DE102009039621A1 - Particle beam processing device comprises a vacuum chamber that has a chamber wall with a first opening that is formed in the chamber wall, and a cover that is adapted to cover the opening and to rotate a rotation axis - Google Patents

Abstract

The particle beam processing device comprises a vacuum chamber (101) that has a chamber wall with a first opening that is formed in the chamber wall, a first cover that is adapted to cover the first opening and to rotate a first rotation axis that goes through the first opening, and to cover the second opening that is formed in the first opening, a second cover that is adapted to cover the second opening and to rotate a second rotation axis that goes through the second opening, and a pressure equalizing means that is adapted to reduce or balance a resultant power. The particle beam processing device comprises a vacuum chamber (101) that has a chamber wall with a first opening that is formed in the chamber wall, a first cover that is adapted to cover the first opening and to rotate a first rotation axis that goes through the first opening, and to cover the second opening that is formed in the first opening, a second cover that is adapted to cover the second opening and to rotate a second rotation axis that goes through the second opening, a pressure equalizing means that is adapted to reduce or balance a resultant power from a first pressure difference between a first pressure external of the vacuum chamber and a second pressure in the vacuum chamber that adjoins on the first and second cover, where the power causes on the first and/or the second layer, a third opening in the second cover with a seal that is adapted to close the third opening and to rotate a third rotation axis that goes through the third opening, a limiting means that is adapted to limit a rotation of the seal around the third rotation axis, a control device, a first drive device that is adapted to rotate the first cover controlled by the control device, a second drive device that is adapted to rotate the second cover controlled by the control device, and a rotatable and/or pivotable reception for a workpiece in the vacuum chamber that is adapted to rotate the workpiece controlled by the control device. The second cover is adapted to move a particle beam generator, which is arranged within the vacuum chamber. The first cover is adapted to rotate the first rotation axis over a first layer and/or the second cover is adapted to rotate the second rotation axis over a second layer. The pressure equalizing means comprises a pressure intensifier that has a fluid chamber and a piston that is movable in the fluid chamber in which the movable piston acts a first piston surface on which the first pressure difference between the first pressure and the second pressure acts, and a second piston surface on which the pressure acts in the fluid chamber. The first piston surface and the second piston surface are connected in a first ratio. The pressure equalizing means comprises a first cavity that immobilizes a first pressure reception surface on the first cover and/or a second cavity that immobilizes a second pressure reception surface on the second cover. The fluid chamber is fluidically connected with the first cavity and/or the second cavity. A second ratio of the surface of the first cover that is exposed to the first reception surface, to the first pressure reception surface, and/or a third ratio of the surface of the second cover that is exposed to the first pressure difference, to the second pressure reception surface are larger or equal to the first ratio. A tube is adapted in the seal to close the third opening. The tube has a section with a diameter reducing against its external diameter, where the diameter extends itself through an opening in an upper wall of the pressure chamber. The longitudinal hollow body is arranged in the pressure chamber. The tube has a flange at its external side and is adapted to lock the interior area of the pressure chamber, which has a connection for adjusting the pressure in the area that is mounted through the second cover, tube and the pressure chamber. The particle beam generator is adapted to a rotation-pivotable device in order to pivot a third rotation axis and fourth rotation axis that is vertical to the third rotation axis. The limiting device is adapted to limit the rotation of the seal around the third rotation axis around 360[deg] . The limiting means comprises a guiding member with a guide channel and a guide rod that is mounted at an end at the vacuum chamber.

Description

The present invention relates to a particle beam processing apparatus according to the preamble of claims 1 or 2 or 3.

A particle beam processing apparatus according to the preamble of claim 1 is known from DE 19 21 226 A (equivalent to US 3,588,442 ) known. An example of a particle beam processing apparatus is an electron beam processing apparatus in which an electron gun is used for machining workpieces in a vacuum chamber. Electron beam generators are well known (e.g. US 5,089,686 ).

The object of the invention is to improve a known particle beam processing device with regard to its practical applicability.

