or nominal adjusting elements 102' can also be added. For example, these are adjusting elements 102, which may be installed during initial construction, in particular when determining an actual situation.

6 12 schematically shows an example of the alignment element set 100A in which the alignment elements 102 are not normally distributed. The height d102 is again plotted on the right-hand axis or abscissa, whereas a number of the adjustment elements 102 is plotted on the vertical axis or ordinate. The adjustment element set 100A without a nominal distribution is shown with a solid line. A safety curve is shown with a dashed line, with an expected value being shown with a dot-dash line. the

Safety curve can be calculated with a safety factor if necessary.

7 Figure 12 shows a schematic perspective view of a further embodiment of a kit or adjustment element set 100B as mentioned above. The adjustment element set 100B can also be referred to as a spacer set. 8th and 9 each show a schematic perspective view of an embodiment of a coarse spacer or coarse adjustment element 102A and of a fine spacer or fine adjustment element 102B for the adjustment element set 100B. The following will refer to the 7 until 9 referenced at the same time.

The adjustment element set 100B differs from the adjustment element set 100A in that two different types of adjustment elements 102A, 102B, namely the coarse adjustment elements 102A and the fine adjustment elements 102B, are provided. A thickness or height d102A is assigned to the coarse adjustment elements 102A. A thickness or height d102B is assigned to the fine adjustment elements 102B. Height d102A may be greater than height d102B. However, this is not mandatory. The coarse adjustment elements 102A have a large step size compared to the fine adjustment elements 102B, whereas the fine adjustment elements 120B have a small step size compared to the coarse adjustment elements 102A. This means in particular that the fine adjustment elements 102B can also be thicker than the coarse adjustment elements 102A.

For the design of the adjusting element set 100B, the overall range G or overall spacer range (original state) is first determined again via a tolerance consideration or tests. The overall range G is the range that must be adjustable using the adjustment elements 102A, 102B.

The increment or spacer increment and thus the sensitivity of the adjustment elements 102A, 102B is then determined by considering tolerances or by testing. The smallest spacer step to get the tasks in specification is determined. In order to reduce the number of adjustment elements 102A, 102B, a division into coarse adjustment elements 102A and fine adjustment elements 102B is undertaken. Then the probabilities of the individual coarse adjustment elements 102A are interpreted. Typically, a Gaussian distribution is superimposed over the area to be covered by the coarse adjustment elements 102A. For example with a range of -3s, +3s to be covered. The fine adjustment elements 102B are then assumed to be uniformly distributed.

For the design of the adjustment element set 102B, it is determined how many adjustment elements 102A, 102B make sense at most per increment or increment. On the other hand, there must always be enough adjusting elements 102A, 102B in order not to endanger the process flow. There is an optimization with regard to the costs of the adjustment elements 102A, 102B versus the availability of the adjustment elements 102A, 102B. The required boundary conditions are the recovery time, the consumption of the adjusting elements 102A, 102B per adjusting element set 100B and the probability of the use of the respective adjusting elements 102A, 102B.

The task here is to determine the number of adjustment elements 102A, 102B per increment that are required in the adjustment element set 100B in order to reliably have all increments of the adjustment elements 102A, 102B available during assembly, in particular during the replacement time. The conversion takes place via a cumulative binomial distribution, which is used to calculate how many adjustment elements 102A, 102B must be stored in order to always have at least one adjustment element 102A, 102B present with a high probability, for example 99%.

Additional adjustment elements 102A, 102B can be added to the adjustment element set 100B to safeguard the design, for example to prevent non-statistical effects, in particular systematic errors. For example, the number of improbable edge justification items is increased. Furthermore, as previously mentioned, nominal spacers or nominal adjustment elements 102A', 102B' ( 10 and 11 ) to be included.

10 shows the layout of the coarse adjustment elements 102A. 11 shows the layout of the fine adjustment elements 102B. In the 10 and 11 the respective height d102a, d102B is plotted on the right axis or abscissa axis and the number of adjustment elements 102A, 102B is plotted on the vertical axis or ordinate axis. The target of the statistics is entered with a solid line. The bars in the 10 and 11 represent alignment element set 100B.

