DE102016108656A1 - Power electronic assembly with vibration-free contacting - Google Patents

Power electronic assembly with vibration-free contacting Download PDF

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Publication number
DE102016108656A1
DE102016108656A1 DE102016108656.8A DE102016108656A DE102016108656A1 DE 102016108656 A1 DE102016108656 A1 DE 102016108656A1 DE 102016108656 A DE102016108656 A DE 102016108656A DE 102016108656 A1 DE102016108656 A1 DE 102016108656A1
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Prior art keywords
semiconductor
electrical conductor
contacting
power electronic
electronic assembly
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DE102016108656.8A
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German (de)
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Ronald Eisele
Frank Osterwald
Holger Ulrich
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Danfoss Silicon Power GmbH
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Danfoss Silicon Power GmbH
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Priority to DE102016108656.8A priority Critical patent/DE102016108656A1/en
Priority to PCT/EP2017/061297 priority patent/WO2017194661A1/en
Publication of DE102016108656A1 publication Critical patent/DE102016108656A1/en
Ceased legal-status Critical Current

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Laser Beam Processing (AREA)

Abstract

Leistungselektronische Baugruppe mit einem Substrat, einem auf dem Substrat angeordneten Halbleiter, einem auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einem den Metallkörper kontaktierenden elektrischen Leiter, dadurch gekennzeichnet, dass der elektrische Leiter mit dem Metallkörper mittels Laserschweißen kontaktiert ist.A power electronic assembly comprising a substrate, a semiconductor disposed on the substrate, a semiconductor body contacting the semiconductor, and an electrical conductor contacting the metal body, characterized in that the electrical conductor is contacted to the metal body by laser welding.

Description

Die Erfindung betrifft eine leistungselektronische Baugruppe mit vibrationsfreier Kontaktierung. Insbesondere betrifft die Erfindung eine leistungselektronische Baugruppe mit einem Substrat, einem auf dem Substrat angeordneten Halbleiter, einem auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einem den Metallkörper kontaktierenden elektrischen Leiter.The invention relates to a power electronic assembly with vibration-free contact. More particularly, the invention relates to a power electronic assembly comprising a substrate, a semiconductor disposed on the substrate, a metal body contacting the semiconductor, and an electrical conductor contacting the metal body.

Eine derartige leistungselektronische Baugruppe ist beispielsweise aus der EP 2 766 922 A1 bekannt.Such a power electronic assembly is for example from the EP 2 766 922 A1 known.

Grundsätzlich führen Leistungsbauelemente einen sehr hohen Strom, beispielsweise von 20 bis 250 A, und entfalten dabei eine sehr hohe Stromdichte von etwa 150–200 A/cm2. Moderne Leistungshalbleiter ermöglichen zudem das Schalten mit sehr hohen Frequenzen, welches vor allem in den steilen Schaltflanken des Stromanstiegs beim Einschalten aufgrund der üblicherweise mit parasitären Induktivitäten belegten Leiterbahnführung üblicherweise zu Überspannungen in den Spannungsverläufen führt. Zudem führen die hohen Frequenzanteile in den Schaltflanken teilweise zu einer Stromverdrängung in den Leitern, die als Skin-Effekt bekannt ist.In principle, power devices carry a very high current, for example from 20 to 250 A, and thereby develop a very high current density of about 150-200 A / cm 2. Modern power semiconductors also make it possible to switch at very high frequencies, which usually leads to overvoltages in the voltage curves, especially in the steep switching edges of the current increase at power-up due to the conductor track guidance usually occupied by parasitic inductances. In addition, the high frequency components in the switching edges partly lead to a displacement of current in the conductors, which is known as the skin effect.

Moderne Leistungsmodule müssen daher durch geeigneten Entwurf und durch hinreichend stromtragfähig ausgelegte Leitungs- und Anschluss-Querschnitte auf die hohe Stromdichte, die Überspannungen und gegebenenfalls den Skin-Effekt Rücksicht nehmen.Modern power modules must therefore take into account the high current density, the overvoltages and possibly the skin effect by suitable design and by sufficiently current-carrying designed line and connection cross-sections.

