DE102013112045A1 - Apparatus and method for processing metallic surfaces with an etching liquid - Google Patents

Abstract

There is provided a method and apparatus for wetting metallic surfaces with an etchant, comprising a first port adapted to supply etchant, a second port adapted to supply a gaseous oxidant, and a mixing nozzle, the mixing orifice having the connected to the first port and the second port so that at an outlet opening of the mixing nozzle, the etching liquid in the form of an aerosol with aerosol particles in the direction of the surface to be treated can be delivered, wherein the droplet size of the aerosol particles by means of a flow restrictor in the second port is adjustable.

Description

The invention relates to a device for processing metallic surfaces with an etching liquid and to a method for processing metallic surfaces with an etching liquid. More particularly, the invention relates to the wetting of metallic surfaces with the etching liquid in a patterning of metallic surfaces such as printed circuit boards or the like as well as for cleaning or activating metallic surfaces.

In industrial technology, such as in the manufacture of printed circuit boards, metallic surfaces are often patterned by means of a suitable etchant. Accordingly, it is possible to manufacture, for example, the finest structures as tracks by an etching process, so that printed circuit board can be provided. The interconnects are usually formed by thin copper tracks, which are produced by etching. During the etching process, the etchant present as aqueous solution is enriched with copper ions, so that the effect of the etchant decreases over time. As etchant, for example, iron (III) chloride can be used, the skilled person also other etchants are known.

Since the decreasing effect of the etchant makes the etching process and thus the production of printed circuit boards increasingly uneconomical, efforts have been made for quite some time to solve this problem in industrial manufacturing.

Thus, it is known from the general state of the art that a regeneration of the etchant must be provided in an etching system, wherein the regeneration takes place in the etching basin in this known example.

From the DE 197 00 470 A1 For example, a method of regenerating etching liquids using UV light and ozone gas is known. In this case, a regeneration device is provided within which spent etchant is treated by means of UV radiation and the addition of ozone.

From the DE 35 39 886 A1 discloses a method for etching etching material, in which an acid is used, which attacks the metal after addition of an oxidizing agent immediately before the actual etching process. The addition of the oxidizing agent is carried out in an amount which slightly exceeds the amount required for the removal, so that a small amount of oxidizing agent remains in the etchant dripping from the etching material. This residual oxidant is then removed from the etchant by a particular device which contains an excess of etchable metal from the etchant.

From the EP 0665309 A1 is a method for removing copper from tin or tin / lead-plated printed circuit boards is known in which the copper to be removed oxidized with an oxidizing agent and the copper oxide is replaced by a phosphoric acid solution, wherein at least from time to time to regenerate the etching solution by adding ozone to Etching solution, a portion of the water is converted into hydrogen peroxide or is converted by anodic oxidation of at least a portion of the phosphoric acid of the etching solution in peroxophosphoric acid.

From the DE 30 46 477 A1 For example, a method of etching metal surfaces is known in which the metal on the circuit is etched away by means of a solution containing phosphoric acid and hydrogen peroxide. The hydrogen peroxide serves to oxidize the metal to be removed, while the phosphoric acid subsequently dissolves the oxidized metal. In this known method, the etching solution before each application or each application is added as much hydrogen peroxide, as is necessary for the respective etching process.

Consequently, from the prior art systems or methods are known in which the regeneration of the etchant takes place in specially designed facilities or by means of hydrogen peroxide.

The provision of these facilities or the introduction of hydrogen peroxide, however, requires some additional effort, which complicates the manufacturing plant for structuring of metallic surfaces, which could lead to increased costs in the production of corresponding workpieces.

It is therefore an object of the invention to provide a device or a method for the production of structured metallic surfaces, in which or in which a simple way a regeneration of etching liquids is made possible.

This object is solved by the features of claims 1 and 11 and 12. Further advantageous embodiments of the invention are each the subject of the dependent claims. These can be combined in a technologically meaningful way. The description, in particular in conjunction with the drawings, additionally characterizes and specifies the invention.

