CS273450B3 - Method of ion-cladding during layer sputtering - Google Patents
Method of ion-cladding during layer sputteringInfo
- Publication number
- CS273450B3 CS273450B3 CS232889A CS232889A CS273450B3 CS 273450 B3 CS273450 B3 CS 273450B3 CS 232889 A CS232889 A CS 232889A CS 232889 A CS232889 A CS 232889A CS 273450 B3 CS273450 B3 CS 273450B3
- Authority
- CS
- Czechoslovakia
- Prior art keywords
- ion
- layers
- substrates
- flow
- during layer
- Prior art date
Links
- 238000005253 cladding Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 238000004544 sputter deposition Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- 150000002500 ions Chemical class 0.000 abstract 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 238000002441 X-ray diffraction Methods 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 238000000746 purification Methods 0.000 abstract 1
- 230000011514 reflex Effects 0.000 abstract 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS232889A CS273450B3 (en) | 1989-04-14 | 1989-04-14 | Method of ion-cladding during layer sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS232889A CS273450B3 (en) | 1989-04-14 | 1989-04-14 | Method of ion-cladding during layer sputtering |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CS232889A1 CS232889A1 (en) | 1990-08-14 |
| CS273450B3 true CS273450B3 (en) | 1991-03-12 |
Family
ID=5360097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS232889A CS273450B3 (en) | 1989-04-14 | 1989-04-14 | Method of ion-cladding during layer sputtering |
Country Status (1)
| Country | Link |
|---|---|
| CS (1) | CS273450B3 (cs) |
-
1989
- 1989-04-14 CS CS232889A patent/CS273450B3/cs unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CS232889A1 (en) | 1990-08-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Mišina et al. | Composite TiN–Ni thin films deposited by reactive magnetron sputter ion-plating | |
| Baouchi et al. | A study of the macroparticle distribution in cathodic-arc-evaporated TiN films | |
| GB2331998B (en) | Carbon coatings, method and apparatus for applying them, and articles bearing such coatings | |
| US5272014A (en) | Wear-resistant coating for substrate and method for applying | |
| CA1193227A (en) | Magnetron sputtering apparatus | |
| Schiller et al. | Use of the ring gap plasmatron for high rate sputtering | |
| CS273450B3 (en) | Method of ion-cladding during layer sputtering | |
| US20030173216A1 (en) | Sputtertarget | |
| Chang et al. | High rate sputtering deposition of nickel using dc magnetron mode | |
| Meassick et al. | Thin film deposition techniques utilizing the anodic vacuum arc | |
| JPS5629670A (en) | Preparation of coated high speed steel | |
| JPS57128437A (en) | Manufacture of lanthanum-boride thermionic emission electrode | |
| JPH0297673A (ja) | イオンビームスパッタ法 | |
| WO2003046248A3 (fr) | Procede perfectionne de revetement d'un support | |
| SU1802550A1 (ru) | Протяженный электродуговой испаритель металлов | |
| Kuwano et al. | Deposition of Aluminum Oxide Film by an Activated Reactive Evaporation Process | |
| JP3004880B2 (ja) | Hcd装置におけるプラズマビーム照射条件の決定方法 | |
| Minato | Decorative applications for hollow cathode discharge ion plating | |
| JPS57145979A (en) | Formation of protective film | |
| JPS59182207A (ja) | 高融点金属窒化膜の形成方法 | |
| JPH0666259B2 (ja) | 硬質炭素被覆膜の製造方法 | |
| AU2826089A (en) | Method of sputtering | |
| Repenning | Process for the Production of Layers With High Hardness and/or Low Friction Properties | |
| Damond et al. | NiCoCrAlYTa coatings deposited by the cathodic arc evaporation technique | |
| KR950018634A (ko) | 내식성이 우수한 알루미늄-망간 합금도금강판 및 그 제조방법 |