Insbesondere hinsichtlich der niederinduktiven Kontaktierung von Leistungshalbleitern sind sogenannte planare Aufbau-Technologien durchaus vorteilhaft. Hierfür ist beispielsweise ein Aufbau bekannt, der durch galvanisches Plating auf den Leistungshalbleitern befestigte und von diesen über eine Isolationsschicht geführte Anschlüsse aufweist. Diese Technik ermöglicht sehr niederinduktive Anschlussgeometrien, ist aber hinsichtlich der Stromtragfähigkeit – vor allem auch, wenn der Skin-Effekt auftritt – stark begrenzt. Auch schlägt dieses Verfahren mit hohen Kosten zu Buche, so dass eine Verbreitung dieser Technik bislang ausgeblieben ist.In particular with regard to the low-inductive contacting of power semiconductors, so-called planar build-up technologies are quite advantageous. For this purpose, for example, a structure is known, which has been attached to the power semiconductors by galvanic plating and has these connections via an insulation layer. This technique enables very low-inductive connection geometries, but is severely limited in terms of current carrying capacity - especially when the skin effect occurs. Also, this process with high costs to book, so that a dissemination of this technique has been missing.

Einen ähnlichen Ansatz verfolgt auch die sogenannte „Embedding-Technik“ von Leistungshalbleitern in Leiterplatten. Auch bei diesem Verfahren werden die oberseitigen Anschlüsse der Halbleiter durch galvanisches Plating ausgeführt. Ähnliche Begrenzungen gelten hier.A similar approach is followed by the so-called "embedding technique" of power semiconductors in printed circuit boards. Also in this method, the top-side terminals of the semiconductors are formed by electroplating. Similar limitations apply here.

Beide Verfahren sind erst ab sehr großen Produktionsvolumina wirtschaftlich und sehr kostenintensiv für Design-Änderungen und bei Kleinserien.Both methods are only economical from very large production volumes and very cost-intensive for design changes and for small batches.

Die traditionelle Kontaktierung mittels Al-Drahtbonds hingegen gerät bei modernen Leistungsmodulen immer mehr an die Grenze der Stromtragfähigkeit von Al-Drähten. Diese sind bei immer kleineren Halbleitern mit immer höherer Stromdichte nicht mehr in der Lage den Strom zu tragen. Zudem müssen sie, um eine hinreichende thermomechanische Belastbarkeit zu erreichen mit vergleichsweise hohen Loops ausgeführt werden. Eine große Loophöhe wiederum führt zu einer unerwünschten parasitären Induktivität.In contrast, traditional contacting using Al wire bonds is increasingly reaching the limits of current carrying capacity of Al wires in modern power modules. These are no longer able to carry the current in ever smaller semiconductors with ever higher current density. In addition, in order to achieve a sufficient thermo-mechanical load capacity, they must be designed with comparatively high loops. In turn, a large loop height results in unwanted parasitic inductance.

Ähnliches gilt für die Ribbonkontaktierung mittels Ultraschall-gestützten Bondverfahren:
Sowohl beim Drahtbonden als auch beim Ribbon-Bonden stellen die Reibschweißkontakte einen „Bottle-neck“ für den Stromfluss dar. Direkt auf die dünne Halbleitermetallisierung gebondete Drähte oder Bändchen können kaum genügend Strom über die dünne Halbleitermetallisierung und die oft zu kleine metallische Kontaktstelle aufnehmen, sodass ein erhöhter Widerstand und eine lokale thermische Überlast die Folge ist.
The same applies to ribbon bonding by means of ultrasound-supported bonding methods:
Both in wire bonding and ribbon bonding, the friction welding contacts provide a "bottle-neck" for the current flow. Wires or ribbon bonded directly to the thin semiconductor metallization can hardly absorb enough current through the thin semiconductor metallization and the often too small metallic pad an increased resistance and a local thermal overload is the result.

Aufgabe der Erfindung ist es daher, eine Halbleiter-Oberseitenkontaktierung mit möglichst hoher Stromtragfähigkeit zum Schalten mit steilen Anstiegsflanken bereitzustellen. The object of the invention is therefore to provide a semiconductor Oberseitenkontaktierung with the highest possible current carrying capacity for switching with steep rising edges.