According to the invention there is provided an apparatus for processing metallic surfaces with an etching liquid comprising a first port adapted to supply etchant, a second port adapted to supply a gaseous oxidant, and a mixing nozzle connected to the first port and is connected to the second connection in order to deliver at a discharge opening of the mixing nozzle, a mixture of the etching liquid with the gaseous oxidizing agent in the direction of a metallic surface to be treated, wherein a first part of the mixture surrounds the second part of the mixture and the size of the inclusion by means of a flow restrictor in second connection is adjustable.

In this case, the etching liquid can be delivered either in the form of an aerosol with aerosol particles or in the form of a liquid with gas bubbles in the direction of the surface to be treated. In the first case, the size of the inclusion then corresponds to a drop size of the aerosol particles and in the second case to a bubble size of gas bubbles. These are complementary embodiments, i. which are formed by a liquid surrounded by gas or a gas surrounded by liquid. Unless otherwise indicated, the following description always refers to both versions, without explicitly using in each case the general terms inclusion or mixture. The invention is therefore suitable for spraying droplet-shaped etching liquid, which is surrounded by a gaseous oxidizing agent, or for use in a dip tank, wherein the etching liquid has bubbles of the gaseous oxidizing agent.

Accordingly, the etching liquid is sprayed by means of the mixing nozzle, so that the etching liquid is distributed in the form of an aerosol with aerosol particles in the direction of the surface to be treated. In this case, a gaseous oxidizing agent is used as the spraying agent, which consequently encounters the material to be treated together with the etching liquid. As soon as an etching process is started by the etching liquid, the simultaneously present oxidizing agent ensures an oxidation of the reaction products of the etching process.

If, for example, a copper-clad assembly is present as the metallic surface to be treated, etching with Cu (II) chloride can be carried out. During the regeneration, the Cu (I) chloride formed during the etching of the copper-clad assembly with Cu (II) chloride is reoxidized to Cu (II) chloride by the addition of the oxidizing agent by means of the mixing nozzle.

Accordingly, a regeneration of the etching liquid already takes place during the etching process in the immediate vicinity of the product to be etched and not first in a sump as in the prior art. As a result, the etch rate remains substantially constant, allowing for easier process control and improved accuracy in etching. In particular, the last point is important in the etching of fine structures, since a poorly controllable etching speed could lead to undercuts, which could lead to defects, for example in the production of printed conductors in the manufacture of printed circuits. Furthermore, the droplet size of the aerosol particles can be adapted to the products to be produced, wherein in particular droplet size and desired structure resolution can be correlated. The device according to the invention can also be used for surface activation or cleaning of surfaces, since in these applications also wetting with an etchant must be carried out. An application in a dip tank filled with the etching liquid, into which the product to be treated is immersed, is also possible, as illustrated above.

According to one embodiment of the invention, the flow restrictor is adjustable so that the droplet size of the aerosol particles or the bubble size of the oxidant is substantially constant during delivery.

Thus, the drop size of the aerosol particles is adjusted to a predetermined value during delivery to give uniform etch rates. Also, the bubble size of the gaseous oxidizer may be adjusted to a predetermined value during delivery.

According to a further embodiment of the invention, the flow restrictor is controllable such that the droplet size of the aerosol particles or the bubble size of the oxidizing agent changes during the delivery of the etching liquid, in particular changes periodically up and down or changes alternately between two extreme values.

In this embodiment, the droplet size of the aerosol particles or the bubble size of the gaseous oxidant is varied during the discharge of the etching liquid, so that pattern widths can be machined over a wide range.

According to a further embodiment of the invention, oxygen or ozone can be supplied as oxidizing agent at the second port.

The use of oxygen or ozone or an oxygen-ozone mixture allows a simple way to effect oxidation or oxidation of the reaction products.

According to a further embodiment of the invention, hydrochloric acid or sulfuric acid can be supplied as the etching liquid at the first connection.

