DE102022127259A1 - Method and device for imaging a beam onto an object and method for making an opening in a workpiece by means of this method - Google Patents

Abstract

The invention relates to a method for imaging at least one beam (1) onto an object (2), wherein the beam (1) is deflected at least twice along its beam path (3) by an optical arrangement (4) by means of at least two optical scanners (6), changing the beam path (3) of the beam (1), and the beam (1) is additionally imaged onto the object (2) by means of imaging optics (7) after its deflection, and a focus region (8) of the beam (1) is placed onto and/or in the object (2) by means of the imaging optics (7). In this case, at least one pivoting movement of a beam section (9) of the beam (1) is generated by means of the scanner (6), in which the pivot point (10) of the beam section (9) lies in the beam path (3) in front of or in the imaging optics (7) and the pivoting movement and/or at least one rotational movement (15) about the pivot point (10) causes a movement of the focus area (8) in at least one spatial direction (X) perpendicular to the optical axis of the imaging optics (7). The invention further relates to a method for introducing at least one opening into the object (2) formed as a workpiece (11) made of a transparent material by means of the above-mentioned method, and to a device for imaging the beam (1) on the object (2).

Description

The invention relates to a method and a device for imaging at least one beam onto an object, wherein the beam is deflected along its beam path at least twice by an optical arrangement using at least two optical scanners, changing the beam path of the beam, and the beam is also imaged onto the object after its deflection by means of imaging optics, and by imaging by means of the imaging optics a focus area of the beam is placed on and/or in the object.

Furthermore, the invention relates to a method for introducing at least one opening into the object formed as a workpiece made of a transparent material by means of the above-mentioned method.

Due to its optical, electrical, chemical and mechanical properties, glass is highly suitable for replacing silicon, for example, not only as a carrier, but also as a directly structured volume material at comparatively low cost, opening up a wide range of possible applications. These range from micro- and nanoelectronics to microelectromechanical systems (MEMS) and applications in the field of microfluidics to use in system packaging. An important prerequisite for this, however, is the availability of a glass processing method that enables the creation of precise structures of very small dimensions in the glass and thus micro-processing of the glass with preferably high freedom of shape of the structures in conjunction with short processing times.

In principle, a wide range of glass processing methods are already known from the state of the art, with grinding, etching or laser ablation processes being used to process the glass. However, these processes have the disadvantage of long processing times and little freedom of shape. In some cases, the processes mentioned also introduce undesirable defects into the glass, for example in the form of chipping, microcracks or thermally induced stresses.

Another method known from the state of the art that does not have these disadvantages is micro-machining of the glass using laser-induced deep etching. This method is known as LIDE (Laser Induced Deep Etching). The LIDE method enables extremely precise structures to be created in extremely short processing times and thus creates the conditions for the increased use of glass as a material in the applications mentioned above.

The LIDE process is in contrast to a process known as selective laser-induced etching, also known as ISLE (In-volume Selective Laser-induced Etching), which is suitable for creating structures from and in transparent materials. For this, laser radiation is focused almost point-like inside a transparent material such as glass, whereby the material is structurally and/or chemically changed in a small volume of just a few cubic micrometers. The changed volumes can then be etched at an etching rate that is ten times higher than unchanged material. Due to the small volumes that have been changed due to the point-like focusing of the laser beam, an extremely high number of pulse sequences are necessary for structuring. However, this in turn leads to long processing times.

On the other hand, in the case of, for example, WO 2014 / 161 534 A2 and the WO 2016 / 041 544 A1 In known laser-induced deep etching, a transparent material, in particular glass, is modified by means of a laser pulse or a pulse sequence over an elongated area along the beam axis, so that the modification is again etched anisotropically in a subsequent wet-chemical etching bath. The modification often takes place over the entire thickness of the transparent material, for example over the entire thickness of a glass plate.

From the WO 2021 / 239 302 A1 A similar method is also known for creating a recess, for example a blind hole, in a transparent material by means of laser-induced deep etching, whereby the modification of the material also takes place over the entire elongated area of the recess to be formed. The modification is achieved by the focus area of the laser beam having a spatial extension in the beam direction and thus a beam formation, as opposed to a point-shaped design. Through this spatial extension or extension of the focus area of the laser beam in the beam direction, an intensity sufficiently high to modify an area over its length can be coupled into the transparent material.