This object is achieved by a particle beam processing device according to claim 1 or 2 or 3.

Further developments of the invention are specified in the subclaims.

The arrangement of a particle beam generator within the vacuum chamber along with movement of the particle beam generator via two eccentrically rotatable cover plates allows a drastic reduction of the chamber volume while maintaining a variable workpiece processing.

The provision of a pressure compensation means allows the precise control of the movement of a particle beam generator, the z. B. About two eccentrically rotatable covers z. B. is arranged in the vacuum chamber.

The provision of a limitation of the rotation of the shutter of a third opening in two eccentrically rotatable covers allows the secure prevention of damage to supply lines and the like to a z. B. arranged in the vacuum chamber particle beam generator.

Further features and expediencies will become apparent from the description of embodiments with reference to FIGS. From the figures show:

1 a first embodiment of a particle beam processing device in a vertical sectional view;

2 in a) a plan view of a second embodiment, and in b) a section along AA in 2a) according to the cut 1 ;

3 a sectional view of a part of the embodiment of 1 ;

4. a sectional view of a pressure compensation device; and

5 in a) an embodiment with pressure-force reduction for a vertical chassis, and in b) another embodiment with vertical chassis and pressure compensation.

Hereinafter, embodiments of an electron beam machining apparatus will be described as an example of a particle beam machining apparatus with reference to FIGS 1 to 5 described.

1 shows an electron beam processing apparatus 100 in a vertical cross-section. The electron beam processing apparatus 100 has a vacuum chamber 101 on. The vacuum chamber 101 is bounded by a bottom wall 102 , a front wall 103 , a back wall 104 , Side walls 105 and an upper chamber wall 1 , The front wall 103 has a loading / unloading, which with a closure 103a as a tilt gate or sliding gate or the like can be closed vacuum-tight. The upper chamber wall 1 subsequently becomes simply a chamber wall 1 referred as it does not matter whether the corresponding chamber wall is the top or another of the chamber walls.

The chamber wall 1 has a first opening O1 in the chamber wall 1 is trained. The opening O1 is circular in the illustrated embodiments (see 2a ). At the edge of the opening O1 is a flange 1f formed by the vacuum wall 1 protrudes outwards. The first opening O1 is in the embodiments shown by an eccentric disc assembly 200 locked. The eccentric disk arrangement 200 has a first (outer) cover 2 , which is formed in the embodiment shown as an outer hub, a second (inner) cover 3 , which is formed in the embodiment shown as an eccentrically arranged inner hub, and a third cover or a closure 10 who is at the in 2 shown embodiment as a turntable for the construction of an electron beam generator 7 is trained on. In this case, the first cover 2 a second opening O2. In the embodiments shown, the second opening O2 is circular. The second cover 3 has a third opening O3, which in turn is circular in the embodiments shown.

The first cover 2 , That is, the outer hub, is also circular with an outer diameter, the inner diameter of the first opening O1 (with clearance for sealing) corresponds. It follows that both the first opening O1 and the first cover 2 has a vertical center axis, which coincide in this case in the axis C1.

The second opening O2, which is also circular, has a second center axis C2. The first and second openings O1, O1 are arranged eccentrically, i. H. the axes C1 and C2 are parallel but spaced apart.

In the embodiments shown, the second cover 2 again formed as a circular hub whose outer diameter (with clearance for sealing) corresponds to the inner diameter of the second opening O1).

The third opening O3, which is also circular, has a third center axis C3. The third opening is in turn arranged eccentrically to the first and second openings O1, O2, d. H. the axis C3 is parallel to but spaced from the axes C1 and C2.

The third opening O3 has a third inner diameter d3. The closure 10 in the form of turntable for the construction of the electron beam generator ( 2 ) or in the form of a device for vertically moving and pivoting and rotating one in the vacuum chamber 1 arranged electron beam generator 7 may be formed, in turn, has an outer diameter which corresponds (with clearance for sealing) to the third inner diameter d3, on.

The eccentric disk arrangement 200 has a built-in state (see 1 ) of the vacuum chamber 101 facing side (hereinafter inner side) and in the installed state of the vacuum chamber 101 opposite side (hereinafter outside) on. On the outside of the first cover 2 is an outwardly projecting flange 2f intended. The flange 2f has a sprocket 2k , which runs on the outer circumference of the flange on. The flange 1f the chamber wall 1 and the flange 2f first cover 2 serve to hold the bearing and the seal of the first cover 2 opposite the chamber wall 1 and thus the seal of the vacuum chamber 101 opposite the atmosphere.

The first cover 2 has at the edge surrounding the second opening O2 a second flange 2g pointing out to the outside. The second cover 3 has at its outer edge in turn an outwardly projecting flange 3f on. At the outer circumference of the flange 3f In turn, a ring gear is formed circumferentially. The flanges 2g and 3f serve in turn, analogous to the flanges 1f and 2f , to hold the bearing and seal for the second cover 3 in the first cover 2 ,

The second cover 3 in turn has at the edge surrounding the third opening O3 an outwardly projecting flange 3g on.

At the in 2 embodiment shown, the closure 10 , ie the turntable for the construction of the electron beam generator, also a flange 10f on. The flanges 10f and 3g in turn serve to hold the bearing and the seal of the closure 10 opposite the second cover 3 ,

At the in 1 and 3 the embodiment shown, the outer wall of a vertically displaceable tube is used 32 as a counterpart to the flange 3e ie as a replacement for the flange 10f ,

The eccentric disk arrangement designed in this way 200 is in and above the first opening O1 of the chamber wall 1 arranged such that the opening O1 is sealed vacuum-tight with respect to the atmosphere, as in the 1 to 3 easy to recognize.

On the chamber wall 1 is a drive 4a like a servo motor that has a pinion in the sprocket 2k engages, arranged. Thus form the sprocket 3k , the flanges 1f and 2f and the associated bearings and seals a sealing rotary bearing 5 the first seal 2 ,

On the first cover 2 is another drive 4b attached, which has a pinion in the sprocket 3k on the flange 3f the second cover 3 to drive the same engages. Thus form the sprocket 3k , the flanges 2g and 3f and the corresponding bearings and seals turn a sealing pivot bearing 6 for the second cover 3 ,

At the in 2 embodiment shown is the electron beam generator 7 on the outside of the closure 10 placed vacuum-tight, so that the electron beam generated by it can be emitted along the axis C3. The shutter (turntable) 10 is about a sealing pivot bearing 8th , including the flanges 3g and 10f has, in turn, vacuum-tight with respect to the atmosphere held.

By said arrangement, it is possible, the first cover 2 (= outer turntable) for rotation about the axis C1 to drive. Furthermore, it is possible the second cover 3 to drive for rotation about the eccentric axis of rotation C2.

Since an electron beam generator is usually supplied with the necessary power and possibly cooling means, etc., via supply cables and the like, it is recommended to prevent excessive rotation of the electron beam generator about the axis C3. Therefore, in the embodiment shown in FIG 2 on the turntable a guide unit 9 provided with linear bearings. In the linear bearings is a connecting and guiding rod 11 held longitudinally displaceable, with one end to the vacuum wall 1 is pivotally mounted. The guide rod 11 that have a warehouse 12 Thus, in a plane perpendicular to the axes C1, C2, C3, it is possible to prevent such rotation of the electron beam generator about the axis D3 by more than about 90 ° (in the illustrated embodiment). The angle can be varied depending on the arrangement of the rod and there may be other devices for limiting such rotation, such. As stops or the like may be provided. Alternatively, a limitation of the corresponding rotation by a CNC control of the machine is possible.

At the in 2 embodiment shown is the electron beam generator 7 outside the vacuum chamber 101 arranged.

