DE10111360A1 - Decoration arrangement used as a piece of jewelry contains a thin layer having non-transparent regions arranged to produce a pattern, and transparent regions - Google Patents

Abstract

Decoration arrangement contains a thin layer (4) having a pattern applied on a substrate (1). The thin layer has non-transparent regions (2) arranged to produce a pattern, and transparent regions (3). The non-transparent and transparent regions are formed by the phase conversion of he layer material. An Independent claim is also included for a process for the production of a pattern on a decoration arrangement. Preferred Features: The thin layer is made from Ti, Nb, Cr, Al, Ce, Zr, V, Cu, Au, In, Mo, Ta, Si, Ge, Mg or their alloys, especially Ti, Nb or their alloys or a transparent conducting oxide, preferably Zn; AlO or In; SnO.

Description

The present invention relates to decoration means comprising a substrate and a thin layer is applied to it, with no pattern arranged transparent and transparent areas as well as a method of manufacture of such a decoration means using laser light for generation of the desired pattern.

Decoration means in the sense of the invention can be jewelry such as pendants, Brooches or rings with a pattern or motif or a decorated object, such as a mirror, an ornament such as a motif or pattern.

In particular, however, there is a projection mask for lighting technology niken understood how they are often used today to create images, logos, Lettering or geometric figures, even in daylight over long distances projections across walls, ceilings and floors.

The projection mask consists of a glass substrate that is illuminated with a light permeable metal layer is coated, the metal layer pattern is structured by removing the metal in the pattern areas, so that the Projection mask in this area is transparent to light.

When irradiated with a strong light source through such a project black and white images are created on the irradiated surfaces.

To illustrate the desired motif, use the one you want Projection masks with motifs, also called "gobos", directly in the Beam path of a projector, the so-called "scanner", introduced and similar to a slide shining through with light.

Typical areas of application for the projection masks described above are for example the lighting of exhibition stands, exhibitions, The Age ideas where the setting is not actually built, but with With the help of such projection masks is projected on a wall, or who its object.  

Since powerful projectors are used for the irradiation, arise high light intensities with color temperatures up to 6000 Kelvin, so that for Production of the projection masks used both high materials Temperature resistance as well as high light fastness must have.

It is also known to produce color effects with such projection masks, in which one or more colored layers are applied to the projection mask be brought. Since the dyes used here are tempera selection must be restricted.

Such projection masks are usually produced using photos lithographic processes.

First, a transparent substrate, usually one Glass pane, a non-transparent material applied to the entire surface Layer of a non-transparent material becomes another layer applied with a photoresist and then pattern-like through a mask exposed. After development, the exposed areas including the underlying metal is etched away by wet chemistry, the metal on the exposed areas of the substrate to form the desired pattern Will get removed. Such a method is in the German utility model DE 296 22 154 U1.

The production of projection masks using photolithographic processes shows however, there are a number of disadvantages. So is the achievable resolution on one The order of magnitude of 10 µm is limited.

In addition, this procedure is very complex since there are numerous steps includes, to achieve the most accurate and sharp images possible are extremely precise, such as the application of the photo varnishes in a uniform, homogeneous layer, uniform exposure and Development conditions across the area to ensure a clean etching and removing the desired areas. Another problem is avoiding undercuts. Here comes to the edges structuring areas etching liquid under the remaining photoresist and dissolves metal out there in an undesirable manner, so that the structures obtained  are fuzzy and irregular and the resulting images ent are speaking out of focus. Consequently, using the photolithographic process often get defective masks, making the reject rate undesirable is high.

Shades of gray are set via the pixel density, but due to the low resolution that is inherent in such etching processes, is limited.

Projection masks for colored images are, for example, in German Utility model DE 296 06 215 U1 described, wherein one or more far other layers are applied to the substrate. The pattern is created by the individual colors on the with each differently trimmed Masks covered glass are evaporated so that the single layer of paint only applied to certain areas of the glass and in the After applying all layers, the desired pattern was formed becomes. Numerous steps are also required here. In addition, the ver colors used are thermally and mechanically sufficiently stable.