The aforementioned embodiments of laser-induced deep etching, but in particular the WO 2021 / 239 302 A1 also describe the modification of several parallel aligned areas, partially overlapping, so that, for example, larger, flat structures can also be formed in a transparent material. For this purpose, a laser head, which emits the laser beam causing the modification, is regularly moved along at least one linear axis and at least one laser pulse is emitted at the areas to be modified during the process. Despite the short processing times that can already be provided by laser-induced deep etching, this design disadvantageously limits the shorter processing times that can be achieved, since accelerations and speeds of linear axes are comparatively limited, particularly due to high masses.

In this context, however, it is already known from the prior art to deflect a laser beam by means of an optical scanner system, for example by means of at least one galvanometer scanner, in order to increase the area that can be covered by a laser beam in a short period of time.

However, the use of scanner systems for deflecting laser beams, which have the aforementioned beam shaping, is problematic, especially in combination with standard optics commonly used to project the laser beam onto the material, since this causes a disturbance in the beam shaping of the laser beam, so that the extended focus range cannot be guaranteed.

However, state-of-the-art solutions are already being proposed to circumvent this problem.

So from the US 2014 / 0 008 549 A1 a method and a device for creating a volumetric image of a sample with an extended depth of field by means of laser scan imaging are known. For this purpose, a laser beam with an extended focus area in the area of the image to be recorded is used, which is deflected over two scanner mirrors, i.e. in two spatial directions. To provide the extended focus area on the sample, a Bessel-like, non-diffracting beam is generated from the laser beam initially emitted by a laser source using an axicon. Before each deflection, this is transformed by one of the two scanner mirrors into a ring beam with a focus on the scanner mirror using a converging lens in order to avoid distortions of the laser beam during deflection. After each deflection, the beam is again transformed back into a non-diffracting beam using an achromatic lens. To provide the beam with an extended focus area for recording the sample, this is focused again by a converging lens to form a ring beam, with the focus being placed on the rear focal plane of the objective that images the beam onto the sample. The imaging lens is used to repeatedly transform the beam into a non-diffracting, Bessel-like beam, which has an extended focus area on the sample. The complex optical structure chosen here, however, has the disadvantage of creating superpositions of imaging errors, which are impressed on the beam by the large number of optical elements. In addition, the structure chosen for a microscopy system is largely unsuitable for an application in the field of laser processing due to the optical elements that are sometimes required.

Against this background, the invention is based on the object of providing a method and a device of the type mentioned at the outset, which have an optical structure adapted for use in a laser processing application and, moreover, simplified.

This object is achieved according to the invention with a method according to the features of claims 1 and 2 and with a device according to the features of claim 12.

The further embodiment of the invention can be taken from the subclaims.

According to the invention, a method is therefore provided for imaging at least one beam of electromagnetic radiation, in particular a laser beam of laser radiation, onto an object. Such a beam, in particular a pulsed beam, would preferably first be emitted by a beam source, in particular a laser source, of the optical arrangement.

In this case, the beam emitted in particular is deflected along its beam path through an optical arrangement by means of an optical scanner system of the optical arrangement, changing the beam path or a propagation direction of the beam. For this purpose, the scanner system has at least two optical scanners, via which the beam is deflected at least twice at a predetermined and/or predeterminable, variable angle.

The beam or radiation is not subject to any further refraction before and/or between each deflection. Thus, at least between each deflection, the beam does not pass through any further optical element that refracts the beam, such as a converging lens, which significantly simplifies the optical structure. and avoids undesirable imaging errors. However, any disturbance to any existing beam formation caused by deflection of the beam requires correction.

Thus, according to the invention, after the beam has been deflected, it is imaged onto the object by means of an imaging optic, whereby the imaging by means of the imaging optic places a focus area of the beam on and/or in the object. The invention further provides that the scanner system is used to generate at least one pivoting movement of a beam section emerging from the scanner system, in which the pivot point or rotation point of the beam section lies in the beam path in front of or in the imaging optic. The pivoting movement and/or at least one rotational movement around the pivot point causes the focus area to move in at least one spatial direction perpendicular to the optical axis of the imaging optic. By placing the pivot point of the beam section in front of and/or in the imaging optic, undesirable imaging errors introduced into the beam by the deflection are advantageously avoided. This is particularly possible without the use of special imaging optics to avoid such undesirable imaging errors. On the other hand, standard optics that are usually used for imaging the beam onto the object can be used as imaging optics.