These acids are often used in industrial manufacturing and allow a simple and inexpensive supply of an etchant. According to a further embodiment of the invention, a multiplicity of mixing nozzles are provided which apply droplet-shaped etching liquid or etching liquid mixed with gas bubbles to a metallic surface to be etched for structuring, wherein a regeneration of the etching liquid takes place in an etching channel on the metallic surface.

It is also possible to use a plurality of mixing nozzles, which enable a large-area processing in continuous operation.

According to a further embodiment of the invention, the mixing nozzles on a definable emission direction, which is selected perpendicular or oblique to the surface of the material to be etched.

Accordingly, different configurations are possible. In this case, the emission direction can be selected counter to the direction of travel of a production device, but also in the direction of travel or from different directions, so that for each application optimum wetting with the aerosol particles of the etching liquid or offset with gas bubbles of the gaseous oxidant etching liquid is given.

According to a further embodiment of the invention, a light source is additionally provided which is suitable for emitting light in a range having a wavelength of less than 300 nm.

The irradiation of light in the ultraviolet range additionally supports the oxidation, which leads to an improved regeneration of the etchant. The light source can be arranged in the immediate vicinity of the surface of the object to be etched, with simultaneous treatment of upper and lower sides also two or more light sources can be provided.

According to a further embodiment of the invention, the contact time of the drop-shaped etching liquid or the etching liquid mixed with gas bubbles of the gaseous oxidizing agent is adjustable.

The exposure time of the drop-shaped etching liquid or the etching liquid mixed with gas bubbles of the gaseous oxidizing agent can take place, for example, via the supply of etching liquid via the first connection, which enables simple control and creates reliable process control.

According to a further embodiment of the invention, the etching liquid is mixed with a further oxidizing agent which cooperates with the gaseous oxidizing agent.

Accordingly, a further oxidizing agent can be submitted. Through the interaction with the gaseous oxidizing agent, an oxidation of the reduced oxidizing agent then takes place, so that the already consumed oxidizing agent is renewed. By way of example, the use of hydrogen peroxide with sulfuric acid or of hydrogen peroxide with nitric acid or else hydrochloric acid is mentioned. In order to achieve better etching rates, a second liquid oxidizing agent can thus be introduced or added with the gaseous oxidizing agent, which is regenerated again by means of the gaseous oxidizing agent after one cycle and is available for a further oxidation cycle.

In a further aspect of the invention, a method for processing metallic surfaces with an etching liquid is specified, in which the following steps are carried out: provision of a mixing nozzle which is suitable for atomizing etching liquid with an adjustable droplet size by means of a gaseous oxidizing agent as an aerosol and in the direction of to spray a good to be etched, the drop size of the aerosol is set by limiting the flow of the gaseous oxidant.

In yet another aspect of the invention, there is provided a method of processing metallic surfaces with an etchant, comprising the steps of: providing a mixing nozzle capable of providing a gaseous oxidant having an adjustable bubble size in an etchant in the direction of a material to be etched to spray, wherein the bubble size of gaseous oxidant is adjusted via a limitation of the flow of the gaseous oxidant.

The specified method can be used for etching, for example, printed circuit boards, for surface activation or for cleaning surfaces. In these applications, a treatment with an etchant is carried out, in turn, the applications of the Spraying or dipping can be distinguished.

Some exemplary embodiments will be explained in greater detail below with reference to the drawing, in which:

1 a device according to the invention in a side view,

2 (A) to (C) different temporal developments of the drop size with a device according to the invention according to 1 in a cross-sectional view,

3 (A) to (D) different systems with a device according to the invention according to 1 in a cross-sectional view, and

4 a cross-sectional view through a material to be etched when using the device according to the invention 1 ,

In the figures, identical or functionally identical components are provided with the same reference numerals.

The following is with reference to 1 a first embodiment of the invention, which is suitable for example for the production of structured metallic surfaces or for cleaning or activation of metallic surfaces.

