DE102016009437A1 - Security element and method for producing a security element - Google Patents

Security element and method for producing a security element

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Publication number
DE102016009437A1
DE102016009437A1 DE102016009437.0A DE102016009437A DE102016009437A1 DE 102016009437 A1 DE102016009437 A1 DE 102016009437A1 DE 102016009437 A DE102016009437 A DE 102016009437A DE 102016009437 A1 DE102016009437 A1 DE 102016009437A1
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DE
Germany
Prior art keywords
reflector layer
layer
microstructure
pattern
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102016009437.0A
Other languages
German (de)
Inventor
Patrick RENNER
André Gregarek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Giesecke and Devrient Currency Technology GmbH
Original Assignee
Giesecke and Devrient Currency Technology GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Giesecke and Devrient Currency Technology GmbH filed Critical Giesecke and Devrient Currency Technology GmbH
Priority to DE102016009437.0A priority Critical patent/DE102016009437A1/en
Publication of DE102016009437A1 publication Critical patent/DE102016009437A1/en
Withdrawn legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40Manufacture
    • B42D25/405Marking
    • B42D25/43Marking by removal of material
    • B42D25/435Marking by removal of material using electromagnetic radiation, e.g. laser
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/328Diffraction gratings; Holograms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/346Perforations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B42BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42DBOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30Identification or security features, e.g. for preventing forgery
    • B42D25/355Security threads

Abstract

A method of making a security element (10) comprising the steps of: providing a first patternable layer (22); Creating a first microstructure (16) in a front surface of the first patternable layer (22); and applying a first reflector layer (14) to the first microstructure (16) in a first pattern that is visible in plan view of the front side. In the present case, the first reflector layer (14) is applied by printing in the first pattern with a homogeneous thickness (d). In a further step, the first reflector layer (14) is removed by means of laser ablation, wherein a second pattern, which can be seen in plan view of the front, is produced in the first reflector layer (14).

Description

  • The invention relates to a method for producing a security element, in which a first microstructure is produced on a front side and a reflector layer is applied over it.
  • Furthermore, the invention relates to a security element which comprises a first structurable layer, which is applied on a front side, a first microstructure in a surface of the first structurable layer and a first reflector layer on the first microstructure.
  • In the prior art, such structures are known for reflective holograms. They use micro-optical effects for security elements and are usually produced by embossing a metal layer or by embossing and subsequent vapor deposition (PVD) of a metal layer on the embossed structure. The metal layer can be subsequently structured by laser ablation.
  • The object of the invention is to provide a method for producing a security element and a security element, so that manufacturability, security against imitation and visual appearance are improved.
  • The object is solved by the subject matter of the independent claims. The dependent claims describe preferred embodiments.
  • The method for producing a security element comprises the following steps: providing a first structurable layer, producing a first microstructure in a front side of the first structurable layer, applying a first reflector layer to the first microstructure in a first pattern, which can be seen from the front side , In the present case, the first reflector layer is applied by printing in the first pattern with a homogeneous thickness. In a further step, the first reflector layer is removed by means of laser ablation, wherein a second pattern, which can be seen in plan view of the front side, is produced in the first reflector layer.
  • An advantage of the method for producing the security element is that two authenticity features are generated. A first authenticating feature is the reflector layer in the first pattern. The first pattern preferably relates to an outline of the reflector layer, through which, for example, a geometric shape or a contour of a person or an object can be seen in plan view. The second authenticity feature is created by the removal of the first reflector layer to produce the second pattern, which can be seen in plan view. The second pattern may be a representation of the object or a geometry. The first pattern and the second pattern can complement each other to a total pattern. Preferably, both authenticity features can be recognized by the naked eye for a viewer. Another advantage is the fact that the reflector layer thus has two optically effective (identically) microstructured surfaces. The microstructuring is effective as an authenticity feature in supervision from the front and also usable as an authenticity feature in supervision of the back.
  • Advantageously, reflective nanoparticles and / or microstructures adapting and reflecting, in particular metallic, pigments are printed. The microstructure, ie also the first microstructure, adapting pigment is designed to be so thin or flexible that it follows the contour of the microstructure. Such nanoparticles or contour-matching pigments are known, for example EP 1689586 B1 . WO 2010/069823 A1 and WO 2013/090983 A1 ,
  • The microstructure is preferably produced by embossing.
  • In one embodiment, the first patternable layer is provided on a substrate. The structurable layer may alternatively itself be a substrate. These steps of the procedure need not be performed in the order given. It is also possible in further developments to produce the microstructure in a structurable layer and further optionally to transfer the thus structured layer onto the substrate.
  • A substrate, such as paper, may be non-transparent but have at least one transparent portion. A substrate, such as a foil, may alternatively be transparent.
  • The security element may be a data carrier, such as a security thread, a label, a transfer element or a security print. The substrate may be configured as any thin-surface element suitable for supporting the first patternable layer and the first reflector layer. For example, the substrate may be a paper, in particular a cotton paper, or a film of polyethylene (PE), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), polypropylene (PP) or polyamide (PA). The paper may contain a proportion x polymer material in the range of 0 <x <100 wt .-%. The film may be monoaxially or biaxially stretched. Among other things, the stretching of the film leads to it obtaining polarizing properties, which are used as a further authenticity feature can be. For the utilization of these properties required tools, such. As polarizing filters are known in the art. In addition, the substrate can be a paper-foil composite or a film composite in which the substrate, the structurable layer and the reflector layer are embedded between two film layers.