Erfindungsgemäß ist also eine leistungselektronische Baugruppe mit einem Substrat, einem auf dem Substrat angeordneten Halbleiter, einem auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einem den Metallkörper kontaktierenden elektrischen Leiter vorgesehen, wobei der elektrische Leiter mit dem Metallkörper mittels Laserschweißen kontaktiert ist.According to the invention, therefore, a power electronic assembly is provided with a substrate, a semiconductor disposed on the substrate, a metal body contacting the semiconductor, and an electrical conductor contacting the metal body, wherein the electrical conductor is contacted to the metal body by laser welding.

Bevorzugt ist der elektrische Leiter ein Bändchen oder eine Litze, also ein aus dünnen Einzeldrähten bestehender elektrischer Leiter.The electrical conductor is preferably a ribbon or a stranded wire, that is to say an electrical conductor consisting of thin individual wires.

Besonders bevorzugt besteht der elektrische Leiter aus Aluminium (Al) oder Kupfer (Cu) oder einer überwiegend Aluminium (Al) oder Kupfer (Cu) enthaltenden Legierung oder einem Aluminium (Al) und Kupfer (Cu) enthaltenden Schichtmaterial.Particularly preferably, the electrical conductor made of aluminum (Al) or copper (Cu) or a predominantly aluminum (Al) or copper (Cu) containing alloy or a aluminum (Al) and copper (Cu) containing layer material.

Nach einer weiteren bevorzugten Ausgestaltung ist der Metallkörper auf dem Halbleiter mittels Sintern kontaktiert.According to a further preferred embodiment, the metal body is contacted on the semiconductor by means of sintering.

Schließlich ist bevorzugt vorgesehen, dass die Loop-Höhe des elektrischen Leiters wenigstens 0,025 mm und höchstens 1 mm beträgt.Finally, it is preferably provided that the loop height of the electrical conductor is at least 0.025 mm and at most 1 mm.

Desweiteren wird ein Verfahren zum Herstellen einer leistungselektronischen Baugruppe beansprucht, die ein Substrat, einen auf dem Substrat angeordneten Halbleiter, einen auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einen den Metallkörper kontaktierenden elektrischen Leiter aufweist, wobei das Kontaktieren des elektrischen Leiters auf dem Metallkörper mittels Laserschweißen erfolgt.Furthermore, a method for manufacturing a power electronic assembly is claimed, comprising a substrate, a semiconductor disposed on the substrate, one on the semiconductor arranged, the semiconductor contacting metal body and an electrical conductor contacting the metal body, wherein the contacting of the electrical conductor on the metal body is effected by means of laser welding.

Bevorzugt ist der zur Kontaktierung des Halbleiters verwendete elektrische Leiter ein Bändchen oder eine Litze.Preferably, the electrical conductor used to contact the semiconductor is a ribbon or a stranded wire.

Besonders bevorzugt besteht der elektrische Leiter aus Aluminium (Al) oder Kupfer (Al) oder einer überwiegend Aluminium (Al) oder Kupfer (Cu) enthaltenden Legierung oder einem Aluminium (Al) und Kupfer (Cu) enthaltenden Schichtmaterial.Particularly preferably, the electrical conductor consists of aluminum (Al) or copper (Al) or a predominantly aluminum (Al) or copper (Cu) -containing alloy or a aluminum (Al) and copper (Cu) -containing layer material.

Schließlich erfolgt das Kontaktieren des Metallkörpers mit dem Halbleiter durch Sintern.Finally, the metal body is contacted with the semiconductor by sintering.

Ein erster Grundgedanke der Erfindung ist es, eine weitestgehend vollflächige Kontaktierung des Leistungshalbleiters mit einem Metallplättchen vorzugsweise aus einem elektrisch und thermisch sehr gut leitfähigen Material wie Kupfer (Cu) zu nutzen, um zunächst eine sehr gute Stromverteilung auf dem Leistungshalbleiter zu ermöglichen und lokale thermische Überlasten des Leistungshalbleiters zu vermeiden. Das Metallplättchen wird mit dem Leistungshalbleiter vorzugsweise durch Sintern mittels Sinterpaste (z. B. Ag-Sinterpaste) verbunden.A first basic idea of the invention is to utilize a largely full-area contacting of the power semiconductor with a metal plate, preferably of an electrically and thermally highly conductive material such as copper (Cu), in order to initially enable a very good current distribution on the power semiconductor and local thermal overloads to avoid the power semiconductor. The metal plate is preferably connected to the power semiconductor by sintering using sintering paste (eg, Ag sintered paste).

