DE102012018635A8 - Verfahren zum Herstellen einer 3D-Struktur - Google Patents

Verfahren zum Herstellen einer 3D-Struktur Download PDF

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Publication number
DE102012018635A8
DE102012018635A8 DE102012018635.5A DE102012018635A DE102012018635A8 DE 102012018635 A8 DE102012018635 A8 DE 102012018635A8 DE 102012018635 A DE102012018635 A DE 102012018635A DE 102012018635 A8 DE102012018635 A8 DE 102012018635A8
Authority
DE
Germany
Prior art keywords
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102012018635.5A
Other languages
English (en)
Other versions
DE102012018635A1 (de
Inventor
Walter Prof. Dr.-Ing. Lang
Miron Kropp
Mike Bülters
Dr. Schröder Martin
Bergmann Ralf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universitaet Bremen
Bremer Institut fuer Angewandte Strahltechnik BIAS GmbH
Original Assignee
Universitaet Bremen
Bremer Institut fuer Angewandte Strahltechnik BIAS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaet Bremen, Bremer Institut fuer Angewandte Strahltechnik BIAS GmbH filed Critical Universitaet Bremen
Priority to DE201210018635 priority Critical patent/DE102012018635A1/de
Publication of DE102012018635A1 publication Critical patent/DE102012018635A1/de
Publication of DE102012018635A8 publication Critical patent/DE102012018635A8/de
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037Production of three-dimensional images
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10Processes of additive manufacturing
    • B29C64/141Processes of additive manufacturing using only solid materials
    • B29C64/153Processes of additive manufacturing using only solid materials using layers of powder being selectively joined, e.g. by selective laser sintering or melting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00Processes of additive manufacturing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
DE201210018635 2012-09-21 2012-09-21 Verfahren zum Herstellen einer 3D-Struktur Withdrawn DE102012018635A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE201210018635 DE102012018635A1 (de) 2012-09-21 2012-09-21 Verfahren zum Herstellen einer 3D-Struktur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201210018635 DE102012018635A1 (de) 2012-09-21 2012-09-21 Verfahren zum Herstellen einer 3D-Struktur

Publications (2)

Publication Number Publication Date
DE102012018635A1 DE102012018635A1 (de) 2014-03-27
DE102012018635A8 true DE102012018635A8 (de) 2014-07-03

Family

ID=50234901

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201210018635 Withdrawn DE102012018635A1 (de) 2012-09-21 2012-09-21 Verfahren zum Herstellen einer 3D-Struktur

Country Status (1)

Country Link
DE (1) DE102012018635A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015004151B4 (de) 2015-03-31 2022-01-27 Feinmetall Gmbh Verfahren zur Herstellung einer Federkontaktstift-Anordnung mit mehreren Federkontaktstiften
EP3537216B1 (de) * 2018-03-09 2021-09-15 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zur herstellung einer röntgen- und röntgenbeugungsoptik
DE102019211001A1 (de) * 2019-07-24 2021-01-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur digitalen Erzeugung eines optischen Elements mit integrierten Funktionalitäten und derart hergestelltes optisches Element

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG52858A1 (en) * 1996-11-07 1998-09-28 Univ Singapore Micromachining using high energy light ions
DE10006081A1 (de) 2000-02-11 2001-08-23 Heidelberg Instruments Mikrotechnik Gmbh Verfahren zur Herstellung von dreidimensionalen Mikrostrukturen in Photolack mittels Mehrphotonen-Prozeß
US7014988B2 (en) * 2000-06-15 2006-03-21 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
JP2002189112A (ja) * 2000-12-22 2002-07-05 Canon Inc 回折光学素子の製造方法、回折光学素子の製造方法によって製造したことを特徴とする回折光学素子製造用金型、回折光学素子、および該回折光学素子を有する光学系、光学機器、露光装置、デバイス製造方法、デバイス
US6894762B1 (en) * 2002-09-17 2005-05-17 Lsi Logic Corporation Dual source lithography for direct write application
US7846642B2 (en) * 2007-08-17 2010-12-07 The University Of Massachusetts Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Tormen, m. et al.: "Three-dimensional micro- and nanostructuring by combination of nanoimprint and x-ray lithography", J. Vac. Sci. Technol. B 22(2), pp.766-770 (2004)

Also Published As

Publication number Publication date
DE102012018635A1 (de) 2014-03-27

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee