DE102013110328A1 - Coating arrangement and method for operating a coating arrangement - Google Patents

Abstract

According to various embodiments, a coating arrangement (400) may include: a processing area (402); a coating device configured to provide a coating material for coating a substrate (414) located in the processing region (402); and a transport device (100) for transporting the substrate (414) through the processing area (402), the transport device (100) comprising: a transport roller (102), the transport roller (102) including a magnet assembly (104) for providing a magnetic field outside the transport roller (102); and wherein the transport roller (102) is arranged such that the magnetic field is provided in the processing area (402).

Description

The invention relates to a coating arrangement and a method for operating a coating arrangement.

In general, various coating methods can be used for producing thin layers on correspondingly suitable substrates. Chemical vapor deposition processes (CVD, or CVD processes) may be modified in their effect and function, for example, by providing a plasma in an area where the coating of the substrate takes place, such processes being associated with plasma enhanced chemical vapor deposition (PECVD, PECVD). or PECVD processes). In this case, a plasma can be generated by means of microwave radiation (μW-PECVD) and / or by means of a high-frequency (HF) excitation. The coupling of the microwave radiation can be done via horn antennas, λ / 4 antennas, plasmaline sources (single plasmaline sources or duo plasmaline sources). Chemical vapor deposition processes (CVD processes, PECVD processes, μW-PECVD processes) may include undirected deposition of the material, for example, with a 1 / r ² dependence around the plasma zone.

One aspect of various embodiments can be clearly seen in that a magnetic field for plasma bundling in the immediate vicinity of a substrate to be coated can be produced by integrating a magnet arrangement in at least one transport roller, which is required for transporting the substrate, so that a magnetic field ( Eg a stationary magnetic field) above the transport roller and thus also above the surface to be coated of the transported substrate may be provided.

Further, an aspect of various embodiments may be illustratively provided by providing a coating arrangement such that a microwave plasma may be generated within a vacuum processing chamber, wherein the process pressure in the vacuum processing chamber may be limited to a range of less than, for example, about 5 Pa. In other words, the magnetic field that can be generated by means of the magnet arrangement provided within the transport roller, enable a microwave plasma-assisted chemical vapor deposition (μW-PECVD), so that the microwave plasma-assisted chemical vapor deposition in a continuous coating plant (in-line coating system) can be performed, wherein the process pressure in the continuous coating plant can be limited to a range of less than about 5 Pa.

According to various embodiments, a transport device for a coating arrangement may comprise: a transport roller; wherein the transport roller may comprise a magnet assembly for providing a magnetic field outside the transport roller. Furthermore, a transport device for a coating arrangement can have a plurality of transport rollers; wherein the plurality of transport rollers may each comprise a magnet assembly for providing a magnetic field outside the corresponding transport roller; or wherein at least one of the plurality of transport rollers may include a magnet assembly so that a magnetic field may be provided outside the transport roller.

According to various embodiments, a coating arrangement may include: a processing area; a coating device configured to provide a coating material for coating a substrate located in the processing region; and a transport device for transporting the substrate ( 414 through the processing area, the transport device comprising: a transport roller, the transport roller having a magnet assembly for providing a magnetic field outside the transport roller; wherein the transport roller is arranged such that the magnetic field is provided in the processing area.

Furthermore, the magnet arrangement can be integrated in the transport roller. Furthermore, the magnet arrangement can be integrated in the transport roller, wherein the magnet arrangement can be surrounded by at least one rotatably mounted structure.

Furthermore, the magnet arrangement can be set up such that it can generate a stationary magnetic field outside the transport roller. In other words, a part or section of the transport roller, for example, be rotatably mounted, wherein the magnet assembly can be arranged and arranged stationary or immovable.

Furthermore, the magnet arrangement can be set up such that the magnet arrangement generates a homogeneous magnetic field along the length of the transport roller.

According to various embodiments, a coating arrangement may include: a processing area; a transport apparatus as described herein for transporting a substrate through the processing area, wherein the transport roller may be configured such that the magnetic field is provided within the processing area.

Furthermore, the magnet arrangement can be set up and arranged such that the magnet arrangement can generate a homogeneous magnetic field along a direction transverse to the transport direction of the substrate transported through the processing area. The magnet assembly may be configured such that the magnetic field is provided substantially homogeneously along the length of the transport roller. The magnet arrangement can furthermore be set up such that the magnetic field can be homogeneously distributed along a direction substantially perpendicular to the transport direction of the substrate. Furthermore, a corresponding homogeneous magnetic field can be generated in that the magnet arrangement has a symmetry along the length of the transport roller.

According to various embodiments, the coating arrangement may further comprise: a source for generating microwave radiation, and a gas supply for providing a reaction gas in the processing area, so that by means of the microwave radiation, a plasma can be provided in the magnetic field generated by the magnet arrangement in the processing area.