Anstelle der üblicherweise für die Kontaktierung des Leistungshalbleiters nach außen zu verwendenden Cu-Drähte wird vorzugsweise ein Metallbändchen oder Ribbon (vorzugsweise ebenfalls aus Cu) auf dem Metallplättchen angebracht. Das Metallbändchen wird jedoch nicht wie beim Ribbon-Bonden üblich mit einer hohen Loop gebondet, sondern wird möglichst flach zur zweiten Kontaktstelle geführt, um einen denkbar geringen Beitrag zur parasitären Induktivität zu haben. Bändchen werden üblicherweise für Hochfrequenzkontakte genutzt, um dem Skin-Effekt wirksam zu begegnen.Instead of the copper wires usually to be used for contacting the power semiconductor to the outside, a metal strip or ribbon (preferably also made of Cu) is preferably applied to the metal plate. However, the metal strip is not bonded as usual with ribbon bonding with a high loop, but is performed as flat as possible to the second contact point in order to have a very small contribution to the parasitic inductance. Ribbons are commonly used for high frequency contacts to effectively counteract the skin effect.

Die flache Loopführung der Bändchen hat in einem Ultraschall-gestützten Bondprozess den Nachteil, dass alleine schon die Ultraschall-Reib-Bewegung spätestens an der zweiten Kontaktstelle durch das wenig elastisch geführte Bändchen unkontrollierbar stark gedämpft wird. Je geringer die Loop-Höhe des Kontaktbändchens umso höher ist seine Steifigkeit und die Neigung, die mechanische Belastung auf die Verbindungsstelle zu konzentrieren. Eine Schweißverbindung unbekannter Güte wäre die Folge.The flat loop guidance of the tapes has the disadvantage in an ultrasound-supported bonding process that alone the ultrasound friction movement is strongly attenuated uncontrollably at the latest at the second contact point by the little elastically guided ribbon. The lower the loop height of the contact strip, the higher its rigidity and the tendency to concentrate the mechanical stress on the joint. A weld of unknown quality would be the result.

Ein weiterer Vorteil der Erfindung besteht daher darin, die vibrationslose Kontaktierung mittels Laserschweißen zu nutzen, um eine minimale Loop-Höhe für eine minimale, parasitäre Induktivität zu erreichen. Da der Energie-Eintrag durch Laserenergie und nicht durch Ultraschall-induzierte Schwingungen erfolgt, kann die Schweißenergie auf beiden Anschlüssen des flachen Bändchens kontrolliert eingebracht werden, obwohl das Bändchen durch den geringen Loop maximal Steifheit aufweist.Another advantage of the invention is therefore to use the vibration-free contacting by means of laser welding in order to achieve a minimum loop height for a minimum, parasitic inductance. Since the energy input is by laser energy and not by ultrasound-induced vibrations, the welding energy can be applied to both terminals of the flat ribbon in a controlled manner, although the ribbon has maximum rigidity due to the small loop.

Ein weiterer bekannter Nachteil der Ultraschall-gestützten Bondtechnik wird dadurch ebenfalls vermieden: Die Sinterverbindung des Metallplättchens auf dem Leistungshalbleiter wird nicht „losgerüttelt“. Another known disadvantage of the ultrasound-supported bonding technique is also avoided: The sintered connection of the metal plate on the power semiconductor is not "shaken loose".

Sehr vorteilhaft bei der Laserschweißtechnik für Bändchen ist die Möglichkeit, eine sehr vollflächige Schweißverbindung zu erreichen. Dies ist bei der Ultraschall-gestützten Verbindungstechnik nur mit sehr gut angepasster Werkzeuggeometrie und Prozessführung möglich und wird vor allem auf dem Leistungshalbleiter zu den o. g. Ablösungen der Sinterverbindung führen können.Very advantageous in laser welding technology for tapes is the ability to achieve a very full-surface welded joint. This is only possible with ultrasound-based connection technology with very well adapted tool geometry and process control and is mainly used on the power semiconductor to the o. G. Abolish the sintered compound can cause.

