CS258709B1 - Method of visualizing crystallographic disorders in phosphite indite InP orientation (001) - Google Patents
Method of visualizing crystallographic disorders in phosphite indite InP orientation (001) Download PDFInfo
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- CS258709B1 CS258709B1 CS862979A CS297986A CS258709B1 CS 258709 B1 CS258709 B1 CS 258709B1 CS 862979 A CS862979 A CS 862979A CS 297986 A CS297986 A CS 297986A CS 258709 B1 CS258709 B1 CS 258709B1
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Abstract
Riešenie sa týká sposobu zviditelňovania krystalografických porúch v fosfide inditom InP orientácie (001) metodou fotoleptania. Podstatou riešenia je, že na fosfid inditý sa posobí zmesou hydroxidu draselného a hexakyanoželezitanu draselného vo formě vodného roztoku pri teplote 15 až 50 °C počas 1 a 20 min. za intenzívneho miešania a osvetlenia, pričom roztok obsahuje 6,5 až 10 % hmot. hydroxidu draselného a 3 až 7 pere. hmot. hexakyanoželezitanu draselného. Riešenie je možné využit pri zisťovaní vhodnosti fosfidu inditého pre výrobu mikrovlnných a optoelektronických prvkov.The solution concerns a method of visualizing crystallographic defects in indium phosphide of InP orientation (001) by the photoetching method. The essence of the solution is that indium phosphide is treated with a mixture of potassium hydroxide and potassium hexacyanoferrate in the form of an aqueous solution at a temperature of 15 to 50 °C for 1 and 20 min. under intensive stirring and illumination, while the solution contains 6.5 to 10 wt. % potassium hydroxide and 3 to 7 wt. % potassium hexacyanoferrate. The solution can be used to determine the suitability of indium phosphide for the production of microwave and optoelectronic elements.
Description
Vynález sa týká sposobu na zviditelňovanie krystalografických porúch v fosfide inditom InP orientácie (001), pomocou fotoleptania zmesou zloženou z vodných roztokov hydroxidu draselného a ferikyanidu draselného.The invention relates to a method for visualizing crystallographic disturbances in phosphide by indite InP orientation (001), by means of photo-etching with a mixture composed of aqueous solutions of potassium hydroxide and potassium ferricyanide.
Zlúčenina fosfid inditý InP s vlastnosťami polovodiča )e vhodná na přípravu mikrovlnných aj optoelektronických prvkov. Krystalografické poruchy v materiáli spůsobujú degradáciu týchto prvkov. Jednou z metod na identifikáciu a zviditefnenie týchto porúch je fotoleptanie, t. j. chemické leptáme pri ožiarení materiálu vonkajším zdrojom světla. Doteraz holi pri fotoleptaní fosfidu inditého InP použité dva druhy leptadiel, ktoré tu zviditelňujú krystalografické poruchy, a to najma dislokácie a rastové čiary. Leptadlo zložené z kyseliny fosforečné] H3PO4 a peroxidu vodíka H2O2 vzhladom na leptaciu rýchlosť zviditelňuje poruchy len na povrchu materiálu alebo poruchy na povrchu ústiáce, například dislokácie.Indium phosphide compound InP with semiconductor properties is suitable for the preparation of microwave and optoelectronic elements. Crystallographic disturbances in the material cause degradation of these elements. One method to identify and visualize these disorders is photo-etching, ie chemical etching when irradiating the material with an external light source. So far, two types of etch have been used to photo-etch indium phosphide InP, which make visible crystallographic disturbances, in particular dislocations and growth lines. The etching composed of phosphoric acid 1 H 3 PO 4 and hydrogen peroxide H 2 O 2, due to the etching rate, makes visible defects only on the surface of the material or defects on the surface of the oyster, such as dislocation.
Leptadlo zložené z oxidu chrómového CrO3, kyselina fluorovodíkové]’ HF a vody H2O zviditelňuje nielen povrchové defekty, ale aj defekty vo vnútri materiálu, čím je možno určit' geometrický tvar a usporiadanie porúch v materiáli. Vzhladom na to, že toto leptadlo obsahuje kyselinu fluorovodíkovú, je práca s ním nebezpečná a zdraviu škodlivá. Druhou nevýhodou je, že použité nádoby, nástroje, přístroje nemůžu byť zo skla, pretože táto kyselina a jej výpary leptajú sklo.An etch composed of chromium trioxide CrO 3 , hydrofluoric acid 1 HF and water H 2 O makes not only surface defects visible but also defects inside the material, thereby determining the geometric shape and arrangement of the defects in the material. As this etching agent contains hydrofluoric acid, working with it is dangerous and harmful to health. The second disadvantage is that the used containers, tools, appliances cannot be made of glass, because this acid and its vapors etch the glass.