Furthermore, the source for generating microwave radiation may comprise at least one duo-plasmaline source or at least one horn antenna.

According to various embodiments, the coating arrangement may further comprise a cooling arrangement for cooling the magnet arrangement and / or the at least one transport roller.

According to various embodiments, a method of operating a coating arrangement as described herein may include: transporting a substrate through the processing area by the transport device; and coating a processing area facing surface of the substrate transported through the processing area.

The coating of the substrate may further include introducing a precursor into the processing area and generating microwave radiation in the processing area.

Furthermore, the coating of the substrate can be effected by means of a plasma which can be generated by means of the precursor and the microwave radiation in the magnetic field generated by the magnet arrangement, above the surface of the substrate transported through the processing area facing the processing area.

Furthermore, the precursor can be a reactive gas or have a reactive gas.

Furthermore, the introduction of the precursor into the vacuum process chamber can take place such that a process pressure within the vacuum process chamber and / or within the processing region can be less than 5 Pa.

According to various embodiments, a coating arrangement and a coating method may or may not be provided such that large-area deposition of functional layers, for example weathering protective layers, may be accomplished by microwave-excited PECVD in a continuous coating (in-line PVD / CVD) facility. Furthermore, the deposition can be done at a high rate, e.g. greater than about 200nm m / min. Furthermore, according to various embodiments, a coating arrangement and a coating method can be or are provided so that a long service life can be realized, for example a long service life of the coating arrangement without undesired interruption.

Embodiments of the invention are illustrated in the figures and are explained in more detail below.

Show it

1A a cross-sectional view or side view and a plan view of a transport device for a coating arrangement, according to various embodiments;

1B a side view of a transport device for a coating arrangement, according to various embodiments;

2A to 2D each a cross-sectional view of a transport device for a coating arrangement, according to various embodiments;

2E a schematic perspective view of a transport device for a coating arrangement, according to various embodiments;

2F a schematic view of a magnet assembly within a transport roller, according to various embodiments;

3 a cross-sectional view and an associated plan view of a transport device for a coating arrangement, according to various embodiments;

4 a schematic cross-sectional view or side view of a coating arrangement, according to various embodiments;

5 a schematic cross-sectional view or side view of a coating arrangement, according to various embodiments; and

6 a schematic flow diagram of a method for operating a coating arrangement, according to various embodiments.

In the following detailed description, reference is made to the accompanying drawing which forms a part hereof and in which is shown by way of illustration specific embodiments in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "rear", etc. is used with reference to the orientation of the described figure (s). Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It should be understood that other embodiments may be utilized and structural or logical changes may be made without departing from the scope of the present invention. It should be understood that the features of the various exemplary embodiments described herein may be combined with each other unless specifically stated otherwise. The following detailed description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

As used herein, the terms "connected," "connected," and "coupled" are used to describe both a direct and indirect connection, a direct or indirect connection, and a direct or indirect coupling. In the figures, identical or similar elements are provided with identical reference numerals, as appropriate.

For coating substrates or substrates with a large surface area, e.g. with a surface of a size in the square meter range, a coating plant can be configured as a continuous coating plant, a so-called in-line plant, wherein a substrate or a carrier can be guided on transport rollers through the coating area.

In this case, a specific process pressure for the coating within the processing area of a coating installation (eg an in-line coating installation) may be necessary, wherein, for example, the process pressure can not be set arbitrarily in the coating installation. For example, a CVD process and / or a PECVD process may require a certain process pressure for coating or, for example, for igniting the plasma. Usually, in an in-line coater, a process pressure in a range of about 10 ^-3 Pa to about 4 Pa may be provided or provided. In this case, the process pressure due to the design of the in-line coating system or due to the appropriate operating parameters for coating by means of the in-line coating system may be limited. For a process pressure in a processing area of a coating line of less than about 5 Pa, for example, a plasma for a PECVD process can not ignite, so that, for example, for μW-PECVD (eg for a microwave assisted CVD process), a process pressure in a range of greater than about 5 Pa or greater than about 10 Pa may be needed. For partially different pressures, a gas separation can be used within an in-line coating system.

Furthermore, the plasma for a PECVD method can also be ignited by means of a high frequency (HF, eg 13.56 MHz), but for this purpose electrodes over the substrate may be required, which may entail disadvantages, especially for the deposition of electrically non-conductive Layers.

Furthermore, it can be difficult to prepare broad substrates, e.g. with a width of about 2 m to about 4 m by standard method homogeneous coating.