  • How the microstructure (s) is produced on the substrate is not essential to the invention. Particularly simple is the use of a patternable layer on the substrate. A front side of the patternable layer (or the substrate with the patternable layer) corresponds to a front side of the security element. Insofar as in the preceding or in the following the wording is used in supervision of the front side (or the back side), the front side (or the back side) of the security element is to be understood in each case also in a plan view.
  • This structurable layer then optionally comprises an embossing lacquer, for example a UV embossing lacquer. However, the patternable layer may also comprise any other material which is formable by printing, laser treatment or other types of treatment such that a microstructure can be produced therein. The structurable layer may be transparent / translucent or opaque. It may also have a color which optionally does not interact with the laser radiation for laser ablation. The patternable layer is applied to the front side of the substrate, where the front side can be any side of the substrate and, alternatively, can also be referred to as a first side.
  • The microstructure is optionally a hologram structure for generating a holographic image of an object or a person. The holographic image represents a further authenticity feature. Thus, a hologram, for example a pictorial representation of an object or a person, can be seen in plan view. However, the microstructure may also be a microlens, micromirrors, or any other micron or nanometer scale structure. The microstructure may be, for example, by means of printing or laser ablation on the substrate, for. In the structurable layer. By applying the reflector layer to the microstructure, the latter is better in plan view or optically effective (eg in the case of a hologram).
  • The reflector layer may be greater than the microstructure in its surface extent in a preferred embodiment, so that the microstructure in a portion of the reflector layer is effective. The outline of the reflector layer is predetermined in the first pattern, which for example has a certain geometric shape or represents an object / person in cross-section.
  • The first reflector layer is printed, taking care that their thickness is always the same, so that therefore results in a homogeneous thickness. The thickness is z. Along the local surface normal of the microstructure or along a normal to the plane in which the microstructure resides (eg, it may be an upper surface of the substrate).
  • Due to the homogeneous thickness, the surface structure of the security element is identical before the application of the first reflector layer and after the application of the first reflector layer, since the surface structure of the microstructure is retained by the first reflector layer due to its constant thickness. The microstructure is not equalized or filled by the printing. Due to this, the first microstructure can be seen from both sides of the reflector layer, i. H. in plan view of a front side of the security element and in view through a transparent portion through the substrate to the first microstructure and the first reflector layer.
  • Methods for printing the reflector layer, for example a metallic reflector layer, are described in US Pat EP 1689586 B1 . WO 2010/069823 A1 and WO 2013/090983 A1 described, the disclosure content of which is fully incorporated in this application with respect to the printing process for applying the reflector layer with a homogeneous thickness. For example, a metallic ink can be printed on the first microstructure by conventional printing methods, for example using known printing presses. The metallic ink may include metallic pigment particles and a binder. The metallic particles may be microstructured metallic flat pigments (flakes) comprising, for example, aluminum, stainless steel, gold, silver, platinum or copper. The binder of the metallic ink may contain microcellulose, vinyl chloride, vinyl acetate copolymers or vinyl. Further, as metal particles for the metallic ink, silver nanoparticles, aluminum nanoparticles or titanium nanoparticles may be used.
  • The second pattern is produced by partially or completely removing the thickness of the first reflector layer. The aim of this ablation is to increase the transmission of light in the ablated area compared to the rest of the first reflector layer, so that the second pattern can be seen in plan view and / or in review. In the case of laser ablation, because of the homogeneous thickness of the printed reflector layer, the microstructure is not changed, ie not removed, so that the Effectiveness of the microstructure and also the stability of the security element are preserved.
  • This is achieved with the security element described here in that the first reflector layer has a homogeneous thickness and thus the intensity of the laser radiation can be adjusted so that only the first reflector layer is removed and the underlying microstructure or other layers are not damaged. Due to the fact that the first reflector layer has a constant thickness, the same laser power can always be used for the uniform removal of the first reflector layer. Furthermore, the microstructure may be opaque because, even if the laser ablation is operated with constant intensity, due to the homogeneous thickness of the first reflector layer, no damage to the microstructure is to be expected. The laser beam for laser ablation 2 laser having a wavelength of about 10.6 microns or Nd, for example, with an infrared laser, a CO: YAG laser with a wavelength of 1.064 microns are produced.
  • In addition to the first microstructure and the reflector layer, further layers may be provided in the security element, such as an adhesive layer for securing a layer composite to the substrate, for example of a PU adhesive, or an intermediate layer, for example of a PET film. To protect against damage and soiling, the reflector layer can be covered with a cover layer of an optically transparent color or a transparent layer.
  • In order to increase the security against forgery of the security element, the second pattern is optionally applied in such a way that it can be seen through. For this purpose, it is provided in a development that the substrate has a transparent or translucent section which is arranged below the structurable layer, wherein the first reflector layer is removed over the section, so that the second pattern can be seen through the section. As a result of the reflector layer being removed via the transparent or translucent section of the substrate, the removed area of the reflector layer, which can represent a recess in the first reflector layer, is illuminated in a transparent manner so that the second pattern is then particularly clearly visible. It also stands in perfect Passer to the first pattern. Furthermore, the first microstructure can be seen not only in supervision, but also in transparency.
  • The transparent or translucent portion may be, for example, a window, an area in an opaque substrate in which a transparent or translucent portion is provided, or may be part of the transparent or translucent substrate. For example, any portion of a transparent sheet may be considered the portion. Under opaque in the sense of the application is understood to mean a material which transmits a maximum of 5%, in particular a maximum of 2%, of the visible light. Under transparent or translucent in the sense of the application is understood that a subject material between 50%, in particular 90%, and 100% of visible light passes. A transparent and translucent material differs in that an image can be recognized through the transparent material - the image information remains after passing through the transparent material - this is not the case with a translucent material - the image information is lost through the translucent material. The section can also be made translucent in that, although the substrate is opaque, it is made so thin in the region of the section that light can translucently pass through the section. For example, the section may be part of a watermark.
