DD106417A1 - - Google Patents

Info

Publication number
DD106417A1
DD106417A1 DD16806572A DD16806572A DD106417A1 DD 106417 A1 DD106417 A1 DD 106417A1 DD 16806572 A DD16806572 A DD 16806572A DD 16806572 A DD16806572 A DD 16806572A DD 106417 A1 DD106417 A1 DD 106417A1
Authority
DD
German Democratic Republic
Application number
DD16806572A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD16806572A priority Critical patent/DD106417A1/xx
Priority to DE19732355058 priority patent/DE2355058A1/de
Priority to CS839273A priority patent/CS169180B1/cs
Priority to GB5840473A priority patent/GB1451643A/en
Priority to PL16739373A priority patent/PL89600B1/pl
Priority to FR7346389A priority patent/FR2221535B3/fr
Priority to CH1816373A priority patent/CH597362A5/xx
Publication of DD106417A1 publication Critical patent/DD106417A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45576—Coaxial inlets for each gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DD16806572A 1972-12-27 1972-12-27 DD106417A1 (OSRAM)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DD16806572A DD106417A1 (OSRAM) 1972-12-27 1972-12-27
DE19732355058 DE2355058A1 (de) 1972-12-27 1973-11-03 Verfahren und vorrichtung zur erzeugung duenner, homogener schichten auf unterlagen
CS839273A CS169180B1 (OSRAM) 1972-12-27 1973-12-05
GB5840473A GB1451643A (OSRAM) 1972-12-27 1973-12-17
PL16739373A PL89600B1 (OSRAM) 1972-12-27 1973-12-17
FR7346389A FR2221535B3 (OSRAM) 1972-12-27 1973-12-26
CH1816373A CH597362A5 (OSRAM) 1972-12-27 1973-12-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16806572A DD106417A1 (OSRAM) 1972-12-27 1972-12-27

Publications (1)

Publication Number Publication Date
DD106417A1 true DD106417A1 (OSRAM) 1974-06-12

Family

ID=5489648

Family Applications (1)

Application Number Title Priority Date Filing Date
DD16806572A DD106417A1 (OSRAM) 1972-12-27 1972-12-27

Country Status (7)

Country Link
CH (1) CH597362A5 (OSRAM)
CS (1) CS169180B1 (OSRAM)
DD (1) DD106417A1 (OSRAM)
DE (1) DE2355058A1 (OSRAM)
FR (1) FR2221535B3 (OSRAM)
GB (1) GB1451643A (OSRAM)
PL (1) PL89600B1 (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741708A1 (de) * 1987-12-09 1989-06-22 Asea Brown Boveri Einrichtung zur materialabscheidung aus der gasphase

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276796B1 (en) * 1987-01-27 1992-04-08 Asahi Glass Company Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
DE102005056322A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741708A1 (de) * 1987-12-09 1989-06-22 Asea Brown Boveri Einrichtung zur materialabscheidung aus der gasphase

Also Published As

Publication number Publication date
GB1451643A (OSRAM) 1976-10-06
PL89600B1 (OSRAM) 1976-11-30
FR2221535B3 (OSRAM) 1976-10-22
DE2355058A1 (de) 1974-07-11
FR2221535A1 (OSRAM) 1974-10-11
CS169180B1 (OSRAM) 1976-07-29
CH597362A5 (OSRAM) 1978-03-31

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