According to various embodiments, the coating arrangement described herein may allow for a broad scaling of a coating process (eg, a PECVD process, or a μW-PECVD process) at a high deposition rate. In this case, for example, the width scaling can be effected by homogenizing the generated microwave plasma over the entire width of the substrate by means of a corresponding magnetic field, so that the homogeneity of the coating process (or the homogeneity of the deposited layer, for example the homogeneity of the layer thickness) does not directly produce the homogeneity of the Microwave radiation is correlated. Furthermore, by means of a magnetic field due to the plasma bundling close to the substrate and due to the high plasma density, a high deposition rate can be achieved at a low gas pressure within the processing region, the plasma density Effectiveness and / or the efficiency of the fragmentation of the precursor can influence, as well as the activation of the reactive gas (for example, oxygen). Further, the plasma density may be increased at a low process gas pressure within the processing area due to the generated magnetic field.

According to various embodiments, the scattering coating can be reduced to undesired areas of the vacuum processing chamber, since by means of the magnetic field the material deposition can be forced onto the surface of the substrate. Thus, particle formation in areas remote from the surface of the substrate to be coated can be reduced, for example, the spotting of secondary precipitates can be reduced, thereby prolonging the life of the coating plant during operation. Furthermore, extensive layer accumulation behind the substrate can be avoided.

As in 1A schematically in a cross-sectional view 101 or side view 101 and in a plan view 101b is shown, a transport device 100 a transport role 102 have, wherein the transport roller 102 a magnet arrangement 104 can have.

According to various embodiments, a magnet arrangement 104 in the transport role 102 be integrated, for example, a magnet arrangement 104 inside the transport roller 102 be arranged. In this case, the transport roller of magnetically transparent material (eg V2A steel, aluminum, titanium) exist or be set up magnetically transparent. Furthermore, the magnet arrangement may be surrounded by a rotatably mounted structure, for example a plurality of sleeves may be arranged around the magnet arrangement for transporting the substrate. Furthermore, a magnet arrangement 104 or at least part of a magnet arrangement 104 on the surface 102 (the lateral surface 102 the transport role 102 ) or near the surface 102 be provided.

According to various embodiments, the transport roller 102 comprise or consist of at least one of the following materials: a magnetic material, a magnetizable material, a ferromagnetic material, iron, magnetic steel, nickel, cobalt, neodymium, boron, neodymium-iron-boron.

Furthermore, the transport roller 102 also have a magnetic core or a magnetic interior which may be surrounded by a roll material such as non-magnetic steel (V2A), titanium, copper and / or aluminum.

According to various embodiments, the transport roller 102 have a permanent magnet. Furthermore, the magnet arrangement 104 be a permanent magnet arrangement or have. According to various embodiments, the magnet assembly 104 also have a coil for generating a magnetic field.

Furthermore, a transport device 100 be used, for example, for transporting a substrate through a coating system, wherein the transport device 100 a plurality of transport rollers 102 which may be spaced apart so that a substrate and / or carrier may be transported through a processing area within a coating line. Furthermore, the transport device 100 be provided within an in-line coating facility.

Furthermore, the transport device 100 a transport role 102 or a plurality of transport rollers 102 which, for example, can transport a planar substrate (not shown) along the transport direction through a coating arrangement. In this case, the transport roller 102 rotate or at least a portion of the transport roller 102 can rotate, so that the transport roller 102 or a section of the transport roller 102 can enable the substrate transport. According to various embodiments, the transport device 100 also more than two transport wheels 102 have, for example, three, four, five or more than five transport rollers 102 , Further, the plurality of transport rollers 102 form a common transport plane, for example by means of their lateral surfaces. According to another embodiment, the transport rollers can also be arranged with an offset to each other, and provide, for example, an arbitrary transport path for transporting a substrate.

In the case that the transport device 100 several transport rollers 102 may include at least one of the plurality of transport rollers 102 a magnet arrangement 104 exhibit. Furthermore, several of the plurality of transport rollers may also be used 102 a magnet arrangement 104 have, or all transport wheels 102 can each have a magnet arrangement 104 exhibit.

According to various embodiments, the transport rollers may 102 be arranged at a distance from each other. Furthermore, the axes of the transport rollers 102 be arranged parallel to each other and the transport rollers 102 can be aligned.

According to various embodiments, a transport roller 102 or can the transport rollers 102 a length 115 in a range of about a few centimeters to about a few meters, for example, in a range of about 30 cm to about 4 m, for example in a range of about 1 m to about 2.5 m, for example in a range of about 2 m to about 3.3 m. According to various embodiments, the transport roller 102 or can the transport rollers 102 a length 105 of more than 1 m.

According to various embodiments, the transport rollers may 102 be arranged within a coating arrangement. Furthermore, a substrate to be coated or a carrier to be coated by means of a transport roller 102 be transported through a process area of a coating plant.

According to various embodiments, the transport roller 102 or can the transport rollers 102 a diameter 113 in a range of about a few centimeters to about one meter, for example, in a range of about 5 cm to about 1 m, for example, in a range of about 10 cm to about 50 cm, for example, in a range of about 15 cm to about 25 cm. According to various embodiments, the transport roller 102 or can the transport rollers 102 a diameter 103 of more than 1 m.

