CZ309251B6 - Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies - Google Patents

Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies Download PDF

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Publication number
CZ309251B6
CZ309251B6 CZ2020-578A CZ2020578A CZ309251B6 CZ 309251 B6 CZ309251 B6 CZ 309251B6 CZ 2020578 A CZ2020578 A CZ 2020578A CZ 309251 B6 CZ309251 B6 CZ 309251B6
Authority
CZ
Czechia
Prior art keywords
ampoule
cleaning
neck
furnace
head
Prior art date
Application number
CZ2020-578A
Other languages
Czech (cs)
Other versions
CZ2020578A3 (en
Inventor
Pavel Höschl
Roman Fesh
Petr Sladký
Original Assignee
Univerzita Karlova
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univerzita Karlova filed Critical Univerzita Karlova
Priority to CZ2020-578A priority Critical patent/CZ309251B6/en
Publication of CZ2020578A3 publication Critical patent/CZ2020578A3/en
Publication of CZ309251B6 publication Critical patent/CZ309251B6/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/90—Investigating the presence of flaws or contamination in a container or its contents
    • G01N21/9018—Dirt detection in containers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning In General (AREA)

Abstract

The method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies consists of the end part (16) of the neck (15) of the ampoule (10) is fitted with a head (11) which has inlets and outlets (12, 13, 14) of gases. Next, the ampoule (10) is placed in the process furnace (100) by leaving the head (11) with part of the neck (15) outside the furnace (100) at room temperature, the UV-VIS changes are monitored separately via the head (11) of IR optical properties in the formation of deposits of chlorine reaction products with impurities on the neck (15) of the ampoule (10) in correlation with the purification process. The volume of the ampoule is pumped to a pressure of 0.008 to 0.012 Pa and allowed to heat to a process temperature of 1,050 to 1,175 °C and degassing for a heating time of 4 to 6 hours. Further, Cl 2 gas is allowed to operate at a process temperature of 1,050 to 1,175 °C for at least 12 hours. Then the heating of the ampoule (10) is stopped and the ampoule (10) together with the furnace (100) is allowed to cool spontaneously and / or in a controlled manner for 11 +/- 1 hours. After cooling the ampoule (10) and the furnace (100) to room temperature, the Cl2 gas is pumped out, the ampoule (10) is filled with N2 gas to atmospheric pressure and the gas inflow and outflow are stopped. Finally, the ampoule (10) is removed from the furnace (100), the head (11) is removed from the neck (15) of the ampoule (10), the ampoule (10) is closed and the neck (15) and the other parts of the ampoule are made accessible, e.g. another known method of evaluating the cleaning process for further operations and uses.
CZ2020-578A 2020-10-23 2020-10-23 Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies CZ309251B6 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CZ2020-578A CZ309251B6 (en) 2020-10-23 2020-10-23 Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CZ2020-578A CZ309251B6 (en) 2020-10-23 2020-10-23 Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies

Publications (2)

Publication Number Publication Date
CZ2020578A3 CZ2020578A3 (en) 2022-05-04
CZ309251B6 true CZ309251B6 (en) 2022-06-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CZ2020-578A CZ309251B6 (en) 2020-10-23 2020-10-23 Method of cleaning and non-destructive monitoring of the process of cleaning quartz ampoules for semiconductor technologies

Country Status (1)

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CZ (1) CZ309251B6 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230375983A1 (en) * 2022-05-20 2023-11-23 Mb-Microtec Ag Fabrication of glass cells for hermetic gas enclosures

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CZ20012839A3 (en) * 2000-09-26 2002-05-15 General Electric Company Device for measuring surface contamination with particles
WO2009134385A1 (en) * 2008-04-30 2009-11-05 Corning Incorporated Process for preparing an optical preform
WO2012021317A1 (en) * 2010-08-12 2012-02-16 Corning Incorporated Treatment of silica based soot or an article made of silica based soot
CN106353333A (en) * 2015-07-17 2017-01-25 住友化学株式会社 A membrane inspection apparatus, a membrane inspection method, and a film manufacturing method
CN111349968A (en) * 2020-03-29 2020-06-30 四川大学 Synthesis method of selenium cadmium sulfide polycrystal

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CZ20012839A3 (en) * 2000-09-26 2002-05-15 General Electric Company Device for measuring surface contamination with particles
WO2009134385A1 (en) * 2008-04-30 2009-11-05 Corning Incorporated Process for preparing an optical preform
WO2012021317A1 (en) * 2010-08-12 2012-02-16 Corning Incorporated Treatment of silica based soot or an article made of silica based soot
CN106353333A (en) * 2015-07-17 2017-01-25 住友化学株式会社 A membrane inspection apparatus, a membrane inspection method, and a film manufacturing method
CN111349968A (en) * 2020-03-29 2020-06-30 四川大学 Synthesis method of selenium cadmium sulfide polycrystal

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
(Threshold of light breakdown of hydroxylfree quartz glass of high purity; A. G. Boganov, G. P. Gusev, V. S. Rudenko, A. V. Shatilov; Fizika i Khimiya Stekla (19801031), 6(5), pp. 573-81 CODEN: FKSTD5 ISSN: 0132-6651) 12.05.1984 *

Also Published As

Publication number Publication date
CZ2020578A3 (en) 2022-05-04

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Date Code Title Description
MM4A Patent lapsed due to non-payment of fee

Effective date: 20231023