In addition, the invention provides a method for introducing at least one opening, in particular a recess and/or an opening, into the object designed as a workpiece, preferably as a substrate, made of a transparent material, in particular glass. In this case, a modification of the material of the workpiece is produced by means of the above-described method according to the invention for imaging the beam at least in the focus area of the beam, but in particular exclusively in the focus area of the beam. This is done without any removal of the material as a result of the action of the radiation of the beam, so that the opening is subsequently produced in the workpiece by the action of an etching medium through an anisotropic removal of the material in the respective area of the modification. The removal of the material therefore occurs exclusively as a result of the etching effect of the etching medium and not as a direct result of the action of the beam or the radiation of the beam. Although the etching rate of the modification or modifications is several orders of magnitude higher than that of an unmodified material, the workpiece can additionally be provided with a mask, in particular an etching mask, preferably made of a structured photoresist, in which the areas to be etched are exposed.

Each modification would preferably be generated by at least one pulse of the beam, whereby in order to generate several modifications, e.g. at different positions on the workpiece, the beam or the focus area of the beam is moved over the workpiece between the pulses of the beam by deflection. In this way, non-connected or connected, even overlapping modifications can be generated in the workpiece, which are removed during the subsequent action of the etching medium and which form at least one opening in the workpiece. By generating several connected modifications, structures with a high degree of freedom of form can be formed in the workpiece, correspondingly composed of a large number of individual openings.

By moving the focus area by deflecting it via the optical scanners to create a variety of modifications, a significant reduction in processing times can be achieved while maintaining a high degree of freedom of shape, especially in comparison with a standard LIDE process.

The area that can be covered by the deflection of the beam and thus the movement of the focus area in each spatial direction, in which the modifications could also be generated, in particular without superimposing another movement, can be up to plus/minus ten millimeters around a central axis or a center point. This with an extremely small position error of the focus area and therefore of the modifications of less than ten micrometers.

In a particularly advantageous development of the invention, a respective rotational movement of the beam section about - exclusively - one axis of rotation of the pivot point and thus a respective linear movement of the focus area in a - single - spatial direction is carried out via two interacting rotational movements of two optical scanners about their two mutually parallel rotational axes, which deflect the beam in the beam path. The two scanners form a scanner pair. By using two scanners with rotational axes aligned parallel to one another to move the focus area of the beam in a single spatial direction, undesirable imaging errors of the beam and in particular of the focus area, which would occur when using only one scanner, can be advantageously easily eliminated. den, profitably minimize or even avoid.

An embodiment of the invention is also extremely profitable if two rotational movements of the beam section around, in particular perpendicular to one another, axes of rotation of the pivot point are superimposed for the linear movement of the focus area in two spatial directions. In this way, the focus area of the beam or the beam striking the object or workpiece could not only be moved along a line but also two-dimensionally, over a surface. To carry out the two rotational movements of the beam section around the pivot point, the beam would be deflected for each rotational movement over two and thus a total of four rotational axes to two groups of two rotational axes, with the rotational axes of the two groups being aligned perpendicular to one another. The rotational axes would be provided accordingly by the optical scanners, with a group of two rotational axes consequently being formed by a pair of scanners.

Furthermore, in a promising embodiment of the invention, it is provided that the two rotational movements of a scanner pair, which cause a rotational movement of the beam section around - exclusively - a rotational axis of the pivot point, interact and deflect the beam in the beam path, are designed asynchronously. This asynchronous movement can advantageously cause the pivoting movement of the beam around at least one scanner of the scanner pair, in particular the second or rear scanner of the scanner pair in the beam path of the beam. At least one of the absolute angle, angular velocity and/or angular acceleration of the scanners, in particular of a deflection element of the scanners, should differ from one another.

It should also be mentioned that there is basically the possibility that the beam formed in at least one of the methods has a Gaussian focus in general, but in particular in the focus area of the beam on and/or in the object or workpiece. This would therefore correspond to a design without beam shaping of the beam and thus an extended focus area. Any imaging errors that may occur could nevertheless be advantageously avoided.