Anstelle eines Bändchens in Form eines Metallstreifens lassen sich sehr vorteilhaft auch Verbindungen durch Litze herstellen. Die Verbindung der Litze mit den Kontaktstellen ist durch Ultraschall-gestützte Verfahren nur unzureichend möglich. Bekannt ist eine Verbindung der Litze durch Löten oder durch Silbersintern (eigenes Patent bzw. Veröffentlichungen). Diesen Verfahren haften jedoch Nachteile bei der Automatisierung der Prozessführung an. Hier ist der Einsatz der Laserschweißtechnik sehr vorteilhaft. Instead of a ribbon in the form of a metal strip can also be very advantageous compounds produced by stranded wire. The connection of the strand to the contact points is insufficiently possible by ultrasound-assisted methods. Known is a compound of the strand by soldering or by silver sintering (own patent or publications). However, these methods adhere to disadvantages in the automation of the process control. Here, the use of laser welding technology is very beneficial.

Die gewebte Struktur der Litze bietet gegenüber der Vollmaterial-Struktur eines Bändchens den Vorteil der Elastizität unter thermo-mechanischen Belastungen. Die Litze kann sich in der Ebene verformen, hingegen ein Bändchen die Elastizität lediglich aus einer gewissen Dehnungsreserve durch die Loopführung beziehen kann.The woven structure of the strand offers over the solid material structure of a ribbon the advantage of elasticity under thermo-mechanical loads. The strand can deform in the plane, whereas a ribbon can only draw the elasticity from a certain expansion reserve through the loop guide.

Die flache Loopführung der laserkontaktierten Bändchen oder Litze stellt allerdings erhöhte Anforderungen an die Isolierung insbesondere von Chipkanten dar. Überschläge sind daher unbedingt zu vermeiden.The flat loop guidance of the laser-contacted ribbon or strand, however, places increased demands on the insulation, in particular of chip edges. Flash-overs are therefore absolutely to be avoided.

Eine besonders bevorzugte Methode ist es, die Trägerfolie des oberseitigen Chipkontaktes um den Chip umlaufend überlappen zu lassen. Damit lässt sich eine wirksame Isolierung von den flach geführten Bändern zu den Chipkanten sicher erreichen.A particularly preferred method is to allow the carrier film of the top chip contact to overlap circumferentially around the chip. Thus, an effective isolation of the flat-guided bands to the chip edges can be achieved safely.

Eine andere Methode die erforderliche Isolation zwischen Bändchen und Fremdpotential auf dem überbrückten Halbleiter und Substrat herbeizuführen, ist das Erzeugen einer konturkonformen Isolationsschicht vor dem Laserkontaktieren. Die Isolationsschicht erstreckt sich hierbei von der Kante der Halbleiterkontaktfläche über die Halbleiterkante und der Leiterfläche des Substrates bis zur offenen Kontaktfläche des zweiten laserkontaktierten Bändchen-„Landeplatzes“. Eine beispielhafte Isolationsschicht ist das unter dem Markennamen Parylene® (Markenname Union Carbide) vertriebene Beschichtungsverfahren und -material oder auch Folien aus dem Material Kapton® (Markenname DuPont).Another method for bringing about the required isolation between ribbon and external potential on the bridged semiconductor and substrate is to produce a contour-conforming insulation layer prior to laser contacting. The insulating layer extends from the edge of the semiconductor contact area via the semiconductor edge and the conductor surface of the substrate to the open contact surface of the second laser-contacted ribbon "landing site". An exemplary insulating layer is sold under the trade name Parylene ® (trademark Union Carbide) displaced coating methods and materials or films of the material Kapton ® (brand name of DuPont).

Bei sicherer Loopführung der Bändchen ist auch der übliche Silikon-Weichverguss, der nach dem Verschweißen aufgebracht wird, von Leistungsmodulen ausreichend, um die Isolation zu gewährleisten.With secure loop guidance of the ribbons, the usual silicone soft encapsulation, which is applied after welding, of power modules is sufficient to ensure the insulation.