Furthermore, single-color projections can be realized by a high-temp Raturally stable inorganic color filter using a second filter wheel in the Beam path of the projector is introduced. These are optical Multi-layer systems that consist of a combination of single layers of high and low refractive index materials to produce the desired color exist that abge on a transparent substrate such as a glass be divorced. For the reproducible production of such projection masks However, for monochrome imaging is a high technological effort necessary to achieve the required high layer thickness accuracy of up to 30 To ensure single layer thicknesses.

By using several of the color filter glasses described above it is possible to get projection masks for multi-color projection where in the color filter glasses used one behind the other and with each other be glued. Each filter is closed in a separate process step etch and position. Such multi-glass systems can only be used with special  Etching processes are structured, under-etching and rounded edges can occur, which lead to imprecise images. Micrometer Exact Positioning work, problematic adhesive connections and blurring by the defocusing stacking of the individual color filter glasses make the Manufacture and use of such systems complex and expensive.

It is also known to produce projection masks by removing the metal from the substrate in the areas to be structured by means of laser radiation (so-called laser ablation). High-energy lasers such as CO ₂ lasers are used for this. The projection masks obtained in this way also show an insufficient resolution, since the material is removed by being blasted off or flaking off, which is difficult to control.

It was an object of the present invention to solve the above problems and to provide a projection mask that has high resolution shows and can be produced in a simple manner. Was in particular it is the task of such a projection mask not only for black and white, but also available for multi-color images.

In addition to the provision of projection masks as decoration, the Invention according to a further aspect, the provision of decoration means such as jewelry or decorative items that are simple Way can be provided with decorative patterns.

The object of the invention is achieved by a decoration agent that a Substrate and applied thereon at least one thin layer with a Has pattern, characterized in that the pattern in the thin Layer is formed by transparent and non-transparent layer regions, and the pattern is created by using a in the material for the thin layer Phase change is induced.  

The present invention further comprises a method for producing a such decoration means, wherein a thin layer of on a substrate a material is applied that a phase change when exposed to laser change and transparent next to non-transparent areas Formation of a pattern can be generated.

According to the invention, the decoration means has a substrate and thereon brings at least a thin layer of transparent and non-transparent areas that form a pattern.

As material for the thin layer, a material is used that is used with lasers effect a phase change from a non-transparent state to a transparent state or vice versa, so that by correspond guiding the laser beam in the material a pattern is drawn can be made from the transparent and non-transparent areas is formed. The phase change is limited to the areas that are exposed to laser exposure.

The present invention takes advantage of the fact that a effect of laser radiation of a suitable wavelength the state of a Material, for example, is changed as a result of local oxidation and thus one new layer material with different optical properties is generated. The material can be non-transparent, highly refractive State in a transparent state with a lower refractive index or be transferred vice versa.

Examples of such materials are metals such as titanium Ti, niobium Nb, chromium Cr, aluminum Al, cerium Ce, zirconium Zr, vanadium V, copper Cu, gold Au, indium in, molybdenum Mo, tantalum Ta, silicon Si, germanium Ge and magnesium Mg. Further suitable examples are SiN, SiO ₂ , MgF ₂ .
Alloys of these metals are also suitable.
Ti, Nb, Cr and Al are particularly preferred, Ti and Nb and alloys thereof being particularly preferred.

A suitable titanium alloy may contain aluminum, with a preferred one Al content of 0.1 to 15 wt .-%, in particular 8 to 13 wt .-%, can be.  

The metals mentioned above by way of example are not transparent per se. As a result of laser exposure, atmospheric oxygen diffuses into the areas of the Material that are exposed to laser radiation and it ent speaking oxides and / or mixed oxides, whose refractive index of that of the starting material is different. Because of the different Refractive indices appear on the untreated areas and that of the laser exposed areas differently transparent.

For example, an oxide material with a refractive index n ₅₅₀ of approximately 2.95 can be obtained from a Ti or Si layer with a refractive index n ₅₅₀ = 1.88 (Ti) or n ₅₅₀ = 4.1 (Si) by laser bombardment (TiO ₂ ) or n ₅₅₀ = 1.46 (SiO ₂ ) can be obtained, which appears transparent.