However, in a preferred development of the invention, a beam shape is imposed on the beam as it passes through the optical arrangement using beam shaping optics, whereby a focus area that is extended in the direction of the beam path is imaged on and/or in the object and extends over at least part of a dimension of the object that is formed in the direction of the beam path. As already mentioned at the beginning, the extended focus area can be used to significantly reduce the processing times of the object, which is in particular formed as a workpiece, in the context of a LIDE process compared to a point-shaped focus, and thus increase the throughput.

The beam can be shaped by beam shaping optics, which are designed, for example, as an axicon, a diffractive optical element (DOE) or as a spatial modulator for light, also known as a spatial light modulator (SLM). This would allow the beam to be designed in particular as a Bessel-like beam. In a widely preferred embodiment, however, the beam shaping would take place by imposing a spherical aberration, which also causes an extended, in particular cigar-shaped, focus area of the beam. For such beam shaping, the beam shaping element should preferably be designed as a particularly plane-parallel quartz plate.

In a further advantageous embodiment of the invention, the beam shaping is also carried out by means of the beam shaping optics before the beam enters the optical scanner system of the arrangement. In this way, the formation of imaging errors can be avoided by shaping a deflected beam that strikes the beam shaping element at an angle.

A highly practical design of the invention is also based on the fact that a respective focus area of the beam, whose beam path changes due to the optical arrangement due to the deflection, is imaged by the imaging optics onto a single, in particular common, focus plane on which the respective focus area lies or from which the respective focus area extends into the object. The focus area, which is therefore always on the focus plane or extends from the focus plane, can advantageously ensure an intensity of the beam in the focus area that acts on the object and in particular the material of the workpiece. This also results in a uniform or similar generation of several modifications in the material of the workpiece. For this purpose, the imaging optics should preferably be designed as at least one f-theta lens.

In a no less advantageous embodiment, the invention further provides that the imaging of a respective focus area by the Imaging optics are telecentric. In this way, the focus area of the beam would always be aligned parallel to the optical axis of the imaging optics, whereby modifications in the workpiece that are always aligned in the same direction and thus do not differ in their angular orientation in the workpiece can be created. This is possible with the appropriate alignment of the object or workpiece, in particular perpendicular to the surface of the object or workpiece. For this purpose, the imaging optics should preferably be designed as at least one telecentric f-theta lens.

A particularly promising development of the invention is also described in that the linear movement of the focus area in at least one spatial direction is superimposed with at least one additional movement, in particular a linear movement, of a travel axis. In this case, the travel axis is part of a device, with at least part of the optical arrangement belonging to the device being arranged on the travel axis. The travel axis is in particular designed as a linear axis. By combining the movement of the focus area by deflecting the beam via in particular one or two pairs of scanners with the additional movement of at least one travel axis, workpieces can also be processed whose dimensions exceed the maximum possible deflection of the beams or the resulting possible movement section of the focus area, and the workpiece can therefore preferably be processed over its entire extent with very high processing speeds and thus short processing times. In addition, modifications can be made in the workpiece which individually and/or contiguously follow a virtually arbitrary trajectory, e.g. in the form of a spline. The respective possible directions of movement of the focus area and the travel axis do not have to be aligned parallel and/or perpendicular to each other. However, an alignment at virtually any angle is conceivable, for example an angle of 45 degrees.

In particular in connection with the above development, but also in general, an embodiment of the invention is to be regarded as advantageous in which the additional movement of the travel axis is at least partially corrected and/or at least partially compensated by the superimposition of the - linear - movement of the focus area in at least one spatial direction with the at least one additional - linear - movement of the travel axis. With the same direction of movement of the focus area and the travel axis, the movement of the focus area could be superimposed in this way, in particular in redundancy to the movement of the travel axis, and thus, for example, a resolution of the positioning of modifications compared to the resolution provided by the travel axis itself in the workpiece could be increased. In addition, the movement of the travel axis can also be completely compensated by the movement of the focus area. This is the case, for example, when several modifications are to be created in the direction of movement of the travel axis in exactly the same position or in the same position but with an offset, e.g. transverse to the direction of movement of the travel axis in the workpiece. A very high degree of freedom of form of structures created in the workpiece can thus be guaranteed with outstanding precision.