Furthermore, the magnet arrangement can be integrated in a cooling roller.

As in 1B is shown schematically in a side view (along the width 115 the transport role 102 ), the transport roller can coaxially arranged rings 102r have, wherein the rings 102r a larger diameter than the transport roller 102 can have. The Rings 102r For example, they can be rotatably mounted, so that by means of the rotating rings 102r (or pods 102r ) the substrate transport can take place. Thus, for example, the roll itself may be mounted stationarily within a coating or coating equipment, and the rings 102r may transport a substrate or carrier through the coating assembly or coating equipment. In this case, the magnetic field may also be stationary, since the rings 102r For example, may consist of non-magnetic material, so that the solid transport roller 102 can provide a fixed magnetic field.

According to various embodiments, the magnet assembly 104 be surrounded by a rotatably mounted jacket. Furthermore, the magnet arrangement 104 from a rotatably mounted coat and the rings 102r be surrounded.

According to various embodiments, a transport roller 102 two, three, four, five, six, seven, eight, nine, ten, or more than ten rings 102r exhibit. Furthermore, the rings 102r made of the same material as the sheath of the transport roller 102 consist, for example, of a metal, a metallic material or a ceramic.

As in 2A is shown schematically in a cross-sectional view, the transport roller 102 an area 104 in which the magnet arrangement 104 can be arranged. Furthermore, the transport roller 102 be tubular, so that the magnet assembly 104 within the transport role 102 can be arranged. Between the magnet arrangement 104 and the transport role 102 can a gap 106 be set up so that the transport role 102 for example, can be rotatably mounted.

2 B shows a cross-sectional view of the transport device 100 or a cross-sectional view of the transport roller 102 according to various embodiments. The transport role 102 can be an outer surface 102 have, for example, which can come into contact with a substrate to be transported.

As in 2C is shown schematically in a cross-sectional view, the transport roller 102 in addition a storage 108 have, for example, between the magnet assembly 104 and the tubular transport roller 102 , so the transport role 102 rotatably mounted and with the magnet assembly 104 can be connected.

Furthermore, the magnet arrangement 104 inside a tubular transport roller 102 be arranged, with the transport roller 102 additional rings 102r (or pods 102r ). In this case, for example, only the surfaces 102m The Rings 102r or the lateral surfaces 102m the sleeves 102r have mechanical contact with a substrate or carrier to be transported, as in 2D is illustrated.

2E exemplifies a transport device 100 having a transport roller 102 and a magnet assembly 104 in a perspective view. Further, by way of example, a magnetic field configuration north-south-north for the magnet assembly 104 shown. It is understood that the polarity can also be arranged reversed (south-north-south). The magnetic field can be generated by means of an annular or at least partially annular magnet, for example by means of a permanent magnet. Furthermore, the Magnetic field generated by means of an array of bar magnets.

Furthermore, the magnet arrangement 104 be arranged and arranged such that a substantially homogeneous magnetic field, with symmetry in the direction of the roller axis, outside the transport roller 102 is generated, so that can be bundled in this magnetic field in plasma and that the spatial distribution of the plasma along the roller axis is substantially homogeneous.

As in 2F is shown schematically in a cross-sectional view, the magnet assembly 104 within the transport role 102 by means of two (eg straight or curved) permanent magnets 104 be provided. In this configuration, two equal poles, for example, the south pole of both permanent magnets adjoin one another, but the permanent magnets may be arranged such that there is a gap 204 between the permanent magnets 104 located. Furthermore, the magnet arrangement 104 more than two permanent magnets 104 exhibit. The magnet arrangement 104 may be configured as an annular gap magnet arrangement.

Like in the 2F is shown, the gap 204 between the arcuate permanent magnets 104 relative to by means of the transport roller 102 provided transport level 102e be arranged such that the gap 204 the smallest possible distance to the transport plane 102e (or transport path 102e ) having.

The magnet arrangement 104 can be a permanent magnet 104 or a plurality of permanent magnets 104 have, wherein by means of the magnet arrangement 104 a magnetic field above the lateral surface 102 the transport role 102 wherein the magnetic flux density may be in a range greater than about 10 mT, for example, the horizontal magnetic field strength or magnetic flux density may be in a range from about 10 mT to about 300 mT, or even greater than 300 mT.

The magnet arrangement 104 can within the transport role 102 be arranged and arranged such that the magnetic flux density outside the transport roller 102 , for example, above one by means of the transport roller 102 transported substrate may be as large as possible, so that the coating process can be effectively supported and / or provided by the generated magnetic field.

According to various embodiments, the transport roller 102 be cooled by a cooling arrangement or thermally coupled to a cooling arrangement. Furthermore, the magnet arrangement 104 be cooled by a cooling arrangement or thermally coupled to a cooling arrangement. Cooling the transport roller 102 and / or the magnet assembly 104 can be done for example by means of water cooling. Furthermore, the transport roller 102 a device for conducting a cooling liquid, for example water, have. Furthermore, the magnet arrangement 104 a device for conducting a cooling liquid, for example water, have. In this case, the cooling liquid, for example by means of copper pipes or a copper cooling arrangement by the transport roller 102 and / or the magnet arrangement 104 be passed through.

Cooling the magnet assembly 104 may be necessary, for example, so that the remanence of the permanent magnets 104 due to heating of the magnet assembly 104 does not decrease or so the remanence of the permanent magnets 104 as high as possible.

Furthermore, the magnet arrangement 104 and / or the permanent magnets 104 comprise or consist of at least one of the following materials: iron, nickel, cobalt, neodymium, boron, and / or an alloy of the metals described.

According to various embodiments, the magnet assembly 104 also have a coil or a plurality of coils, so that a corresponding magnetic field can be provided.

As in 3 schematically in a cross-sectional view 301 and in a plan view 301b is shown, the transport device 100 at least one transport role 102 which is a magnet arrangement 104 include, as well as other transport roles 302 , which may be configured, for example, as standard transport rollers (without a magnet arrangement 104 ). The majority of transport wheels 102 . 302 can be a transport plane 102e or provide a transport path as already described.

Furthermore, the transport roller 102 be rotatably mounted, for example by means of a storage 108 (For example, having one or more ball bearings or roller bearings), wherein a gap between the transport roller 102 and the magnet assembly 104 is set up. Furthermore, the magnet arrangement 104 be stationary, so that the magnet assembly 104 in the transport of a substrate by means of the transport roller 102 can not turn. Thus, a constant and temporally immutable magnetic field above the transport roller 102 , For example, in a processing area of a vacuum coating system, be provided.

According to various embodiments, the transport rollers may 102 . 302 at a distance 303 from each other, measured as the distance of parallel axes, for example at a distance in a range of about a few centimeters to about one meter, eg in a range of about 5 cm to about 1 m, for example in a range of about 10 cm to about 60 cm, eg in a range of about 20 cm to about 40 cm.

According to various embodiments, the diameter 313 the transport rollers 302 which, for example, no magnet arrangement 104 have, equal to the diameter 113 the transport role 102 be.

Furthermore, the diameter 313 the transport rollers 302 which, for example, no magnet arrangement 104 have, less than or greater than the diameter 113 the transport role 102 be. In this case, the transport rollers 302 be arranged such that the lateral surfaces of the transport rollers 102 . 302 a corresponding transport level 102e form.

As in 4 is shown schematically in a cross-sectional view, a coating arrangement 400 at least: a processing area 402 ; and a transport device 100 for transporting a substrate 414 through the processing area 402 through, with at least one transport roller 102 is set up such that the magnetic field in the processing area 402 is provided.

The magnetic field can be the substrate 414 penetrate, so that the magnetic field by means of the magnet assembly 104 above the surface 414a of the substrate 414 may be provided, the surface 414a of the substrate 414 the processing area 402 may be facing. Furthermore, the surface can be 414a of the substrate 414 within the processing area 402 the coating arrangement 400 be coated. The substrate 414 can by means of the transport device 100 within the transport level 102e along the transport direction 403 be transported. The transport direction 403 may be substantially perpendicular to the roller axes.

As in 5 is shown schematically in a cross-sectional view, the coating arrangement 400 further a vacuum processing chamber 500 exhibit.

According to various embodiments, by means of the vacuum process chamber 500 a vacuum in the range of the rough vacuum, the fine vacuum, the high vacuum or the ultrahigh vacuum be or become. In this case, the vacuum can be generated by means of a vacuum pump arrangement (not shown). According to various embodiments, a process pressure within the vacuum process chamber 500 be provided dynamically, wherein during the process both at least one gas in the vacuum process chamber 500 is introduced, as well as gas from the vacuum process chamber 500 is pumped by the vacuum pump assembly. This can set a balance, whereby the process pressure can be set.

According to various embodiments, within the processing area 402 For example, a process pressure in a range of about 10 ^-6 mbar to about 0.05 mbar may or may not be provided, eg, the process pressure may be in a range less than about 0.05 mbar. Thus, for example, a microwave plasma within the processing area 402 by the assistance of the magnetic field of the magnet arrangement 104 be ignited or ignited, the microwave plasma would not ignite, for example, without the magnetic field.

For example, the microwave plasma may be within a range due to the magnetic field configuration 516 Ignite above the substrate. It can thus due to the magnet arrangement 104 a plasma beam on the surface 414a of the substrate 414 be generated.