So it is, if that with the electron beam generator 7 necessary to be machined workpieces in various dimensions and directions, necessary, corresponding workpiece moving devices (manipulators) in the vacuum chamber 101 provided. This inevitably leads to a comparatively large volume of the vacuum chamber 101 because in addition to the volume of the workpiece, it must additionally accommodate the usually voluminous manipulators, such as portals and the like. In the in the 1 and 3 In the embodiment shown, the electron beam generator is in the vacuum chamber 101 arranged. The closure 10 has a tube 32 on, along the axis C3 (= Z) over a path 11 is longitudinally displaceable. At the in the vacuum chamber 101 located end of the tube 32 is the electron beam generator 7 via a turning and swiveling device 39 attached. The turning and swiveling device 39 is for rotation about the axis Z (= C3) and for the rotation of the generator 7 about a pivot axis X, which is perpendicular to the longitudinal axis Z, is formed.

The linear guide and seal for the pipe 32 in the closure 10 is in 3 With 38 designated. In the pipe 32 is a slot 321 provided in which a pen 36 is longitudinally displaceable as rotation. Unlike with the connecting rod 11 out 2 will be at the in 3 shown embodiment, an excessive rotation of the connecting cable for the electron beam generator 7 This prevents the turning and swiveling device 39 according to the rotation by turning the generator 7 is compensated for the axis Z. The control of the electron beam processing device is programmed accordingly.

The linear process of the pipe 32 and thus the generator 7 in the vacuum chamber 101 is at the in the 1 and 3 shown embodiment accomplished as follows. It is a mounting frame 31 for a ball screw 34 and one on the pipe 32 attached walking beam 33 provided with ball screw nut. On the mounting frame 31 is a drive motor 35 provided for the ball screw (ball screw drive). This allows the tube over the travel path 11 and thus the electron beam generator 7 in the vacuum chamber 101 over the travel path 11 be moved in the direction of the Z axis.

By the appropriate arrangement of two eccentric discs 2 . 3 Thus, it is possible to have an electron beam generator mounted outside on the eccentric disk assembly 7 ( 2 ) in plan view over a work area R to move as in 2a ) hatched.

With the in the 1 and 3 In the embodiment shown, at least as far as the axis X is at a distance from the axis Z, it is possible to increase the working radius r1 of such a working area by the distance between the two axes.

These solutions have particular for so-called large chambers, ie vacuum chambers with chamber volume of about 1 m ³ and larger, can accommodate the workpieces with side lengths from 600 to 800 mm machining, considerable advantages.

The advantage is particularly great if, in addition to the eccentric disc arrangement, the electron beam generator is arranged in the chamber. As a result, a large part of the chamber volume-increasing workpiece movement devices is superfluous, because now instead of the workpiece, the electron beam for the three-dimensional processing can be moved. Compared with electron-beam processing devices in which the electron beam generator is mounted on the outside, and which do not have the eccentric disk arrangement, the travel paths in the horizontal direction for the workpiece located in the chamber can be reduced by approximately 40 to 50%.

Compared to a solution in which the electron beam generator is arranged in the chamber, and in which the workpiece is moved by means of a portal in the chamber, in addition about 40 to 50% of the chamber volume in vertical Saved direction. It is obvious that the eccentric disc arrangement allows for both solutions significant reductions of the chamber volume to be evacuated with a constant workpiece size.

In the 4. is an embodiment of a pressure compensating device for the eccentric disc assembly 200 shown.

The idea of the pressure compensation is that due to the differential pressure in .DELTA.P between the atmospheric pressure (first pressure P1) and the comparatively low second pressure P2 in the vacuum chamber on the eccentric disk arrangement 200 , and more precisely on the first cover 2 and the second cover 3 , a large compressive force is exerted, which depends on the surface on which this differential pressure acts.

At the in 4. shown pressure compensation device is on the first cover 2 and / or on the second cover 3 a back pressure chamber 22 respectively. 23 intended. In the back pressure chambers (hollow chambers) 22 . 23 a pressure Px acts on the upper boundary surfaces of the back pressure chambers. At the back pressure chamber 22 this surface is a ring portion with a ring thickness r4 and a resulting annular surface A4. In contrast, the eccentric disc arrangement of the first cover 2 , second cover 3 and closure 10 a circular area A3, resulting from the diameter b1 of the first cover 2 results. On the surface A1 acts the differential pressure .DELTA.P, while on the corresponding surface of the back pressure chamber 22 the differential pressure from the pressure Px and the atmospheric pressure P1 acts. The areas A3 and A4 are in a certain relationship to each other.