  • In order to further increase the security against forgery of the security element, a similar composite structure as on the front side is preferably applied to a rear side of the security element. For this purpose, the following steps are preferably carried out: generating a second microstructure on a back side of the substrate under a transparent or translucent section and printing a second reflector layer on the second microstructure of homogeneous thickness in a third pattern, which can be seen in plan view on the back, wherein laser ablation simultaneously removes the second reflector layer by passing the laser radiation through the section during laser ablation. As a result of that the first reflector layer and the second reflector layer are removed by the same laser irradiation, the patterns in the first reflector layer and in the second reflector layer are exactly in register with each other.
  • With regard to the second microstructure and / or the second reflector layer, the considerations made above on the first microstructure and / or the first reflector layer apply analogously. The third pattern, in which the second reflector layer is applied, may be identical to the first pattern, so that a similar outline of the respective reflector layer can be seen on the front side and the rear side. However, it is also possible that the third pattern differs from the first pattern, so that different outlines of the respective reflector layer can be seen on the front and back. The material of the first reflector layer may be identical to that of the second reflector layer, but it is preferred that different materials are used for the first reflector layer and the second reflector layer, so that preferably different optical impressions result from the first and second reflector layer. The second microstructure may also be incorporated into a patternable layer which is optionally applied to the backside of the substrate over the portion.
  • In this preferred embodiment, the portion and / or structurable layers are / are made transparent such that during laser ablation, the first reflector layer and the second reflector layer are ablated by the same laser irradiation step by passing the laser radiation through the section. For example, the laser radiation impinges perpendicular to the substrate, but it is also possible that the laser radiation is incident on the substrate at a different angle, in particular between ± 30 ° and ± 60 ° to the normal, so that the second pattern is viewed at an angle , which corresponds to the angle of incidence of the laser radiation during laser ablation, is visible.
  • In order to further increase the security against forgery of the security element, it is preferable for the first reflector layer and / or the second reflector layer to be applied such that the first reflector layer in the first pattern and / or the second reflector layer in the third pattern have at least one recess. having. Since the section is transparent and / or translucent, in principle the first microstructure would be visible from the rear side due to its homogeneous thickness, and the second microstructure would also be visible from the front in a top view. However, since the reflector layers are opaque, this is not possible. The recesses are therefore provided in the first reflector layer and / or in the second reflector layer, so that the first microstructure can be seen through the recess in the second reflector layer in a plan view of the rear side and / or the second microstructure is viewed through the recess in plan view of the front side to recognize in the first reflector layer. Thus, a second hologram of the second microstructure can be seen in the first microstructure that can be seen on the front side. The same applies to the back. By providing the savings in the first reflector layer and / or in the second reflector layer, a hologram in the hologram can thus be seen in plan view. The application of the at least one recess in the first reflector layer and / or in the second reflector layer can take place during printing itself or subsequently by laser ablation. It is preferred that the first reflector layer and / or the second reflector layer is already printed with the recesses on the first structurable layer or the second structurable layer.
  • As far as proceeding from or in the following, a substrate with a transparent section is assumed, the further elements and embodiments can be provided analogously for a transparent substrate. In this respect, a transparent section can also be understood as meaning a section of the transparent substrate which is not covered by opaque layers.
  • To increase the security against forgery of the security element, it is preferred that the second reflector layer generates in reflection one of the first reflector layer different optical impression. For example, the color of the radiation reflected by the respective reflector layer may be different. For this purpose, optionally different materials for the first and second reflector layer are printed. In the embodiment of the hologram in the hologram, the respective holograms then show different colors in supervision, so that they are particularly clearly recognizable. By using different colors, a bimetal effect can be generated in the hologram in the hologram.
  • The security against forgery of the security element can be further increased by carrying out the following steps: producing a third microstructure on the front side of the substrate over the section and printing a third reflector layer on the third microstructure with a homogeneous thickness in a fourth pattern, which is in a top view the front side is recognizable, wherein the laser ablation simultaneously removes the third reflector layer and wherein the first reflector layer and / or the third reflector layer is / is applied such that the first reflector layer in the first pattern and / or the second reflector layer in the fourth pattern at least one Have recess / has.
  • With regard to the third structurable layer, the third microstructure and the third reflector layer, analogous considerations apply as have been presented for the first or second structurable layer, the first or second microstructure and the first or second reflector layer. The fourth pattern may be identical to the first pattern and / or the third pattern, however, it is preferred that the fourth pattern be different from the first pattern and / or the third pattern. The fourth pattern can serve as a further authenticity feature. As a result of the second pattern taking place simultaneously by laser ablation of the first reflector layer and the third reflector layer with a laser beam, the second patterns in the first reflector layer and the third reflector layer are exactly in register.
  • The recess in the first reflector layer and / or the third reflector layer, as described above, also generates a hologram in the hologram. Optionally, the first reflector layer (together with the first structurable layer) is disposed between the third reflector layer (together with the third structurable layer) and the substrate. In this embodiment, by applying the recess in the third reflector layer in plan view of the front side, a hologram of the first microstructure is visible in the hologram of the third microstructure. In view of the rear side, a hologram of the third microstructure can be recognized due to the recesses in the first reflector layer in the hologram of the first microstructure.