Important parameters when designing the adjusting elements 102, 102A, 102B of the respective adjusting element set 100A, 100B are the increment or the increment Δs and the value range R to be covered. With a single-row adjusting element set 100A, n steps or increments of the adjusting elements 102 are required: $$n=\frac{R}{\Delta s}+1$$

In the case of a two-row adjustment element set 102B, on the other hand, n stages or increments of the adjustment elements 102A, 102B are required: $$n=2\sqrt{\frac{R}{\Delta s}+1}$$

$$n_{zweireihig}=2\sqrt{\frac{\mathrm{1,436}mm}{\mathrm{0,004}mm}+1}=\mathrm{37,9}$$

In theory, for a given example with a value range R of 1.436 mm and a step size Δs of 0.004 mm then: $$n_{ein\mathrm{right}eiHiG}=\frac{\mathrm{1,436}mm}{0.004mm}+1=360$$

$$n_{\mathrm{e.g}wei\mathrm{right}eiHiG}=2\sqrt{\frac{\mathrm{1,436}mm}{0.004mm}+1}=37.9$$

In practice, if the increment Δs of the coarse adjustment elements 102A is suitably selected: $$n_{\mathrm{e.g}wei\mathrm{right}eiHiG}=n_{fein}+n_{G\mathrm{right}Ob}=20+18=38$$

12 shows the adjustment element set 100B according to the aforementioned example in a highly schematic manner. Here are in the left part of the figure 12 the coarse adjustment elements 102A with an increment Δs of 80 μm and the fine adjustment elements 102B with an increment Δs of 4 μm are shown in the right partial figure. 18 variants of the coarse adjustment elements 102A and 20 variants of the fine adjustment elements 102B are therefore provided. However, it does not apply here that the height d102A is always greater than the height d102B.

Other distributions besides the previously mentioned Gaussian distribution are also conceivable. After a certain period of use, the probabilities can also be determined via the actual consumption of the adjustment elements 102, 102A, 102B. The probabilities can also be determined using so-called Monte Carlo simulations or process flow simulations, in which the component and assembly configurations are simulated with randomly determined tolerance characteristics and the required thicknesses d102, d102A, d102B of the adjustment elements 102, 102A, 102B are determined from the results . The more random configurations that are simulated, the more meaningful the statistical consideration derived from this for the probability that an adjustment element 102, 102A, 102B of a specific thickness d102, d102A, d102B is required. The advantage of an additional process flow simulation is that the entire nested replacement process and the nested removal from the respective adjustment element set 100A, 100B are taken into account. In this way, it can be determined whether a selected stock quantity is sufficient to ensure removal during the replenishment lead time, i.e. the time in which the stock is not replenished.

If the increment Δs is chosen favorably, this is 0.2 times the width of the tolerance band to be maintained. Neighboring spacers can therefore also be used for an adjustment task. Theoretically, with otherwise ideal boundary conditions, it only has to be ensured that the increment Δs is less than or equal to the width of the tolerance band. With this constellation, it is always possible to compensate for a state that is just outside the tolerance band by replacing the adjustment element 102, 102A, 102B with one that differs from the built-in adjustment element 102, 102A, 102B by exactly one increment Δs to reach tolerance. This means that when the appropriate adjustment element 102, 102A, 102B is selected, the set state will never deviate from the desired setting by more than half the increment Δs, given otherwise ideal boundary conditions.

It is possible to merge spacer tasks. In this case, different adjustment element sets 100A, 100B are combined.

A division between one row or two rows with coarse adjustment elements 102A to fine adjustment elements 102B or n-rows is possible with a minimization of the spacer thicknesses.