Grundsätzlich gilt für die Loop-Höhe des laserkontaktierten, niederinduktiven Bändchens, dass die angestrebte, minimale Höhe des Bändchens vom Fremdpotential durch die Isolationsfestigkeit des Volumens unterhalb des Bändchens bestimmt wird. So gestattet insbesondere die Beschichtung mit dem Material Parylene® eine geringe Schichtdicke (je nach Isolationsanforderung der Anwendung) und damit eine niedrige, niederinduktive Loop-Gestaltung.Basically, for the loop height of the laser-contacted, low-inductive ribbon, the desired minimum height of the ribbon from the external potential is determined by the insulation resistance of the volume below the ribbon. In particular, the coating with the material Parylene ® allows a small layer thickness (depending on the insulation requirements of the application) and thus a low, low-inductive loop design.

Beispielsweise ist die elektrische Durchbruchfestigkeit von Parylene N® höher als 200V/µm Schichtdicke. Für einen Halbleiter mit einer Sperrfähigkeit von z.B. 1200 V ist also mit einer Schichtdicke von 6 µm und besonders bevorzugt zusätzlich eines Sicherheitsaufschlages von Faktor 2–5 (entspricht ca. 30 µm) eine Loop-Höhe von wenigen 10 µm erreichbar (ab ca. 25 µm). Diese geringe Loop-Höhe gestattet die Erreichung sehr geringer parasitärer Induktivitäten für jedes laserkontaktierte Bändchen über einer Parylene®-Isolationsschicht.For example, the electrical breakdown strength of Parylene N ® is higher than 200V / micron film thickness. For a semiconductor with a blocking capability of, for example, 1200 V, a loop height of a few 10 μm can therefore be achieved with a layer thickness of 6 μm and particularly preferably additionally a safety impact of factor 2-5 (corresponding to approximately 30 μm) (from approx microns). This low loop height allows the achievement of very low parasitic inductances for each laser contacted ribbon over a Parylene ® insulation layer.

Ähnliche Isolationsfestigkeiten und damit vergleichbare Loophöhen sind auch mit Kapton® (Polyimid) als Folie erreichbar (> 200 V/µm Foliendicke ab 25 µm).Similar insulation strengths and thus comparable loop heights are also equipped with Kapton ® (polyimide) film as the distance (> 200 V / micron film thickness from 25 microns).

Die Erfindung wird im Folgenden anhand von in den beigefügten Zeichnungen dargestellten, besonders bevorzugt ausgestalteten Ausführungsbeispielen näher erläutert. Es zeigen:The invention will be explained in more detail below with reference to exemplary embodiments illustrated in the attached drawings and particularly preferred embodiments. Show it:

1 den schematischen Aufbau einer besonders bevorzugt ausgestalteten leistungselektronischen Baugruppe nach der Erfindung; und 1 the schematic structure of a particularly preferred designed power electronic assembly according to the invention; and

2 ein Flussdiagramm für den Verfahrensablauf zur Herstellung der leistungselektronischen Baugruppe aus 1. 2 a flowchart for the process flow for the production of power electronic assembly from 1 ,

1 zeigt den schematischen Aufbau einer besonders bevorzugt ausgestalteten leistungselektronischen Baugruppe nach der Erfindung. 1 shows the schematic structure of a particularly preferred designed power electronic assembly according to the invention.

Insbesondere zeigt 1 eine leistungselektronische Baugruppe 10 mit einem Substrat 20, einem auf dem Substrat 20 angeordneten Halbleiter 30, einem auf dem Halbleiter 30 angeordneten, den Halbleiter 30 kontaktierenden Metallkörper 40 und einem den Metallkörper 40 kontaktierenden elektrischen Leiter 50. Erfindungsgemäß ist der elektrische Leiter 50 mit dem Metallkörper 40 mittels Laserschweißen kontaktiert. Ebenso ist der elektrische Leiter 50 mit dem nicht weiter identifizierten Substratanschluss mittels Laserschweißen kontaktiert.In particular shows 1 a power electronic module 10 with a substrate 20 , one on the substrate 20 arranged semiconductors 30 one on the semiconductor 30 arranged, the semiconductor 30 contacting metal body 40 and one the metal body 40 contacting electrical conductor 50 , According to the invention, the electrical conductor 50 with the metal body 40 contacted by laser welding. Likewise, the electrical conductor 50 contacted with the not further identified substrate connection by means of laser welding.