  • A particularly simple arrangement of the first reflector layer and the third reflector layer results when the first reflector layer is arranged between the first and the third microstructure. In a preferred development, the first reflector layer is in direct contact with the first and the third microstructure. This results in a preferred construction of the security element, in which the first microstructure lies under the first reflector layer, which in turn is arranged under the third macrostructure, which in turn is arranged under the third reflector layer.
  • Another arrangement of the first and third layers preferably takes place in that a transparent carrier layer is provided between the first and the third microstructure. The carrier layer can be, for example, a film, in particular a PET film, which for example has a thickness of 6 μm. The microstructures are attached to the carrier layer, wherein the respective reflector layers are in turn applied to the microstructures. The first reflector layer is thus facing the back and the third reflector layer of the front.
  • In order to produce a bimetallic effect to further increase the security against forgery, it is preferred that a fourth reflector layer, which generates in reflection one of the first reflector layer, the second reflector layer and / or the third reflector layer different optical impression, in regions over the first reflector layer, the second reflector layer and / or the third reflector layer is printed with a homogeneous thickness, wherein optionally during laser ablation, the fourth reflector layer is removed simultaneously. The fourth reflector layer can be printed on the first, the second, or the third reflector layer or on all reflector layers. Since the fourth reflector layer and the respective underlying reflector layer each have a homogeneous thickness, the surface of the fourth reflector layer has the same structure as the underlying microstructure. The microstructure can therefore be seen even when the fourth reflector layer is printed on top.
  • In a further development, the fourth reflector layer differs in reflection in each case from the reflector layer on which it is applied, in their optical impression. For example, the fourth reflector layer differs from the reflector layer on which it is applied in its colored perception, so that bimetallic effects can be generated. In the fourth reflector layer and / or in the first, second or third reflector layer at least one recesses are also provided, which can be introduced as described above. Depending on the reflector layer in which the recess is made, the bimetallic effect is visible in supervision from the front or the back.
  • A further authenticity feature can preferably be produced by providing a laser-radiation-sensitive layer, which changes the color upon laser radiation, and is changed in terms of color by the laser ablation. The laser-radiation-sensitive layer may comprise, for example, laser-modifiable effect pigments or else pigment-free laser-modifiable marking substances. Examples of suitable markers and the manner in which they are applied and / or introduced onto the substrate are described in the document WO 2010/072329 A1 described in more detail, the disclosure of which is included in the present application in this respect.
  • The laser-radiation-sensitive layer can be applied under the microstructure or over the reflector layer. In particular, the laser-radiation-sensitive layer changes its color due to the laser radiation of the laser ablation. For example, the laser-radiation-sensitive layer may be blue before the application of the laser radiation and red after the application. In addition, it is possible that the laser radiation-sensitive layer was transparent before being exposed to the laser ablation radiation and becomes colored upon interaction with the laser ablation radiation. Since the color change of the laser radiation sensitive layer is performed by the laser ablation, the area of the laser radiation sensitive layer whose color is changed is in exact registration with the second pattern.
  • The features and advantages described in this application can be combined with the security element as described in the DE 10 2010 053 052 A1 be combined. This document is incorporated in the present application in this respect. The according to DE 10 2010 053 052 A1 Inserted hole in the substrate is preferably closed again with a film. The combination is of particular interest for composite substrates when the features discussed in this invention are incorporated under a film as an internal security feature.
  • In addition, the object is achieved by a security element which has a substrate, a first patternable layer which is applied on a front side of the substrate over the section, a first microstructure in a surface of the first structurable layer and a first reflector layer which is applied to the first Microstructure is printed with a homogeneous thickness includes. The first reflector layer is structured in a first pattern, which can be seen in a plan view of the front side. The first reflector layer has, above the cutout, a recess in the form of a second pattern, which can be seen in a view through the section.
  • With regard to the security element, the advantages listed above, preferred embodiments and variants apply analogously.
  • Further exemplary embodiments and advantages of the invention are explained below with reference to the figures, in the representation of which a representation true to scale and proportion has been dispensed with in order to increase the clarity. Show it:
  • 1 a plan view of a front side of a security element;
  • 2a . 2 B Sectional views of two further embodiments of the security element;
  • 3 an enlarged sectional view of an embodiment of the security element for illustrating a reflector layer;
  • 4 Sectional views of another embodiment of the security element;
  • 5 a sectional view of an embodiment of the security element;
  • 6 a sectional view of another embodiment of the security element;
  • 7 a sectional view of an embodiment of the security element; and
  • 8a . 8b a sectional view of an embodiment of the security element before and after a laser ablation.
  • A security element 10 As it is in different embodiments in the 1 to 8th may be part of a value document or an entire value document, such as a banknote, an identity card or the like. The security element 10 has a substrate 12 which can extend over the entire value document or can be connected to the value document.
  • In a plan view of a front side is a first reflector layer 14 recognizable, which in particular can be printed as metallic, for example with metallic effect pigments. The first reflector layer 14 has a homogeneous thickness d, ie the thickness d constant everywhere. The thickness D can z. Along a normal to an area of the first microstructure 16 be measured as this is particularly good in 3 is recognizable. With regard to the embodiments of the material of the first reflector layer 14 and their method of production is on the EP 1689586 A1 , the WO 2013/090983 A1 and the WO 2011/064152 A2 directed. The first reflector layer 14 is applied with an outline in the form of a first pattern; in 1 For example, the first pattern is a curved star, but it is also possible for the first pattern to use other geometric shapes or the contour of a person, object or animal or the like. The first reflector layer 14 with the first pattern represents an authenticity feature of the security element 10 represents.