An adjustment element 102, 102A, 102B can depict several dimensions. Typically, however, only one dimension is provided. The respective adjustment element set 100A, 100B typically has about 20 to 200 different adjustment elements 102, 102A, 102B. The total number of alignment elements 102A, 102B per alignment element set 100A, 100B is typically 100 to 10,000.

$$v=t-f$$

$$r\le \frac{t}{4}$$

$$\Delta s\le \mathrm{0,4}\ast t$$

13 shows the distribution of the tolerance. t stands for the tolerance, i.e. the actual deviation (state) must not exceed the tolerance t in terms of amount. Accordingly, the tolerance band has a width of T = 2 * t. v stands for the default value. The amount of the measured deviation must not exceed the specified value v. r stands for the maximum reproducibility error (3 sigma) during assembly including changing the adjustment element 102, 102A, 102B of the same type. f stands for the maximum measurement error (3 sigma) in determining the deviation and Δs stands for the increment or spacer increment. Z stands for the nominal condition. With a favorable constellation that ensures a stable adjustment process, the following then applies: $$f\le \frac{\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102022207348A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}$$

$$v=t-f$$

$$\mathrm{right}\le \frac{\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102022207348A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}$$

$$\Delta s\le 0.4\ast t$$

If the above equations are observed, there is a maximum of one adjustment loop.

$$t\ge 4\ast r$$

14 shows the convergence. From the above equations, the minimum tolerance to be observed under the given boundary conditions of measurement error f and reproducibility error r can be deduced: $$t\ge 4\ast f$$

$$t\ge 4\ast \mathrm{right}$$

If these equations are observed, there is also a maximum of one adjustment loop. This means, for example, that if there is a measurement accuracy of 120 µm, a tolerance of +/-480 µm can be accepted. In order to be able to achieve a tolerance of 268 µm, the measuring error must not exceed 67 µm. In the 14 reference numeral 112 designates the measured value before the spacer. The reference number 114, on the other hand, designates the measured value after the spacer. The installation of the appropriate adjustment elements 102, 102A, 102B is referred to as “spacering”. $$\begin{array}{c}3{\sigma }_{\Delta pOs}=\sqrt{2}\ast \mathrm{right}\le \frac{\sqrt{2}\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102022207348A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}\\ 3{\sigma }_{\Delta mess}=\sqrt{2}\ast f\le \frac{\sqrt{2}t}{4}\end{array}\}3{\sigma }_{\Delta j\mathrm{and}st}=\sqrt{2{\mathrm{right}}^2+2{\mathrm{<figure-callout\; id="2"\; label="f"\; filenames="DE102022207348A1\_0015.png,DE102022207348A1\_0018.png"\; state="\{\{state\}\}">f</figure-callout>}}^2}\le \sqrt{2}\ast \frac{\sqrt{2}\mathrm{<figure-callout\; id="4"\; label="t"\; filenames="DE102022207348A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{4}=\frac{\mathrm{<figure-callout\; id="2"\; label="t"\; filenames="DE102022207348A1\_0015.png,DE102022207348A1\_0018.png"\; state="\{\{state\}\}">t</figure-callout>}}{2}$$

A general relationship can be described as follows: $$t_{min}=\frac{\Delta s}{2}+\sqrt{2{\mathrm{right}}^2+2{\mathrm{<figure-callout\; id="2"\; label="f"\; filenames="DE102022207348A1\_0015.png,DE102022207348A1\_0018.png"\; state="\{\{state\}\}">f</figure-callout>}}^2}+f=v_{min}+f$$

t _min stands for the minimum tolerance that can be maintained, Δs for the increment or the increment, r for the maximum reproducibility error (3 sigma) during assembly including changing the adjusting element 102, 102A, 102B of the same type, v _min for the minimum default value, where the absolute value of the measured deviation must not exceed the minimum specified value v _min , and f for the maximum measurement error (3 sigma) when determining the deviation. As described above, with otherwise ideal boundary conditions (r = 0 and t = 0), the set state never deviates more than Δs/2 from the desired state.

15 shows a schematic view of an embodiment of an optical system 200 for the projection exposure system 1.

The optical system 200 can be an illumination optics 4 as previously mentioned or a projection optics 10 as previously mentioned. The optical system 200 can therefore also be referred to as illumination optics 4 or as projection optics 10 . In the following, however, it is assumed that the optical system 200 is projection optics 10 .