Der dargestellte elektrische Leiter 50 ist bevorzugt als Bändchen oder als Litze ausgebildet und besteht besonders bevorzugt aus Aluminium (Al) oder Kupfer (Cu) oder einer überwiegend Aluminium (Al) oder Kupfer (Cu) enthaltenden Legierung oder einem Aluminium (Al) und Kupfer (Cu) enthaltenden Schichtmaterial.The illustrated electrical conductor 50 is preferably formed as a ribbon or as a strand and is particularly preferably made of aluminum (Al) or copper (Cu) or a predominantly aluminum (Al) or copper (Cu) -containing alloy or a aluminum (Al) and copper (Cu) containing layer material.

Wie in 1 angedeutet ist der Metallkörper 40 auf dem Halbleiter 30 mittels Sintern kontaktiert.As in 1 indicated is the metal body 40 on the semiconductor 30 contacted by sintering.

Auffällig ist auch der flache Aufbau der in 1 dargestellten leistungselektronischen Baugruppe 10, der insbesondere dadurch erreicht wird, dass die Loop-Höhe LH des elektrischen Leiters 50 wenigstens 0,025 mm, höchstens aber 1 mm beträgt. Der elektrische Leiter 50 weist daher eine im Wesentlichen gestreckte Konformation auf.Striking is also the flat structure of the 1 shown power electronic assembly 10 , which is achieved in particular by the loop height LH of the electrical conductor 50 at least 0.025 mm, but at most 1 mm. The electrical conductor 50 therefore has a substantially elongated conformation.

Die flache Loopführung des elektrischen Leiters 50 erfordert eine Isolierung gegenüber dem Halbleiter 30, die in 1 durch die zwischen Halbleiter 30 und elektrischem Leiter 50 angeordnete Isolationsschicht 60 bewirkt wird.The flat loop of the electrical conductor 50 requires isolation from the semiconductor 30 , in the 1 through the between semiconductors 30 and electrical conductor 50 arranged insulation layer 60 is effected.

2 zeigt ein Flussdiagramm für den Verfahrensablauf zur Herstellung der leistungselektronischen Baugruppe aus 1. 2 shows a flowchart for the process flow for the production of the power electronic module 1 ,

In einem ersten Schritt 100 wird der Halbleiter 30 auf dem Substrat 20 angeordnet. Zugleich kann in diesem Schritt bereits eine Befestigung des Halbleiters 30 auf dem Substrat erfolgen.In a first step 100 becomes the semiconductor 30 on the substrate 20 arranged. At the same time in this step already a fastening of the semiconductor 30 done on the substrate.

In einem zweiten Schritt 110 wird der Metallkörper 40 auf dem Halbleiter 30 angeordnet und zugleich ein elektrischer Kontakt zwischen Halbleiter 30 und Metallkörper 40 hergestellt. In diesem Schritt kann zugleich eine Befestigung des Metallkörpers 40 mit dem Halbleiter 30 und eine Befestigung des Halbleiters 30 auf dem Substrat erfolgen, soweit letztere noch nicht in Schritt 100 vorgenommen worden ist.In a second step 110 becomes the metal body 40 on the semiconductor 30 arranged and at the same time an electrical contact between semiconductors 30 and metal body 40 produced. In this step, at the same time an attachment of the metal body 40 with the semiconductor 30 and an attachment of the semiconductor 30 take place on the substrate, as far as the latter is not in step 100 has been made.

In Schritt 120 wird – wie oben bereits erwähnt – die freie Oberfläche des Halbleiters 30 mit einer Isolationsschicht 60, beispielsweise aus Parylene oder Kapton oder einem anderen Material, abgedeckt.In step 120 becomes - as already mentioned above - the free surface of the semiconductor 30 with an insulation layer 60 For example, from Parylene or Kapton or other material, covered.

Schließlich wird in Schritt 130 der Metallkörper 40 mit dem elektrischen Leiter 50 mittels Laserschweißen kontaktiert. Finally, in step 130 the metal body 40 with the electrical conductor 50 contacted by laser welding.

