DE102008062619B8 - Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions - Google Patents

Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions Download PDF

Info

Publication number
DE102008062619B8
DE102008062619B8 DE102008062619A DE102008062619A DE102008062619B8 DE 102008062619 B8 DE102008062619 B8 DE 102008062619B8 DE 102008062619 A DE102008062619 A DE 102008062619A DE 102008062619 A DE102008062619 A DE 102008062619A DE 102008062619 B8 DE102008062619 B8 DE 102008062619B8
Authority
DE
Germany
Prior art keywords
forming
atmospheric pressure
pressure conditions
under atmospheric
linearly elongated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE102008062619A
Other languages
German (de)
Other versions
DE102008062619A1 (en
DE102008062619B4 (en
Inventor
Julius Roch
Dr. Dani Ines
Prof. Dr. Kaskel Stefan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technikum Laubholz GmbH TLH
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority to DE102008062619A priority Critical patent/DE102008062619B8/en
Priority to PCT/DE2009/001765 priority patent/WO2010066247A2/en
Publication of DE102008062619A1 publication Critical patent/DE102008062619A1/en
Publication of DE102008062619B4 publication Critical patent/DE102008062619B4/en
Application granted granted Critical
Publication of DE102008062619B8 publication Critical patent/DE102008062619B8/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461Microwave discharges
    • H05H1/463Microwave discharges using antennas or applicators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
DE102008062619A 2008-12-10 2008-12-10 Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions Active DE102008062619B8 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE102008062619A DE102008062619B8 (en) 2008-12-10 2008-12-10 Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions
PCT/DE2009/001765 WO2010066247A2 (en) 2008-12-10 2009-12-08 Microwave plasma source and method for forming a linearly extended plasma under atmospheric pressure conditions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008062619A DE102008062619B8 (en) 2008-12-10 2008-12-10 Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions

Publications (3)

Publication Number Publication Date
DE102008062619A1 DE102008062619A1 (en) 2010-07-01
DE102008062619B4 DE102008062619B4 (en) 2012-01-19
DE102008062619B8 true DE102008062619B8 (en) 2012-03-29

Family

ID=42136177

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102008062619A Active DE102008062619B8 (en) 2008-12-10 2008-12-10 Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions

Country Status (2)

Country Link
DE (1) DE102008062619B8 (en)
WO (1) WO2010066247A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012013418A1 (en) 2012-07-02 2014-01-02 Sitec Automation Gmbh Generating device i.e. plasma-jet source, for generating scalable linear plasma in e.g. vacuum atmospheric pressures, has plasma reactor comprising contour with side surfaces, and slot antennas arranged along longitudinal axis of reactor
DE102015205809B4 (en) * 2015-03-31 2018-01-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Apparatus for the production of carbon fibers with plasma assistance

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4957061A (en) * 1985-12-04 1990-09-18 Canon Kabushiki Kaisha Plurality of beam producing means disposed in different longitudinal and lateral directions from each other with respect to a substrate
EP0449081A2 (en) * 1990-03-30 1991-10-02 New Japan Radio Co., Ltd. Microwave plasma CVD apparatus
DE4113142A1 (en) * 1991-03-14 1992-09-17 Leybold Ag DEVICE FOR GENERATING GLIMMENT CHARGES
DE4327958C1 (en) * 1993-08-19 1994-11-17 Ppv Verwaltungs Ag Process and apparatus for recycling waste containing plastic and/or organic material
WO1998059359A1 (en) * 1997-06-23 1998-12-30 Sung Spitzl Hildegard Device for the production of homogenous microwave plasma
US6177148B1 (en) * 1996-08-29 2001-01-23 Carl-Zeiss-Stiftung Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process
DE10239875A1 (en) * 2002-08-29 2004-03-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for large-area coating of substrates under atmospheric pressure conditions
DE102004060068A1 (en) * 2004-12-06 2006-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Microwave plasma source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5270616A (en) * 1989-09-25 1993-12-14 Ryohei Itatani Microwave plasma generating apparatus
JPH04144992A (en) * 1990-10-01 1992-05-19 Idemitsu Petrochem Co Ltd Microwave plasma-generating device and method for producing diamond film with the same
DE4437050A1 (en) * 1994-10-17 1996-04-18 Leybold Ag Device for treating surfaces of hollow bodies, in particular inner surfaces of fuel tanks

