DE102008032784A1 - Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt - Google Patents

Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt Download PDF

Info

Publication number
DE102008032784A1
DE102008032784A1 DE102008032784A DE102008032784A DE102008032784A1 DE 102008032784 A1 DE102008032784 A1 DE 102008032784A1 DE 102008032784 A DE102008032784 A DE 102008032784A DE 102008032784 A DE102008032784 A DE 102008032784A DE 102008032784 A1 DE102008032784 A1 DE 102008032784A1
Authority
DE
Germany
Prior art keywords
glass
mass
mol
composition
electrical contacts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102008032784A
Other languages
German (de)
English (en)
Inventor
Jochen Dr.-Ing. Schilm
Mihails Dr. Kusnezoff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority to DE102008032784A priority Critical patent/DE102008032784A1/de
Priority to PCT/DE2009/000908 priority patent/WO2010000234A1/fr
Publication of DE102008032784A1 publication Critical patent/DE102008032784A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02Frit compositions, i.e. in a powdered or comminuted form
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/18Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Sustainable Energy (AREA)
  • Dispersion Chemistry (AREA)
  • Sustainable Development (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Glass Compositions (AREA)
  • Conductive Materials (AREA)
DE102008032784A 2008-07-02 2008-07-02 Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt Withdrawn DE102008032784A1 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE102008032784A DE102008032784A1 (de) 2008-07-02 2008-07-02 Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt
PCT/DE2009/000908 WO2010000234A1 (fr) 2008-07-02 2009-06-29 Composition à consistance pâteuse pour la formation de contacts électriques sur une tranche solaire de silicium et contact ainsi produit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102008032784A DE102008032784A1 (de) 2008-07-02 2008-07-02 Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt

Publications (1)

Publication Number Publication Date
DE102008032784A1 true DE102008032784A1 (de) 2010-03-18

Family

ID=41161356

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102008032784A Withdrawn DE102008032784A1 (de) 2008-07-02 2008-07-02 Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt

Country Status (2)

Country Link
DE (1) DE102008032784A1 (fr)
WO (1) WO2010000234A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010037088A1 (de) * 2010-08-20 2012-02-23 Roth & Rau Ag Verfahren zum Erzeugen eines verbesserten Kontaktes zwischen einer silberhaltigen Leitbahn und Silizium
DE102016206345A1 (de) * 2016-04-15 2017-10-19 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Pastöse Zusammensetzung sowie ein Verfahren zum Herstellen von dreidimensionalen Strukturen oder Strukturelementen auf Substratoberflächen

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030047735A1 (en) * 2001-06-28 2003-03-13 Takeshi Kyoda Photoelectric conversion device, glass composition for coating silicon, and insulating coating in contact with silicon
EP1713094A2 (fr) 2005-04-14 2006-10-18 E.I.Du pont de nemours and company Composition(s) de film(s) épais électroconducteur(s), électrode(s) et dispositif(s) semiconducteur(s) faits à partir de celle(s)-ci
WO2006132766A2 (fr) 2005-06-03 2006-12-14 Ferro Corporation Contacts de cellules solaires sans plomb

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7435361B2 (en) * 2005-04-14 2008-10-14 E.I. Du Pont De Nemours And Company Conductive compositions and processes for use in the manufacture of semiconductor devices
US20060231802A1 (en) * 2005-04-14 2006-10-19 Takuya Konno Electroconductive thick film composition, electrode, and solar cell formed therefrom
US7462304B2 (en) * 2005-04-14 2008-12-09 E.I. Du Pont De Nemours And Company Conductive compositions used in the manufacture of semiconductor device
WO2007102287A1 (fr) * 2006-03-07 2007-09-13 Murata Manufacturing Co., Ltd. Pate conductrice et cellule solaire
CN101512778B (zh) * 2006-08-31 2012-05-09 信越半导体股份有限公司 半导体基板、形成电极的方法、及太阳能电池的制造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030047735A1 (en) * 2001-06-28 2003-03-13 Takeshi Kyoda Photoelectric conversion device, glass composition for coating silicon, and insulating coating in contact with silicon
EP1713094A2 (fr) 2005-04-14 2006-10-18 E.I.Du pont de nemours and company Composition(s) de film(s) épais électroconducteur(s), électrode(s) et dispositif(s) semiconducteur(s) faits à partir de celle(s)-ci
WO2006132766A2 (fr) 2005-06-03 2006-12-14 Ferro Corporation Contacts de cellules solaires sans plomb

Also Published As

Publication number Publication date
WO2010000234A1 (fr) 2010-01-07

Similar Documents

Publication Publication Date Title
DE602004006951T2 (de) Leitfähige paste
DE112012001576T5 (de) Wismut-Tellur-Oxid enthaltene Dickfilmpaste und ihre Verwendung bei der Herstellung von Halbleitervorrichtungen
DE3111808C2 (de) Elektrisch leitende Paste, ihr Herstellungsverfahren und ihre Verwendung
DE3650210T2 (de) Leitfähige Dickschichtzusammensetzung.
DE69132237T2 (de) Paste zum hochtemperaturbrennen
US11161775B2 (en) Conductive composition, method for producing conductor, and method for forming wire of electronic component
JP2013089600A (ja) 厚膜銀ペーストと半導体デバイスの製造においてのその使用
DE2655085A1 (de) Metallisierungspraeparate, enthaltend elektrisch leitfaehige metalle
DE102013009241B4 (de) Kupferpastenzusammensetzung und ihre Verwendung in einem Verfahren zum Bilden von Kupferleitern auf Substraten
DE112015000424T5 (de) Leitfähige Paste und Verfahren zur Herstellung einer Halbleitervorrichtung, worin diese verwendet wird
CN1129340A (zh) 粘着力增强的厚膜导体组合物
DE2610303C2 (de) Siebdruckpaste für dicke, elektrisch leitende, Leiterbahnen bildende Schichten auf einem keramischen Substrat
DE3203826A1 (de) Verfahren zur wiedergewinnung vom edelmetallen
DE1011348B (de) Verglasbares Flussmittel sowie keramischer Gegenstand
EP1647352B1 (fr) Matériau de brasure
DE102008032784A1 (de) Zusammensetzung mit pastöser Konsistenz für die Ausbildung elektrischer Kontakte auf einem Silicium-Solarwafer und damit hergestellter Kontakt
CN106448802A (zh) 导电糊料组合物及由其制成的半导体装置
DE60212950T2 (de) Verwendung von leiterzusammensetzungen in elektronischen schaltungen
DE112014006907T5 (de) Kupfer enthaltende leitfähige Pasten und daraus hergestellte Elektroden
DE112014006903B4 (de) Solarzellen mit Kupferelektroden
DE69117439T2 (de) Organisches Trägermedium für elektronische Zusammensetzungen
DE60316133T2 (de) Verfahren zur herstellung eines heizelements vom molybdänsilizid-typ
DE60013868T2 (de) Leitfähige zusammensetzung
JP2018043895A (ja) 二酸化ルテニウム粉末とその製造方法、厚膜抵抗体ペースト、及び、厚膜抵抗体
DE102009013919B4 (de) Lotmaterial mit einem Zusatzwerkstoff, Trägerbauteil oder Bauelement mit einem solchen Lotmaterial sowie Verwendung eines Flussmittels

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
R016 Response to examination communication
R002 Refusal decision in examination/registration proceedings
R006 Appeal filed
R008 Case pending at federal patent court
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20150203