  • In addition, in supervision on the security element 10 a first microstructure 16 recognizable, which in 1 symbolized as a triangle. The first microstructure 16 may be of any shape and holographically depicts objects, a person or an animal to thereby enhance the security of the security element 10 to increase. The first microstructure 16 can be designed as a hologram structure; the hologram of the first microstructure 16 is another authenticity feature of the security element 10 , Because the first reflector layer 14 has the constant thickness d has the first reflector layer 14 a surface structure identical to that of the first microstructure 16 is like this in 3 is shown as an example. The first microstructure 16 is thus recognizable in principle in supervision and in review.
  • In the reflector layer 14 is a recess 18 incorporated in the form of a second pattern, which in 1 is shown as a half ring. The recess 18 and thus the second pattern can be seen in review. The second pattern can be configured as desired and represents another authenticity feature of the security element 10 represents.
  • In one embodiment, the substrate is 12 made of an opaque material, for example paper, in particular cotton paper, and has for example a basis weight of 68 g / m 2 .
  • At the in 2a embodiment shown, the substrate 12 a transparent or translucent section 20 on, which is made of a plastic, in particular a plastic film such as polyethylene (PE). In addition, it is also possible that the section 20 a window in the substrate 12 is. In another embodiment of the security element 10 , in the 2 B is shown, is the substrate 12 completely made of a transparent or translucent material, for example plastic, in particular a plastic film such as polyethylene (PE) or a film bank note substrate made of stretched polypropylene film (BOPP) with a weight per unit area of 70 g / m 2 . The section 20 forms part of the substrate in this embodiment 12 ,
  • In the 2a and 2 B embodiment shown is directly on the front of the substrate 12 a first structurable layer 22 and on an opposite rear side, a second structurable layer 28 applied, which can optionally be omitted. However, it is also possible that the layers by means of adhesive and other layers on the substrate 12 be applied, as will be exemplified in the following. The first structurable layer 22 is configured such that therein the first microstructure 16 introduced, z. B. imprinted, is. For example, the first layer 22 made from a UV embossing lacquer with a basis weight of 5.0 g / m 2 . The first shift 22 is in the area above the section in this embodiment 20 transparent.
  • In the 2a and 2 B is in addition to the first reflector layer 14 and the first layer 22 with the first microstructure 16 also a second reflector layer 24 and a second microstructure 26 in a second structurable layer 28 intended. The second reflector layer 24 has an outline in the form of a third pattern, which is another authenticity feature of the security element 10 represents. The thickness d of the second reflector layer 24 is constant, leaving the second reflector layer 24 has a surface structure identical to the second underlying microstructure 26 is, analogous to the in 3 shown exemplary representation. The second microstructure 26 can be designed as a hologram structure; also the hologram of the second microstructure 26 serves as an authenticity feature and may be identical or different to that of the first microstructure 16 be. The second reflector layer 24 can be made of the same materials as the first reflector layer 14 be prepared. The third pattern of the second reflector layer 24 may be identical to the first pattern of the first reflector layer 14 However, it is also possible that the first pattern and the third pattern differ. In the second reflector layer 24 also becomes a recess 18 provided, which is identical to the recess 18 in the first reflector layer 14 is. There between the recesses 18 the transparent or translucent section 20 is provided, the second pattern of the recess 18 Recognizable as an authenticity feature. The second layer 28 is preferably analogous to the first layer 22 designed.
  • The security element 10 of the 2a and 2 B is made by the substrate 12 with the transparent or translucent section 20 provided. At least on the section 20 becomes the first structurable layer on the front side 22 applied, in the surface of which the first microstructure 16 is provided. Following this, the first structurable layer is added 22 the first reflector layer 14 printed with an outline in the form of the first pattern, as for example in the EP 1689586 A1 , of the WO 2013/090983 A1 and the WO 2011/064152 A2 is described. Further, on the back of the security element 10 the second structurable layer 28 at least over the section 20 embossed and in the surface of the second microstructure 26 imprinted. About the second structurable layer 28 becomes the second reflector layer 24 printed with an outline in the form of the third pattern, as for example in the EP 1689586 A1 , of the WO 2013/090983 A1 and the WO 2011/064152 A2 is described. Following this, the first reflector layer 14 and the second reflector layer 24 ablated. This is done by using for ablation the arrows indicated by 2a and 2 B illustrated laser radiation through the section 20 is passed, so that the first reflector layer 14 and the second reflector layer 24 be removed simultaneously. This is how the recesses stand 18 the first reflector layer 14 and the second reflector layer 24 in perfect registration. The laser beam for the ablation 2 laser having a wavelength of about 10.6 microns or Nd, for example, with an infrared laser such as a CO: YAG laser with a wavelength of 1.064 microns are produced.
  • In the 3 shown embodiment of the security element 10 agrees with the in 2a and 2 B shown embodiment of the security element 10 except for the following differences. The security element 10 according to 3 does not have a second structurable layer 28 , no second microstructure 26 and no second reflector layer 24 on. Further, in the substrate 12 no transparent section 20 intended. In addition, it is the substrate 12 opaque. The recess 18 in the form of the second pattern can thus not be recognized in a transparent manner. The first structurable layer 22 can also be opaque. Damage to the first structurable layer 22 by the laser ablation to create the recess 18 can be minimized even with constant energy input of laser ablation, as the first reflector layer 14 has a constant thickness d such that when the power for the laser ablation is once set correctly, the extent of the first reflector layer 14 in each case only in the region of the second pattern, the first reflector layer 14 is removed, but no interaction with the first structurable layer 22 takes place.
