CS169180B1 - - Google Patents
Info
- Publication number
- CS169180B1 CS169180B1 CS839273A CS839273A CS169180B1 CS 169180 B1 CS169180 B1 CS 169180B1 CS 839273 A CS839273 A CS 839273A CS 839273 A CS839273 A CS 839273A CS 169180 B1 CS169180 B1 CS 169180B1
- Authority
- CS
- Czechoslovakia
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/45576—Coaxial inlets for each gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DD16806572A DD106417A1 (OSRAM) | 1972-12-27 | 1972-12-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CS169180B1 true CS169180B1 (OSRAM) | 1976-07-29 |
Family
ID=5489648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS839273A CS169180B1 (OSRAM) | 1972-12-27 | 1973-12-05 |
Country Status (7)
| Country | Link |
|---|---|
| CH (1) | CH597362A5 (OSRAM) |
| CS (1) | CS169180B1 (OSRAM) |
| DD (1) | DD106417A1 (OSRAM) |
| DE (1) | DE2355058A1 (OSRAM) |
| FR (1) | FR2221535B3 (OSRAM) |
| GB (1) | GB1451643A (OSRAM) |
| PL (1) | PL89600B1 (OSRAM) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0276796B1 (en) * | 1987-01-27 | 1992-04-08 | Asahi Glass Company Ltd. | Gas feeding nozzle for a chemical vapor deposition apparatus |
| DE3741708A1 (de) * | 1987-12-09 | 1989-06-22 | Asea Brown Boveri | Einrichtung zur materialabscheidung aus der gasphase |
| DE102005056322A1 (de) * | 2005-11-25 | 2007-06-06 | Aixtron Ag | VPE-Reaktor mit koaxial zueinander angeordneten Quellgasrohren |
-
1972
- 1972-12-27 DD DD16806572A patent/DD106417A1/xx unknown
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1973
- 1973-11-03 DE DE19732355058 patent/DE2355058A1/de active Pending
- 1973-12-05 CS CS839273A patent/CS169180B1/cs unknown
- 1973-12-17 GB GB5840473A patent/GB1451643A/en not_active Expired
- 1973-12-17 PL PL16739373A patent/PL89600B1/pl unknown
- 1973-12-26 FR FR7346389A patent/FR2221535B3/fr not_active Expired
- 1973-12-27 CH CH1816373A patent/CH597362A5/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DD106417A1 (OSRAM) | 1974-06-12 |
| GB1451643A (OSRAM) | 1976-10-06 |
| PL89600B1 (OSRAM) | 1976-11-30 |
| FR2221535B3 (OSRAM) | 1976-10-22 |
| DE2355058A1 (de) | 1974-07-11 |
| FR2221535A1 (OSRAM) | 1974-10-11 |
| CH597362A5 (OSRAM) | 1978-03-31 |