The device according to the invention has a mixing nozzle MD which is provided with a first connection EA and a second connection ZA. About the first terminal EA etchant, which in 1 is denoted by the reference FL, the mixing nozzle MD supplied via the first terminal EA. A gaseous component is supplied via the second port ZA of the mixing nozzle MD, wherein in the second port ZA a flow restrictor DB is provided which regulates the flow of the gaseous oxidant OM. The gaseous oxidizing agent OM can be provided, for example, as oxygen, ozone or as an oxygen-ozone mixture.

The etching liquid FL and the gaseous oxidizing agent OM are discharged from the mixing nozzle MD via an outlet opening OE provided for this purpose, so that the etching liquid FL is not delivered as a liquid stream but atomized. This results in an aerosol AE with aerosol particles or drops AP, which are emitted in the direction of the surface to be treated OB.

The droplet size TG of the aerosol particles AP can be set by means of the flow restrictor DB in the second port ZA. Consequently, a drop-shaped etching liquid FL, which is in 1 schematically indicated by the reference AP, delivered. The drops AP in the aerosol AE as the etching liquid FL are delivered in the direction of the material to be etched, for example a printed circuit board, or the object to be cleaned or activated via the outlet opening OE.

The droplet size TG is set via the flow restrictor DB. It is provided that, depending on the application, different temporal developments in the droplet size TG can be set.

In relation to 1 For example, the etching liquid FL was delivered either in the form of an aerosol AE in the direction of the surface to be treated. The drop size TG can be generally referred to as the size of an inclusion. However, the complementary case is also conceivable, ie the etching liquid FL is mixed with gas bubbles of the gaseous oxidizing agent OM, which are emitted in the direction of the surface OB to be treated. This application is particularly provided in a dip tank which is filled with the etching liquid FL and in which the mixing nozzle MD introduces the gaseous oxidizing agent OM. The drop size TG in this case would correspond to a bubble size of gas bubbles. According to the invention, both applications are conceivable.

As in 2 (A) is shown, the droplet size TG, for example, adjustable but constant to be selected. Consequently, there is a time profile of the drop size TG, which has a linear course.

But it is also possible that the droplet size TG is set varying, for example, up and down, as in 2 B) is shown. In this case, a periodic, for example, sinusoidal change in the drop size TG can be provided. However, it is also conceivable to vary the period of the swell and swell.

Furthermore, it is also possible, as in 2 (C) It is shown that the size TG of the drops AP alternately changes between two extreme values. In this case, a periodic, for example rectangular, change in the size TG of the drops AP can be provided.

Different systems that the inventive device according to 1 are used below with reference to the 3 (A) to 3 (D) described.

As in 3 (A) is shown, a plurality of mixing nozzles MD are provided, which in a container BE are arranged. The workpieces to be machined are guided above and below the mixing nozzles MD, which are arranged, for example, at a fixed distance from one another, according to FIG 3 (A) a vertical wetting is provided with the spray of aerosol particles AP.

In the execution according to 3 (B) are also provided a plurality of mixing nozzles MD, which are arranged in the container BE. The workpieces to be machined are again passed above and below the mixing nozzles MD and wetted in a vertical direction with the spray mist of the aerosol particles AP. Between the mixing nozzles MD, a plurality of light sources LQ are provided, which emit light in the ultraviolet range, it being possible, depending on the type of lamp used, to emit monochromatic light of 185 nm or 254 nm, but also a continuous spectrum through the light sources LQ.

In the execution according to 3 (C) In turn, several mixing nozzles MD are provided. The workpieces to be machined are passed above and below the mixing nozzles MD and wetted in one direction with the spray of aerosol particles AP, which is selected obliquely to the running direction of the workpieces.

The execution according to 3 (D) corresponds to the according to 3 (C) , in addition, also in connection with the 3 (B) explained light sources LQ are provided.

By way of example, the use of the device according to 1 to 3 with reference to 4 explained in more detail in an etching process. Here, a printed circuit board LE is shown, which below a structured resist RE has a conductive path LS, which was structured by means of the droplets AP as etching liquid. As the etching channel AK, the intermediate region of the interconnect structure LS is to be considered. If a copper-clad circuit board LE is present as the metallic surface to be treated, the interconnect structure LS can be formed by etching with Cu (II) chloride. The Cu (I) chloride formed during the etching of the interconnect structure LS with Cu (II) chloride is reoxidized to Cu (II) chloride during the regeneration by the addition of the oxidizing agent OM.