  • In the 4 shown embodiment of the security element 10 is similar to the one in 2a and 2 B shown embodiment, so that will be discussed below only the differences. The second layer 28 with the second microstructure 26 and the second reflector layer 24 are at the security element 10 according to 4 not provided, but can be analogous to that in the 2a and 2 B be provided embodiment shown, or, as discussed in the following first layer 22 , with the first microstructure 16 and the first reflector layer 14 be designed. The first shift 22 is in the range of the first reflector layer 14 colored, so that the recess 18 can be seen in color. The first shift 22 can also be colored in the entire area. In addition to the first reflector layer 14 is at the security element 10 according to 4 a fourth reflector layer 30 provided with a homogeneous thickness d, so that the fourth reflector layer 30 has a surface texture identical to that of the first microstructure 16 is. The first reflector layer 14 and the fourth reflector layer 30 are designed differently so that they produce a different visual impression in reflection at an observer. For example, the reflector layers 14 . 30 be made of different materials. The fourth reflector layer 30 can be applied in a different or the same pattern in the first pattern. In the first reflector layer 14 and / or the fourth reflector layer 30 are recesses 32 intended. These recesses 32 produce a bimetal effect in supervision. Through the recesses 32 in the fourth reflector layer 30 is to see a bimetallic effect in the front view, while through the recesses 32 in the first reflector layer 14 in supervision on the back, ie through the section 20 through, another bimetal effect can be seen. The bimetal effect represents another authenticity feature.
  • The production of the security element according to 4 is analogous to the production of the security element in 2a and 2 B , In addition, in the step of applying the first layer 22 the first layer 22 in the region of the first reflector layer 14 colored, for example, by introducing a colored pigment in the first layer 22 , When applying the first reflector layer 14 become the recesses 32 intended. Optionally, this is achieved by the recesses 32 be printed, ie the recesses 32 are pressure reliefs when printing the first reflector layer 14 , In addition, it is possible that the recesses 32 be generated by ablation. The printing of the fourth reflector layer 30 takes place analogously to the application of the first reflector layer 14 , Are both reflector layers 14 and 30 Applied, so by ablation, the first reflector layer 14 and the fourth reflector layer 30 ablated. Because the ablations in the two reflector layers 14 . 30 takes place simultaneously, the recesses are 18 in the first reflector layer 14 and in the fourth reflector layer 30 in perfect registration with each other.
  • Another embodiment of the security element 10 is in 5 shown. This embodiment is similar to that in FIG 2a or 2 B shown. The first shift 22 is in the range of the first reflector layer 14 colored. The first reflector layer 14 is further with the recess 18 and the recess 32 Mistake. Analog are the second layer 28 and the second reflector layer 24 designed. In addition, the security element points 10 each on the front and back an adhesive layer 34 , an intermediate layer 36 and a cover layer 38 on. The adhesive layer 34 For example, it may be a PU adhesive weighing 4.5 g / m 2 . The adhesive layers 34 serve for fixing the first layer 22 and the second layer 28 on the substrate 12 , On the adhesive layer 34 is in each case the intermediate layer 36 provided, which may be, for example, a PET film with a thickness of 6 microns. The cover layer 38 is on the first reflector layer 14 and the second reflector layer 24 applied and serves to damage and contamination of the reflector layers 14 and 24 to reduce. The cover layer 38 may be, for example, an optically transparent ink layer. The adhesive layer 34 and the intermediate layer 36 are also designed transparent.
  • By providing the recesses 32 in the first reflector layer 14 and the second reflector layer 24 is the hologram of the first microstructure 16 through the recess 32 in the second reflector layer 24 visible, noticeable. Likewise, the hologram is the second microstructure 26 through the recess 32 in the first reflector layer 14 recognizable. Thus, a hologram in hologram can be seen from both sides in supervision, which represents another authenticity feature. At the front is the hologram of the first microstructure 16 and through the recess 32 that of the second microstructure 26 recognizable. From the back is the hologram of the second microstructure 26 and through the recess 32 in the second reflector layer 24 that of the first microstructure 16 recognizable. Are the first reflector layer 14 and the second reflector layer 24 made of different materials, such as in 4 the first reflector layer 14 and the fourth reflector layer 30 , by means of the recesses 32 Bimetal effects are generated. The holograms are recognizable from both sides because the respective reflector layers 14 . 24 have a homogeneous thickness d
  • The production of the security element 10 according to 5 is similar to those in 2a . 2 B and 4 described production method. Therefore, only the differences will be discussed below. Before the reflector layers 14 and 24 First, the adhesive layers are printed 34 on the front and back of the substrate 12 applied. On the respective adhesive layers 34 become the corresponding intermediate layers 36 arranged. Following this, the first layer will be 22 on the front and the second layer 28 on the back over the neckline 20 imprinted and in the area of the respective reflector layers 14 and 24 inked. Then the first reflector layer 14 and the second reflector layer 24 with the recesses 32 applied, and finally with the topcoat 38 overdrawn. The last step will be in the first reflector layer 14 and in the second reflector layer 24 the recesses 18 introduced by ablation, as described above, so that they are in exact registration.
