DE102014216240A1 - Reflektives optisches Element - Google Patents

Reflektives optisches Element Download PDF

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Publication number
DE102014216240A1
DE102014216240A1 DE102014216240.8A DE102014216240A DE102014216240A1 DE 102014216240 A1 DE102014216240 A1 DE 102014216240A1 DE 102014216240 A DE102014216240 A DE 102014216240A DE 102014216240 A1 DE102014216240 A1 DE 102014216240A1
Authority
DE
Germany
Prior art keywords
optical element
channel
reflective
layer system
shaped defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102014216240.8A
Other languages
German (de)
English (en)
Inventor
Dirk Heinrich Ehm
Moritz Becker
Irene Ament
Gisela VON BLANCKENHAGEN
Jörn Weber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102014216240.8A priority Critical patent/DE102014216240A1/de
Priority to PCT/EP2015/068306 priority patent/WO2016023840A1/de
Priority to JP2017508479A priority patent/JP6722655B2/ja
Publication of DE102014216240A1 publication Critical patent/DE102014216240A1/de
Priority to US15/433,708 priority patent/US10061205B2/en
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/085—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal
    • G02B5/0875—Multilayer mirrors, i.e. having two or more reflecting layers at least one of the reflecting layers comprising metal the reflecting layers comprising two or more metallic layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE102014216240.8A 2014-08-15 2014-08-15 Reflektives optisches Element Ceased DE102014216240A1 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE102014216240.8A DE102014216240A1 (de) 2014-08-15 2014-08-15 Reflektives optisches Element
PCT/EP2015/068306 WO2016023840A1 (de) 2014-08-15 2015-08-07 Reflektives optisches element
JP2017508479A JP6722655B2 (ja) 2014-08-15 2015-08-07 反射光学素子
US15/433,708 US10061205B2 (en) 2014-08-15 2017-02-15 Reflective optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014216240.8A DE102014216240A1 (de) 2014-08-15 2014-08-15 Reflektives optisches Element

Publications (1)

Publication Number Publication Date
DE102014216240A1 true DE102014216240A1 (de) 2016-02-18

Family

ID=54011694

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014216240.8A Ceased DE102014216240A1 (de) 2014-08-15 2014-08-15 Reflektives optisches Element

Country Status (4)

Country Link
US (1) US10061205B2 (https=)
JP (1) JP6722655B2 (https=)
DE (1) DE102014216240A1 (https=)
WO (1) WO2016023840A1 (https=)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016213839A1 (de) 2016-07-27 2016-12-15 Carl Zeiss Smt Gmbh Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels
DE102017211824A1 (de) 2017-07-11 2017-09-21 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102017213178A1 (de) 2017-07-31 2018-06-21 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102016226202A1 (de) 2016-12-23 2018-06-28 Carl Zeiss Smt Gmbh Optisches Element, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102017200667A1 (de) 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem
US10338476B2 (en) 2015-12-16 2019-07-02 Carl Zeiss Smt Gmbh Reflective optical element
DE102018211498A1 (de) * 2018-07-11 2019-08-01 Carl Zeiss Smt Gmbh Optische Anordnung
US10684553B2 (en) 2017-04-11 2020-06-16 Carl Zeiss Smt Gmbh Wavefront correction element for use in an optical system

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6869242B2 (ja) * 2015-11-19 2021-05-12 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のためのｅｕｖソースチャンバーおよびガス流れ様式、多層ミラー、およびリソグラフィ装置
DE102016213831A1 (de) 2016-07-27 2018-02-01 Carl Zeiss Smt Gmbh Reflektives optisches Element für die EUV-Lithographie
DE102016224200A1 (de) 2016-12-06 2018-06-07 Carl Zeiss Smt Gmbh Verfahren zum Reparieren von reflektiven optischen Elementen für die EUV-Lithographie

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060216912A1 (en) * 2005-03-28 2006-09-28 Bristol Robert L Methods to manufacture contaminant-gettering materials in the surface of EUV optics
WO2008148516A2 (en) 2007-06-06 2008-12-11 Carl Zeiss Smt Ag Reflective optical element and method for operating an euv lithography device

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GB1499684A (en) * 1974-06-20 1978-02-01 Westinghouse Electric Corp High power laser mirror
EP1624467A3 (en) * 2003-10-20 2007-05-30 ASML Netherlands BV Lithographic apparatus and device manufacturing method
JP4025316B2 (ja) * 2004-06-09 2007-12-19 株式会社東芝 半導体装置の製造方法
DE102006008784A1 (de) * 2006-02-24 2007-09-06 Rodenstock Gmbh Kratzfeste entspiegelte Oberfläche mit Antifog-Eigenschaften
KR20090105747A (ko) * 2008-04-03 2009-10-07 삼성전자주식회사 광주사장치 및 이를 채용한 화상형성장치
JP5061069B2 (ja) * 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光を用いる半導体露光装置
IT1400159B1 (it) * 2010-03-15 2013-05-17 St Microelectronics Srl Metodo di fotolitografia ad elevata risoluzione per la realizzazione di nanostrutture, in particolare nella fabbricazione di dispositivi elettronici integrati
KR101846336B1 (ko) * 2010-06-25 2018-04-06 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 방법
DE102011076011A1 (de) * 2011-05-18 2012-11-22 Carl Zeiss Smt Gmbh Reflektives optisches Element und optisches System für die EUV-Lithographie
JP6253641B2 (ja) * 2012-05-21 2017-12-27 エーエスエムエル ネザーランズ ビー．ブイ． リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置
US9335206B2 (en) * 2012-08-30 2016-05-10 Kla-Tencor Corporation Wave front aberration metrology of optics of EUV mask inspection system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060216912A1 (en) * 2005-03-28 2006-09-28 Bristol Robert L Methods to manufacture contaminant-gettering materials in the surface of EUV optics
WO2008148516A2 (en) 2007-06-06 2008-12-11 Carl Zeiss Smt Ag Reflective optical element and method for operating an euv lithography device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10338476B2 (en) 2015-12-16 2019-07-02 Carl Zeiss Smt Gmbh Reflective optical element
DE102016213839A1 (de) 2016-07-27 2016-12-15 Carl Zeiss Smt Gmbh Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels
DE102016226202A1 (de) 2016-12-23 2018-06-28 Carl Zeiss Smt Gmbh Optisches Element, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2018114159A1 (en) 2016-12-23 2018-06-28 Carl Zeiss Smt Gmbh Optical element, in particular for a microlithographic projection exposure apparatus
US10578974B2 (en) 2016-12-23 2020-03-03 Carl Zeiss Smt Gmbh Optical element, in particular for a microlithographic projection exposure apparatus
DE102017200667A1 (de) 2017-01-17 2018-07-19 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem
WO2018134077A1 (de) 2017-01-17 2018-07-26 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische projektionsbelichtungsanlage oder ein inspektionssystem
US11086055B2 (en) 2017-01-17 2021-08-10 Carl Zeiss Smt Gmbh Mirror, in particular for a microlithographic projection exposure apparatus or an inspection system
US10684553B2 (en) 2017-04-11 2020-06-16 Carl Zeiss Smt Gmbh Wavefront correction element for use in an optical system
DE102017211824A1 (de) 2017-07-11 2017-09-21 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102017213178A1 (de) 2017-07-31 2018-06-21 Carl Zeiss Smt Gmbh Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102018211498A1 (de) * 2018-07-11 2019-08-01 Carl Zeiss Smt Gmbh Optische Anordnung

Also Published As

Publication number Publication date
JP2017526007A (ja) 2017-09-07
US10061205B2 (en) 2018-08-28
JP6722655B2 (ja) 2020-07-15
US20170160639A1 (en) 2017-06-08
WO2016023840A1 (de) 2016-02-18

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