So the pivot bearing 5 is relieved, is in the back pressure chamber 22 to apply a back pressure PX in such a way that acts on the counter-pressure surface A4, a force equal to less than the resulting from the first differential pressure ΔP pressure force plus weight of the eccentric disc assembly, etc. That will be at the in 4. shown embodiment in a simple manner by a pressure booster 60 reached. The pressure intensifier 60 is on the first cover in the embodiment shown 2 educated. This is on top of the first cover 2 a Ringflanch outwardly provided on the inside, on the inside of a plate-shaped piston 62 is vertically reciprocable. The plate-shaped piston is on its outside 62 subjected to the atmospheric pressure P1, and on its inside via openings in the first cover 2 with the second pressure P2 in the vacuum chamber 101 , At the bottom of the piston 62 a cylindrical base is formed in a second annular flask of smaller diameter which forms a fluid chamber 61 limited, vertically reciprocable. The plate-shaped section of the piston 62 in the larger, outer annular flange as well as the foot in the inner, smaller Ringflanch are sealed on their outer sides by seals. This results in a surface A1 of the piston, which is acted upon by the first differential pressure .DELTA.P, which corresponds to a ring portion with ring thickness r5 corresponding to a surface A1. The base of the cylindrical foot 62b with a diameter d5 corresponds to an area A2.

The ratio A1 / A2 is now chosen so that the ratio A3 / A4 is greater than or equal to the ratio A1 / A2. If the two conditions are equal, the compressive force is exactly balanced, and the bearings 5 are charged exclusively with the weight of the eccentric disc assembly.

It would also be possible to choose the ratio A1 / A2 slightly greater than the ratio A3 / A4, in order to compensate for a part of the own weight of the eccentric disc arrangement.

The second cover with closure 10 again has the diameter d2 of the second cover 3 on, which in turn corresponds to an area A6. The counter-pressure surface of the back pressure chamber 23 again corresponds to a ring portion with ring thickness r6, which corresponds to an area A5. The ratio A1 / A2 in relation to the ratio A5 / A6 is set analogously. When the back pressure chambers on both covers 2 . 3 are provided, then the ratios A3 / A4 and A5 / A6 should be substantially identical, if only one pressure booster 60 should be used.

Alternatively, it is of course possible, the fluid for the back pressure chamber (s) also different than with a pressure booster, z. B. a normal pump to put under pressure.

In 5 is an embodiment with a reduction of the pressing force applied to the vertical landing gear for vertically shifting the electron beam generator 7 acts, shown. This is the tube 32 at its top, substantially, except for a reduced diameter opening, onto which a pipe 41 with reduced diameter, closed. A pressure chamber 43 is on top of the second cover 3 intended. The pressure chamber 44 encloses the tube 32 on top of the second cover 3 , except for an opening through which the pipe 41 can escape to the top. This opening is sealed vacuum-tight. This prevails in the chamber 44 the chamber pressure, and the differential pressure acts only on an area equal to the footprint of the pipe 41 equivalent.

This allows the requirements for the seal of the linear guide for the tube 32 be reduced. At the in 5a ) is the drive for vertical movement of the tube 32 sealed separately.

At the in 5b ) shown embodiment, a pressure compensation is provided. In this case, the outer surface of the cylindrical tube 32 from an annular chamber 53 Surrounded by a connection 54 can be acted upon with pressure, for example by compressed air. At the top of the pipe 32 is an annular flange 32f provided with seal to the chamber 53 close at the top.

It is explicitly pointed out that all features disclosed in the description and / or the claims are considered separate and independent of each other for the purpose of original disclosure as well as for the purpose of limiting the claimed invention independently of the feature combinations in the embodiments and / or the claims should. It is explicitly stated that all range indications or indications of groups of units disclose every possible intermediate value or subgroup of units for the purpose of the original disclosure as well as for the purpose of restricting the claimed invention, in particular also as the limit of a range indication.