Uvedené nedostatky sú odstránené sposobom zviditelňovania krystalografických porúch v fosfide inditom InP orientácie (001) metodou fotoleptania, ktorého podstatou je, že na fosfid inditý InP orientácie (001) sa působí zmesou zloženou z hydroxidu draselného a hexakyanoželezitanu draselného vo formě vodného roztoku pri teplote 15 až 50 °C po dobu 1 až 20 min. za intenzívneho miešania a osvetlenia, pričom roztok obsahuje 6,5 až 10 % hmot. hydroxidu draselného a 3 až 7 % hmot. hexakyanoželezitanu draselného. Pri fotoleptaní touto zmesou sa pre časy kratšie ako 1 minúta zviditelňujú krystalografické poruchy na povrchu materiálu. Pre časy dlhšie ako 1 minúta sa zviditelňujú poruchy aj vo vnútri materiálu. Zmes sa vyznačuje aj paměťovým efektom, to znamená, že i po odleptaní poruchy zostáva na povrchu materiálu po nej stopa vo formě jamky, ryhy, kopčeka a podobné.The above-mentioned deficiencies are eliminated by the method of visualization of crystallographic disturbances in phosphide by indite InP orientation (001) by the photo-etching method, which is based on treating indium phosphide InP orientation (001) with a mixture of potassium hydroxide and potassium ferrocyanide 50 ° C for 1 to 20 min. with vigorous stirring and illumination, the solution containing 6.5 to 10 wt. % potassium hydroxide and 3 to 7 wt. potassium ferrocyanide. When photo-etched with this mixture, crystallographic disturbances are visible on the surface of the material for times less than 1 minute. For times longer than 1 minute, faults are also visible inside the material. The mixture is also characterized by a memory effect, that is, even after etching of the failure, there remains a trace of the material in the form of a hole, groove, scoop and the like on the surface of the material.
Leptací roztok ani jeho výpary nespůsobujú zdraviu škodlivé popáleniny a neporušujú sklenné nádoby, v ktorých sa skladajú.The etching solution and its vapors do not cause harmful burns and do not damage the glass containers in which they are stored.
PříkladExample
Lesklá polovodičová podložka z fosfidu inditého InP, orientácie (001), o hrúbke 500 μπι bola leptaná v zmesi obsahujúcej 5 % hmot. hexakyanoželezitan draselný, 10 % hmot. hydroxid draselný a 85 % hmot. deionizovanej vody počas 1,5 až 10 minút.A shiny semiconductor pad of indium phosphide InP, orientation (001), thickness 500 μπι was etched in a mixture containing 5 wt. % potassium ferrocyanide, 10 wt. % potassium hydroxide and 85 wt. of deionized water for 1.5 to 10 minutes.
Osvetlenie bolo realizované pomocou objektivu mikroskopu, halogenovou žiarovkou 50 W. P 1 minútovom leptaní v miestach prieniku dislokaci! s povrchom materiálu sa vyleptali malé jamky. Takisto sa jamky vyleptali v miestach iných krystalografických porúch. Po 5 a 10-minútovom leptaní sa dislokačné jamky zvýraznili, vtedy, keď dislokácie bota kolmá k povrchu. Ak dislokácia bola šikmá k povrchu, tak sa to prejavilo vyleptáním ryhy, ktorá sleduje směr dislokácie.The illumination was realized by means of a microscope objective, a 50 W halogen bulb. P 1 minute etching at dislocation penetration sites! small wells were etched with the surface of the material. Also, the wells were etched at other crystallographic disorders. After etching for 5 and 10 minutes, the dislocation wells were enhanced when the shoe dislocation was perpendicular to the surface. If the dislocation was oblique to the surface, this was manifested by etching the groove that followed the direction of the dislocation.
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS862979A CS258709B1 (en) | 1986-04-24 | 1986-04-24 | Method of visualizing crystallographic disorders in phosphite indite InP orientation (001) |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CS862979A CS258709B1 (en) | 1986-04-24 | 1986-04-24 | Method of visualizing crystallographic disorders in phosphite indite InP orientation (001) |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CS297986A1 CS297986A1 (en) | 1987-12-17 |
| CS258709B1 true CS258709B1 (en) | 1988-09-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CS862979A CS258709B1 (en) | 1986-04-24 | 1986-04-24 | Method of visualizing crystallographic disorders in phosphite indite InP orientation (001) |
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1986
- 1986-04-24 CS CS862979A patent/CS258709B1/en unknown
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| Publication number | Publication date |
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| CS297986A1 (en) | 1987-12-17 |
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