  • In the 6 shown embodiment of the security element 10 is similar to the previously described embodiments of the security element 10 so that only the differences are discussed. At the security element 10 according to 6 is on the first reflector layer 14 a third structurable layer 40 in whose surface a third microstructure 42 is provided, provided. The third layer 40 is with a third reflector layer 44 , which is printed with an outline in the form of a fourth pattern with a homogeneous thickness d covered. The fourth pattern may be analogous to or different from the first pattern. The third layer 40 can be like the first layer 22 or the second layer 28 be designed; also the third reflector layer 14 can be made of the material of the first reflector layer 14 or the second reflector layer 24 be prepared. Both in the first reflector layer 14 as well as in the third reflector layer 44 are the recesses 18 and the recesses 32 intended. The recess 32 in the third reflector layer 44 When viewed from the front, it allows the hologram of the first microstructure 16 to recognize. The recess 32 in the first reflector layer 14 it allows in supervision from behind the hologram of the third microstructure 42 to recognize. Thus, by means of the in 6 shown construction of the security element 10 as a further authenticity feature a hologram in the hologram can be recognizable to the observer again. Become the first reflector layer 14 and the third reflector layer 44 Made of different materials, so can interact with the recesses 32 Bimetal effects are generated again, which are visible in supervision of the front and the back.
  • The method of manufacturing the security element 10 to 6 is similar to the previously described methods of preparation. Thus, only the differences are discussed. After application of the first structurable layer 22 with the first microstructure provided therein 16 and applying the first reflector layer 14 with the recesses 32 gets onto the first reflector layer 14 the third structurable layer 40 applied. Subsequently, the third microstructure 42 into the surface of the third layer 40 introduced and on the third reflector layer 44 with the recesses 32 arranged. The recesses 32 in the first reflector layer 14 and the third reflector layer 44 can be pressure reliefs or be made by ablation. After application of the first reflector layer 14 and the third reflector layer 44 becomes the first reflector layer by ablation 14 and the third reflector layer 44 simultaneously removed, so that the recesses generated therewith 18 in perfect registration with each other.
  • In the 7 shown embodiment of the security element 10 is similar to the one in 6 shown embodiment of the security element 10 so that only the differences are discussed. The security element 10 analogous to the in 6 shown embodiment, a first reflector layer 14 on the first layer 22 with the first microstructure mounted therein 16 and the third layer 40 with the third microstructure 42 and the third reflector layer 44 on. In addition, the security element points 10 a carrier layer 46 which may be a transparent PET film, for example with a thickness of about 6 microns. On the carrier layer 46 are the first layer 22 and the third layer 40 applied. This means that the first layer 22 and the third layer 40 on different sides of the carrier layer 46 are attached. On the respective layers 22 . 40 are in their from the carrier layer 46 facing away from the respective microstructures 16 and 42 intended. Also be on the carrier layer 46 each side facing away from the reflector layers 14 and 44 applied. The first reflector layer 14 is therefore the front of the substrate 12 facing, while the third reflector layer 44 the front of the substrate 12 turned away. The fixation of the composite of carrier layer 46 , first shift 22 , first reflector layer 14 , third layer 40 and third reflector layer 44 on the substrate 12 gets through the adhesive layer 34 reached. The third reflector layer 44 is with the topcoat 38 covered to reduce contamination and damage.
  • The method of manufacturing the security element 10 according to 7 is as follows: First, the backing layer 46 provided on one side of the first layer 22 is provided. In its surface becomes the first microstructure 16 provided and the first reflector layer 14 applied with an outline in the form of the first pattern. On the other side of the carrier layer 46 becomes the third layer 40 applied. In the surface of the third layer 40 becomes the third microstructure 42 introduced and the third reflector layer 44 applied. On the third reflector layer 44 now becomes the topcoat 38 applied. The composite thus prepared is using the adhesive layer 34 on the substrate 12 arranged such that the recess 18 over the section 20 is arranged. The provision of the recess 18 may be before or even after application to the substrate 12 be performed.
  • In the 8a and 8b shown embodiment of the security element 10 is similar to the previously described embodiments. This security element 10 moreover has a laser-radiation-sensitive layer 48 on which optional between the first layer 22 and the intermediate layer 36 is arranged. The laser-radiation-sensitive layer 48 is transparent to a certain intensity before being exposed to laser radiation. After exposure to the laser-radiation-sensitive layer 48 with laser radiation for ablation is the laser radiation sensitive layer 48 colored in the area of the application of the laser radiation. The laser-radiation-sensitive layer 48 may contain laser-modifiable effect pigments or pigment-free laser-modifiable markers. Examples of the laser-radiation-sensitive layer 48 be in the publication WO 2010/072329 A1 described.
  • The production of the security element 10 according to the 8a and 8b is similar to the previously described procedures. First, the adhesive layer 34 and the intermediate foil 36 on the substrate 12 applied. Subsequently, the laser-radiation-sensitive layer 48 on the intermediate layer 36 applied. The laser-radiation-sensitive layer 48 is in this state, as in 8a shown, transparent. On the laser-radiation-sensitive layer 48 becomes the first layer 22 with the first microstructure arranged thereon 16 applied. On the first shift 22 becomes the first reflector layer 14 applied with the outline in the form of the first pattern. Ablation occurs in the first reflector layer 14 the recess 18 provided in the second pattern. The laser radiation during the ablation causes a color change in the laser-radiation-sensitive layer 48 induced. Because the ablation in the first reflector layer 14 and the color change in the laser radiation-sensitive layer 48 is done by the same laser radiation is the colored area of the laser radiation-sensitive layer 48 in perfect registration with the recess 18 in the second pattern. This means that the colored area of the laser-radiation-sensitive layer 48 also has the second pattern.
  • QUOTES INCLUDE IN THE DESCRIPTION
  • This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.