ZITATE ENTHALTEN IN DER BESCHREIBUNG QUOTES INCLUDE IN THE DESCRIPTION

Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Zitierte PatentliteraturCited patent literature

  • EP 2766922 A1 [0002] EP 2766922 A1 [0002]

Claims (9)

Leistungselektronische Baugruppe mit einem Substrat, einem auf dem Substrat angeordneten Halbleiter, einem auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einem den Metallkörper kontaktierenden elektrischen Leiter, dadurch gekennzeichnet, dass der elektrische Leiter mit dem Metallkörper mittels Laserschweißen kontaktiert ist.A power electronic assembly comprising a substrate, a semiconductor disposed on the substrate, a semiconductor body contacting the semiconductor, and an electrical conductor contacting the metal body, characterized in that the electrical conductor is contacted to the metal body by laser welding. Leistungselektronische Baugruppe nach Anspruch 1, dadurch gekennzeichnet, dass der elektrische Leiter ein Bändchen oder eine Litze ist.Power electronic assembly according to claim 1, characterized in that the electrical conductor is a ribbon or a stranded wire. Leistungselektronische Baugruppe nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der elektrische Leiter aus Aluminium (Al) oder Kupfer (Cu) oder einer überwiegend Aluminium (Al) oder Kupfer (Cu) enthaltenden Legierung oder einem Aluminium (Al) und Kupfer (Cu) enthaltenden Schichtmaterial besteht.Power electronic assembly according to one of the preceding claims, characterized in that the electrical conductor of aluminum (Al) or copper (Cu) or a predominantly aluminum (Al) or copper (Cu) containing alloy or an aluminum (Al) and copper (Cu) containing layer material. Leistungselektronische Baugruppe (10) nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass der Metallkörper auf dem Halbleiter mittels Sintern kontaktiert ist.Power electronic assembly ( 10 ) according to one of the preceding claims, characterized in that the metal body is contacted on the semiconductor by means of sintering. Leistungselektronische Baugruppe nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Loop-Höhe des elektrischen Leiters wenigstens 0,025 mm und höchstens 1 mm beträgt. Power electronic assembly according to one of the preceding claims, characterized in that the loop height of the electrical conductor is at least 0.025 mm and at most 1 mm. Verfahren zum Herstellen einer leistungselektronischen Baugruppe mit einem Substrat, einem auf dem Substrat angeordneten Halbleiter, einem auf dem Halbleiter angeordneten, den Halbleiter kontaktierenden Metallkörper und einem den Metallkörper kontaktierenden elektrischen Leiter, dadurch gekennzeichnet, dass das Kontaktieren des elektrischen Leiters auf dem Metallkörper mittels Laserschweißen erfolgt.A method of manufacturing a power electronic assembly comprising a substrate, a semiconductor disposed on the substrate, a semiconductor body contacting the semiconductor, and an electrical conductor contacting the metal body, characterized in that the contacting of the electrical conductor to the metal body is by laser welding , Verfahren nach Anspruch 6, dadurch gekennzeichnet, dass der elektrische Leiter ein Bändchen oder eine Litze ist.A method according to claim 6, characterized in that the electrical conductor is a ribbon or a stranded wire. Verfahren nach einem der Ansprüche 6 und 7, dadurch gekennzeichnet, dass der elektrische Leiter aus Aluminium (Al) oder Kupfer (Al) oder einer überwiegend Aluminium (Al) oder Kupfer (Cu) enthaltenden Legierung oder einem Aluminium (Al) und Kupfer (Cu) enthaltenden Schichtmaterial besteht.Method according to one of claims 6 and 7, characterized in that the electrical conductor of aluminum (Al) or copper (Al) or a predominantly aluminum (Al) or copper (Cu) containing alloy or an aluminum (Al) and copper (Cu ) containing layer material. Verfahren nach einem der Ansprüche 6 bis 8, dadurch gekennzeichnet, dass das Kontaktieren des Metallkörpers mit dem Halbleiter durch Sintern erfolgt.Method according to one of claims 6 to 8, characterized in that the contacting of the metal body with the semiconductor is carried out by sintering.
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