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE19921226A [0002]
• US 3588442 [0002]
• US 5089686 [0002]

Claims (14)

Particle beam processing device with a vacuum chamber ( 101 ), which has a chamber wall ( 1 ) having a first opening (O1) in the chamber wall ( 1 ) is formed, a first cover ( 2 ) which is adapted to cover the first opening (O1) and to be rotated about a first rotation axis (C1) passing through the first opening (O1) and a second opening (O2) formed in the first one Cover ( 2 ) is formed, and a second cover ( 3 ) adapted to cover the second opening (O2) and to be rotated about a second rotation axis (C2) passing through the second opening (O2) and a particle beam generator (O2) 7 ), characterized in that the particle beam generator ( 7 ) within the vacuum chamber ( 101 ) is arranged. Particle beam processing device with a vacuum chamber ( 101 ), which has a chamber wall ( 1 ) having a first opening (O1) in the chamber wall ( 1 ) is formed, a first cover ( 2 ) which is adapted to cover the first opening (O1) and via a first bearing ( 5 ) about a first axis of rotation (C1), which passes through the first opening (O1), and a second opening (O2), which in the first cover (O2) 2 ) is formed, and a second cover ( 3 ) which is adapted to cover the second opening (O2) and via a second bearing ( 39 ) about a second axis of rotation (C2), which passes through the second opening (O2), and a particle beam generator ( 7 ), characterized by a pressure compensating means adapted to receive one of a first pressure difference (ΔP) between a first pressure (P1) outside the vacuum chamber (Fig. 101 ) and a second pressure (P2) in the vacuum chamber ( 101 ) attached to the first and second covers ( 2 . 3 ), resulting force acting on the first and / or second bearing ( 5 . 6 ) acts to diminish or even out. Particle beam processing device with a vacuum chamber ( 101 ), which has a chamber wall ( 1 ) having a first opening (O1) in the chamber wall ( 1 ) is formed, a first cover ( 2 ) adapted to cover the first opening (O1) and to be rotated about a first rotation axis (C1) passing through the first opening (O1) and the one second opening (O2) formed in the first cover ( 2 ) is formed, and a second cover ( 3 ) adapted to cover the second opening (O2) and to be rotated about a second rotation axis (C2) passing through the second opening (O2) and a particle beam generator (O2) 7 ), characterized by a third opening (O3) in the second cover ( 3 ) with a closure ( 10 ) which is adapted to close the third opening (O3) and to be rotated about a third rotation axis (C3) passing through the third opening (O3), and a restriction means adapted to effect rotation of the third opening (O3) Closure ( 10 ) to limit the third axis of rotation (C3). Particle beam processing apparatus according to claim 1 or 3, wherein the first cover ( 2 ) is adapted to a first stock ( 5 ) about the first axis of rotation (C1) to be rotated and / or the second cover ( 3 ) is adapted, via a second warehouse ( 39 ) about the second axis of rotation (C2), and a pressure equalizing means adapted to receive one of a first pressure difference (ΔP) between a first pressure (P1) outside the vacuum chamber (FIG. 101 ) and a second pressure (P2) in the vacuum chamber ( 101 ) attached to the first and second covers ( 2 . 3 ), resulting force acting on the first and / or second bearing ( 5 . 6 ) acts to reduce or compensate. Particle beam processing apparatus according to claim 2 or 4, wherein the pressure compensation means comprises a pressure intensifier ( 60 ), which has a fluid chamber ( 61 ) and a piston ( 62 ), which is movable in the fluid chamber, has, in which the movable piston ( 62 ) a first piston surface ( 62 ), to which the first pressure difference (ΔP) between the first pressure (P1) and the second pressure (P2) acts, and a second piston surface ( 62b ), to which a pressure in the fluid chamber ( 61 ), and in which the first piston surface ( 62 ) and the second piston surface ( 62b ) are in a first relationship (A1 / A2) to each other, and the pressure compensation means a first cavity ( 22 ), which has a first pressure-receiving surface (A4) on the first cover ( 2 ) and / or a second cavity ( 4a ) having a second pressure receiving surface (A6) on the second cover ( 3 ), and the fluid chamber ( 61 ) with the first cavity ( 22 ) and / or the second cavity ( 4a ) is in fluid communication and a second ratio (A3 / A4) of the area (A3) of the first cover ( 2 ) exposed to the first pressure difference (ΔP) to the first pressure receiving surface (A4) and / or a third ratio (A5 / A6) of the surface (A5) of the second cover (A5). 