CS266513B1 - Vacuum device for forming thin layers on metal components using a low voltage arc - Google Patents

Abstract

Vacuum device using a low-voltage arc, consisting of a vacuum chamber, tilting evaporators. There is a rotating mechanism and a lifting mechanism in the bottom of the chamber. The vacuum chamber is of a modular type, with tilting evaporators on the walls of each part. The device can be used to create thin layers on engineering components using a low-voltage arc.

Description

The invention relates to a vacuum device which allows the formation of thin layers by means of a low-voltage arc on metallic and non-metallic components.

These methods are currently under development in advanced industrialized nations. Examples of foreign manufacturers are Balzers Switzerland, Multi-arc USA and fa. Kawasaki Japan, engaged in the development and production of these devices. The technological equipment of the above-mentioned foreign companies is designed for a single purpose with limited possibilities of use. These are single-chamber vacuum devices with a rectangular cross-section of deposition chambers. The deposition chambers are in a horizontal position with the possibility of opening one of the 4 walls of the chamber. Due to this concept, the handling of the charge is difficult. The production of these vacuum chambers is expensive due to the shape of the deposition chamber. These devices need a larger built-up area for installation.

The above drawbacks are eliminated by the solution of the device according to the invention. The essence of the solution of the device according to the invention lies in the fact that it consists of a vacuum chamber, which has tilting evaporators in the walls and the lid, which are equipped with a device for creating a low-voltage arc. The vacuum chamber is provided with a bottom on which the rotating mechanism is mounted. The bottom is mounted on a bracket that is rotatable and is mounted on the stand of the lifting mechanism. The vacuum chamber is either integral or of the modular type, whereby it is formed from parts and tilting evaporators are mounted on the walls of each part.

AND

The higher effect of the device according to the invention consists in the fact that the device is modular, its size is determined (can be adapted) according to the shape and size of the sputtered parts. The shape of the chamber preferably forms a cylinder in a vertical position with the possibility of connecting Tilting evaporators on the walls and the cylinder lid. The layout of the tilting evaporators allows you to coat both rotating and planar components. Tilting evaporators allow quick and easy operation of the elements creating the low-voltage arc. Another advantage of this device is the easy handling of the batch.

The accompanying drawings show a vacuum device according to the invention, in which Fig. 1 shows the overall arrangement of the device according to the invention and Fig. 2 is a plan view of the device.

The vacuum device in FIG. 1 is formed by a vacuum chamber 2 * on the circumference of which tilting evaporators 2 are arranged according to technological need. One or even more tilting evaporators 2 are located in the lid of the vacuum chamber 2, depending on the technology performed. The vacuum chamber 2 has a bottom base 4 and is mounted on the base frame (frame) 2 · bottom 2 j ^e is pushed by a bracket 5, which is rotatably disposed on the frame of the lifting mechanism 2 · ^{At the} bottom 2 of the air-tight connection to a rotating mechanism] _ _t which ensures movement and rotation of the charge. Vacuum chamber 2 ^e j connected to the vacuum system 2 · Further, the vacuum chamber 2 installed technological media feed, i.e. the working gas, water, electricity etc. The location of these feeds is not shown in the drawing, since it is not essential in the present solutions. In FIG. 2, a further alternative of the solution of the shape of the vacuum chamber 2 is shown in dashed lines above, which would be made in the shape of a higher cylinder according to the requirement for how large components the device would be used. If the vacuum chamber 2 is used as a higher cylinder, tilting evaporators 2 would also be located in another part of the walls of the vacuum chamber 2.

The technological process on this device proceeds as follows - the loading of the load 2 is performed after lowering the bracket 2 ^{with the} bottom 2 ^and turning it about 180 degrees in front of the base frame 2, which allows access to the load 9 from all sides. After the establishment of the charge 2 ^is rotated bracket 5 with a bottom 2 under the vertical axis of the vacuum chamber 2 ^{and the} lifting mechanism 2 ^is inserted into a batch vacuum chamber 2 · 2 ^upon abutment of the bottom 2 to the vacuum chamber 2 begins technological process. The bottom 2 is pressed by means of the lifting mechanism 2 / bracket 2 ^and by the action of a vacuum.

The vacuum device according to the invention is used to form thin abrasion-resistant layers

CS 266 513 Bl on engineering components by means of a low-voltage arc. The components can have both a rotating and a flat shape.

Claims (2)

OBJECT OF THE INVENTION Vacuum device for forming thin layers on metal components using a low-voltage arc, characterized in that it consists of a vacuum chamber (1) having tilting evaporators (2) in the walls and lid, which are equipped with a device for creating a low-voltage arc, the vacuum chamber (1) is provided with a bottom (4) on which the rotating mechanism (7) is mounted, the bottom (4) being mounted on a bracket (5) which is rotatably mounted on the stand of the lifting mechanism (6). 2. Vacuum device according to claim 1, characterized in that the vacuum chamber (1) is of the modular type and is formed in one piece or in parts, tilting evaporators (2) being mounted on the walls of each part.