The microwave plasma, for example, by means of a horn antenna 518b or by means of a plasmaline source 518a or another suitable microwave radiation source 518a . 518b or a combination of several microwave radiation sources 518a . 518b be generated. The microwave radiation source may be disposed within the vacuum processing chamber. Furthermore, the microwave radiation source can be within the processing area 402 be arranged. By means of a microwave radiation source or several sources of microwave radiation can microwave radiation 519 be sent out and within the magnetic field, which in the area 516 by means of the transport device 100 (the magnet arrangement 104 ) is generated, a plasma can be generated.

According to various embodiments, the plasma may be within the range 516 also be generated by means of a high frequency excitation (eg by means of an RF source).

The plasma in the area 516 can support a coating process, eg a CVD process. This can be done by means of a gas supply 520 a reaction gas, for example a gaseous precursor, is introduced into the processing area be so that by means of the microwave radiation, a plasma can be provided in the magnetic field generated by the magnetic field in the processing area. By means of the plasma in the area 516 Pyrolysis of the reaction gas, or of the precursor, can take place, for example at a lower temperature and / or at a lower process pressure compared to a purely thermal decomposition. The proximity of the generated plasma to the substrate 414 can improve the coating process.

The gas pressure of the reaction gas, or of the precursor, within the processing area can be or be adjusted dynamically.

The coating arrangement 400 can be used, for example, to realize a so-called plasma assisted or plasma enhanced chemical vapor deposition (PACVD) or Plasma Enhanced Chemical Vapor Deposition (PECVD). By means of the coating arrangement 400 For example, homogeneous dielectric layers can be applied to wide substrates 414 be deposited.

According to various embodiments, the substrate 414 a width (eg a spatial extension perpendicular to the transport direction 403 ) in a range of about 1 m to about 4 m, for example, the width of the substrate 414 in a range of about 1.5 m to about 4 m, for example in a range of about 3 m to about 4 m. According to various embodiments, the substrate 414 have a width of more than 1.5 m.

Furthermore, this can be done by means of the magnet arrangement 104 generated magnetic field over the entire width of the substrate 414 extend. Furthermore, the width of the substrate 414 the extent of the substrate 414 along a direction parallel to the longitudinal axis of the transport roller 102 be.

6 schematically shows a process flow of a method 600 for operating a coating arrangement 400 , The procedure 600 for operating a coating arrangement 400 may include: in 610 , transporting a substrate 414 by means of the transport device 100 through the processing area 402 therethrough; and in 620 , coating a processing area 402 facing surface 414a through the processing area 402 transported through substrate 414 , In this case, the coating of the substrate 414 for example, during transport of the substrate 414 take place, or the substrate 414 can in the processing area 402 be transported into it, then coated, and then out of the processing area 402 be transported out.

The procedure 600 for operating a coating arrangement 400 may be modified and adapted such that the functionalities and features of the coating arrangement described herein 400 , the transport role 102 , the magnet arrangement 104 , the vacuum process chamber 500 , the gas supply 520 and / or the plasma sources 518a . 518b are considered.

As already described, the coating of the substrate 414 within the processing area 402 carried out, wherein a CVD method can be used, wherein a precursor or a reactive gas in the processing area 402 can be initiated and by means of the plasma, which by means of the microwave radiation and the magnetic field in the area 516 is generated, can be decomposed, leaving the substrate 414 is coated.

Furthermore, the introduction of the precursor into the vacuum process chamber can be dynamically controlled and / or regulated, so that a process pressure within the vacuum process chamber and / or within the processing range of less than 5 Pa can be provided.

According to various embodiments, by means of the coating arrangement described herein 400 or a suitably adapted coating method 600 a plasma-assisted vacuum coating of substrates (eg non-magnetic substrates) can be realized. For example, functional oxide layers (eg silicon oxide layers) and / or nitride layers (eg silicon nitride layers) can be deposited, which can be used, for example, in heat protection layer systems, solar thermal absorbers, reflectors, and / or thin-film photovoltaic systems. Furthermore, SiO _x -based weathering protective layers, diffusion barriers for architectural glass, photovoltaics, solar absorbers and / or solar reflectors can be produced. Furthermore, metal nitrides and / or metal oxides can be deposited as Ag seed layer for low-E layer systems (layer systems for a low emission of heat radiation). According to various embodiments, TCO layers (transparent conductive oxide layers) for display technology and photovoltaic systems can be deposited.

According to various embodiments, by means of the coating arrangement described here or a suitably adapted coating method, homogenization of the plasma over the entire width of the substrate can take place independently of the homogeneity of the microwave feed. According to different In embodiments, the high plasma density may allow effective fragmentation of the precursor and activation of the reactive gas (eg, oxygen); and thus, a high deposition rate can be enabled. Furthermore, an increase in the plasma density can be achieved at low process gas pressures. Furthermore, a concentration of the plasma density in the vicinity of the substrate can take place, so that, for example, a reduction of scattering coating and particle formation outside the substrate can be realized. Furthermore, extensive layer accumulation behind the substrate can be avoided.

According to various embodiments, due to the magnetic field (eg, arranged such that a circumferentially closed zero line of the magnetic field is provided (a so-called "race track" arrangement)) which can be provided behind the substrate along the entire width of the substrate by means of a magnet arrangement Homogenization of the plasma can be carried out, wherein the plasma can be distributed over the entire substrate width within the processing area ("race track"), and wherein the distribution of the plasma can be largely independent of the feed distribution of the microwave power. By means of the magnet arrangement, a magnetic field can be provided which can guide the electrons in the magnetic field in a closed (circulating) path, so that plasma excitation in the vicinity of the transport roller can or may be assisted.

According to various embodiments, a strong, balanced magnetic field can be provided with a short distance behind the substrate so that high plasma density and effective fragmentation can lead to a high efficiency and a high deposition rate. Further, this can be effective in the bundling of secondary electrons so that dense plasma (e.g., unbalanced) can be provided at low pressure. Furthermore, the magnetic field can be provided by means of the magnet arrangement in such a way that the highest plasma density can be directly at the surface of the substrate to be coated and thus a reduction of the scattering layer thickness can ensure a long service life.

According to various embodiments, the placement of the magnet assembly may be in one or more transport rollers. Thus, obstruction of substrate transport upon accumulation of layers behind the substrate can be avoided since coating of an area behind the substrate can be reduced by, for example, substrate gaps. Furthermore, according to various embodiments, the possibility of substrate heating may result if cooling is implemented.

According to various embodiments, a large area deposition may be enabled, for example over the entire width of the substrate, e.g. over a width in a range of about 2 m to about 4 m.

According to various embodiments, deposition of a layer on the surface of a substrate may be allowed at a high rate, for example, at a deposition rate in a range of approximately 200 nm / min or at a deposition rate greater than approximately 200 nm / min.

According to various embodiments, deposition of a layer on the surface of a substrate may be facilitated by microwave excited PECVD, for example, deposition may be at a gas pressure of about 5 Pa, or, for example, at a gas pressure in a range less than about 5 Pa.

According to various embodiments, a large-area deposition of a layer on the surface of a substrate may be allowed at a high rate, for example, at a deposition rate in a range of about 200 nm m / min or at a deposition rate greater than about 200 nm m / min. According to various embodiments, large-scale high-rate deposition may be enabled by microwave-excited PECVD, for example, the deposition may be at a gas pressure of about 5 Pa or, for example, at a gas pressure in a range less than about 5 Pa.

According to various embodiments, a transport roller or a plurality of transport rollers may be used in a horizontal vacuum coating equipment (e.g., glass, foil, or metal strip coating equipment) wherein a magnetic field assembly may be stationarily disposed in the pipe interior volume of the respective transport roller. Furthermore, the magnetic field arrangement can have a self-contained, circumferential magnetic annular gap ("race track"). For this purpose, for example, a magnetic field can be provided at the roller ends or be (by means of the magnet arrangement), so that the electrons are deflected. Illustratively, the magnetic field of the roll can be "terminated" by an array of magnets of the same polarity, so that electrons are "trapped" in the magnetic field.

According to various embodiments, the substrate material moved and / or transported on the transport roller may be flooded by an annular gap magnetic field, wherein the horizontal magnetic field strength or the magnetic flux density may be in a range of at least about 10 mT, eg in a range of about 50 mT about 300 mt. As a result, in this magnetic field arrangement (provided by means of the transport device 100 ), ie outside of the transport roller or on the transported substrate surface, a powerful microwave-generated plasma discharge can be focused. Furthermore, in a vacuum, mediated by an externally supplied gas inlet and / or precursor inlet (for example for introducing HMDSO), a microwave-based PECVD discharge can take place, which can cause intensive coating of the substrate surface transported in vacuum in the roller area.

According to various embodiments, the substrate may rest on the transport roller having the magnet assembly.

According to various embodiments, the microwave antennas may, for example, have the shape of a waveguide, and be channel-shaped, semi-tubular and / or funnel-shaped. For example, in accordance with various embodiments, the microwave antennas may be operated at 2.54 GHz, i. a microwave with a frequency of 2.54 GHz can be generated, with a wavelength corresponding to approximately 1 cm. Further, the microwave antennas may be operated, for example, at a different frequency, e.g. a frequency in the gigahertz range, for example 2.45 GHz.

According to various embodiments, the precursor (eg, HMDSO, TM-DSO, and / or silicone oils) may include or provide the coating material. According to various embodiments, the chemical reaction may be in the gas phase over the substrate (e.g., a SiO 2 coating).

