CS220088A1 - Method of photoresist layers' surface treatment,applicated on semiconductor plate - Google Patents

Method of photoresist layers' surface treatment,applicated on semiconductor plate

Info

Publication number
CS220088A1
CS220088A1 CS882200A CS220088A CS220088A1 CS 220088 A1 CS220088 A1 CS 220088A1 CS 882200 A CS882200 A CS 882200A CS 220088 A CS220088 A CS 220088A CS 220088 A1 CS220088 A1 CS 220088A1
Authority
CS
Czechoslovakia
Prior art keywords
applicated
surface treatment
photoresist layers
semiconductor plate
semiconductor
Prior art date
Application number
CS882200A
Other languages
Czech (cs)
Other versions
CS269152B1 (en
Inventor
Milos Ing Rothbauer
Zdenek Ing Novotny
Original Assignee
Rothbauer Milos
Novotny Zdenek
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rothbauer Milos, Novotny Zdenek filed Critical Rothbauer Milos
Priority to CS882200A priority Critical patent/CS269152B1/en
Publication of CS220088A1 publication Critical patent/CS220088A1/en
Publication of CS269152B1 publication Critical patent/CS269152B1/en

Links

CS882200A 1988-03-31 1988-03-31 Method of photoresist layers' surface treatment,applicated on semiconductor plate CS269152B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CS882200A CS269152B1 (en) 1988-03-31 1988-03-31 Method of photoresist layers' surface treatment,applicated on semiconductor plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CS882200A CS269152B1 (en) 1988-03-31 1988-03-31 Method of photoresist layers' surface treatment,applicated on semiconductor plate

Publications (2)

Publication Number Publication Date
CS220088A1 true CS220088A1 (en) 1989-09-12
CS269152B1 CS269152B1 (en) 1990-04-11

Family

ID=5358426

Family Applications (1)

Application Number Title Priority Date Filing Date
CS882200A CS269152B1 (en) 1988-03-31 1988-03-31 Method of photoresist layers' surface treatment,applicated on semiconductor plate

Country Status (1)

Country Link
CS (1) CS269152B1 (en)

Also Published As

Publication number Publication date
CS269152B1 (en) 1990-04-11

Similar Documents

Publication Publication Date Title
DE68921273D1 (en) System for the continuous treatment of semiconductor substrates.
GB2193346B (en) A method of rinsing a substrate from which the resist layer has been removed
EP0342496A3 (en) Light-sensitive composition, and process for the formation of relief patterns
DE3367287D1 (en) Displacement device, particularly for the photolithographic treatment of a substrate
EP0335383A3 (en) Semiconductor device having a metallization film layer semiconductor device having a metallization film layer
IL89927A (en) Process for the surface treatment of soil
EP0559986A3 (en) Method for producing semiconductor wafer and substrate used for producing the semiconductor
EP0327253A3 (en) Forming films, e.g. of amorphous silicon
GB8801171D0 (en) Method of manufacturing semiconductor device
IT8622838A0 (en) BLACK DECORATIVE LAYER FOR WEAR PROTECTION.
EP0432713A3 (en) Process for the preparation of images on tonable light-sensitive layers
GB9118724D0 (en) Multiple layer semiconductor
CS220088A1 (en) Method of photoresist layers' surface treatment,applicated on semiconductor plate
GB2228489B (en) Surface treatment
EP0341148A3 (en) A semiconductor substrate having a superconducting thin film, and a process for producing the same
SG63582A1 (en) Method for improving deposit of photoresist on wafers
EP0432599A3 (en) Light-sensitive composition, and process for the formation of relief patterns
EP0325939A3 (en) Process for planarizing the surfaces of semiconductors
EP0424737A3 (en) Light-sensitive composition, and process for the formation of relief pattern
DE3279843D1 (en) Method for forming patterned resist layer on semiconductor body
CS591886A1 (en) Method of photoresist layers' surface treatment
FR2627902B1 (en) METHOD FOR MOUNTING THE SURFACE OF A SEMICONDUCTOR DEVICE
CS396186A1 (en) Method of recessed regions formation on semiconductor plate's surface
GB8815339D0 (en) Treatment of semiconductor layer
CS463089A2 (en) Method of semiconductor elements' surface treatment