  • Cited patent literature
    • EP 1689586 B1 [0008, 0019]
    • WO 2010/069823 A1 [0008, 0019]
    • WO 2013/090983 A1 [0008, 0019, 0053, 0060, 0060]
    • WO 2010/072329 A1 [0038, 0071]
    • DE 102010053052 A1 [0040, 0040]
    • EP 1689586 A1 [0053, 0060, 0060]
    • WO 2011/064152 A2 [0053, 0060, 0060]

Claims (15)

  1. Method for producing a security element ( 10 ), comprising the steps of: a) providing a first structurable layer ( 22 b) producing a first microstructure ( 16 ) in a front side of the first structurable layer ( 22 ), c) applying a first reflector layer ( 14 ) on the first microstructure ( 16 ) in a first pattern, which is visible in a plan view of the front, characterized in that the first reflector layer ( 14 ) is applied by printing in the first pattern with a homogeneous thickness (d), and the further step: d) removing the first reflector layer ( 14 ) by means of laser ablation, wherein a second pattern, which can be seen in plan view of the front, in the first reflector layer (FIG. 14 ) is produced.
  2. A method according to claim 1, characterized in that microstructures adapting reflective pigments and / or metallic nanoparticles are printed.
  3. Method according to claim 1 or 2, characterized in that the first structurable layer ( 22 ) on a substrate ( 12 ) provided.
  4. Method according to one of the claims 3, characterized in that the substrate ( 12 ) a transparent or translucent section ( 20 ), which under the first structurable layer ( 22 ), wherein the first reflector layer ( 14 ) is removed so that the second pattern is viewed through the section ( 20 ) is recognizable.
  5. Method according to claim 3 or 4, characterized by the steps: - generating a second microstructure ( 26 ) on a back side of the substrate ( 12 ), in particular under the section ( 20 ), and - printing a second reflector layer ( 24 ) to the second microstructure ( 26 ) in a third pattern, which can be seen in a plan view of the rear side, wherein in step e) the second reflector layer ( 24 ) is ablated, in particular by the laser radiation during the laser ablation through the section ( 20 ) is passed through.
  6. Method according to claim 5, characterized in that a second structurable layer ( 28 ) and the second microstructure ( 26 ) is produced in the second structurable layer, preferably by embossing.
  7. Method according to claim 5 or 6, characterized in that the first reflector layer ( 14 ) and / or the second reflector layer ( 24 ) is / are applied such that the first reflector layer ( 14 ) in the first pattern and / or the second reflector layer ( 24 ) in the third pattern at least one recess ( 32 ).
  8. Method according to one of claims 5 to 7, characterized in that the second reflector layer ( 24 ) in reflection one of the first reflector layer ( 14 ) produces different visual impression.
  9. Method according to one of claims 3 to 8, characterized by the steps - generating a third microstructure ( 42 ) on the front side of the substrate ( 12 ), especially over the section ( 20 ), and - printing a third reflector layer ( 44 ) to the third microstructure ( 42 ) having a homogeneous thickness (d) in a fourth pattern, which can be seen from the front side, while in step e) the third reflector layer ( 44 ) and - wherein the first reflector layer ( 14 ) and / or the third reflector layer ( 44 ) is / are applied such that the first reflector layer ( 14 ) in the first pattern and / or the third reflector layer ( 44 ) in the fourth pattern at least one recess ( 32 ).
  10. Method according to claim 9, characterized in that a third structurable layer ( 40 ) and the third microstructure ( 42 ) in this layer ( 40 ), preferably by embossing.
  11. A method according to claim 10, characterized in that the first reflector layer ( 14 ) between the first microstructure ( 16 ) and the third microstructure ( 42 ) is arranged.
  12. A method according to claim 10, characterized in that a transparent carrier layer ( 46 ), between the first microstructure ( 16 ) and the third microstructure ( 42 ) is provided.
  13. Method according to one of the preceding claims, characterized in that a fourth reflector layer ( 30 ), which in reflection one of the first reflector layer ( 14 ) produces different optical impression, in regions over the first reflector layer ( 14 ) is printed with homogeneous thickness (d), wherein in step e) simultaneously the fourth reflector layer ( 30 ) and wherein the first reflector layer ( 14 ) and / or the fourth reflector layer ( 30 ) is / are printed such that the first reflector layer ( 14 ) in the first pattern and / or the fourth reflector layer ( 30 ) at least one recess ( 32 ).
  14. Method according to one of the preceding claims, characterized in that a laser-radiation-sensitive layer ( 48 ), which changes the color on laser radiation, is applied and changed in color by the laser ablation.
  15. Security element, comprising - at least a first structural layer ( 22 ), - a first microstructure ( 16 ) in a front side of the first structural layer ( 22 ) and - a first reflector layer ( 14 ) referring to the first microstructure ( 16 ) is printed with a homogeneous thickness (d), - wherein the first reflector layer ( 14 ) is patterned in a first pattern, which is visible in a plan view of the front, and - wherein the first reflector layer ( 14 ) a recess produced by means of laser ablation ( 18 ) in the form of a second pattern, which is visible in plan view of the front.
DE102016009437.0A 2016-08-03 2016-08-03 Security element and method for producing a security element Withdrawn DE102016009437A1 (en)

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EP1689586A2 (en) 2003-11-14 2006-08-16 Printetch Limited Security printing using a diffraction grating
EP1689586B1 (en) 2003-11-14 2014-01-15 Basf Se Security printing using a diffraction grating
US20100037326A1 (en) * 2006-09-15 2010-02-11 Odisea Batistatos Radiation curable embossed ink security devices for security documents
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WO2010069823A1 (en) 2008-12-19 2010-06-24 Basf Se Thin aluminum flakes
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WO2011064152A1 (en) 2009-11-26 2011-06-03 Universität Bern Verwaltungsdirektion Inhibitors of topoisomerase i for the treatment of autoimmune diseases
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