According to various embodiments, the substrate may be spared due to the lower amplitude of the microwave compared to the RF Sutter. According to various embodiments, higher deposition rates can be achieved than with conventional PECVD processes and at best can generate new types of layers and layer systems, since the splitting of the gas molecules can take place directly in the concentrated plasma. According to various embodiments, for example, it is possible to dispense with electrodes in the vicinity of the substrate (as required in HF sputtering). By means of the sufficiently high plasma concentration on the substrate, the ignition of the plasma can take place at a process pressure of less than 5 Pa.

Furthermore, the transport device 100 and the coating arrangement 400 also be used in an RF-excited PECVD method, for example for plasma bundling, as described above.

According to various embodiments, a coating arrangement 400 be part of an in-line coating system. Furthermore, the transport device 100 be part of an in-line coating system.

According to various embodiments, a plasma may be generated by means of a plasma generation device ( 516 ) in the magnetic field generated by the magnet arrangement in the processing area ( 402 ) to be provided. In this case, for example, a plasma generating device may comprise a magnetron, for example a planar magnetron or a tubular magnetron. In this case, the magnetron can be operated by means of a process gas, for example argon, to generate the plasma. Furthermore, by means of the magnetron and an additional reactive gas, a reactive sputtering process can be carried out.

According to various embodiments, a physical or chemical vapor deposition may be performed by means of a coating device. The coating device may provide a vaporous material for coating a substrate.

Claims (13)

Coating arrangement ( 400 ), comprising: a processing area ( 402 ); a coating device configured to provide a coating material for coating a coating in the processing area ( 402 ) substrate ( 414 ); and a transport device ( 100 ) for transporting the substrate ( 414 ) through the processing area ( 402 ), wherein the transport device ( 100 ): - a transport roller ( 102 ), The transport roller ( 102 ) a magnet arrangement ( 104 ) for providing a magnetic field outside the transport roller ( 102 ) having; the transport roller ( 102 ) is arranged such that the magnetic field in the processing area ( 402 ). Coating arrangement according to claim 1, wherein the magnet arrangement ( 104 ) in the transport roller ( 102 ), and wherein the magnet arrangement ( 104 ) is surrounded by at least one rotatably mounted structure. Coating arrangement according to claim 1 or 2, wherein the magnet arrangement ( 104 ) is arranged such that it has a stationary magnetic field outside the transport roller ( 102 ) generated. Coating arrangement according to one of claims 1 to 3, wherein the magnet arrangement ( 104 ) is arranged such that it has a homogeneous magnetic field along the length ( 115 ) of the transport roller ( 102 ) generated. Coating arrangement according to one of claims 1 to 4, wherein the magnet arrangement ( 104 ) is arranged and arranged such that the magnet arrangement ( 104 ) a homogeneous magnetic field along one direction ( 115 ) transversely to the transport direction ( 403 ) of the substrate ( 414 ) through the processing area ( 402 ) generated. Coating arrangement according to one of claims 1 to 5, wherein the coating device comprises a plasma generating device for generating a plasma at least within the magnetic field in the processing region. Coating arrangement according to one of claims 1 to 6, wherein the coating device comprises: - a source ( 518a . 518b ) for generating microwave radiation ( 519 ); and - a gas supply ( 520 ) for providing a reaction gas in the processing area ( 402 ), so that by means of the microwave radiation ( 519 ) a plasma ( 516 ) in the magnetic field generated by the magnet arrangement in the processing area ( 402 ) can be provided. Coating arrangement according to claim 7, wherein the source ( 518a . 518b ) for generating microwave radiation ( 519 ) has at least one duo-plasmaline source or at least one horn antenna. Coating arrangement according to one of claims 1 to 8, further comprising: a cooling arrangement for cooling the magnet assembly ( 104 ) and / or the at least one transport roller ( 102 ). Method for operating a coating arrangement ( 400 ) according to one of claims 1 to 9, wherein the method comprises: - transporting a substrate ( 414 ) by means of the transport device ( 100 ) through the processing area ( 402 through; and - coating a processing area ( 402 ) facing surface ( 414a ) of the processing area ( 402 ) transported substrate ( 414 ) with the coating material provided by the coating device. Process according to claim 10, wherein the coating of the substrate ( 414 ) further introducing a precursor into the processing area ( 402 ) and the generation of microwave radiation ( 519 ) in the processing area ( 402 ) having. Process according to claim 11, wherein the coating of the substrate ( 414 ) by means of a plasma, which by means of the precursor and the microwave radiation ( 519 ) in which of the magnet assembly ( 104 ), above the processing area ( 402 ) facing surface ( 414a ) of the processing area ( 402 ) transported substrate ( 414 ), is produced. Method according to claim 11 or 12, wherein the introduction of the precursor into the processing area ( 402 ) such that a process pressure within the processing area ( 402 ) is less than 5 Pa.

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