The optical system 200 has a component 202 . The component 202 can be an optical element, in particular a mirror. The component 202 can be one of the mirrors M1 to M6, for example. The optical system 200 also includes a fixed world 204. The fixed world 204 can be any other component of the projection exposure system 1. For example, the fixed world 204 is a force frame or the like.

When manufacturing the optical system 200 and/or when replacing the component 202, it may be necessary to align or adjust the component 202 in space or with respect to the solid world 204. The component 202 is initially in an actual position IL. The component 202 can be aligned or adjusted in such a way that the component 202 is moved from the actual position IL to a setpoint position SL. In the setpoint position SL, the component is provided with the reference number 202' and is shown with dashed lines.

The component 202 basically has six degrees of freedom, namely three translational degrees of freedom in each case along the x-direction x, the y-direction y and the z-direction z and three rotational degrees of freedom in each case about the x-direction x, the y-direction y and the z-direction z. This means that both a position and an orientation of the component 202 can be determined or described using the six degrees of freedom.

Accordingly, the “position” of the component 202 is to be understood as meaning its coordinates or the coordinates of a measurement point provided on the component 202 with respect to the x-direction x, the y-direction y and the z-direction z. Accordingly, the “orientation” of the component 202 is to be understood in particular as its tilting with respect to the three directions x, y, z. This means that the component 202 can be tilted about the x-direction x, the y-direction y and/or the z-direction z. This results in the six degrees of freedom for the position and/or orientation of component 202.

The "position" of the component 202 includes both its position and its orientation. This means that the orientation and the position can also be referred to as position or the position can be referred to as orientation and position. The terms "location" and "orientation and position" can thus be interchanged as desired.

Accordingly, “adjusting” or “aligning” the component 202 means that both the orientation and the position of the component 202 can preferably be changed in order to move the component 202 from the actual position IL to the target position SL to spend. In the present example, the adjustment takes place in such a way that the component 202′ in its target position SL is displaced along the z-direction z and tilted about the x-direction x relative to the component 202 in its actual position IL.

The component 202 is adjusted by installing a nominal spacer 102′, for example, between the fixed world 204 and the component 202 . The component 202 is now in the actual position IL. However, assembly can also take place virtually. In order to bring the component 202 into the target position SL, several adjusting elements 102 of the adjusting element set 100A are used, for example, which make it possible to move the component 202 from its actual position IL into the target position SL.

16 12 shows a schematic block diagram of one embodiment of a method for designing the alignment element set 100A, 100B.

The method describes the previously explained design of the respective adjustment element set 100A, 100B. In the method, the total area G to be covered by the adjusting element set 100A, 100B, which is required to adjust the position of the component 202, 202', is determined in a step S1. In a step S2, the increment Δs of the adjustment elements 102, 102A, 102B is determined.

In a step S3, the probability is determined with which adjusting elements 102, 102A, 102B differing in height d102, d102A, d102B are required to adjust the position of component 202, 202'. In a step S4, a minimum required number of adjustment elements 102, 102A, 102B is also determined for each height d102, d102A, d102B.

Step S1 and/or step S2 are carried out with the aid of tests and/or a tolerance analysis. During step S3, a Gaussian distribution can be placed over the total area G determined during step S1. During step S4, the minimum required number of adjustment elements 102, 102A, 102B for each increment Δs can be calculated with the aid of a cumulative binomial distribution.

Furthermore, a safety factor can be taken into account during step S4. During step S1, the nominal adjustment element 102', 102A' can be used, which is added to the respective adjustment element set 100A, 100B.

As previously mentioned, the adjustment element set 100B can have coarse adjustment elements 102A and fine adjustment elements 102B, wherein during step S3 a probability is determined with which the coarse adjustment elements 102A, which differ from one another in their heights d102A, for adjusting the construction partly 202, 202' are required respectively. A Gaussian distribution can be placed over the entire area G of the coarse adjustment elements 102A, with the fine adjustment elements 102B being assumed to be uniformly distributed.

Although the present invention has been described using exemplary embodiments, it can be modified in many ways.

Reference List

1

projection exposure system

2

lighting system

3

light source

4

lighting optics

5

object field

6

object level

7

reticle

8th

reticle holder

9

reticle displacement drive

10

projection optics

11

image field

12

picture plane

13

wafers

14

wafer holder

15

Wafer displacement drive

16

illumination radiation

17

collector

18

intermediate focal plane

19

deflection mirror

20

first facet mirror

21

first facet

22

second facet mirror

23

second facet

100A

adjustment element set

100B

adjustment element set

102

adjustment element

102'

nominal adjustment element

102A

adjustment element

102A'

nominal adjustment element

102B

adjustment element

102B'

nominal adjustment element

104

outer surface

106

breakthrough

108

face

110

face

112

reading

114

reading

200

optical system

202

component

202'

component

204

solid world

C

cumulative probability

d102

Height

d102A

Height

d102B

Height

G

total area

IL

actual situation

M1

mirror

M2

mirror

M3

mirror

M4

mirror

M5

mirror

M6

mirror

N

number

p

probability

Δs

increment

SL

target position

S1

Step

S2

Step

S3

Step

S4

Step

t

tolerance

v

default value

x

x direction

y

y direction

e.g

z direction

Z

Condition

σ

Sigma

QUOTES INCLUDED IN DESCRIPTION

This list of documents cited by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Patent Literature Cited

• DE 102008009600 A1 [0050, 0054]
• US 2006/0132747 A1 [0052]
• EP 1614008 B1 [0052]
• US6573978 [0052]
• DE 102017220586 A1 [0057]
• US 2018/0074303 A1 [0071]

Claims (10)

Method for designing an adjusting element set (100A, 100B) with a plurality of adjusting elements (102, 102A, 102B) for adjusting a position of a component (202, 202') of a projection exposure system (1), with the following steps: a) Determination (S1) of a total area (G) to be covered by the adjusting element set (100A, 100B) that is required to adjust the position of the component (202, 202'), b) determining (S2) an increment (Δs) of the adjustment elements (102, 102A, 102B), c) determining (S3) a probability with which adjusting elements (102, 102A, 102B) differing in their geometry are required in each case for adjusting the position of the component (202, 202'), and d) determining (S4) a minimum required number of adjustment elements (102, 102A, 102B) for each geometry. procedure after claim 1 , wherein step a) and/or step b) is carried out with the aid of tests and/or a tolerance analysis. procedure after claim 1 or 2 , wherein during step c) a Gaussian distribution, a uniform distribution, an exponential distribution or the like is superimposed over the total area (G) determined during step a). Procedure according to one of Claims 1 - 3 , wherein during step d) the minimum number of adjustment elements (102, 102A, 102B) required for each geometry is calculated with the aid of a cumulative binomial distribution, a simulation or an actual consumption. procedure after claim 4 , wherein a safety factor is taken into account during step d). Procedure according to one of Claims 1 - 5 wherein during step a) a nominal adjustment element (102', 102A') is used which is added to the adjustment element set (100A, 100B). Procedure according to one of Claims 1 - 6 , wherein the adjustment element set (100B) has coarse adjustment elements (102A) and fine adjustment elements (102B), and wherein during step c) a probability is determined with which the coarse adjustment elements (102A), which differ from one another in their geometries, for adjusting the position of the component ( 202, 202') are required respectively. procedure after claim 7 , wherein a Gaussian distribution is placed over a total area (G) of the coarse adjustment elements (102A), and the fine adjustment elements (100B) are assumed to be uniformly distributed. Adjusting element set (100A, 100B) for adjusting a position of a component (202, 202') of a projection exposure system (1), the adjusting element set (100A, 100B) using the method according to one of Claims 1 - 8th is designed, and wherein the adjusting element set (100A, 100B) has a plurality of adjusting elements (102, 102A, 102A) which differ from one another in terms of their geometries. adjustment element set claim 9 , wherein the adjustment elements (102A, 102B) have coarse adjustment elements (102A) and fine adjustment elements (102B), and wherein an increment (Δs) of the coarse adjustment elements (102A) is greater than or an integer multiple of an increment (Δs) of the fine adjustment elements (102B).

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