Furthermore, according to the invention, a device with an optical arrangement is also envisaged, in particular for carrying out at least one of the methods explained above. The optical arrangement of the device has a beam source, in particular a laser source, for emitting a beam of electromagnetic radiation, in particular a laser beam of laser radiation, and an optical scanner system. The scanner system is in turn designed with at least two optical scanners, each with at least one rotatable deflection element for deflecting the beam. In this context, it should be noted that no further, in particular optically refractive element is arranged in the beam path between the scanners. In addition, the optical arrangement has at least one imaging optics through which the beam can be imaged onto an object and through the imaging by means of the imaging optics a focus area of the beam can be placed on and/or in the object. According to the invention, two scanners each form a scanner pair, with the rotation axes of the scanners belonging to a respective scanner pair being aligned parallel to one another. The optical arrangement has at least one scanner pair or at least two, preferably only two, scanner pairs. It should be noted that the rotation axes or the groups of rotation axes of the scanners of the different scanner pairs are aligned perpendicular to each other. Using the device according to the invention, at least some of the methods according to the invention can be carried out advantageously, with a significantly simplified optical structure of the optical arrangement. In this way, undesirable imaging errors can be avoided and at the same time disturbances caused by deflecting the beam in any beam formation can be corrected by placing a pivot point or rotation point of a beam section emerging from the scanner system in the beam path in front of or in the imaging optics via the scanner system. In addition to the optical arrangement, the device would also have at least one travel axis on which at least part of the optical arrangement is arranged.

In a particularly advantageous development of the invention, the optical arrangement also has beam-forming optics, by means of which beam formation can be imposed on the beam. As already explained above, the beam-forming optics are designed, for example, as an axicon, a diffractive optical element (DOE), as a spatial modulator for light, also known as a spatial light modulator (SLM), or as a particularly plane-parallel quartz plate and/or are preferably arranged after the beam source and before the optical scanner system.

• 1 eine Weiterbildung einer erfindungsgemäßen Vorrichtung;
• 2a bis 3b Weiterbildungen der erfindungsgemäßen Verfahren.

The invention allows for various embodiments. To further clarify its basic principle, some of them are shown in the drawings and are described below. These drawings show in

• 1 a further development of a device according to the invention;
• 2a to 3b Further developments of the inventive methods.

The 1 shows a further development of an optical arrangement 4, wherein the optical arrangement 4 has the beam source 19 for emitting the beam 1, the beam shaping optics 16, the scanner system 5 having the two optical scanners 6, each with a rotatable deflection element, here a mirror, for deflecting the beam 1, and the imaging optics 7.

After the beam 1 exits from the beam source 19, the beam 1 is given a beam shape by means of the beam shaping optics 16 following the beam source 19 in the beam path 3.

The beam 1 is then deflected twice by the optical scanner system 5 following the beam forming optics 16 in the beam path 3 at a predetermined, variable angle, each time changing the beam path 3 of the beam 1, in order to be imaged at different positions on the workpiece 11 and thereby to produce a modification 20 of the material of the workpiece 11 in the focus area 8 of the beam 1, wherein the focus area 8 of the beam 1 in the development of the 1 is placed in the workpiece 11. The deflection of the beam 1 is carried out via the two scanners 6 of the scanner system 5.

In order to avoid a disruption of the beam shaping imposed on the beam 1 via the beam shaping optics 16, a pivoting movement of the beam section 9 of the beam 1 emerging from the scanner system 5 is generated by means of the scanner system 5 and in particular by means of the scanner 6 following the first scanner 6 in the beam path 3 and arranged in front of the imaging optics 7, in which the rotation or pivot point 10 of this beam section 9 lies in the beam path 3 in the imaging optics 7. The pivoting movement thus results in the rotational movement 15 of the beam 1 about the pivot point 10, which in turn causes a movement of the focus area 8 in the spatial direction X perpendicular to the optical axis of the imaging optics 7 in this development.

In this context, it should be noted that the 1 shows beam 1 in a very simplified form in its beam profile, whereby only one beam path 3 of beam 1 is shown.

