JPS6417879A - Method for etching gallium phosphide crystal and liquid etchant used therefor - Google Patents

Method for etching gallium phosphide crystal and liquid etchant used therefor

Info

Publication number
JPS6417879A
JPS6417879A JP17397987A JP17397987A JPS6417879A JP S6417879 A JPS6417879 A JP S6417879A JP 17397987 A JP17397987 A JP 17397987A JP 17397987 A JP17397987 A JP 17397987A JP S6417879 A JPS6417879 A JP S6417879A
Authority
JP
Japan
Prior art keywords
etchant
gallium phosphide
liq
hydrogen peroxide
hydrofluoric acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17397987A
Other languages
Japanese (ja)
Inventor
Eiji Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP17397987A priority Critical patent/JPS6417879A/en
Publication of JPS6417879A publication Critical patent/JPS6417879A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To distinctly and stably expose a dislocation pit by using a liq. mixture contg. hydrofluoric acid and hydrogen peroxide to etch th gallium phosphide crystal having a (100) face. CONSTITUTION:Hydrogen peroxide and hydrofluoric acid are mixed to prepare a liq. etchant. In this case, a 50wt.% soln. of hydrogen peroxide and a 30wt.% soln. of hydrofluoric acid are mixed in the volume ratio of about 1/4-4/1. The gallium phosphide having a (100) face is etched by using the obtained liq. etchant. As a result, the etched pit corresponding to dislocation can be exposed in the form of an inverted quadrangular pyramid, and can be accurately observed by a differential interference microscope, etc. In addition, the etchant is appropriately kept at about 80 deg.C, phosphoric acid, nitric acid, etc., can be added to the etchant, or the etchant can be diluted with water.
JP17397987A 1987-07-14 1987-07-14 Method for etching gallium phosphide crystal and liquid etchant used therefor Pending JPS6417879A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17397987A JPS6417879A (en) 1987-07-14 1987-07-14 Method for etching gallium phosphide crystal and liquid etchant used therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17397987A JPS6417879A (en) 1987-07-14 1987-07-14 Method for etching gallium phosphide crystal and liquid etchant used therefor

Publications (1)

Publication Number Publication Date
JPS6417879A true JPS6417879A (en) 1989-01-20

Family

ID=15970557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17397987A Pending JPS6417879A (en) 1987-07-14 1987-07-14 Method for etching gallium phosphide crystal and liquid etchant used therefor

Country Status (1)

Country Link
JP (1) JPS6417879A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0540497A2 (en) * 1991-10-29 1993-05-05 Alcatel Austria Aktiengesellschaft Method of making solid solder coatings
JPH0722895U (en) * 1993-09-30 1995-04-25 丸石自転車株式会社 Bicycle brake booster
USRE39126E1 (en) * 1992-01-24 2006-06-13 Micron Technology, Inc. Two-step chemical mechanical polishing process for producing flush and protruding tungsten plugs
CN103217328A (en) * 2013-03-26 2013-07-24 中国科学院上海技术物理研究所 Corrosion liquid used for revealing various defects of cadmium zinc telluride crystals
CN110205681A (en) * 2019-06-03 2019-09-06 中国科学院半导体研究所 Indium arsenide single-chip dislocation corrosion liquid and dislocation corrosion detecting method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0540497A2 (en) * 1991-10-29 1993-05-05 Alcatel Austria Aktiengesellschaft Method of making solid solder coatings
USRE39126E1 (en) * 1992-01-24 2006-06-13 Micron Technology, Inc. Two-step chemical mechanical polishing process for producing flush and protruding tungsten plugs
JPH0722895U (en) * 1993-09-30 1995-04-25 丸石自転車株式会社 Bicycle brake booster
CN103217328A (en) * 2013-03-26 2013-07-24 中国科学院上海技术物理研究所 Corrosion liquid used for revealing various defects of cadmium zinc telluride crystals
CN110205681A (en) * 2019-06-03 2019-09-06 中国科学院半导体研究所 Indium arsenide single-chip dislocation corrosion liquid and dislocation corrosion detecting method

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