Transparent conductive can also be used for the application according to the invention Oxides (the so-called TCO's) are used, such as In dium / tin oxide (In / SnO) or zinc / aluminum oxide (Zn / AlO).

In this case, the starting material can be used to form the thin layer rial from which these transparent conductive oxides can be obtained Substrate can be applied in a non-transparent form and by exposure of laser of suitable wavelength into the corresponding transparent conductive Material to be converted.

The starting material is usually a TCO material in a non-conductive opaque form, such as so-called "Black ITO" or Zn: Al (opaque) + = O ₂ .

Such TCO materials, their production and application as a thin layer on a substrate are known per se (see for example US 5,536,466).

If transparent areas are to be converted into non-transparent areas, the laser treatment can also be carried out in a reducing atmosphere. For example, the treatment can take place under forming gas with approx. 98% N ₂ and approx. 2% H ₂ .

For black and white effects, the conversion is usually done via the ge entire thickness of the layer.  

Shades of gray can be achieved by controlling the depth of penetration of the Lasers in the layer material.

In this case, the phase change of the layer material does not take place the entire layer thickness, but only up to a predetermined layer depth, the light transmittance of the layer in this area depending on the Depth to which the layer can be converted can be set.

Multi-color images can also be produced with the present invention become.

The incident light is turned on for the creation of a colored image of the thin layer is reflected in the desired wavelength range.

The proportion of the incident light that is reflected on the layer depends and consequently the hue from the layer material and the layer depth down to the phase change has been carried out. This results in the Color of the partially phase-converted layer from the refractive index difference between the converted and the unconverted material.

The choice of laser depends on the material used and lies within the professional skill. For example, an argon io laser or a pulsed solid-state laser such as a diode laser the.

A diode laser is generally sufficient.

By exposure to radiation from a diode laser, for example Materials to be preferably used according to the invention, such as titanium, niobium, chromium or aluminum in the appropriate transparent state. Typically, laser power is up to 10 W and wavelength in worked in a range of preferably 500 nm.

Typical beam powers for the generation of structures are a few milli watt.

The use of laser radiation enables an exact and narrowly limited Write with local conversion limited to the areas to which the laser acts.  

When writing with a laser, the laser beam is usually over a Beam delivery system directly controlled using a computer, creating a. exact and exact writing is possible and high-resolution structures with a resolution of 2 µm or less can be obtained.

Unlike when creating a pattern by removing the material using Lasers (ablation) can cause defects due to edge rounding or uncontrolled Chipping can be avoided.

The laser beam can be changed by widening and focusing that in addition to point and line structures, large areas can be converted homogeneously.

The depth of penetration of the laser into the layer material, and thus the depth, up to The conversion of the material in the layer can be done via the in control the laser-coupled energy.

The application of the thin layer to the substrate can by means of conventional Licher procedures, as are common for the materials mentioned, take place. As Examples of this can be conventional evaporation, plasma chemical processes ren or cathode sputtering in a vacuum. The layers can also be of sufficient quality by wet chemical or galvanic Methods are applied to the substrate, but one corresponds pretreatment of the substrate, for example by pre-seeding can be such.

Depending on the arrangement, number of layers and the material for the thin layer can image the pattern by transmission or Re Flexion of the incident light take place, depending on whether the incident light penetrates through or on the pattern areas in the decoration means is reflected.  

The layer thicknesses are generally determined by the desired one Light passage or reflection. Typical layer thicknesses are for Reflective layers in a range of 100-300 nm, for color transparent layers in a range of 6-300 nm, preferably 6-100 nm. For low refractive index layers, usually higher layer thicknesses are used chosen than for layers with a higher refractive index.

The material for the substrate can be selected depending on the intended use become. It can be transparent, partially transparent or non-transparent. Examples of suitable substrate materials are inorganic materials such as a glass material, metals and ceramics or plastics.

Conventional and known ones can be used for the production of projection masks Glass substrates are used, in particular borosilicate, float or quartz glass and glass ceramics.

Can be used to make a piece of jewelry or a decorative item the corresponding blank for the piece of jewelry or the decorative item stood to be used as a substrate on which the thin layer to form of the pattern is applied.

For transparent substrates, laser radiation can also be carried out by the sub back of the street.

In the case of imaging by transmission, a light is transmitted as the substrate casual substrate chosen. The incident projection light passes through the transpa anneal areas of the thin layer and the substrate.

For imaging by reflection, the incident light is through the substrate itself or a reflection layer provided.

With regard to the projection masks as a preferred embodiment according to the invention The terms "transmission mask" are also used below approximately "reflection mask" used.  

In addition to the simple type of manufacture and the high resolution that can be achieved of the pattern, the decoration means according to the invention have the advantage that the phase-converted areas have improved mechanical stability and have chemical inertness.

The principle of the present invention is illustrated below using the example of a Projection mask as a preferred embodiment with reference to the attached figures explained in detail.

Here shows

Fig. 1 shows the schematic beam path by a projection mask in transmission,

Fig. 2 xion the schematic beam path in a projection mask in Refle,

Fig. 3 shows an arrangement for the projection of an image by means of a projection mask, and

Fig. 4 a selection of measured in reflection color values in Ti / TiOx- and Nb / NbO-layer systems.

In Fig. 1, the beam path of projection light through a projection mask A according to the invention in transmission is shown schematically, different shades of gray can be achieved by adjusting the depth to which the phase change in the thin layer follows.

In the examples of projection masks A shown in FIG. 1, a thin layer 4 with a non-transparent region 2 and a transparent region 3 is applied to a transparent substrate 1 . In the embodiment shown here, a non-transparent material 2 was first applied as a thin layer to the transparent substrate 1 , a transparent region 3 having been generated by phase conversion by laser action. When viewed in the direction of the projection light 10 , the phase conversion took place in the right layer area over the entire depth, so that this area is completely transparent to the projection light and appears white on the projection side 11 in the illustration. In the middle area, the phase conversion took place only up to the transition from light to dark, as a result of which this area is only partially continuous for the projection light and a dark gray shade of color is brought about on the projection side 11 . The right area was not exposed to laser exposure and is therefore not translucent, so that Fig. 1 appears black on the projection side 11 .

In the lower figure in FIG. 1, the penetration depth of the laser light was set lower, so that the phase conversion took place over a higher layer thickness and only a smaller proportion of the layer thickness remained as non-transparent material 2 . Accordingly, a light gray color shading is effected on the projection side 11 .

By controlling the depth of penetration of the laser light into the layer and thus of the layer thickness fraction up to which the phase change takes place, it is possible according to the invention, projection masks for high-precision light-dark project with various shades of gray for projection in transmission achieve.

Lasers can also be used to produce the finest point grids in the layer, which enables the finest shades of gray to be achieved in the projection.

The projection of an image by means of a projection mask (here transmission mask) by a scanner is shown schematically in FIG. 3.

According to the invention, it is also possible to reproduce the high-resolution colored patterns. An example of this is shown in FIG. 2. As in FIG. 1, the beam path of the projection light 10 is indicated by arrows. Unlike in FIG. 1, the projection light 10 does not pass through the mask in FIG. 2, but is reflected on the layer depending on the extent of the phase conversion taking place in the layer. Depending on the layer depth up to which the phase conversion has taken place, certain wavelengths of the projection light are reflected 12 and others are transmitted 11 , so that the wavelength can be adjusted by the wavelength of the reflected light.

As in FIG. 1, a thin layer 4 made of a non-transparent material 2 was first applied to a substrate 1 in FIG. 2, the region 3 being made transparent or partially transparent by the action of a laser by means of phase change. Seen in the direction of the projection light 10 , a complete permanent reflection 12 takes place on the right non-transparent layer region, so that the image appears white, in the middle region in which the layer conversion has not been carried out completely, but only to a certain depth only a part of the incident light is reflected, the rest can pass through the substrate, in which case the conversion depth of the thin layer 4 has been selected so that light of blue wavelength is reflected. In the left, transparent area, light 11 can completely pass the projection mask, there is no reflection and this area appears black in the illustration.

By setting the layer depth up to which the phase change takes place In this embodiment, the hue to be reflected can be to adjust. Of course, the layer thickness varies for a chosen one Color depending on the selected layer material.

The color, by partial reflection of the incident light 10 at the partial phase converted transparent layer (transition 2/3) is obtained, resulting from the difference in refractive index of the phase shift change th transparent material to the non-converted material.

In the case of phase transformation of an Si layer, the known reflection colors of SiO _{2 of} the first order appear in extracts in the colors blue in the layer thickness range from 10-12 nm, yellow in the range from 17-20 nm and red in the range from 24-35 nm.

For higher refractive index layer materials, the corresponding layer thicknesses can be obtained from the refractive index ratio by dividing the value calculated from n (higher refractive index) / n (SiO ₂ = x), for example n (TiO ₂ ) / n (SiO ₂ ) = 2.95 / 1.46 = 2.02.

In the case of a Ti / TiO ₂ layer system, the layer thickness for the corresponding color should be selected to be 2.02 times smaller.

The determination of a suitable layer depth and a suitable material for a certain color can be done in a simple way fewer routine attempts are made.

According to a further embodiment, the thin layer can be in the form of multilayers system with more than two layers. Adjacent layers consist preferably of different materials. With a derar multi-layer system, the color palette that can be achieved can be expanded higher color intensities can be obtained. The layers can do this vary in thickness and composition depending on the desired effect. It can also layers of the same composition in the multilayer system be made up of one or more layers of one other material are separated. Find examples of such layer systems in DE 199 45 730.

By laser bombardment, patterns can be transformed into this layer system layer material in transparent phases. By Selection of the layer depth up to which the conversion takes place can be targeted Color intensities and hues can be set. This can be done by Variation of the layer materials in connection with the chosen layer depth of the Phase change Obtain a large number of color variations.

Thus, a selection of measured in reflection color values is shown in FIG. 4, which have been achieved with a multilayer system with titanium and niobium layers below-described according to Example 2.

The corresponding measured values and color shades achieved are shown in Table 1 give.

The generation in the reflection masks according to the invention can be colored Structures also via optical gratings, the so-called holographic gratings, take place, which can be introduced into the layer by means of laser bombardment.  

In addition, reflection masks have the advantage that due to the changed Projection light guide when used in scanner systems the thermal Bela The mask material can be significantly reduced.

Due to the lower thermal load for the fiction reflection masks also less thermostable layer and substrate materials are used, which increases the possible color variations hen and / or reduce costs.

As already stated above, the material for the substrate on which the at least one thin layer can be applied, no further limits and is determined depending on the application of the decoration to be produced rationsmittels.

For example, transparent substrates are to be used for transmission projection masks zen, such as appropriate glasses or transparent art substances.

Non-transparent substrates can also be used for reflection projection masks be used.

In this case, if the substrate itself acts as a reflective layer, it consists of a metal. On the other hand, a reflective metal layer on a Substrate made of another material or a metal can be applied. Alternatively, layers that are only phase reversed over part of the thickness have been converted, the unconverted portion as a reflective layer Act.

The projection masks according to the invention can also be used with conventional UV or IR protection filter systems. Because this protective filter systems in the relevant wavelength range of the lasers used are, they can advantageously already on the laser treatment Projection masks are applied.  

The present invention is also extremely suitable for the production of Masks for wet chemical etching processes, since phase-converted Layer areas of thin layers of metal a larger chemi have inertness than the metallic starting material, so that on expensive and specially made exposure masks can be dispensed with.

It is first applied to the metal layer by the action of a laser creates an oxidic structure in a pattern-like manner, the phase change in the oxide not over the entire layer thickness, but only in the surface area of the layer. Then the metal layer is etched away. In the areas protected by the oxide formation on the surface However, the metal layer remains as the corresponding mask can work.

Above was the production of the decoration agents according to the invention, in particular of projection masks, described by means of a method, in which the phase change is caused by laser bombardment.

The phase change and the optical effects caused by it are different in principle not limited to the effects of lasers, but can also electrochemically as required, such as in GB 2 063 920, by thermal action or by Plasma treatment can be achieved. By applying these measures analogous to the effect of laser in the layer material, the desired Phase change causes.

However, it has been shown that laser treatment results in higher resolutions let preserved.

It is the projection masks described in more detail above are preferred embodiments of the invention. The invention includes but also decorative means such as jewelry or decorative ele elements for furniture, for which the principle described above also is easily achievable. According to the present invention, in Projection masks or in other decorations patterns in high Precision and high resolution are easily generated be made by a phase in a layer material by means of laser action conversion is effected, wherein the material from a non-transparent in  goes into a transparent (or vice versa) state. Here, a the finer the structure, the more precise the beam guidance system with which the laser is controlled.

The following examples serve to illustrate the fiction moderate principle.

1st example Production of a transmission mask

For the production of transmission masks as shown, for example, in FIG. 1, titanium or niobium layers with a layer thickness of 300 nm were applied to a glass substrate by vapor deposition or sputtering.

In a first step, these layers were washed with a focusierten Leis laser processing of a few mW to a conventional argon laser in the transition region 2/3 of 220 nm deep oxidized through. The remaining metallic residual material with a thickness of approx. 80 nm showed a transmission of less than 10% during the transmission and thus appears dark gray in the view.

In a second step, the layer area adjoining this became involved irradiated twice the power and completely oxidized. The completely through-oxidized area appears white in the transmission with a transmis sion of more than 88%.

Analogously was prepared a further transmission mask, wherein the transition region was about 2/3 of irradiated with a beam power of higher strength, so that the layer was about oxidized through nm deep 260th The remaining non-phase-converted layer thickness was now 40 nm and appeared light gray with a transmission of approx. 60%.

2nd example Production of coloring layers

For the determination of the color values according to FIG. 4, titanium and niobium layers were deposited on borosilicate glass, each with a layer thickness of 300 nm, and bombarded by means of laser bombardment in a wavelength range of approximately 500 nm with different beam powers.

The color measurement is done by measuring the reflection of the colored, the is called partially phase-converted layer areas according to DIN 5033 Part 4 ("Color measurement; spectral method"). The determination of the individual color values results according to DIN 6174 ("colorimetric determination of color differences at Body colors according to the CIELAB formula ").

The main parameters are listed in Table 1.

Here mean:
CIE = Commission Internationale de I'Eclairage
CIE C = standard illuminant C
SBW = Scan Bandwith, half-width of the measured value acquisition
Interval = measurement interval
Observer Angle = field of view of the colorimetric normal observer
x, y, z, u ', v', L *, a *, b * = color values

Table 1

color calculations

LIST OF REFERENCE NUMBERS

A projection mask

1

substratum

2

unconverted shift area

3

converted layer area

4

thin layer

5

scanner

6

lens

7

projected image

10

incident light

11

projection side

12

reflected light

Claims (23)