The special feature of the deflection of the beam 1 via the scanner system 5, which was only briefly outlined above, is that the rotational movement 15 of the beam section 9 about the axis of rotation 12 of the pivot point 10 and thus also the linear movement of the focus area 8 in the spatial direction X is carried out via two interacting rotational movements 13 of the scanners 6 about their two mutually parallel rotational axes 14, which deflect the beam 1 in the beam path 3. The two scanners 6 form a scanner pair, with the rotational movements 13 of the scanners 6 of the scanner pair being asynchronous.

By impressing the beam shaping and imaging the beam 1 having the beam shaping via the imaging optics 7, a focus area 8 extended in the direction of the beam path 3 is imaged on or in the workpiece 11, which in this development extends over the entire dimension formed in the direction of the beam path 3, here the thickness of the workpiece 11. The extended focus area 8 thus causes a modification 20 of the material of the workpiece 11 over the entire thickness of the workpiece 11, so that an opening, here a breakthrough in the workpiece 11, is created by an etching step following the modification 20.

In order to be able to ensure a substantially constant intensity of the beam 1 in the focus area 8 acting on the material of the workpiece 11 in the case of several modifications 20 to be produced at different positions in the workpiece 11, the respective focus area 8 producing a modification 20 of the beam 1 deflected for positioning and thus changing in its beam path 3 is telecentrically focused by the imaging optics 7 onto a single focus plane 17. from which the respective focus area 8 extends into the workpiece 11.

From the 2a and 2 B and 3a and 3b also show further developments of the method according to the invention. These figures show that the movement of the focus area 8 in the spatial directions X, Y is superimposed with an additional movement of the travel axis 18 in the direction of movement Y', which coincides with the spatial direction Y. This allows modifications 20 to be made in the focus areas 8 in the 1 produce the workpiece 11 shown in more detail, which as shown in the 2a and 3a isolated or as in the 2 B and 3b are trained.

It is possible that the focus areas 8 and thus the modifications 20 as in the 2a and 2 B shown follow a virtually arbitrary trajectory, here in the form of a spline, so that depending on the pulse sequence of the 1 shown beam 1, as in 2a , individual openings or, as in 2 B , cuts are produced by overlapping several openings in the workpiece 11. In the further development of the 2a and 2 B For this purpose, the movement of the focus area 8 in only the spatial direction X is superimposed with the movement of the travel axis 18 in its direction of movement Y', whereby the spatial direction X and the direction of movement Y' are perpendicular to one another.

By superimposing the movement of the focus area 8 in the spatial directions X, Y with the additional movement of the travel axis 18 in its direction of movement Y', the additional movement of the travel axis 18 can also be at least partially corrected and/or at least partially compensated.

This way, as in 3a shown, the movement of the focus area 8 is superimposed, in particular in redundancy, on the movement of the travel axis 18 and thus, for example, increases a resolution of the positioning of the modifications 20 compared to the resolution provided by the travel axis 18 itself in the workpiece 11.

In addition, the movement of the travel axis 18 can also be completely compensated by the movement of the focus area 8. This is particularly the case when, as in 3b , in the direction of movement Y' of the travel axis 18, several modifications 20 are generated at the same position, but with an offset transverse to the direction of movement Y' in the spatial direction X in the workpiece 11.

LIST OF REFERENCE SYMBOLS

1

beam

2

object

3

Beam path

4

optical arrangement

5

Scanner system

6

scanner

7

Imaging optics

8th

Focus area

9

Beam section

10

Pivot point

11

workpiece

12

Rotation axis

13

Rotational movement

14

Rotation axis

15

rotational movement

16

Beam shaping optics

17

Focal plane

18

Travel axis

19

Beam source

20

Modification

X, Y

Spatial direction

Y'

Direction of movement

QUOTES INCLUDED IN THE DESCRIPTION

This list of documents listed by the applicant was generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA accepts no liability for any errors or omissions.

