DD108559A1 - - Google Patents
Info
- Publication number
- DD108559A1 DD108559A1 DD175035A DD17503573A DD108559A1 DD 108559 A1 DD108559 A1 DD 108559A1 DD 175035 A DD175035 A DD 175035A DD 17503573 A DD17503573 A DD 17503573A DD 108559 A1 DD108559 A1 DD 108559A1
- Authority
- DD
- German Democratic Republic
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD17503573A DD108559B1 (en) | 1973-12-03 | 1973-12-03 | Process for controlling the vapor deposition of NiCr resistance layers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD17503573A DD108559B1 (en) | 1973-12-03 | 1973-12-03 | Process for controlling the vapor deposition of NiCr resistance layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DD108559A1 true DD108559A1 (en) | 1974-09-20 |
| DD108559B1 DD108559B1 (en) | 1979-11-28 |
Family
ID=5493686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD17503573A DD108559B1 (en) | 1973-12-03 | 1973-12-03 | Process for controlling the vapor deposition of NiCr resistance layers |
Country Status (1)
| Country | Link |
|---|---|
| DD (1) | DD108559B1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0067432A1 (en) * | 1981-06-12 | 1982-12-22 | Siemens Aktiengesellschaft | Arrangement for measuring the electric resistance and the temperature of thin metallic conducting films deposited by vapour deposition or sputtering on substrates during the manufacture of the films |
| EP0289661A2 (en) * | 1987-03-28 | 1988-11-09 | Messerschmitt-Bölkow-Blohm Gesellschaft mit beschränkter Haftung | Procedure for reproduceable formation of layers of material and/or for the handling of semiconductor material-layers |
| WO2018229250A1 (en) * | 2017-06-15 | 2018-12-20 | Gottfried Wilhelm Leibniz Universität Hannover | Method and system for producing an electrical component, and computer program |
-
1973
- 1973-12-03 DD DD17503573A patent/DD108559B1/en unknown
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0067432A1 (en) * | 1981-06-12 | 1982-12-22 | Siemens Aktiengesellschaft | Arrangement for measuring the electric resistance and the temperature of thin metallic conducting films deposited by vapour deposition or sputtering on substrates during the manufacture of the films |
| EP0289661A2 (en) * | 1987-03-28 | 1988-11-09 | Messerschmitt-Bölkow-Blohm Gesellschaft mit beschränkter Haftung | Procedure for reproduceable formation of layers of material and/or for the handling of semiconductor material-layers |
| EP0289661A3 (en) * | 1987-03-28 | 1989-02-01 | Messerschmitt-Bölkow-Blohm Gesellschaft mit beschränkter Haftung | Procedure for reproduceable formation of layers of material and/or for the handling of semiconductor material-layers |
| WO2018229250A1 (en) * | 2017-06-15 | 2018-12-20 | Gottfried Wilhelm Leibniz Universität Hannover | Method and system for producing an electrical component, and computer program |
Also Published As
| Publication number | Publication date |
|---|---|
| DD108559B1 (en) | 1979-11-28 |