The features indicated above and in the claims, as well as the features which can be seen in the figures, can be implemented advantageously both individually and in various combinations. The invention is not limited to the exemplary embodiments described, but can be modified in many ways within the scope of expert knowledge.

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 19700470 A1 [0005]
• DE 3539886 A1 [0006]
• EP 0665309 A1 [0007]
• DE 3046477 A1 [0008]

Claims (12)

Device for processing metallic surfaces with an etching liquid, comprising: A first connection (EA) suitable for supplying etching liquid (FL), A second port (ZA) adapted to supply a gaseous oxidant (OM), and - A mixing nozzle (MD), which is connected to the first port (EA) and the second port (ZA) to at an outlet opening (OE) of the mixing nozzle (MD) a mixture of the etching liquid (FL) with the gaseous oxidant (OM ) in the direction of a metallic surface (OB) to be treated, a first part of the mixture enclosing the second part of the mixture and the size of the inclusion being adjustable by means of a flow restrictor (DB) in the second connection (ZA). Apparatus according to claim 1, which emits the etching liquid (FL) in the form of an aerosol (AE) with aerosol particles (AP) in the direction of the surface (OB) to be treated, the size of the inclusion corresponding to a droplet size (TG) of the aerosol particles (AP) , or which emits the etching liquid (FL) in the form of a liquid with gas bubbles, wherein the size of the inclusion corresponds to a bubble size (TG) of the gas bubbles. Apparatus according to claim 1 or 2, wherein the flow restrictor (DB) is adjustable such that the size (TG) of the enclosure (AP) is substantially constant during delivery, or in which the flow restrictor (DB) is controllable such that the size (TG) of the inclusion (AP) changes during the delivery of the etching liquid (FL), in particular changes periodically up and down or changes alternately between two extreme values. Device according to one of claims 1 to 3, wherein at the second port (ZA) oxygen or ozone can be supplied as the oxidant (OM). Device according to one of Claims 1 to 4, in which hydrochloric acid or sulfuric acid can be supplied as the etching fluid (FL) at the first connection. Device according to one of claims 1 to 5, wherein a plurality of mixing nozzles (MD) are provided, the drop-shaped etching liquid (FL) on a to be etched metallic surface to structure them, wherein a regeneration of the etching liquid (FL) in an etching channel on the metallic surface takes place. Apparatus according to claim 6, wherein the mixing nozzles have a definable emission direction, which is selected perpendicular or oblique to the surface of the material to be etched. Device according to one of claims 1 to 7, wherein in addition a light source (LQ) is provided, which is suitable to emit light in a range having a wavelength of less than 300 nm. Device according to one of claims 1 to 8, wherein the exposure time of the drop-shaped etching liquid (FL) is adjustable. Device according to one of claims 1 to 9, in which a further oxidizing agent is provided, wherein the etching liquid (FL) is mixed with the further oxidizing agent, so that the further oxidizing agent with the gaseous oxidizing agent (OM) cooperates. A method of processing metallic surfaces with an etching liquid, comprising the steps of: providing a mixing nozzle (MD) capable of aerosolizing etching liquid (FL) with an adjustable droplet size (TG) by means of a gaseous oxidant (OM) and to spray in the direction of a material to be etched, wherein the droplet size (TG) of the aerosol is set by limiting the flow of the gaseous oxidizing agent (OM). A method of processing metallic surfaces with an etching liquid, comprising the steps of: providing a mixing nozzle (MD) capable of providing a gaseous oxidant (OM) having an adjustable bubble size in an etchant (FL) toward a material to be etched to spray, wherein the bubble size of gaseous oxidant (OM) is adjusted via a limitation of the flow of the gaseous oxidant (OM).

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