3 ) exposed to the first pressure difference (ΔP) to the second pressure receiving area (A6) is greater than or equal to the first ratio (A1 / A2). Particle beam processing device according to one of claims 1 or 2 or 1 and 4 or 1, 4 and 5 or 2 and 5, which has a third opening (O3). in the second cover ( 3 ) with a closure ( 10 ) which is adapted to close the third opening (O3) and to be rotated about a third rotation axis (C3) passing through the third opening (O3), and a restriction means adapted to effect rotation of the third opening (O3) Closure ( 10 ) to limit the third axis of rotation (C3). A particle beam processing apparatus according to claim 3 or 6, which is attached to the closure ( 10 ) a pipe ( 32 ) which is adapted to move in the third opening (O3) and the particle beam generator ( 7 ), and a drive device ( 33 - 35 ), which is adapted to the pipe ( 32 ) in the third opening (O3). Particle beam processing apparatus according to claim 7, wherein the tube ( 32 ) in a pressure chamber ( 43 ) on the second cover ( 3 ), is displaceable, the interior ( 44 ) of the pressure chamber ( 43 ) in conjunction with the vacuum chamber ( 101 ) is that the first pressure (P1) acts therein, and the pipe ( 32 ) has a portion with a reduced diameter relative to its outer diameter, which extends through an opening in an upper wall of the pressure chamber ( 43 ). Particle beam processing apparatus according to claim 7, wherein the elongated hollow body ( 32 ) in a pressure chamber ( 43 ) on the second cover ( 3 ), is displaceable, the interior ( 44 ) of the pressure chamber ( 43 ) not in connection with the vacuum chamber ( 101 ) and the pipe ( 32 ) on its outside a flange ( 32f ), which is adapted to the interior ( 44 ) of the pressure chamber ( 43 ), wherein the pressure chamber ( 43 Further, a port for adjusting the pressure in the space, which through the second cover ( 3 ), the pipe ( 32 ) and the pressure chamber ( 43 ). Particle beam processing device according to one of claims 1 to 6, in which the particle beam generator ( 7 ) on a rotary pivoting device ( 39 ), which is adapted to the particle beam generator ( 7 ) about a third axis of rotation (C3) and to pivot about a fourth axis of rotation (X) which is perpendicular to the third axis of rotation (C3). Particle beam processing apparatus according to claim 3 or 5 or any one of claims 6 to 10 as far as dependent on claim 3 or 5, in which the limiting means is adapted to mechanically control the rotation of the shutter ( 10 ) to limit the third axis of rotation (C3) to a maximum of 360 °. A particle beam processing apparatus according to claim 11, wherein said restriction means comprises a guide member (Fig. 9 ) with a guide channel and a guide rod ( 11 ) pivotally mounted at one end to the vacuum chamber ( 101 ) and is adapted to slide in the guide channel has. Particle beam processing apparatus according to one of the preceding claims, comprising a control device and a first drive device ( 4a ), which is adapted to the first cover ( 2 ) controlled by the control device, and a second drive device ( 4b ), which is adapted to the second cover ( 3 ) controlled by the control device to rotate. Particle beam processing device according to claim 13, with a rotatable and / or pivotable and / or displaceable receptacle for a workpiece in the vacuum chamber ( 101 ) adapted to rotate and / or pivot and / or translate the workpiece under control of the control device.

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