1. Decoration means containing a substrate ( 1 ) and applied thereon at least one thin layer ( 4 ), a pattern being depicted in the thin layer ( 4 ), characterized in that the thin layer ( 4 ) is arranged in a pattern-like manner to produce the pattern Has non-transparent areas ( 2 ) and transparent areas ( 3 ), and the non-transparent and transparent areas ( 2 , 3 ) are formed by phase change of the layer material. 2. Decoration agent according to claim 1, characterized in that the at least one thin layer ( 4 ) is formed from a material selected from titanium, niobium, chromium, aluminum, cerium, zirconium, vanadium, copper, gold, indium, molybdenum, tantalum, Silicon, germanium and magnesium as well as alloys of these metals. 3. decoration means according to claim 1, characterized, that the at least one thin layer is formed from one material selected from titanium, niobium and alloys of these metals. 4. Decoration agent according to claim 3, characterized in that the at least one thin layer ( 4 ) is formed from a titanium alloy containing aluminum, aluminum in the alloy preferably in a content of 0.1 to 15 percent by weight, preferably from 8 to 13 percent by weight is included. 5. Decoration means according to claim 1, characterized in that the at least one thin layer ( 4 ) is formed from a transparent conductive oxide, preferably Zn: AlO or In: SnO. 6. Decoration means according to one of the preceding claims 1 to 5, characterized in that the substrate ( 1 ) is a transparent substrate and on the substrate ( 1 ) at least one thin layer ( 4 ) is applied, which consists of non-transparent areas arranged in a pattern ( 2 ) and transparent areas ( 3 ), and the pattern is generated by phase change of the layer material. 7. decoration means according to claim 6, characterized, that the decoration medium is a projection mask. 8. Decoration agent according to one of claims 1 to 7, characterized in that the at least one thin layer ( 4 ) has areas in which the phase change does not extend over the entire layer thickness. 9. Decoration means according to claim 8, characterized in that the areas of the layer ( 4 ) which have not been subjected to a phase change have been removed. 10. Decoration means according to one of claims 1 to 5, characterized in that the substrate (1) consists of a reflective material, or alternatively, a reflective layer is deposited on the substrate (1), and the decorative means on the substrate (1) or the reflecting layer thereon has at least one thin layer ( 4 ) with non-transparent regions ( 2 ) arranged in a pattern, transparent regions ( 3 ) and optionally regions in which the phase change does not extend over the entire layer thickness. 11. Decoration means according to claim 10, characterized in that on the substrate ( 1 ) or the reflection layer, a multilayer system of at least two thin layers ( 4 ) is applied, the at least two thin layers ( 4 ) made of different materials, in which Phase change a pattern is generated. 12. decoration means according to claim 11, characterized, that the decoration medium is a projection mask in which the illustration is generated by reflection. 13. The projection mask as claimed in claim 12, characterized in that the projection mask has a metallic substrate ( 1 ) or a reflective metallic layer to which a multilayer system composed of at least two thin layers ( 4 ) is applied and transparent regions ( 3 ) are designed in a pattern-like manner, the depth to which the phase conversion has taken place in the layer system being selected as a function of the desired wavelength range which is to be reflected. 14. Projection mask according to one of claims 12 or 13, characterized, that the multilayer system consists of layer sequences with alternating high and low-index materials, the high or low refractive index phases can be obtained. 15. projection mask according to one of claims 12 to 14, characterized, that the multilayer system contains layers consisting of at least one Material can be obtained, selected from titanium, niobium and silicon.   16. Projection mask according to one of claims 13 to 15, characterized in that the at least one thin layer ( 4 ) has a layer thickness of 6 nm to 300 nm. 17. A method for producing a pattern on a decorative agent according to any one of claims 1 to 16, characterized in that at least one thin layer ( 4 ) made of a material is applied to a substrate ( 1 ), the phase change by laser exposure to form different transparent areas. 18. The method according to claim 17, characterized in that a non-transparent material is selected as the material for the formation of the thin layer ( 4 ), which changes into a transparent phase by the action of a laser and a pattern is written into the non-transparent material by means of a laser. 19. A method for producing a decorative agent according to one of claims 17 or 18, characterized in that at least one thin layer ( 4 ) made of a material is applied to a transparent substrate ( 1 ), which by means of laser action causes a phase change to form areas with different transparent areas and a pattern is written into these at least one thin layer ( 4 ) using a laser. 20. The method according to any one of claims 17 or 18, characterized in that on a reflective substrate ( 1 ) or a substrate ( 1 ) with a reflective layer at least one thin layer ( 4 ) made of a material is applied, the phase change by laser action experiences differently transparent areas and a pattern is written into the at least one thin layer ( 4 ) by means of a laser. 21. The method according to claim 20, characterized in that at least two thin layers ( 4 ) of different materials are applied to the reflective substrate ( 1 ) or the substrate ( 1 ) with a reflective layer, the phase change by laser action with formation experience differently transparent areas, and a pattern is drawn into this layer system, the depth to which the phase conversion takes place in the layer system being chosen variably depending on the desired wavelength range to be reflected. 22. The method according to any one of claims 17 to 21, characterized in that the laser radiation for converting the layer material on the side of the substrate ( 1 ) on which the at least one thin layer ( 4 ) is applied or in the event that a transparent substrate ( 1 ) is selected, the irradiation takes place from the substrate side. 23. The method according to claim 17, characterized, that the phase change in the surface area of the thin layer takes place and the unconverted layer material in the areas that are not protected by the superficially phase-changed material, Will get removed.