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4957061A (en) * 1985-12-04 1990-09-18 Canon Kabushiki Kaisha Plurality of beam producing means disposed in different longitudinal and lateral directions from each other with respect to a substrate
EP0449081A2 (en) * 1990-03-30 1991-10-02 New Japan Radio Co., Ltd. Microwave plasma CVD apparatus
DE4113142A1 (en) * 1991-03-14 1992-09-17 Leybold Ag DEVICE FOR GENERATING GLIMMENT CHARGES
DE4327958C1 (en) * 1993-08-19 1994-11-17 Ppv Verwaltungs Ag Process and apparatus for recycling waste containing plastic and/or organic material
US6177148B1 (en) * 1996-08-29 2001-01-23 Carl-Zeiss-Stiftung Plasma CVD system with an array of microwave plasma electrodes and plasma CVD process
WO1998059359A1 (en) * 1997-06-23 1998-12-30 Sung Spitzl Hildegard Device for the production of homogenous microwave plasma
DE10239875A1 (en) * 2002-08-29 2004-03-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for large-area coating of substrates under atmospheric pressure conditions
DE102004060068A1 (en) * 2004-12-06 2006-07-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Microwave plasma source

Also Published As

Publication number Publication date
DE102008062619A1 (en) 2010-07-01
DE102008062619B4 (en) 2012-01-19
WO2010066247A3 (en) 2010-11-11
WO2010066247A2 (en) 2010-06-17

Similar Documents

Publication Publication Date Title
EP2297377A4 (en) Plasma-based chemical source device and method of use thereof
DE112009000756A5 (en) Method for producing an electronic component and electronic component
EP2396456A4 (en) Plasma source and method for removing materials from substrates utilizing pressure waves
DE112010004566B8 (en) Method of sealing curved vacuum glass and curved vacuum glass
DE602007008937D1 (en) DEVICE FOR PROCESSING OF LEAKAGE GAS
DE602007006223D1 (en) DEVICE FOR PROCESSING OF LEAKAGE GAS
BRPI0909699A2 (en) apparatus and method for low-complexity combinatorial coding of signals
PL2200458T3 (en) Apparatus and method for microwave vacuum-drying of organic materials
DE602008002716D1 (en) Speaker assembly and method for attaching a speaker
AT505687A3 (en) CALIBRATION DEVICE AND METHOD OF CALIBRATION
DE112010000771T8 (en) Method for cutting a substrate and method for producing an electronic component
IL208479A0 (en) Method and apparatus for local modification of atmosphere
DE102010053280B8 (en) Compressor power control method and apparatus for power control of a compressor
ATE540492T1 (en) METHOD AND DEVICE FOR FREQUENCY BAND DETECTION
EP2357658A4 (en) Apparatus of electron cyclotron resonance ion source and manufacturing method thereof
EP2216797A4 (en) Electron emitting source and manufacturing method of electron emitting source
ES2600252T8 (en) Device and procedure for the production and / or confinement of a plasma
FI20096004A0 (en) Method and apparatus for purifying gas
DE112010002056A5 (en) Apparatus and method for identifying the author of a work of art
DE112010000724T8 (en) Plasma processing apparatus and plasma CVD film forming method
FI20080248L (en) Chemical gas coating and method for forming gas coating
TWI372653B (en) System for eliminating waste gases by making use of plasmas at low and atmospheric pressure
ATE535551T1 (en) METHOD AND DEVICES FOR POLYMERIZATION
DE112008003961A5 (en) Arrangement and method for producing a plasma with a defined and stable ionization state
DE102008062619B8 (en) Microwave plasma source and method of forming a linearly elongated plasma under atmospheric pressure conditions

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R082 Change of representative

Representative=s name: ,

R020 Patent grant now final

Effective date: 20120420

R081 Change of applicant/patentee

Owner name: TECHNIKUM LAUBHOLZ GMBH, DE

Free format text: FORMER OWNER: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V., 80686 MUENCHEN, DE