DD112013A5 - - Google Patents

Info

Publication number
DD112013A5
DD112013A5 DD179514A DD17951474A DD112013A5 DD 112013 A5 DD112013 A5 DD 112013A5 DD 179514 A DD179514 A DD 179514A DD 17951474 A DD17951474 A DD 17951474A DD 112013 A5 DD112013 A5 DD 112013A5
Authority
DD
German Democratic Republic
Application number
DD179514A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP48072214A external-priority patent/JPS5234966B2/ja
Priority claimed from JP7359673A external-priority patent/JPS5222678B2/ja
Application filed filed Critical
Publication of DD112013A5 publication Critical patent/DD112013A5/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
DD179514A 1973-06-28 1974-06-27 DD112013A5 (xx)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP48072214A JPS5234966B2 (xx) 1973-06-28 1973-06-28
JP7359673A JPS5222678B2 (xx) 1973-07-02 1973-07-02

Publications (1)

Publication Number Publication Date
DD112013A5 true DD112013A5 (xx) 1975-03-12

Family

ID=26413345

Family Applications (1)

Application Number Title Priority Date Filing Date
DD179514A DD112013A5 (xx) 1973-06-28 1974-06-27

Country Status (12)

Country Link
US (1) US4192685A (xx)
CA (1) CA1032288A (xx)
CH (1) CH599282A5 (xx)
CS (1) CS185227B2 (xx)
DD (1) DD112013A5 (xx)
DE (1) DE2429636C3 (xx)
DK (1) DK346374A (xx)
FR (1) FR2235170B1 (xx)
GB (1) GB1481216A (xx)
IT (1) IT1015428B (xx)
NL (1) NL7408781A (xx)
SE (1) SE7408491L (xx)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105774A (en) * 1978-02-08 1979-08-20 Hitachi Ltd Method of forming pattern on thin film hybrid integrated circuit
US4252888A (en) * 1980-02-26 1981-02-24 Minnesota Mining And Manufacturing Company Solder mask composition
JPS56141321A (en) * 1980-04-08 1981-11-05 Mitsubishi Gas Chem Co Inc Photosetting resin composition
US4322490A (en) * 1980-11-17 1982-03-30 Eastman Kodak Company Photopolymerizable compositions featuring improved monomers
US4638040A (en) * 1983-06-03 1987-01-20 Minnesota Mining And Manufacturing Company Acrylate and methacrylate monomers and polymers
US4578504A (en) * 1983-06-03 1986-03-25 Minnesota Mining And Manufacturing Company Acrylate and methacrylate monomers and polymers
US4801740A (en) * 1983-06-03 1989-01-31 Minnesota Mining And Manufacturing Company Acrylate and methacrylate monomers and polymers
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
JPS62178502A (ja) * 1986-01-31 1987-08-05 Tokuyama Soda Co Ltd 歯科用補綴剤
JPS62290705A (ja) * 1986-06-10 1987-12-17 Mitsubishi Chem Ind Ltd 光重合性組成物
US5290892A (en) * 1990-11-07 1994-03-01 Nestle S.A. Flexible intraocular lenses made from high refractive index polymers
DE4424101A1 (de) * 1994-07-08 1996-01-11 Basf Lacke & Farben Strahlenhärtbare Lacke und deren Verwendung zur Herstellung matter Lackfilme
US5747597A (en) * 1995-09-25 1998-05-05 Dainippon Ink And Chemicals, Inc. Curable resin composition and coating material composition
US5922821A (en) * 1996-08-09 1999-07-13 Alcon Laboratories, Inc. Ophthalmic lens polymers
DE19737017A1 (de) * 1997-08-26 1999-03-04 Bayer Ag Verfahren zur Herstellung von Estern ethylenisch ungesättigter Carbonsäuren und deren Verwendung
US6803414B2 (en) * 1999-09-29 2004-10-12 Mitsubishi Fuso Truck And Bus Corporation Damping resin composition and damping resin article for structure using the resin composition
FR2960547B1 (fr) * 2010-05-28 2014-01-10 Saint Gobain Rech Composition adhesive renfermant un polyester insature a terminaison acide carboxylique et utilisations.
JP5466689B2 (ja) * 2011-11-30 2014-04-09 富士フイルム株式会社 フレキソ印刷版用樹脂組成物、フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法
KR20140033636A (ko) * 2012-09-10 2014-03-19 삼성디스플레이 주식회사 발광보조층의 구조가 개선된 유기발광 표시장치 및 그 제조방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3616028A (en) * 1967-04-04 1971-10-26 Weyerhaeuser Co Process of bonding resin-impregnated overlay material to a coated substrate material utilizing high-energy radiation
JPS5137320B1 (xx) * 1967-11-09 1976-10-14
US3839171A (en) * 1968-02-15 1974-10-01 Asahi Chemical Ind Unsaturated polyesters and laminates thereof
CA935398A (en) 1969-01-28 1973-10-16 L. Osborn Claiborn Crosslinking process
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
JPS4814173B1 (xx) * 1969-07-30 1973-05-04
US3695877A (en) * 1969-08-13 1972-10-03 Teijin Ltd Photopolymerizable resin compositions
JPS5033767B1 (xx) * 1971-03-11 1975-11-04
US3918393A (en) * 1971-09-10 1975-11-11 Ppg Industries Inc Method of producing flat (non-glossy) films
US3827959A (en) * 1973-01-12 1974-08-06 Scm Corp Process for photopolymerization with carbonylated phenyl nuclear sulfonyl chloride sensitizer
US3827960A (en) * 1973-01-12 1974-08-06 Scm Corp Process for photopolymerization with carbonylated polynuclear sulfonyl chloride sensitizers
JPS51999A (ja) * 1974-06-21 1976-01-07 Nippon Electric Co Jidoshoruijunjoseirisochi

Also Published As

Publication number Publication date
NL7408781A (xx) 1974-12-31
GB1481216A (en) 1977-07-27
CA1032288A (en) 1978-05-30
DE2429636A1 (de) 1975-01-16
AU7059174A (en) 1976-01-08
FR2235170A1 (xx) 1975-01-24
DK346374A (xx) 1975-03-17
IT1015428B (it) 1977-05-10
FR2235170B1 (xx) 1978-02-17
CS185227B2 (en) 1978-09-15
DE2429636C3 (de) 1986-05-07
DE2429636B2 (de) 1981-07-30
SE7408491L (xx) 1974-12-30
CH599282A5 (xx) 1978-05-31
US4192685A (en) 1980-03-11

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