Cited patent literature

• WO 2014161534 A2 [0007]
• WO 2016041544 A1 [0007]
• WO 2021239302 A1 [0008, 0009]
• US 20140008549 A1 [0013]

Claims (13)

Method for imaging at least one beam (1) of electromagnetic radiation onto an object (2), wherein the beam (1) is deflected via its beam path (3) by an optical arrangement (4) by means of an optical scanner system (5) of the optical arrangement (4), having at least two optical scanners (6), at least twice with a predetermined and/or predeterminable, variable angle, each time changing the beam path (3) of the beam (1), and the beam (1) is not subject to refraction between each deflection, the beam (1) is also imaged onto the object (2) by means of an imaging optics (7) after its deflection, and by imaging by means of the imaging optics (7) a focus area (8) of the beam (1) is placed on and/or in the object (2), characterized in that at least one pivoting movement of a beam section (9) of the beam (1) emerging from the scanner system (5) is generated by means of the scanner system (5), in which the pivot point (10) of the Beam section (9) in the beam path (3) in front of or in the imaging optics (7) and the pivoting movement and/or at least one rotational movement (15) about the pivot point (10) causes a movement of the focus area (8) in at least one spatial direction (X, Y) perpendicular to the optical axis of the imaging optics (7). Method for introducing at least one opening into the object (2) formed as a workpiece (11) made of a transparent material, wherein by means of the method according to Claim 1 a modification (20) of the material of the workpiece (11) is produced at least in the focus region (8) of the beam (1), without any removal of the material occurring as a result of the action of the beam (1), so that the opening is subsequently produced by the action of an etching medium through an anisotropic removal of the material in the respective region of the modification (20) in the workpiece (11). Procedure according to Claim 1 or 2 , characterized in that a respective rotational movement (15) of the beam section (9) about a rotation axis (12) of the pivot point (10) and thus a respective linear movement of the focus area (8) in a spatial direction (X, Y) is carried out via two interacting rotational movements (13) of two optical scanners (6) forming a scanner pair about their two mutually parallel rotation axes (14) which deflect the beam (1) in the beam path (3). Method according to at least one of the preceding claims, characterized in that for the linear movement of the focus area (8) in two spatial directions (X, Y), two rotational movements (15) of the beam section (9) about two axes of rotation (12) of the pivot point (10) are superimposed. Method according to at least one of the preceding claims, characterized in that the rotational movements (13) of the scanners (6) of a scanner pair are asynchronous. Method according to at least one of the preceding claims, characterized in that the beam (1) is given a beam shape via its beam path (3) by the optical arrangement (4) by means of a beam shaping optics (16), so that a focus region (8) extended in the direction of the beam path (3) is imaged on and/or in the object (2), which extends over at least part of the dimension of the object (2) formed in the direction of the beam path (3). Method according to at least one of the preceding claims, characterized in that the beam shaping is applied by means of the beam shaping optics (16) before the beam (1) enters the optical scanner system (5). Method according to at least one of the preceding claims, characterized in that a respective focus region (8) of the beam (1) changing in its beam path (3) through the optical arrangement (4) due to the deflection is imaged by the imaging optics (7) onto a focus plane (17) on which the respective focus region (8) lies or from which the respective focus region (8) extends. Method according to at least one of the preceding claims, characterized in that the imaging of a respective focus area (8) by the imaging optics (7) takes place telecentrically. Method according to at least one of the preceding claims, characterized in that the movement of the focus region (8) in at least one spatial direction (X, Y) is superimposed with at least one additional movement of a travel axis (18) belonging to a device, on which at least part of the optical arrangement (4) belonging to the device is arranged. Method according to at least one of the preceding claims, characterized in that by superimposing the movement of the focus area (8) in at least one spatial direction (X, Y) with the at least one additional movement of the travel axis (18), the additional movement movement of the travel axis (18) is at least partially corrected and/or at least partially compensated. Device with an optical arrangement (4), in particular for carrying out a method according to at least one of the preceding claims, wherein the optical arrangement (4) has a beam source (19) for emitting a beam (1) of electromagnetic radiation, a scanner system (5) having at least two optical scanners (6), each with at least one rotatable deflection element for deflecting the beam (1), and at least one imaging optics (7) by means of which the beam (1) can be imaged onto an object (2) and by imaging by means of the imaging optics (7) a focus area (8) of the beam (1) can be placed onto and/or into the object (2), wherein no further optical element is arranged in the beam path (3) between the scanners (6), characterized in that two scanners (6) each form a scanner pair, the rotation axes (14) of which are aligned parallel to one another and the optical arrangement (4) has at least one scanner pair or at least two scanner pairs and the rotation axes (14) of the scanner pairs are aligned perpendicular to one another. Device according to Claim 12 , characterized in that the optical arrangement (4) has a beam-forming optics (16) by means of which a beam shape can be imposed on the beam (1).

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